JP2009147236A - Vacuum processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus capable of carrying out high-speed substrate transfer when a deposition processing, etc., is carried out on a large substrate. <P>SOLUTION: The vacuum processing apparatus includes a transfer chamber 10, first processing chambers 12-1 and 12-2, second processing chambers 12-3 and 12-4, first substrate transfer trucks 20-1 and 20-2, and second substrate transfer trucks 20-3 and 20-4. The transfer chamber 10 extends in an X direction, and includes a first transfer area 10-1 and a second transfer area 10-2. The first processing chambers 12-1 and 12-2 are connected to the side of the first transfer area 10-1, while the second processing chambers 12-3 and 12-4 are connected to the side of the second transfer area 10-2. The first substrate transfer trucks 20-1 and 20-2 move in the first transfer area 10-1, while the second substrate transfer trucks 20-3 and 20-4 move in the second transfer area 10-2. The first substrate transfer trucks 20-1 and 20-2 transfer a substrate 2 to/from at least one of the second processing chambers 12-3 and 12-4 and the first processing chambers 12-1 and 12-2, while second substrate transfer trucks 20-3 and 20-4 transfer the substrate 2 to/from the second processing chambers 12-3 and 12-4. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

  The present invention relates to a vacuum processing apparatus.

  2. Description of the Related Art A vacuum processing apparatus that performs a film forming process on a substrate, an etching process of a formed film, etc. in a vacuum or a reduced pressure atmosphere is known. The vacuum processing apparatus may have a plurality of processing chambers in order to perform a plurality of processes in parallel. For example, in the case of forming a thin-film solar battery, p-layer, i-layer, and n-layer semiconductor layers are stacked as photoelectric conversion layers on a substrate. In this case, the vacuum processing apparatus is provided with a dedicated processing chamber (film forming chamber) for each semiconductor layer, and simultaneously performs film formation for each layer. Thereby, a vacuum processing apparatus can be used efficiently and the time concerning formation of a photoelectric converting layer can be shortened.

  As an example of such a vacuum processing apparatus, JP-A-2001-127133 discloses a cluster type vacuum processing system. FIG. 1 is a schematic diagram showing this cluster type vacuum processing system. In this cluster type vacuum processing system, substrates are successively transferred to a plurality of processing chambers for processing. The cluster type vacuum processing system is arranged around a common transfer chamber (330) located in the center and around the common transfer chamber (330), and gate valves (340A to 340E, 340H) with respect to the common transfer chamber (330). A plurality of vacuum processing chambers (370A to 370E, 380) that are provided so as to be able to communicate with each other via a vacuum chamber, respectively, and a gate valve (340F) with respect to the common transfer chamber (330). Via the gate valve (340G) and the load chamber (310) provided so that the substrate (G) can be communicated via the gate valve (340G). The substrate (G) is carried between the load chamber (320), the vacuum processing chambers (370A to 370E, 80), the common transfer chamber (330), the load chamber (310), and the unload chamber (320). At least three conveying carriage for (306A / 306B, 306C / 306D, 306E / 306F); and a. This cluster type vacuum processing system uses a plurality of substrate transport carts in a vacuum processing apparatus. And it has the cart waiting room which suppresses the interference between several board | substrate conveyance trolleys.

  Japanese Laid-Open Patent Publication No. 2006-264826 discloses a vacuum processing apparatus. FIG. 2 is a schematic view showing this vacuum processing apparatus. The vacuum processing apparatus includes a transfer chamber (402), a plurality of process chambers (403-1 to 403-6) connected to the transfer chamber (402) and vacuum-supported by supporting the substrate inclined from the vertical direction. And a substrate transfer device (406) that moves in the transfer chamber (402). The substrate transfer device (406) is configured to support and carry the substrate from one processing chamber among the plurality of processing chambers (403-1 to 403-6) to the transfer chamber (402) while being inclined. The substrate is inclined and supported from the transfer chamber (402) into the other processing chambers (403-1 to 403-6). The substrate transfer device (406) includes a first frame that supports the substrate, a second frame that supports the first frame so as to be movable in the loading / unloading direction from the inside of the transfer chamber toward the inside of the processing chamber, and the second frame. A third frame that supports the third frame so as to be movable in the loading / unloading direction, and a slide base that supports the third frame so as to be movable in the loading / unloading direction. The slide base moves in a movement direction that is not parallel to the carry-in / out direction, and the first frame is formed of a rod-shaped member. This vacuum processing apparatus has a substrate transfer mechanism for transferring a substrate in a central transfer chamber arranged in parallel. Note that gate valves (411, 415, 407-1 to 407) are provided between the load chamber (404), the unload chamber (405), and the plurality of processing chambers (403-1 to 403-6) and the transfer chamber (402). -6) is provided.

  Japanese Patent Laid-Open No. 6-5687 discloses a vacuum processing apparatus. This vacuum processing apparatus divides a load lock chamber for storing a plurality of semiconductor substrates and a transfer chamber arranged so as to surround a plurality of vacuum processing chambers for processing the semiconductor substrates one by one up and down. And a substrate handling arm for carrying in, placing and unloading the semiconductor substrate between each vacuum processing chamber and the load lock chamber, and in each vacuum processing chamber, cooperating with these substrate handling arms And a substrate lifter for moving the semiconductor substrate by moving up and down. Although this vacuum processing apparatus does not use a substrate transfer carriage, the transfer chamber is divided into upper and lower parts, and two upper and lower lines are transferred simultaneously by the substrate transfer handling arm.

  Japanese Unexamined Patent Application Publication No. 2002-184706 discloses a vacuum processing apparatus. The vacuum processing apparatus includes a main vacuum chamber, a hand disposed in the main vacuum chamber, a transport mechanism for reciprocating the hand in the horizontal direction in the vacuum chamber, an upper portion of the main vacuum chamber, It has a plurality of processing chambers arranged above the movement trajectory, and a lifting device arranged below each processing chamber in the main vacuum chamber and configured to be vertically movable. Although the substrate processing carriage is not used in the vacuum processing apparatus, the substrate is horizontally transferred at the upper part of the main vacuum chamber, and the processed substrate is returned and transferred below the substrate.

JP 2001-127133 A JP 2006-264826 A Japanese Patent Laid-Open No. 06-05687 JP 2002-184706 A

  When a large substrate is transported in a vacuum processing apparatus, as described in Patent Document 1 and Patent Document 2, a technology has been developed in which a large substrate is transported by a transport carriage while being inclined and supported by its own weight. Yes. Here, when a large substrate is transferred to a plurality of processing chambers, when a plurality of transfer carriages are used in a cluster-type vacuum processing apparatus (Patent Document 1) (FIG. 1), there are many pinion shafts for driving the transfer carriages. It takes time to make adjustments, including synchronous adjustment of the pinion shaft and position adjustment of the transport carriage. On the other hand, when a single transfer carriage is used in the parallel type vacuum processing apparatus (Patent Document 2) (FIG. 2), even if the transfer speed of the substrate and the transfer speed of the substrate are improved, the substrates in the plurality of film forming chambers are Since the conveyance processing cannot be performed at the same time, there is a limit to shortening the tact time. A vacuum processing apparatus that is easy to adjust and capable of transporting the substrate at high speed is desired when performing film forming processing on a larger substrate.

  An object of the present invention is to provide a vacuum processing apparatus capable of transporting a substrate at a high speed when performing a film forming process or the like on a large substrate.

  Another object of the present invention is to provide a vacuum processing apparatus that can be easily adjusted and transported at a high speed when performing a film forming process on a large substrate.

  These objects and other objects and benefits of the present invention can be easily confirmed by the following description and the accompanying drawings.

  Hereinafter, means for solving the problem will be described using the numbers and symbols used in the best mode for carrying out the invention. These numbers and symbols are added in parentheses in order to clarify the correspondence between the description of the claims and the best mode for carrying out the invention. However, these numbers and symbols should not be used for interpreting the technical scope of the invention described in the claims.

The vacuum processing apparatus of the present invention includes a transfer chamber (10), a plurality of first processing chambers (12-1 to 12-2), a plurality of second processing chambers (12-3 to 12-4), 1 board | substrate conveyance trolley (20-1 to 20-2) and a 2nd board | substrate conveyance trolley (20-3 to 20-4) are comprised. Here, the transfer chamber (10) includes a first transfer region (10-1) and a second transfer region (10-2) that extend in the first direction (X direction) and are adjacent to each other. The plurality of first processing chambers (12-1 to 12-2) are connected along the first direction (X direction) to the first transfer region (10-1) side of the transfer chamber (10) to form a substrate. (2) is vacuum processed. The plurality of second processing chambers (12-3 to 12-4) are connected along the first direction (X direction) to the second transfer region (10-2) side of the transfer chamber (10), and the substrate (2) is vacuum processed. The first substrate transfer carts (20-1 to 20-2) move along the first direction (X direction) in the first transfer region (10-1) of the transfer chamber (10). The second substrate transfer carts (20-3 to 20-4) move along the first direction (X direction) in the second transfer region (10-2) of the transfer chamber (10). The first substrate transport carts (20-1 to 20-2) include at least one of a plurality of second processing chambers (12-3 to 12-4) and a plurality of first processing chambers (12-1 to 12-2). The board (2) is carried into or out of the board. The second substrate transport carts (20-3 to 20-4) carry the substrate (2) into or out of the plurality of second processing chambers (12-3 to 12-4).
In the present invention, in the transfer chamber (10), the first substrate transfer carts (20-1 to 20-2) move in the first transfer region (10-1) and the second substrate transfer carts (20-3 to 20). -4) moves in the second transport area (10-2). Therefore, two or more substrate transfer carts (20) can be used simultaneously in the transfer chamber (10). Thereby, a board | substrate (2) can be carried in or out of each process chamber (12), without generating useless time by board | substrate delivery time, trolley | bogie movement time, trolley | bogie waiting time, etc. That is, the waiting time of the substrate transfer cart (20) and the film forming chamber (12) can be significantly reduced. As a result, it is possible to increase the speed of substrate conveyance.

  In the cluster-type vacuum processing system of Patent Document 1, a plurality of substrate transfer carts are used. However, there is one common area where the substrate transfer cart can be moved in the transfer chamber, and a plurality of the substrate transfer carts can simultaneously move within the area. The substrate transfer carriage cannot be operated. That is, it is not described that a plurality of areas in which the substrate transfer carriage can be moved in the transfer chamber are provided and the substrate transfer carriage is used in each of the plurality of areas.

  In the vacuum processing apparatus of Patent Document 2, there is one region in which the substrate transfer carriage can be moved in the transfer chamber, and it is assumed that the substrate transfer is performed using one substrate transfer carriage. That is, it is not described that a plurality of areas in which the substrate transfer carriage can be moved in the transfer chamber are provided and the substrate transfer carriage is used in each of the plurality of areas.

  In the vacuum processing apparatus of Patent Document 3, an upper transfer chamber and a lower transfer chamber in which a substrate can be transferred are provided in the transfer chamber, but a handling arm is used instead of a substrate transfer carriage. The arrangement configuration is a cluster type instead of a parallel type, which is different from the vacuum processing apparatus of the present invention.

  In the vacuum processing apparatus of Patent Document 4, it is disclosed that two hands that transport a substrate move in different trajectories in the transport chamber, but the processing chambers to which the substrate is transported are quite common, When a hand carries in / out a substrate to / from the processing chamber, the influence on the movement of the other hand is large (there are many restrictions). This is because the area related to the loading / unloading of the substrate between one hand and the processing chamber always crosses the path of the other hand. That is, the arrangement configuration of the processing chamber is different from the vacuum processing apparatus of the present invention.

In the above vacuum processing apparatus, each of the first substrate transport cart (20-1 to 20-2) and the second substrate transport cart (20-3 to 20-4) is movable in the first direction (X direction). It is preferable to include a trolley base (50, 50a) and a first direction drive mechanism for moving the trolley base (50, 50a) in the first direction (X direction).
In the present invention, each of the first substrate transport cart (20-1 to 20-2) and the second substrate transport cart (20-3 to 20-4) has an independent drive mechanism, and each has a different transport area ( 10-1 and 10-2), the substrate can be transferred without being interfered with each other.

In the vacuum processing apparatus, the first direction driving mechanism includes a first rotation driving unit (91), a lower support (30), a first ball screw (32), a first ball spline (34), A two-ball screw (38) is preferably provided. In this case, the 1st rotation drive part (91) is being fixed to the conveyance chamber (10). The lower support (30) assists the movement of the carriage base (50, 50a). In the first ball screw (32), the first screw shaft (32b) extends in the first direction (X direction), and is rotated from one end side by the first rotation driving unit (91), and the first ball screw (32) is rotated by the lower support (30). It is connected via a nut (32a). In the first ball spline (34), the first spline shaft (34b) extends in the first direction (X direction), and the rotation of the gear (33) on the other end side of the first ball screw (32) The first spline shaft (34b) is rotatably fixed to the lower support (30) while being transmitted through the gear (35) of the tube (34a). In the second ball screw (38), the second screw shaft (38b) extends in the first direction (X direction), and the rotation of the gear (36) at the end of the first ball spline (34) 37) and is coupled to the carriage base (50, 50a) via the second nut (38a), and the second screw shaft (38b) is rotatably fixed to the lower support (30). The
In the present invention, the first direction driving mechanism for driving the substrate transport carriage (20) in the first direction (X direction) is not a method using an ultra-long ball screw, but a relatively easy to obtain long one. The ball screw (32, 38) is driven in two stages. This makes it possible to use ball screws (32, 38) having a length that is easily available and has high rigidity and reliability, and can improve the reliability of the present drive mechanism. In addition, it becomes unnecessary to provide the drive mechanism with very high rigidity for suppressing the vibration of the ball screw that is required when using an extremely long ball screw. Therefore, it is possible to drive the substrate transport carriage (20) at a high speed while keeping the influence of the vibration of the ball screw to be small, and it is possible to reduce the tact time and to greatly reduce the cost.

In the above vacuum processing apparatus, the first direction drive mechanism includes a first rotation drive unit (91), a lower support (30) and an auxiliary lower support (40), a first ball screw (32), and a first It is preferable to provide a ball spline (34), a second ball screw (38), a second ball spline (44), and a third ball screw (48). In this case, the 1st rotation drive part (91) is being fixed to the conveyance chamber (10). The lower support (30) and the auxiliary lower support (40) assist the movement of the carriage base (50, 50a). In the first ball screw (32), the first screw shaft (32b) extends in the first direction (X direction), and is rotated from one end side by the first rotation driving unit (91), and the first ball screw (32) is rotated by the lower support (30). It is connected via a nut (32a). In the first ball spline (34), the first spline shaft (34b) extends in the first direction (X direction), and the rotation of the gear (33) on the other end side of the first ball screw (32) The first spline shaft (34b) is rotatably fixed to the lower support (30) while being transmitted through the gear (35) of the tube (34a). In the second ball screw (38), the second screw shaft (38b) extends in the first direction (X direction), and the rotation of the gear (36) at the end of the first ball spline (34) 37) and is coupled to the auxiliary lower support (40) via the second nut (38a), and the second screw shaft (38b) is rotatably fixed to the lower support (30). The In the second ball spline (44), the second spline shaft (44b) extends in the first direction (X direction), and the rotation of the gear (37) at the end of the second ball screw (38) causes the lower support ( 30) is transmitted via a gear (43) rotatably coupled to the second slide outer cylinder (44a) and a gear (45) of the second slide outer cylinder (44a), and the second spline shaft (44b) is rotatable to an auxiliary lower support. (40). In the third ball screw (48), the third screw shaft (48b) extends in the first direction (X direction), and the rotation of the gear (46) at the end of the second ball spline (44) 47) and coupled to the carriage base (50, 50a) via the third nut (48a), and the third screw shaft (48b) is rotatably fixed to the auxiliary lower support (40). Is done.
In the present invention, the first direction driving mechanism for driving the substrate transport carriage (20) in the first direction (X direction) is not a method using an ultra-long ball screw, but a relatively easy to obtain long one. The ball screw (32, 38, 48) is driven in three stages. Accordingly, it is possible to move a long distance by using a ball screw (32, 38, 48) having a length that is easily available and has high rigidity and reliability, and the reliability of the drive mechanism can be improved. In addition, it becomes unnecessary to provide the drive mechanism with very high rigidity for suppressing the vibration of the ball screw, which is necessary when using an extremely long ball screw. Therefore, it is possible to drive the substrate transport carriage (20) at a high speed while keeping the influence of the vibration of the ball screw to be small, and it is possible to reduce the tact time and to greatly reduce the cost.

In the above vacuum processing apparatus, the plurality of first processing chambers (12-1 to 12-2) and the plurality of second processing chambers (12-3 to 12-4) are arranged in the second direction from the transfer chamber (10) ( It is preferable that they are connected so as to extend in the Y direction). In this case, each of the first substrate transport cart (20-1 to 20-2) and the second substrate transport cart (20-3 to 20-4) includes an upper cart base (60 to 80) and a second direction drive mechanism. Are further provided. The upper carriage base (60 to 80) is provided on the carriage base (50, 50a), can move in the second direction (Y direction), and can mount the substrate (2). The second direction driving mechanism is for moving the upper carriage base (60 to 80) in the second direction (Y direction). The first direction drive mechanism moves the carriage base (50, 50a) in the first direction (X direction), and the second direction drive mechanism moves the upper carriage base (60-80) in the second direction (Y direction). Moving.
In the present invention, each of the first substrate transport carts (20-1 to 20-2) and the second substrate transport carts (20-3 to 20-4) is moved to the cart base (50, 50a) by the first direction drive mechanism. ) Is moved in the first direction (X direction) to reach the front of the desired processing chamber (12), and the upper carriage base (60 to 80) installed thereon is moved to the second position by the second direction driving mechanism. The substrate (2) can be carried into / out of the desired processing chamber (12) by moving in the direction (Y direction).

In the above vacuum processing apparatus, the second direction driving mechanism includes the second rotation driving unit (92), the lower support (30), the third ball spline (111), and the fourth ball spline (114). It is preferable to include a first bevel gear (117), a first pinion (126), and a first rack (127). In this case, the second rotation drive unit (92) is fixed to the transfer chamber (10). The lower support (30) assists the movement of the carriage base (50). The third ball spline (111) has a third spline shaft (111b) extending in the first direction (X direction) and is rotated from one end side by the second rotation drive unit (92), and the third slide outer cylinder (111a) The third spline shaft (111b) is rotatably coupled to the lower support (30) via the. The fourth ball spline (114) has the fourth spline shaft (114b) extending in the first direction (X direction), and the rotation of the gear (112) of the third slide outer cylinder (111a) of the third ball spline (111). Is transmitted through the gear (113) at the end, and the fourth spline shaft (114b) is rotatably fixed to the lower support (30). The first bevel gear (117) is coupled to the gear (115) of the fourth slide outer cylinder (114a) of the fourth ball spline (114) via the gear (116) at one end, (50) is provided at the other end of the first rotating shaft (118) extending in the first direction (X direction) coupled rotatably. The first pinion (126) is coupled to the first bevel gear (117) via the second bevel gear (124) at one end, and extends in the third direction (Z direction). And are coaxially coupled. The first rack (127) is provided on the upper carriage base (60), extends in the second direction (Y direction), and is coupled to the first pinion (126).
In the present invention, the rotational driving force for expanding and moving the upper carriage base (60 to 80) in the second direction (Y direction) is the first using the two third and fourth ball splines (111, 114). -It is transmitted to the second bevel gear (117, 124). The upper pinion base (60) is provided by rotating the first pinion (126) by the rotation of the second rotating shaft (125) coupled with the second bevel gear (124) and extending in the third direction (Z direction). The first rack (127) can be slid in the Y direction. Thereby, the upper cart base (60 to 80) can be slid in the Y direction. Also in this case, it is not necessary to use a special ultra-long ball spline, and it is possible to use a ball spline or the like that is short and has high rigidity and reliability. Therefore, the reliability of this drive mechanism can be improved.
When the carriage base (50) includes a lifting carriage base (50a) that can be raised and lowered in the third direction (Z direction), the second rotating shaft (125) extending in the third direction (Z direction) is the second rotation shaft (125). This is a spline shaft (125b) of a 7-ball spline (125), and the first pinion (126) is coupled to the seventh slide outer cylinder (125a), and the lifting carriage base (50a) is moved in the third direction (Z direction). Even if it moves, the relationship between the first pinion (126) and the first rack (127) can be maintained.

In the above vacuum processing apparatus, the plurality of first processing chambers (12-1 to 12-2) and the plurality of second processing chambers (12-3 to 12-4) are mutually connected to the transfer chamber (10). It is preferable that they are connected to different positions in the third direction (Z direction). In this case, at least one of the first substrate transport carts (20-1 to 20-2) and the second substrate transport carts (20-3 to 20-4) further includes a third direction drive mechanism, and the cart base ( 50, 50a) includes an elevating carriage base (50a) provided below the upper carriage base (60-80) and movable in the third direction (Z direction). The third direction drive mechanism is for moving the lifting carriage base (50a) in the third direction (Z direction). The first direction driving mechanism moves the carriage base (50, 50a) in the first direction (X direction), and the third direction driving mechanism moves the lifting carriage base (50a) in the third direction (Z direction). The second direction drive mechanism moves the upper carriage base (60 to 80) in the second direction (Y direction).
In the present invention, each of the first substrate transport carts (20-1 to 20-2) and the second substrate transport carts (20-3 to 20-4) is moved to the cart base (50, 50a) by the first direction drive mechanism. ) Is moved in the first direction (X direction), and the elevator cart base (50a) installed thereon is moved in the third direction (Z direction) by the third direction drive mechanism. It reaches the front of the chamber (12), and the upper carriage base (60 to 80) disposed thereon is moved in the second direction (Y direction) by the second direction driving mechanism to move to the desired processing chamber (12). It is possible to carry in / out the substrate (2) from / to the substrate.

In the above vacuum processing apparatus, the third direction driving mechanism includes a third rotation driving unit (93), a lower support (30), a fifth ball spline (101), a sixth ball spline (104), It is preferable to include a third bevel gear (107) and a fourth ball screw (123). In this case, the third rotation drive unit (93) is fixed to the transfer chamber (10). The lower support (30) assists the movement of the carriage base (50, 50a). In the fifth ball spline (101), the fifth spline shaft (101b) extends in the first direction (X direction), and is rotated from one end side by the third rotation driving unit (93), and the fifth spline shaft (101b) is rotated. It is rotatably coupled to the lower support (30) via the fifth slide outer cylinder (101a). The sixth ball spline (104) has a sixth spline shaft (104b) extending in the first direction (X direction), and the rotation of the gear (102) of the fifth slide outer cylinder (101a) of the fifth ball spline (101). Is transmitted through the end gear (103), and the sixth spline shaft (104b) is rotatably fixed to the lower support (30). The third bevel gear (107) is coupled to the gear (105) of the sixth slide outer cylinder (104a) of the sixth ball spline (104) via the gear (106) at one end, and the carriage base (50 , 50a) is rotatably connected to the other end of the third rotating shaft (108) extending in the first direction (X direction). The fourth ball screw (123) has a fourth screw shaft (123b) extending in the third direction (Z direction) and is coupled to the third bevel gear (107) via the fourth bevel gear (121) at the end. , It is connected to the lifting carriage base (50a) via the fourth nut (123a).
In the present invention, the rotational driving force for raising and lowering the elevating carriage base 50a in the third direction (Z direction) uses the fifth and sixth ball splines (101, 104) to provide the third and fourth caskets. It is transmitted to the gears (107, 121). The elevating carriage base 50a can be raised and lowered in the Z direction by a fourth ball screw (123) provided on the elevating carriage base (50a) and coupled to the fourth bevel gear (121). Also in this case, it is not necessary to use a special ultra-long ball spline, and it is possible to use a ball spline having a length that is easily available and having high rigidity and reliability. Therefore, the reliability of this drive mechanism can be improved. In addition, it becomes unnecessary to provide the drive mechanism with very high rigidity for suppressing the vibration of the ball spline that is required when using an extremely long ball spline. Accordingly, the substrate transport carriage (20) can be driven at a high speed while keeping the influence of the vibration of the ball spline to be small, and the tact time can be shortened and the cost can be greatly reduced.

In the above vacuum processing apparatus, it is preferable that there are a plurality of first substrate transfer carts (20-1 to 20-2) and second substrate transfer carts (20-3 to 20-4). In this case, the plurality of first processing chambers (12-1 to 12-2) and the plurality of second processing chambers (12-3 to 12-4) are not connected to the transfer chamber (10), and the first substrate transfer is performed. At least one of the cart (20-1 to 20-2) and the second substrate transport cart (20-3 to 20-4) includes a standby area (10a) in which the cart can stand by.
In the present invention, even if there are a plurality of first substrate transfer carts (20-1 to 20-2) and second substrate transfer carts (20-3 to 20-4), the first transfer region (10-1) is provided. And the board | substrate (2) can be conveyed simultaneously by moving the 2nd conveyance area | region (10-2).

In the above-described vacuum processing apparatus, the plurality of first processing chambers (12-1 to 12-2) and the plurality of second processing chambers (12-3 to 12-4) have the substrate (2) in a horizontal state or a horizontal state. It is preferable to process at a predetermined angle or less. In this case, the first substrate transport cart (20-1 to 20-2) and the second substrate transport cart (20-3 to 20-4) move the substrate (2) within a predetermined angle from the horizontal state or the horizontal state. Hold.
In the present invention, by holding the substrate (2) within a predetermined angle from the horizontal state or the horizontal state, the apparatus cross-sectional area can be suppressed to be small. By suppressing the apparatus cross-sectional area to be small, the installation area (occupied area) of the vacuum processing apparatus can be reduced. The predetermined angle is preferably 0 ° (horizontal) or more and 15 ° or less, or 75 ° or more and 90 ° (vertical).

In the above vacuum processing apparatus, the transfer chamber (10) including the first transfer region (10-1) and the second transfer region (10-2) extending in the first direction (X direction) and adjacent to each other; 10) a load chamber (11) provided on the first transfer region (10-1) side, and an unload chamber (12) provided on the second transfer region (10-2) side of the transfer chamber (10). It is preferable to further comprise. In this case, the substrate (2) is unloaded from the load chamber (11) by the first substrate transfer carriage (20-1), and the substrate (13) is transferred to the unload chamber (13) by the second substrate transfer carriage (20-2). 2) It can be executed simultaneously with loading.
In the present invention, the substrate (2) is unloaded from the load chamber (11), which takes time, and the substrate (2) is loaded into the unload chamber (13) at the same time. The time required for taking in and out the substrate (2) can be greatly shortened.

  According to the present invention, it is possible to obtain a vacuum processing apparatus that can be easily adjusted and transported at a high speed when performing a film forming process on a large substrate.

  Hereinafter, embodiments of a vacuum processing apparatus of the present invention will be described with reference to the accompanying drawings.

  FIG. 3 is a block diagram showing the configuration of the vacuum processing apparatus according to the embodiment of the present invention. The vacuum processing apparatus 1 performs a plurality of processes such as a film forming process and an etching process on a formed film on the plurality of substrates 2 in parallel. The empty processing apparatus 1 includes a central transfer chamber 10, a load chamber 11, a plurality of film forming chambers 12-1 to 12-2, a plurality of film forming chambers 12-3 to 12-4, and an unload chamber 13. And a plurality of first substrate transfer carts 20-1 to 20-2 and a plurality of second substrate transfer carts 20-3 to 20-4.

  The central transfer chamber 10 is a substantially rectangular parallelepiped chamber extending in the X direction, and can move a plurality of first substrate transfer carts 20-1 to 20-2 and a plurality of second substrate transfer carts 20-3 to 20-4. Is stored. The central transfer chamber 10 includes a lower central transfer chamber (first transfer region) 10-1 in the lower Z direction and an upper central transfer chamber (second transfer region) 10-2 in the upper Z direction. That is, the lower central transfer chamber 10-1 and the upper central transfer chamber 10-2 form two transfer regions extending in the X direction and adjacent to each other. However, there is no boundary wall at the boundary between the two transport areas. One of the two transport areas is a lower part in the Z direction (first transport area) and the other is an upper part in the Z direction (second transport area). However, the positional relationship between the upper part and the lower part is limited. Absent. Similarly, one of the plurality of film forming chambers 12-1 to 12-2 and the plurality of film forming chambers 12-3 to 12-4 is in the lower portion (first transfer region) in the Z direction, and the other is the upper portion in the Z direction ( Although it shows communication with the second conveyance area), the positional relationship between the upper part and the lower part is not limited. Furthermore, it is shown that one of the load chamber 11 and the unload chamber 13 communicates with the lower portion in the Z direction (first transport region) and the other communicates with the upper portion in the Z direction (second transport region). The positional relationship is not limited.

  The load chamber 11 is provided so as to be able to communicate with the lower central transfer chamber 10-1 via the gate valve 16-1. The load chamber 11 is connected to the lower central transfer chamber 10-1 so as to extend in the Y direction. The substrate 2 is carried into the load chamber 11 from the outside by a substrate carry-in device (not shown) through the gate valve 16-2, and is transferred from the load chamber 11 to the lower central transfer chamber 10-1 by the first substrate transfer carriage 20-1. It is carried in. The load chamber 11 adjusts the opening / closing timing of the gate valve 16-1 and the gate valve 16-2 and the timing of the vacuum / atmospheric pressure vent of the load chamber, and the lower central transfer chamber 10- via the gate valve 16-1. When communicating with No. 1, the load chamber 11 is in a vacuum state, and is devised so as not to obstruct the vacuum state of the lower central transfer chamber 10-1.

  The plurality of film forming chambers (first processing chambers) 12-1 to 12-2 can communicate with the lower central transfer chamber 10-1 via the gate valves 17-1 to 17-2, respectively, along the X direction. It is provided side by side. The plurality of film forming chambers 12-1 to 12-2 are connected to the lower central transfer chamber 10-1 so as to extend in the Y direction. The plurality of film forming chambers 12-1 to 12-2 perform predetermined processing in a vacuum (reduced pressure) atmosphere by closing the corresponding gate valves 17-1 to 17-2 with respect to the substrate 2. For example, a p-layer, i-layer, or n-layer semiconductor layer is formed on the substrate 2 as a photoelectric conversion layer for a thin-film solar cell. Note that the number of the plurality of film forming chambers is not limited to two. The number of film forming chambers can be increased or decreased according to the necessity of the film forming process.

  The plurality of film forming chambers (second processing chambers) 12-4 to 12-3 can communicate with the upper central transfer chamber 10-2 via the gate valves 17-4 to 17-3, respectively, along the X direction. It is provided side by side. The plurality of film forming chambers 12-4 to 12-3 are connected to the upper central transfer chamber 10-2 so as to extend in the Y direction. That is, the plurality of film forming chambers 12-1 to 12-2 and the plurality of film forming chambers 12-3 to 12-4 are connected to the central transfer chamber 10 at different positions in the Z direction. The plurality of film forming chambers 12-4 to 12-3 close the corresponding gate valves 17-4 to 17-3 with respect to the substrate 2 and execute a predetermined process in a vacuum (depressurized) atmosphere. For example, a p-layer, i-layer, or n-layer semiconductor layer is formed on the substrate 2 as a photoelectric conversion layer for a thin-film solar cell. Note that the number of the plurality of film forming chambers is not limited to two. The number of film forming chambers can be increased or decreased according to the necessity of the film forming process.

  Thus, the vacuum processing apparatus 1 is a parallel type vacuum processing apparatus in which a plurality of film forming chambers 12 are arranged in parallel on both sides of the central transfer chamber 10.

  The unload chamber 13 is provided so as to be able to communicate with the upper central transfer chamber 10-2 via the gate valve 18-1. The unload chamber 13 is connected to the upper central transfer chamber 10-2 so as to extend in the Y direction. The substrate 2 is unloaded from the upper central transfer chamber 10-2 to the unload chamber 11 by the second substrate transfer carriage 20-4, and is unloaded by the substrate unloading device (not shown) via the gate valve 18-2. From outside. Similar to the load chamber 11, the unload chamber 13 adjusts the opening / closing timing of the gate valve 18-1 and the gate valve 18-2 and the timing of the vacuum / atmospheric pressure vent in the unload chamber, and the upper central transfer chamber. It is devised so as not to disturb the vacuum state of 10-2.

  The gate valve 16-1 and the gate valve 18-1 are provided with interlock control. That is, control is performed so that the gate valve 16-1 can be opened when the load chamber 11 is in a vacuum atmosphere, and the gate valve 18-1 can be opened when the unload chamber 13 is in a vacuum atmosphere. By maintaining the vacuum state, contamination with other rooms is suppressed.

  It is preferable that the central transfer chamber 10, the load chamber 11, the plurality of film forming chambers 12-1 to 12-4, and the unload chamber 13 are formed of a stainless steel material from the viewpoint of satisfying corrosion resistance and member strength. The plurality of film forming chambers 12-1 to 12-4 are further formed of a stainless steel material (for example, SUS304) that is a nonmagnetic or weakly magnetic material so as not to inhibit plasma generation. The plurality of film forming chambers 12-1 to 12-4, the central transfer chamber 10, the load chamber 11, and the unload chamber 13 may be made of other materials (for example, an aluminum alloy or a surface depending on the processing content in vacuum atmosphere and design considerations. It is also possible to use a plated iron-based material.

  The first substrate transport cart 20-1 moves along the track 14 extending in the X direction in the lower central transport chamber 10-1. The first substrate transport cart 20-1 places the substrate 2 on the load chamber 11 and the plurality of film forming chambers 12-1 to 12-2, the unload chamber 13 and the plurality of film forming chambers 12-4 to 12-3. Carry in or out.

The first substrate transport carriage 20-1 includes a carriage base 20-1b, an upper carriage base 20-1a, and 1-1, 2-1 and 3-1 drive mechanisms (not shown). The carriage base 20-1b is provided so as to be movable in the X direction, and includes a lifting carriage base 20-1c. The lift carriage base 20-1c is provided below the upper carriage base 20-1a, and can move the upper carriage base 20-1a in the Z direction. The upper carriage base 20-1a is provided on the lifting carriage base 20-1c of the carriage base 20-1b so as to be movable in the Y direction, and the substrate 2 can be placed thereon. The 1-1 drive mechanism has the carriage base 20-1b in the X direction, the 3-1 drive mechanism has the lifting carriage base 20-1c in the Z direction, and the 2-1 drive mechanism has the upper carriage base 20-1a. Move in the Y direction respectively.
A plurality of film forming chambers 12-1 to 12-2 are moved by moving the carriage base 20-1 b in the first drive mechanism in the X direction and moving the upper carriage base 20-1 a in the Y direction in the second drive mechanism. The substrate 2 is carried in or out of the load chamber 11.
Furthermore, the movement of the carriage base 20-1b in the 1-1 drive mechanism in the X direction, the movement of the elevating carriage base 20-1c in the Z direction in the 3-1 drive mechanism, and the upper carriage base in the 2-1 drive mechanism The substrate 2 is carried into or out of the plurality of film forming chambers 12-4 to 12-3 and the unload chamber 13 by the movement in the Y direction of 20-1a.

  The first substrate transport carriage 20-2 moves along the track 14 extending in the X direction in the lower central transport chamber 10-1. The first substrate transport cart 20-2 carries the substrate 2 in or out of the plurality of film forming chambers 12-1 to 12-2 and the plurality of film forming chambers 12-4 to 12-3. However, the substrate 2 is not carried into or out of the load chamber 11 and the unload chamber 13. This is because the first substrate transfer carriage 20-1 is present, so that it cannot move to a position corresponding to the load chamber 11 and the unload chamber 13.

The first substrate transfer carriage 20-2 includes a first, second, second, third, second, third, and third bases provided separately from the carriage base 20-2b, the upper carriage base 20-2a, and the first substrate transfer carriage 20-1. 2 drive mechanism (not shown). The carriage base 20-2b is provided so as to be movable in the X direction, and includes a lifting carriage base 20-2c. The elevating carriage base 20-2c is provided below the upper carriage base 20-2a, and can move the upper carriage base 20-2a in the Z direction. The upper carriage base 20-2a is provided on the raising / lowering carriage base 20-2c of the carriage base 20-2b so as to be movable in the Y direction, and the substrate 2 can be placed thereon. The 1-2 drive mechanism has the carriage base 20-2b in the X direction, the 3-2 drive mechanism has the lifting carriage base 20-2c in the Z direction, and the 2-2 drive mechanism has the upper carriage base 20-2a. Move in the Y direction respectively.
A plurality of film forming chambers 12-1 to 12-2 are moved by the movement in the X direction of the carriage base 20-2 b in the 1-2 driving mechanism and the movement in the Y direction of the upper carriage base 20-2 a in the 2-2 driving mechanism. The substrate 2 is carried in or out.
Furthermore, the movement of the carriage base 20-2b in the X direction in the 1-2 driving mechanism, the movement of the elevating carriage base 20-2c in the Z direction in the 3-2 driving mechanism, and the upper carriage base in the 2-2 driving mechanism By the movement of 20-2a in the Y direction, the substrate 2 is carried into or out of the plurality of film forming chambers 12-4 to 12-3.

  As described above, the first substrate transport carts 20-1 and 20-2 are configured by being divided into three blocks. That is, the carriage bases 20-1b and 20-2b (base 1) are movable in the X direction. The elevating carriage bases 20-1c and 20-2c (base 2) provided on the carriage base are movable in the Z direction. The upper carriage bases 20-1a and 20-2a (base 3) provided on the elevating carriage base are movable in the Y direction. The substrate 2 can be carried into and out of the film forming chamber 12 by each of the base 1 / base 2 / base 3 drive mechanisms (moving mechanisms).

  The second substrate transport cart 20-4 is suspended on the track 15 extending in the X direction in the upper central transport chamber 10-2, and moves along it. The second substrate transport carriage 20-4 carries the substrate 2 in and out of the unload chamber 13 and the plurality of film forming chambers 12-4 to 12-3.

The second substrate transport carriage 20-4 includes a carriage base 20-4b, an upper carriage base 20-4a, and first and second to fourth driving mechanisms (not shown). The carriage base 20-4b is provided so as to be movable in the X direction. The upper carriage base 20-4a is provided on the carriage base 20-4b so as to be movable in the Y direction. The upper carriage base 20-4a can place the substrate 2 thereon. The first to fourth drive mechanisms move the carriage base 20-4b in the X direction, and the second to fourth drive mechanisms move the upper carriage base 20-4a in the Y direction.
A plurality of film forming chambers 12-4 to 12-3 are obtained by moving the carriage base 20-4b in the first to fourth drive mechanisms in the X direction and moving the upper carriage base 20-4a in the second and fourth drive mechanisms in the Y direction. The substrate 2 is carried in or out of the unload chamber 13.

  The second substrate transfer cart 20-3 moves along the track 15 extending in the X direction in the upper central transfer chamber 10-2. The second substrate transport cart 20-3 carries the substrate 2 in or out of the plurality of film forming chambers 12-4 to 12-3. However, the substrate 2 is not carried into or out of the unload chamber 13. This is because the second substrate transfer carriage 20-4 is present, so that it cannot move to a position corresponding to the unload chamber 13.

The second substrate transport carriage 20-3 includes a carriage base 20-3b, an upper carriage base 20-3a, and first and second and second-3 drive mechanisms (not shown). The carriage base 20-3b is provided so as to be movable in the X direction. The upper carriage base 20-3a is provided on the carriage base 20-3b so as to be movable in the Y direction. The upper carriage base 20-3a can place the substrate 2 thereon. The 1-3 drive mechanism moves the carriage base 20-3b in the X direction, and the 2-3 drive mechanism moves the upper carriage base 20-3a in the Y direction.
A plurality of film forming chambers 12-4 to 12-3 are obtained by moving the carriage base 20-3b in the X direction in the first-3 driving mechanism and moving in the Y direction in the upper carriage base 20-3a in the second-3 driving mechanism. The substrate 2 is carried in or out.

  As described above, the second substrate transport carts 20-4 and 20-3 are divided into two blocks. That is, the truck bases 20-4b and 20-3b (base 1) are movable in the X direction. The upper carriage bases 20-4a and 20-3a (base 3) provided on the carriage base are movable in the Y direction. The substrate 2 can be carried into and out of the film forming chamber 12 by the base 1 / base 3 drive mechanism (moving mechanism).

  FIG. 3 shows the following state as an example. That is, the first substrate transport cart 20-1 carries in or out the substrate 2 with the load chamber 11 by the upper mounting table 10-1a. The first substrate transport cart 20-2 carries in or out the substrate 2 with the film forming chamber 12-4 by the lifting platform 20-2c and the upper cart base 20-2a. The second substrate transport carriage 20-3 carries in or out the substrate 2 with the film forming chamber 12-3. The second substrate transport carriage 20-4 carries in or out the substrate 2 with the unload chamber 13.

  FIG. 4 is a schematic cross-sectional view showing the configuration of the vacuum processing apparatus according to the embodiment of the present invention. This figure shows a schematic diagram of a cross section in the Y direction of the central transfer chamber 10.

  The central transfer chamber 10 includes a lower central transfer chamber 10-1 at the lower portion in the Z direction and an upper central transfer chamber 10-2 at the upper portion in the Z direction, and has a boundary wall at the boundary between both transfer chambers (transfer regions). Not. In the lower central transfer chamber 10-1, an opening 26 at a position 23-1 corresponding to the load chamber 11 and the gate valve 16-1, a position 23-2 corresponding to the film forming chamber 12-1 and the gate valve 17-1. The openings 27-2 are respectively provided at positions 23-3 corresponding to the openings 27-1, the film forming chamber 12-2, and the gate valve 17-2. Further, in the upper central transfer chamber 10-2, an opening 28 at a position 23-1 corresponding to the unload chamber 13 and the gate valve 18-1, a position corresponding to the film forming chamber 12-4 and the gate valve 17-4. An opening 27-3 is provided at the position 23-3 corresponding to the opening 27-4, the film forming chamber 12-3, and the gate valve 17-3. The central transfer chamber 10 further has a retreat area 10a at the end opposite to the end to which the load chamber 11 and the unload chamber 13 are connected. In the retreat area 10a, the first substrate transport cart 20-2 and the second substrate transport cart 20-3 can be temporarily retracted, and the first substrate transport cart 20-1 and the second substrate transport cart 20-4 can be retracted. It has been devised to avoid interference.

  The first substrate transport cart 20-1 is movable in the X direction and is movable to positions 23-1, 23-2, 23-3 in the lower central transport chamber 10-1. Thereby, the board | substrate 2 can be carried in or carried out with respect to the load chamber 11, the film forming chamber 12-1, and the film forming chamber 12-2. Further, a part of the first substrate transport cart 20-1 can also move in the Z direction, and a part of the first substrate transport cart 20-1 is located at positions 23-1, 23-2, 23-3 in the upper central transport chamber 10-2. It is movable. Thereby, the board | substrate 2 can be carried in or carried out with respect to the unload chamber 13, the film forming chamber 12-4, and the film forming chamber 12-3.

  The first substrate transport cart 20-2 is movable in the X direction, and is movable to positions 23-2 and 23-3 in the lower central transport chamber 10-1 and a position 22-1 in the retreat area 10a. Thereby, the board | substrate 2 can be carried in or carried out with respect to the film-forming chamber 12-1 and the film-forming chamber 12-2. Further, a part of the first substrate transport cart 20-2 can also move in the Z direction, and a part thereof can move to positions 23-2 and 23-3 in the upper central transport chamber 10-2. . Thereby, the board | substrate 2 can be carried in or carried out with respect to the film-forming chamber 12-4 and the film-forming chamber 12-3.

  The second substrate transport carriage 20-4 is movable in the X direction and is movable to positions 23-1, 23-2, 23-3 in the upper central transport chamber 10-2. Thereby, the board | substrate 2 can be carried in or carried out with respect to the unload chamber 13, the film forming chamber 12-4, and the film forming chamber 12-3. The second substrate transport cart 20-4 cannot move in the Z direction.

  The second substrate transport carriage 20-3 can move in the X direction, and can move to the positions 22-2 and 23-3 in the upper central transfer chamber 10-2 and the retreat area 10a. Thereby, the board | substrate 2 can be carried in or carried out with respect to the film-forming chamber 12-4 and the film-forming chamber 12-3. Note that the second substrate transport carriage 20-3 cannot move in the Z direction.

  In FIG. 4, as in the case of FIG. 3, the following state is shown as an example. That is, the first substrate transport carriage 20-1 carries in or out the substrate 2 through the opening 26 with the load chamber 11 by the upper mounting table. The first substrate transport cart 20-2 carries in or out the substrate 2 through the opening 27-4 between the film forming chamber 12-4 and the lift platform 20-2c and the upper cart base 20-2a. ing. The second substrate transport carriage 20-3 carries in or out the substrate 2 through the opening 27-3 with the film forming chamber 12-3. The second substrate transport carriage 20-4 carries in or out the substrate 2 through the opening 28 with the unload chamber 13.

  FIG. 5 is a schematic diagram showing the operation of each substrate transport cart according to the present embodiment. 5A is a schematic view from the upper surface in the Z direction, and FIG. 5B is a schematic view from the side surface (cross section) in the Y direction. Here, as an example, a case where a p-layer, i-layer, and n-layer semiconductor film is stacked on the substrate 2 as a photoelectric conversion layer of a thin film solar cell will be described.

  The first substrate transport cart (A) 20-1 moves in the lower central transport chamber 10-1 in the X direction, partially moves in the Z direction (upper central transport device 10-2), and moves in the Y direction. Some move. Between the load chamber (L) 11, the film forming chamber (P) 12-1 where the p layer is formed, and the film forming chambers (I) 12-2 and 12-3 where the i layer is formed The substrate 2 is carried in or out. The first substrate transfer cart (B) 20-2 moves in the lower central transfer chamber 10-1 in the X direction, partially moves in the Z direction (upper central transfer device 10-2), and moves in the Y direction. Some move. The film forming chamber (P) 12-1 where the p layer is mainly formed, the film forming chambers (I) 12-2, 12-3 where the i layer is formed, and the film forming where the n layer is formed The substrate 2 is carried into or out of the chamber (N) 12-4.

  The second substrate transfer cart (C) 20-3 moves in the upper central transfer chamber 10-2 in the X direction, and a part thereof moves in the Y direction. The substrate 2 is carried into or out of the film forming chamber (I) 12-3 where the i layer is mainly formed and the film forming chamber (N) 12-4 where the n layer is formed. The second substrate transfer cart (D) 20-4 moves in the upper central transfer chamber 10-2 in the X direction, and a part thereof moves in the Y direction. The substrate 2 is mainly formed between the film forming chamber (I) 12-3 where the i layer is formed, the film forming chamber (N) 12-4 where the n layer is formed, and the unload chamber (UL) 13. Carry in or take out.

  In FIG. 5, when p-layer, i-layer, and n-layer semiconductor films are continuously stacked on the substrate 2 as the photoelectric conversion layer, first, the first substrate transport carriage (A) 20-1 has a load chamber (L ) The substrate 2 is unloaded from 11, and the substrate 2 is loaded into the film forming chamber (P) 12-1. Next, the first substrate transport cart (B) 20-2 carries the substrate 2 out of the film forming chamber (P) 12-1, and carries the substrate 2 into the film forming chamber (I) 12-3. The second substrate transport cart (C) 20-3 carries the substrate 2 out of the film forming chamber (I) 12-3 and carries the substrate 2 into the film forming chamber (N) 12-4. The second substrate transport carriage (D) 20-4 carries the substrate 2 out of the film forming chamber (N) 12-4 and carries the substrate 2 into the unload chamber (UL) 13.

  However, when the film forming chamber (I) 12-3 is in use, the film forming chamber (I) 12-2 is used. In that case, the first substrate transport cart (B) 20-2 carries the substrate 2 out of the film forming chamber (I) 12-2 and carries the substrate 2 into the film forming chamber (N) 12-4. When the first substrate transport cart (B) 20-2 carries the substrate 2 into the film forming chamber (N) 12-4, for example, the second substrate transport cart (D) 20-4 has a position 23 in the unload chamber 13. −1, the second substrate transport carriage (C) 20-3 is retracted to the position 23-3 of the film forming chamber 12-3.

  Thus, when the lower first substrate transport carts 20-1 and 20-2 and the upper second substrate transport carts 20-4 and 20-3 interfere with each other during movement, the lower first substrate transport cart 20- Avoid by moving the elevators 20-1c, 20-2c (base 2) of 1, 20-2 downward in the Z direction, or use the retreat area 10a installed at the end position of the central transfer chamber 10 . Thereby, it can respond | correspond to the board | substrate conveyance when each processes in each film forming chamber 12 freely, without the some board | substrate conveyance carriage 20 interfering. As a result, a plurality of substrates 2 can be simultaneously transported and processed.

  Since the plurality of substrate transfer carts 20 are provided, the substrate 2 is unloaded from the load chamber 11 by the lower first substrate transfer cart 20-1 and unloaded by the upper second substrate transfer cart 20-4. The substrate 2 can be carried into the chamber 13 at the same time. In other words, since the loading and unloading of the substrate 2 that require the evacuation time and the venting operation time to the atmospheric pressure can be performed at the same time, it is possible to greatly reduce the time required for the substrate 2 to be taken in and out of the vacuum processing apparatus 1. I can do it.

  FIG. 6 is a schematic diagram showing another operation of each substrate transport cart according to the present embodiment. 6A is a schematic view from the upper surface in the Z direction, and FIG. 6B is a schematic view from the side surface (cross section) in the Y direction. Here, the case where it is desired to form a single film instead of forming and laminating the above layers will be described.

  In FIG. 6, when a p-layer semiconductor film is formed on the substrate 2, the first substrate transport carriage (A) 20-1 carries the substrate 2 out of the load chamber (L) 11 and forms the film formation chamber (P ) The substrate 2 is carried into 12-1. Thereafter, the first substrate transport cart (A) 20-1 carries the substrate 2 out of the film forming chamber (P) 12-1 and carries the substrate 2 into the unload chamber (UL) 13. At this time, the first substrate transport cart (B) 20-2 is retracted to an appropriate place in the lower central transport device 10-1, and the second substrate transport cart (C) 20-3 and the second substrate transport cart (D). 20-4 retreats to an appropriate place in the upper central transfer device 10-2.

  Similarly, when the i-layer semiconductor film is formed on the substrate 2, the first substrate transport cart (A) 20-1 carries the substrate 2 out of the load chamber (L) 11 to form the film formation chamber (I). The board | substrate 2 is carried in to 12-2 or 12-3. Thereafter, the first substrate transport cart (A) 20-1 unloads the substrate 2 from the film forming chamber (I) 12-2 or 12-3 and loads the substrate 2 into the unload chamber (UL) 13. Similarly, in the case where an n-layer semiconductor film is formed on the substrate 2, the first substrate transport carriage (A) 20-1 carries the substrate 2 out of the load chamber (L) 11, and the film formation chamber (N). The board | substrate 2 is carried in to 12-4. Thereafter, the first substrate transport cart (A) 20-1 carries the substrate 2 out of the film forming chamber (N) 12-4 and carries the substrate 2 into the unload chamber (UL) 13. At these times, the first substrate transport cart (B) 20-2 is retracted to an appropriate location in the lower central transport device 10-1, and the second substrate transport cart (C) 20-3 and the second substrate transport cart (D ) 20-4 is retreated to an appropriate place in the upper central transfer device 10-2.

  As described above, in the parallel type vacuum processing apparatus, a plurality of carts are used for the substrate transport time that is limited by the substrate transfer time of the substrate transport cart 20 and the movement time of the substrate transport cart 20. This can be solved. That is, as described above, in the central transfer chamber 10, a structure in which two or more substrate transfer carts 20 can be used allows a substrate to be loaded or unloaded without wasting time with respect to each film forming chamber 12. can do. Thereby, the waiting time of the substrate transfer cart 20 and the film forming chamber 12 can be remarkably reduced. As a result, it is possible to increase the speed of substrate conveyance. In this structure, the central transfer chamber 10 allows the substrate transfer carriage to move up and down (Z direction) in the space, and the substrate transfer carriage and its drive mechanism interfere with each other in the direction (X direction) in which the film forming chamber 12 is arranged. The substrate can be conveyed without any problem.

  By providing upper and lower transfer spaces in the central transfer chamber, and providing first substrate transfer carts 20-1 and 20-2 that move in the lower space and second substrate transfer carts 20-4 and 20-3 that move in the upper space. The interference between the substrate transfer carts 20 can be reduced as much as possible, and the standby time of the substrate transfer cart 20 and the film forming chamber 12 can be significantly reduced. That is, the upper second substrate transport carts 20-4 and 20-3 move in the X and Y directions to transport the substrate. Since the lower first substrate transfer carts 20-1 and 20-2 move in the Z direction in addition to X and Y to transfer the substrate, the substrate can be moved to all the film forming chambers 12 of the central transfer chamber 10. .

  In this case, the vacuum processing apparatus is provided with a dedicated processing chamber (film forming chamber) for each semiconductor layer, and simultaneously performs film formation for each layer. Thereby, a vacuum processing apparatus can be used efficiently and the time concerning formation of a photoelectric converting layer can be shortened.

  Here, consider a case where the substrate 2 is a large substrate, for example, a size of 1.4 m (vertical) × 1.1 m (horizontal), or larger. It is preferable that the first substrate transport carts 20-1 to 20-2 and the second substrate transport carts 20-4 to 20-3 transport the substrate 2 in the vacuum processing apparatus 1 at an angle from the horizontal. . The angle θ when the substrate 2 is transported is preferably 0 ° (horizontal) or more and 15 ° or less, or 75 ° or more and 90 ° (vertical) or less. The reason will be described below.

FIG. 7 is a schematic diagram showing the definitions of the substrate tilt and the apparatus cross-sectional area of the vacuum processing apparatus according to the present embodiment. 7A shows the definition of the angle θ, and FIG. 7B shows the definition of the apparatus cross-sectional area (X-direction cross section) of the vacuum processing apparatus 1. When the substrate 2 is transported, if the substrate 2 is transported in a nearly horizontal state, the floor occupation area of the apparatus increases, but the apparatus height decreases. Further, when the substrate 2 is transported in a substantially vertical state, the floor occupation area of the apparatus is reduced, but the apparatus height is increased. As an apparatus, either of these states will be selected depending on the situation of the installation location and the influence on the film formation due to the substrate size. As the apparatus size can be evaluated, the apparatus cross-sectional area of the vacuum processing apparatus 1 ( The guideline is to reduce the cross section in the X direction.
Referring to FIG. 7A, the length of one side in the horizontal direction of the substrate 2 is “a” m when the substrate 2 is horizontal. In that case, if the angle θ is inclined, the length in the horizontal direction becomes (a · cos θ) m. Referring to FIG. 7B, when the lateral length of the substrate 2 is (a · cos θ) m with respect to the substrate 2 having a substrate length of one side exceeding 1 m, the load chamber 11 and the respective film forming chambers 12. The length W1 and the height h1 of one side are approximately (1m + (a · cos θ) m) and (1m + (a · sin θ) m), respectively. Similarly, the length W3 and the height h3 of one side of the unload chamber 13 and each film forming chamber 12 are approximately (1m + (a · cos θ) m) and (1m + (a · sin θ) m). Furthermore, the length W2 and the height h2 of one side of the central transfer chamber 10 are approximately (1m + (a · cos θ) m) and 2 × (1m + (a · sin θ) m). Accordingly, the sectional area of the vacuum processing apparatus is (3m + 3 (a · cos θ) m) × (2m + 2 (a · sin θ) m).

  FIG. 8 is a graph showing the relationship between the inclination of the substrate and the cross-sectional area of the vacuum processing apparatus according to this embodiment. The vertical axis represents the cross-sectional area of the vacuum processing apparatus 1, and the horizontal axis represents the angle θ from the horizontal. However, the circle mark, the triangle mark, and the square mark respectively indicate the lengths of one side in the horizontal direction of the substrate 2 when horizontal: a = 1.5 m, 3.0 m, and 5.0 m. When the length of one side: a in the horizontal direction of the substrate 2 in the horizontal state is increased, the apparatus cross-sectional area of the vacuum processing apparatus is greatly influenced by the angle θ when the substrate 2 is transported. It can be seen that the cross-sectional area of the apparatus is suppressed to be small by setting the angle θ at the time of transporting the substrate 2 to 0 ° (horizontal) or more and 15 ° or less, or 75 ° or more and 90 ° (vertical) or less. Thus, it becomes possible to reduce the installation area (occupied area) of the vacuum processing apparatus 1 by suppressing the apparatus cross-sectional area to be small.

  Further, the substrate stability and the substrate deflection amount when the substrate 2 is transported are proportional to the gravity direction integral (cos θ). Therefore, when the substrate deflection is reduced by supporting the substrate at a plurality of locations in the central region of the substrate, the substrate transport carriage is moved up and down (Z direction) by using a method of inclining from the horizontal plane at θ = 0 ° or more and 15 ° or less. The lifting mechanism and stroke are simplified, which is more preferable.

  Next, drive mechanisms in the first substrate transport carts 20-1 to 20-2 and the second substrate transport carts 20-3 to 20-4 will be described. However, the first substrate transport carts 20-1 to 20-2 are driven in the X direction, the Y direction, and the Z direction. The second substrate transport carts 20-3 to 20-4 are driven in the X direction and the Y direction. However, since the driving method is determined depending on the direction and there is no difference between the apparatuses, the substrate transport cart 20 will be described collectively.

FIG. 9 is a configuration diagram showing a driving mechanism in the X direction according to the present embodiment.
The first direction drive mechanism (rotational drive transmission mechanism) drives the substrate transport carriage in the X direction. This corresponds to the above-described 1-1, 1-2, 1-3, and 1-4 driving mechanisms. The first direction drive mechanism includes an X-axis rotation drive unit 91 and a multi-corrugated cardboard screw drive mechanism 31. The X-axis rotation drive unit 91 is directly or indirectly fixed to the central transfer device 10. Usually, since the X-axis rotation drive unit 91 is in the atmosphere, the members of the multi-cardboard screw drive mechanism 31 are driven to rotate via a bearing having a vacuum seal function.

  The plurality of cardboard screw drive mechanisms 31 exhibit the same function as one ultra-long ball screw having a length approximately equal to the length of the plurality of ball screws by combining a plurality of ball screws via a ball spline. Hereinafter, the multi-stage ball screw driving mechanism 31 in which two-stage ball screws are coupled via a ball spline will be described. The multiple cardboard screw driving mechanism 31 includes a first ball screw 32, a first ball spline 34, and a second ball screw 38.

  The first ball screw 32 has a first screw shaft 32b extending in the X direction. One end of the first screw shaft 32 b is connected to the X-axis rotation drive unit 91 and is driven to rotate by the X-axis rotation drive unit 91. A gear 33 is coaxially provided at the other end of the first screw shaft 32b. The first nut 32 a is attached to the first screw shaft 32 b on the side opposite to the gear 33 and in the vicinity of the X-axis rotation drive unit 91. The first nut 32 a is fixed to the lower support 30. That is, the first ball screw 32 is coupled to the lower carriage base 30 via the first nut 32a. However, the lower support 30 is a member related to each drive of the carriage bases 20-1b to 20-4b in each of the substrate transport carriages 20-1 to 20-4.

  In the ball spline, the slide outer cylinder can freely move along an axial groove provided on the spline shaft, and the rotation of the slide outer cylinder is transmitted to the rotation of the spline shaft. The first spline shaft 34b of the first ball spline 34 extends in the X direction. One end of the first spline shaft 34 b extends to the vicinity of the first nut 32 a of the first ball screw 32. A gear 36 is coaxially provided at the other end of the first spline shaft 34b. The first slide outer cylinder 34a is attached to the first spline shaft 34b in the vicinity of the gear 36, and has a gear 35 coaxially on the gear 36 side. The first ball spline 34 is coupled to the first ball screw 32 via a gear 33 and a gear 35. The first spline shaft 34 b of the first ball spline 34 is fixed to the lower support 30 so as to be rotatable.

  The second ball screw 38 has a second screw shaft 38b extending in the X direction. One end of the second screw shaft 38b extends to the vicinity of one end of the first spline shaft 34b of the first ball spline 34. A gear 37 is coaxially provided at the other end of the second screw shaft 38b. The second nut 38a is attached to the second screw shaft 38b on the side opposite to the gear 37 and in the vicinity of one end of the first spline shaft 34b. The second nut 38 a is fixed to the carriage base 50. That is, the second ball screw 38 is coupled to the carriage base 50 via the second nut 38a. The second ball screw 38 is coupled to the first ball spline 34 via a gear 36 and a gear 37. A second screw shaft 38 b of the second ball screw 38 is rotatably fixed to the lower support 30. However, the trolley base 50 is a trolley base 20-1b to 20-4b in each of the substrate transport trolleys 20-1 to 20-4.

FIG. 10 is a configuration diagram showing the operation of the driving mechanism in the X direction according to the present embodiment. From the initial state of FIG. 9 (nut 32a: A0, end A0 ′ of the carriage base 50), the first nut 32a is moved in the X direction by the distance D0, and the end of the carriage base 50 is moved in the X direction by the distance D1 (nut 32a: A1, an end A1 ′) of the carriage base 50 is shown.
When the first screw shaft 32b of the first ball screw 32 is rotated by the X-axis rotation drive unit 91, the rotation causes the first nut 32a of the first ball screw 32 to move in the X direction by a distance D0. As a result, the lower support 30 fixed to the first nut 32a moves in the X direction by a distance D0.

  At this time, the gear 33 of the first ball screw 32 is rotated by the rotation of the first screw shaft 32 b, and the rotation is transmitted to the gear 35 of the first ball spline 34. Due to the rotation of the gear 35, the first slide outer cylinder 34a of the first ball spline 34 rotates. As a result, the first slide outer cylinder 34 a rotates the first spline shaft 34 b of the first ball spline 34 while maintaining the position of the gear 35 in the X direction with respect to the gear 33. Further, when the lower support 30 is moved in the X direction by the distance D0, the first spline shaft 34b fixed to the lower support 30 is pulled out in the X direction by the distance D0 with respect to the first slide outer cylinder 34a.

At this time, the gear 36 of the first ball spline 34 is rotated by the rotation of the first spline shaft 34 b, and the rotation is transmitted to the gear 37 of the second ball screw 38. As the gear 37 rotates, the second screw shaft 38b of the second ball screw 38 rotates. Due to the rotation of the second screw shaft 38b, the second nut 38a of the second ball screw 38 moves in the X direction by a distance D1 with respect to the lower support 30. At the same time, the lower support 30 moves in the X direction by a distance D0, whereby the second screw shaft 38b fixed to the lower support 30 moves in the X direction by a distance D0. As a result, the carriage base 50 fixed to the second nut 38a is represented by the distance D1 that is the movement of the second nut 38a on the lower support 30 and the distance D0 that is the movement of the lower support 30. A large movement amount D2 = D0 + D1 of the carriage base 50 can be secured. At this time, the moving distance between D0 and D1 can be adjusted by appropriately selecting the number of teeth of the gears 33, 35, 36, and 37 and the pitch between the first screw shaft 32b and the second screw shaft 38b. When each gear has the same number of teeth and each screw shaft has the same pitch, D0 = D1, and the movement distance D2 = 2 × D0 of the carriage base 50 is obtained, so that a double movement amount of each screw shaft portion can be secured.
As the carriage base 50 moves, the gear 33 of the first ball screw 32, the gear 35 of the first ball spline 34, etc. can move in a predetermined manner without interfering with each other due to the vertical positional relationship in the Z direction. It is possible.

  As described above, by using the multi-cardboard screw driving mechanism 31 in the present embodiment, the movement amount of the carriage base 50 that is the movement object by the X-axis rotation driving unit 91 is equal to the movement amount of the first ball screw 32 and the second movement amount. It can be the sum of the movement amount of the ball screw 38. That is, the amount of movement can be the amount of addition of the amount of movement of the two ball screws.

  In the present embodiment, the drive mechanism for driving the substrate transport carriage in the X direction is not a system that uses a very long ultra-long ball screw, but a two-stage ball screw that is relatively easy to obtain. The system is driven by. This makes it possible to move the substrate transport carriage for a very long time in the X direction. Specifically, for example, a ball screw having a length of 3 m or less is transmitted to the third shaft (ball screw 38) by the gear drive via the second shaft (ball spline 34) to the third shaft (ball screw 38). It is rotated by a corrugated cardboard screw drive mechanism. Thereby, the substrate transfer carriage can be made movable up to 6 m corresponding to a stroke twice the length of the ball screw. Thereby, it is not necessary to use a special ultra-long ball screw, and it is possible to use a ball screw having a length that is easily available and has high rigidity and reliability. Therefore, the reliability of this drive mechanism can be improved. In addition, it becomes unnecessary to provide the drive mechanism with very high rigidity for suppressing vibration of the ball screw as in the case of using a very long ultra-long ball screw. Accordingly, the cost can be greatly reduced. In addition, the substrate transport carriage can be driven at a high speed while keeping the influence of the vibration of the ball screw to a small extent, and the effect of shortening the tact time can be exhibited.

  9 and 10 show examples of two stages of ball screws. However, in order to move a longer stroke in the X direction, an auxiliary carriage, a ball spline, and a ball screw may be combined. An example is shown below.

FIG. 11 is another configuration diagram showing the drive mechanism in the X direction according to the present embodiment.
The first direction drive mechanism (rotational drive transmission mechanism) is the same as in the case of FIGS. Here, the multi-stage ball screw drive mechanism 31 in which three-stage ball screws are coupled via splines will be described. The multiple cardboard screw drive mechanism 31 includes a first ball screw 32, a first ball spline 34, a second ball screw 38, a second ball spline 44, and a third ball screw 48.

  The first ball screw 32 has a first screw shaft 32b extending in the X direction. One end of the first screw shaft 32 b is connected to the X-axis rotation drive unit 91 and is driven to rotate by the X-axis rotation drive unit 91. A gear 33 is coaxially provided at the other end of the first screw shaft 32b. The first nut 32 a is attached to the first screw shaft 32 b on the side opposite to the gear 33 and in the vicinity of the X-axis rotation drive unit 91. The first nut 32 a is fixed to the lower support 30. That is, the first ball screw 32 is coupled to the lower support 30 via the first nut 32a. However, the lower support 30 is a member involved in driving the carriage bases 20-1b to 20-4b in each of the substrate transport carriages 20-1 to 20-4.

  The first spline shaft 34b of the first ball spline 34 extends in the X direction. One end of the first spline shaft 34 b extends to the vicinity of the first nut 32 a of the first ball screw 32. A gear 36 is coaxially provided at the other end of the first spline shaft 34b. The first slide outer cylinder 34a is attached to the first spline shaft 34b in the vicinity of the gear 36, and has a gear 35 coaxially on the gear 36 side. The first ball spline 34 is coupled to the first ball screw 32 via a gear 33 and a gear 35. The first spline shaft 34 b of the first ball spline 34 is fixed to the lower support 30 so as to be rotatable.

  The second ball screw 38 has a second screw shaft 38b extending in the X direction. One end of the second screw shaft 38b extends to the vicinity of one end of the first spline shaft 34b of the first ball spline 34. A gear 37 is coaxially provided at the other end of the second screw shaft 38b. The second nut 38a is attached to the second screw shaft 38b on the side opposite to the gear 37 and in the vicinity of one end of the first spline shaft 34b. The second nut 38 a is fixed to the auxiliary lower support 40. That is, the second ball screw 38 is coupled to the auxiliary lower support 40 via the second nut 38a. The second ball screw 38 is coupled to the first ball spline 34 via a gear 36 and a gear 37. A second screw shaft 38 b of the second ball screw 38 is rotatably fixed to the lower support 30.

  The second ball spline 44 has a second spline shaft 44b extending in the X direction. One end of the second spline shaft 44b extends in the vicinity of the gear 37 of the second ball screw 38. A gear 46 is coaxially provided at the other end of the second spline shaft 44b. The second slide outer cylinder 44a is attached on one end side of the second spline shaft 44b, and has a gear 45 coaxially on the gear 37 side. The second ball spline 44 is coupled to the second ball screw 38, the gear 37, the gear 45, and the gear 43 between the two gears. The second spline shaft 44b of the second ball spline 44 is rotatably fixed to the auxiliary lower support 40.

  The third ball screw 48 has a third screw shaft 48b extending in the X direction. One end of the third screw shaft 48 b extends to the vicinity of one end of the second spline shaft 44 b of the second ball spline 44. A gear 47 is provided coaxially at the other end of the third screw shaft 48b. The third nut 48 a is attached to the third screw shaft 48 b in the vicinity of the gear 47. The third nut 48 a is fixed to the carriage base 50. That is, the third ball screw 48 is coupled to the carriage base 50 via the third nut 48a. The third ball screw 48 is coupled to the second ball spline 44 via a gear 46 and a gear 47. The third screw shaft 48b of the third ball screw 48 is rotatably fixed to the auxiliary lower support 40. However, the trolley base 50 is a trolley base 20-1b to 20-4b in each of the substrate transport trolleys 20-1 to 20-4.

  Since these operations are the same as in the case of FIG. As shown in FIG. 11, by using the three-stage ball screw drive mechanism 31, the movement amount of the carriage base 50, which is the movement target by the X-axis rotation drive unit 91, is the movement amount of the first ball screw 32 and the second ball screw 38. The sum of the moving amount and the moving amount of the third ball screw 48 can be obtained. That is, the amount of movement can be the amount of addition of the amount of movement of the ball screw for three pieces.

  Thus, when moving the stroke in the X direction that is longer than in the case of FIG. 9, specifically, for example, a ball screw of 3 m or less is used, and the first shaft (ball screw 32) is driven to rotate the second shaft (ball spline). 34), the third shaft (ball screw 38) is rotated by gear driving, and the third shaft (ball screw 38) is rotated by rotating the fourth shaft (ball spline 44) and fifth shaft (ball screw 48) by gear driving. It is rotated by a three-stage ball screw driving mechanism. As a result, the substrate transport carriage can be moved up to 9 m corresponding to a stroke three times the length of the ball screw. Also in this case, it is not necessary to use a special ultra-long ball screw, and it is possible to use a ball screw having a length that is easily available and has high rigidity and reliability. Therefore, the reliability of this drive mechanism can be improved. In addition, it becomes unnecessary to provide the drive mechanism with very high rigidity for suppressing vibration of the ball screw as in the case of using a very long ultra-long ball screw. Accordingly, the cost can be greatly reduced. In addition, the substrate transport carriage can be driven at a high speed while keeping the influence of the vibration of the ball screw to a small extent, and the effect of shortening the tact time can be exhibited.

  Further, when the stroke in the X direction that is longer than that in the case of FIG. 11 is moved, for example, the number of combinations of auxiliary carts, ball splines, and ball screws is increased as in the extension from FIG. 9 to FIG. As a result, the substrate transport carriage can be moved to a distance corresponding to a multiple of the length of the ball screw.

FIG. 12 is a configuration diagram showing second and third direction drive mechanisms in the Y direction and the Z direction according to the present embodiment.
A third direction drive mechanism (rotational drive transmission mechanism) in the Z direction drives the substrate transport carriage in the Z direction. This corresponds to the aforementioned 3-1 and 3-2 drive mechanisms. The third direction drive mechanism in the Z direction is not provided in the second substrate transport carts 20-4 and 20-3 that are not movable in the Z direction in the examples of FIGS. The third direction drive mechanism includes a Z-axis rotation drive unit 93 and a multi-cardboard spline drive mechanism 96. The Z-axis rotation drive unit 93 is fixed directly or indirectly to the central transfer device 10. Usually, since the Z-axis rotation drive unit 93 is in the atmosphere, the member of the multi-stage ball spline drive mechanism 96 that is driven to rotate via a bearing having a vacuum seal function is rotated.

  The multi-cardboard spline drive mechanism 96 is configured such that a plurality of ball splines and a ball screw are coupled via a bevel gear, and can be driven in the Z direction at a destination of a carriage base within the length of the plurality of ball splines. . Hereinafter, a multi-stage ball spline drive mechanism 96 in which a plurality of ball splines in two stages in the X direction and a ball screw in one stage in the Z direction are coupled via a bevel gear will be described. The multi-cardboard spline drive mechanism 96 includes a fifth ball spline 101, a sixth ball spline 104, third and fourth wedge gears 107 and 121, and a fourth ball screw 123.

  The fifth ball spline 101 has a fifth spline shaft 101b extending in the X direction. One end of the fifth spline shaft 101 b is connected to the Z-axis rotation drive unit 93 and is driven to rotate by the Z-axis rotation drive unit 93. The fifth slide outer cylinder 101a is attached to the fifth spline shaft 101b in the vicinity of the Z-axis rotation drive unit 93, and has a gear 102 coaxially on the Z-axis rotation drive unit 93 side. The fifth slide outer cylinder 101a is rotatably fixed to the lower support 30 (not shown in the figure). However, the lower support 30 is a member related to driving of the carriage bases 20-1b to 20-2b in each of the substrate transport carriages 20-1 to 20-2.

  The sixth ball spline 104 has a sixth spline shaft 104b extending in the X direction. One end of the sixth spline shaft 104b extends to the vicinity of one end of the fifth ball spline 101 on the fifth spline shaft 101b. A gear 103 is coaxially provided at one end. The sixth slide outer cylinder 104a is attached in the middle of the sixth spline shaft 104b, has a gear 105 coaxially on the opposite side to the gear 103, and is rotatably fixed to the carriage base 50 (illustrated). not). The sixth ball spline 104 and the fifth ball spline 101 are coupled via a gear 103 and a gear 102. The sixth spline shaft 104b is rotatably fixed to the lower support 30.

  The third bevel gear 107 is provided at the other end of the third rotating shaft 108 extending in the X direction and having the gear 106 provided at one end. The third bevel gear 107 and the sixth ball spline 104 are coupled via the third rotating shaft 108, the gear 106 and the gear 105. The third bevel gear 107 is rotatably fixed to a basic carriage base 50 b that cannot be moved up and down in the carriage base 50. However, the trolley base 50 is the trolley bases 20-1b and 20-2b in each of the substrate transport trolleys 20-1 to 20-2.

  The fourth ball screw 123 has a fourth screw shaft 123b extending in the Z direction. The fourth screw gear 121 is coaxially provided at one end of the fourth screw shaft 123b. The fourth nut 123a is fixed to an elevating carriage base 50a that can move up and down in the carriage base 50. That is, the fourth ball screw 123 is coupled to the carriage base 50a via the fourth nut 123a. The fourth ball screw 123 is coupled to the sixth ball spline 104 via gears 105 and 106, a third bevel gear 107, and a fourth bevel gear 121. However, the trolley base 50a is the trolley bases 20-1c and 20-2c in the substrate transport carts 20-1 to 20-2.

The operation of the third direction drive mechanism in the Z direction will be described.
First, when the lower support 30 is moved by the distance D0 in the X direction by the X-axis rotation drive unit 91 and the carriage base 50 is further moved by the distance D1 in the X direction with respect to the lower support 30, the carriage base 50 is moved to the distance. Move by D2 = D0 + D1 (usually planned to 2 × D0). At this time, in the fifth ball spline 101, the fifth slide outer cylinder 101a is rotatably fixed to the lower support 30. Therefore, with the movement of the lower support 30, the fifth slide outer cylinder 101a moves along the fifth spline shaft 101b in the X direction by a distance D0. On the other hand, the third bevel gear 107 (and the third rotating shaft 108 and the gear 106) and the sixth slide outer cylinder 104a are rotatably fixed to the carriage base 50. Therefore, as the carriage base 50 moves, the third slide gear 107, the third rotating shaft 108, and the sixth slide outer cylinder 104a coupled to the gear 106 and the gear 105 are moved along the sixth spline shaft 104b. Move further in the X direction by a distance D1. In this manner, the drive mechanism from the Z-axis rotation drive unit 93 to the third bevel gear 107 is maintained regardless of the movement of the lower support 30 and the carriage base 50 in the X direction.

  In such a state, when the fifth spline shaft 101b is rotated by the Z-axis rotation driving unit 93, the gear 102 of the fifth slide outer cylinder 101a is rotated. The rotation of the gear 102 is transmitted to the sixth spline shaft 104b via the gear 103. When the sixth spline shaft 104b is rotated, the gear 105 of the sixth slide outer cylinder 104a is rotated. The rotation of the gear 105 is transmitted to the third bulk gear 107 via the gear 106 and the third rotation shaft 108. When the third bevel gear 107 is rotated, the rotation of the fourth bevel gear 121 is transmitted to the fourth screw shaft 123b. As the fourth screw shaft 123b is rotated, the fourth nut 123a is raised or lowered in the Z-axis direction. Guide rails 51 are provided at the four corners of the carriage base 50, and the raising and lowering carriage base 50a is installed so as to be smoothly moved up and down in the Z direction. Thereby, the raising / lowering cart base 50a in the cart base 50 couple | bonded with the 4th nut 123a can raise / lower.

  In addition, the 4th ball screw 123 provided in the raising / lowering trolley base 50a of the trolley base 50 is one set in FIG. However, a total of four sets are provided at each of the four corners of the lifting carriage base 50a, and the rotational driving force from the sixth ball spline 104 is sequentially transmitted by the bevel gear or the like, so that the four sets of ball screws are synchronized by one rotational drive. The lift base 50a may be moved up and down in the Z direction with good stability.

  In this way, in the third direction drive mechanism (rotational drive transmission mechanism) in the Z direction, the rotational drive force that raises and lowers the lift base 50a of the base 50 in the Z direction is two fifth and sixth ball splines. 101 and 104 are transmitted to the third and fourth wedge gears 107 and 121. As a result, the elevating carriage base 50a can be raised and lowered in the Z direction by the fourth ball screw 123 provided on the elevating carriage base 50a. Also in this case, it is not necessary to use a special ultra-long ball spline, and it is possible to use a ball spline having a length that is easily available and has high rigidity and reliability. Therefore, the reliability of this drive mechanism can be improved. In addition, it becomes unnecessary to provide the drive mechanism with very high rigidity for suppressing the vibration of the ball spline as in the case of using a very long ultra-long ball spline. Accordingly, the cost can be greatly reduced. In addition, the substrate transport carriage can be driven in the Z direction at a high speed while keeping the influence of the vibration of the ball spline to a small extent, and the effect of shortening the tact time can be exhibited.

  A second direction drive mechanism (rotational drive transmission mechanism) in the Y direction drives the substrate transport carriage in the Y direction. This corresponds to the aforementioned 2-1, 2-2, 2-3, and 2-4 drive mechanisms. The second direction drive mechanism includes a Y-axis rotation drive unit 92, a multi-stage spline drive mechanism 95, and a multi-stage rack and pinion drive mechanism 94. The Y-axis rotation drive unit 92 is directly or indirectly fixed to the central transport apparatus 10. The member of the multi-cardboard spline drive mechanism 95 that is rotationally driven is rotationally driven.

  The multi-stage ball spline drive mechanism 95 is a destination of the carriage base within the length of the plurality of ball splines, in which a plurality of ball splines and ball screws are coupled via a bevel gear, The rotational drive for the pinion drive mechanism 94 is made possible. In the following, a multi-stage ball spline drive mechanism 95 in which a plurality of ball splines in two stages in the X direction and a ball spline or pinion in the first stage in the Z direction are coupled via a bevel gear will be described. The multi-cardboard spline drive mechanism 95 includes a third ball spline 111, a fourth ball spline 114, a first bevel gear 117, a second bevel gear 124, and a second rotating shaft or a seventh ball spline 125 outside the seventh slide. A cylinder 125a and a first pinion 126 directly connected thereto are provided.

  The third ball spline 111 has a third preline shaft 111b extending in the X direction. One end of the third spline shaft 111b is connected to the Y-axis rotation drive unit 92 and is driven to rotate by the Y-axis rotation drive unit 92. The slide outer cylinder 111a is attached to the third spline shaft 111b in the vicinity of the Y-axis rotation drive unit 92, and has a gear 112 coaxially on the Y-axis rotation drive unit 92 side. The slide outer cylinder 111a is rotatably fixed to the lower support 30 (not shown in the figure). However, the lower support 30 is a member involved in driving the carriage bases 20-1b to 20-4b in each of the substrate transport carriages 20-1 to 20-4.

  The fourth ball spline 114 has a fourth spline shaft 114b extending in the X direction. One end of the fourth spline shaft 114b extends to the vicinity of one end of the third spline shaft 111b of the third ball spline 111. At one end, a gear 113 is provided coaxially. The fourth slide outer cylinder 114a is attached in the middle of the fourth spline shaft 114b, has a gear 115 coaxially on the side opposite to the gear 113, and is rotatably fixed to the carriage base 50 (illustrated). not). The fourth ball spline 114 and the third ball spline 111 are coupled via a gear 113 and a gear 112. The fourth spline shaft 114b is rotatably fixed to the lower support 30.

  The first bevel gear 117 is provided at the other end of the first rotating shaft 118 extending in the X direction and having the gear 116 provided at one end. The first bevel gear 117 and the fourth ball spline 114 are coupled via the first rotating shaft 118, the gear 116, and the gear 115. The first bevel gear 117 is rotatably fixed to a base carriage base 50 b that cannot be moved up and down in the carriage base 50. However, the trolley base 50 is a trolley base 20-1b to 20-4b in each of the substrate transport trolleys 20-1 to 20-4.

  As a partner to be coupled to the first bevel gear 117, (1) in the case of the first substrate transport carts 20-1 and 20-2 in which the second direction driving mechanism in the Y direction drives also in the third direction in the Z direction. Uses a seventh ball spline 125 and a first pinion 126, and (2) the second direction drive mechanism in the Y direction does not drive in the third direction in the Z direction. In this case, the second rotating shaft 125 and the first pinion 126 are used.

(1) For the first substrate transport carts 20-1 and 20-2 (in the case of FIG. 12)
The seventh ball spline 125 has a seventh spline shaft 125b extending in the Z direction. The second spur gear 124 is coaxially provided at one end of the seventh spline shaft 125b. The seventh slide outer cylinder 125a is provided on the seventh spline shaft 125b away from the second bevel gear 124, and the first pinion 126 is provided coupled to the seventh slide outer cylinder 125a. The seventh slide outer cylinder 125a is rotatably fixed to an elevating carriage base 50a that can be raised and lowered in the carriage base 50. That is, the seventh ball spline 125 is coupled to the carriage base 50a via the seventh slide outer cylinder 125a. The seventh ball spline 125 is coupled to the fourth ball spline 114 via gears 115 and 116 and first and second wedge gears 117 and 124.

(2) For the second substrate transport carts 20-3 and 20-4 When using the second rotating shaft 125 and the first pinion 126, the seventh spline shaft 125b in FIG. The first pinion 126 may be directly coupled to the second rotating shaft 125 without using the seventh slide outer cylinder 125a. That is, the second rotating shaft 125 extends in the Z direction. A second bevel gear 124 is coaxially provided at one end of the second rotating shaft 125, and a first pinion 126 is coaxially provided at the other end. The second rotating shaft is fixed to 125, a carriage base 50 (there is no elevating carriage base 50a that can be raised and lowered in the carriage base 50). That is, the first pinion 126 is coupled to the carriage base 50 via the rotation shaft 125. The first pinion 126 is coupled to the fourth ball spline 114 via gears 115 and 116 and first and second wedge gears 117 and 124.

The operation of the multi-cardboard spline drive mechanism 95 in the second direction drive mechanism in the Y direction will be described.
First, when the lower support 30 is moved by the distance D0 in the X direction by the X-axis rotation drive unit 91 and the carriage base 50 is further moved by the distance D1 in the X direction with respect to the lower support 30, the carriage base 50 is moved to the distance. Move by D2 = D0 + D1 (usually planned to 2 × D0). At this time, in the third ball spline 111, the slide outer cylinder 111a is rotatably fixed to the lower support 30. Therefore, as the lower support 30 moves, the slide outer cylinder 111a moves along the third spline shaft 111b in the X direction by a distance D0. On the other hand, the first bevel gear 117 (and the first rotating shaft 118 and the gear 116) and the fourth slide outer cylinder 114a are rotatably fixed to the carriage base 50. Therefore, as the carriage base 50 moves, the first slide gear 117, the first rotating shaft 118, and the fourth slide outer cylinder 114a coupled with the gear 116 and the gear 115 are moved along the fourth spline shaft 114b. Move further in the X direction by a distance D1. In this way, the drive mechanism from the Y-axis rotation drive unit 92 to the first bevel gear 117 is maintained regardless of the movement of the lower support 30 and the carriage base 50 in the X direction.

  Further, when the elevating carriage base 50a that can be moved up and down in the carriage base 50 moves in the Z direction, the seventh ball spline 125 is used for the shaft that couples the second bevel gear 117 as the counterpart to be coupled with the first bevel gear 117. . In that case, the movement of the lift base 50a that can be moved up and down in the base 50 moves the seventh slide outer cylinder 125a that is rotatably fixed to the lift base 50a on the seventh spline shaft 125b. However, the rotation of the first bevel gear 117 is transmitted to the first pinion 126 via the second bevel gear 124, the seventh spline shaft 125b, and the seventh slide outer cylinder 125a. In this way, regardless of the movement of the lower support 30 and the carriage base 50 in the X direction and the movement of the elevating carriage base 50a in the carriage base 50 in the Z direction, the first pinion is driven from the Y-axis rotation drive unit 92. The drive mechanism up to 126 is maintained.

  In such a state, when the third spline shaft 111b is rotated by the Y-axis rotation drive unit 92, the gear 112 of the slide outer cylinder 111a rotates. The rotation of the gear 112 is transmitted to the fourth spline shaft 114b via the gear 113. When the fourth spline shaft 114b is rotated, the gear 115 of the fourth slide outer cylinder 114a is rotated. The rotation of the gear 115 is transmitted to the first bevel gear 117 via the gear 116 and the first rotating shaft 118. Here, (1) in the case of the first substrate transport carts 20-1 and 20-2, when the seventh ball spline 125 and the second pinion 126 are used, when the first bevel gear 117 is rotated, The rotation of the second bevel gear 124 is transmitted to the seventh spline shaft 125b. When the seventh spline shaft 125b is rotated, the seventh slide outer cylinder 125a is rotated, and the first pinion 126 coupled thereto is rotated. On the other hand, in the case of (2) for the second substrate transport carts 20-3 and 20-4, when the second rotating shaft 125 and the first pinion 126 are used, when the first bevel gear 117 is rotated, The rotation of the second bevel gear 124 is transmitted to the second rotating shaft 125. The first pinion 126 is rotated by rotating the second rotation shaft.

  Next, the multi-stage rack and pinion drive mechanism 94 based on the upper carriage will be described. FIG. 13 is a configuration diagram showing a multi-stage rack and pinion drive mechanism in the second direction drive mechanism in the Y direction according to the present embodiment.

  The multi-stage rack and pinion drive mechanism 94 includes an upper carriage base (1) 60 and an upper carriage base (2) 70 corresponding to the upper carriage bases 20-1a to 20-4a in the substrate carrying carriages 20-1 to 20-4. The upper carriage base (3) 80 is driven in the Y-axis direction. The multi-stage rack and pinion drive mechanism 94 includes a second rack 119, a second pinion 128, a first rack 127, a third rack 132, a third pinion 133, a fourth rack 131, a fourth pinion 130, a fifth pinion 135, A fifth rack 136 is provided.

  The second rack 119 is provided on the cart base 50 or the lift cart base 50a and extends in the Y direction. The first rack 127 is provided at the lower part of the upper carriage base (1) 60 and extends in the Y direction. The third rack 132 is provided on the upper carriage base (1) 60 and extends in the Y direction. The second pinion 128 and the fourth pinion 130 are respectively connected to a lower end and an upper end of a fourth rotating shaft 129 extending in the Z direction and rotatably attached to the upper carriage base (1) 60. The fourth rack 131 is provided at the lower part of the upper carriage base (2) 70 and extends in the Y direction. The third pinion 133 and the fifth pinion 135 are respectively connected to the lower end and the upper end of a fifth rotating shaft 134 that extends in the Z direction and is rotatably attached to the upper carriage base (2) 70. The fifth rack 136 is provided below the upper carriage base (3) 80 and extends in the Y direction.

The first pinion 126 that is rotatably fixed to the cart base 50 and the lift cart base 50 a is paired with the first rack 127. The rotational movement (example: clockwise) of the first pinion 126 is converted into a straight movement in the Y direction (example: + Y) by the first rack 127. Accordingly, the upper carriage base (1) 60 moves in the Y direction (example: + Y).
The second rack 119 and the second pinion 128 form an even number. When the upper carriage base (1) 60 moves in the Y direction, the second rack 119 fixed to the carriage base 50 and the lifting carriage base 50a moves in the Y direction (example: -Y) with respect to the second pinion 128. Will move. Thereby, the second pinion 128 converts the rectilinear motion of the second rack 119 into a rotational motion (eg, clockwise). As a result, the fourth pinion 130 coupled with the second pinion 128 and the fourth rotation shaft 129 also performs the same rotational movement (eg, clockwise).
The fourth pinion 130 is paired with the fourth rack 131. The rotational movement of the fourth pinion 130 is converted into a straight movement in the Y direction (example: + Y) by the fourth rack 131. Accordingly, the upper carriage base (2) 70 moves in the Y direction (example: + Y).
The third rack 132 and the third pinion 133 form an even number. When the upper carriage base (2) 70 moves in the Y direction, the third rack 132 fixed to the upper carriage base (1) 60 moves in the Y direction (example: -Y) with respect to the third pinion 133. Will do. Accordingly, the third pinion 133 converts the straight movement of the first rack 119 into a rotational movement (example: counterclockwise). As a result, the fifth pinion 135 coupled with the third pinion 133 and the fifth rotation shaft 134 also performs the same rotational movement (for example, counterclockwise).
The fifth pinion 135 is paired with the fifth rack 136. The rotational movement of the fifth pinion 135 is converted into a straight movement in the Y direction (example: + Y) by the fifth rack 136. Accordingly, the upper carriage base (3) 80 moves in the Y direction (example: + Y). Guide rails 53, 63, 73 are provided between the carriage base 50, the lift carriage base 50 a, the upper carriage base (1) 60, the upper carriage base (2) 70, and the upper carriage base (3) 80. It is provided so that each other can move smoothly.

  As described above, the rotational driving force transmitted from the multi-stage spline drive mechanism 95 is transmitted to the multi-stage rack and pinion drive mechanism 94 to become a driving force in the Y direction.

  Thus, in the second direction driving mechanism (rotational drive transmission mechanism) in the Y direction, the rotational driving force for deploying and moving the upper carriage base (1) 60 to the upper carriage base (3) 80 in the Y direction is two. The third and fourth ball splines 111 and 114 are transmitted to the first and second gears 117 and 124. As a result, by rotating the first pinion 126, the first rack 127 provided on the upper carriage base (1) 60 is slid in the Y direction. Further, when the second direction drive mechanism in the Y direction is used for the first substrate transport carts 20-1 and 20-2 that also drive in the third direction in the Z direction, it is further provided on the lifting cart base 50a of the cart base 50. The first rack 127 provided on the upper carriage base (1) 60 is slid in the Y direction by rotating the first pinion 126 while allowing the seventh ball spline 125 to rise and fall in the Z direction. On the other hand, the relative movement of the second rack 119 provided on the carriage base 50 and the lifting carriage base 50a with respect to the upper carriage base (1) 60 is transmitted to the second pinion 128 and the fourth pinion 130, and the rotation of the fourth pinion 130 is performed. Slides the fourth rack 131 provided on the upper carriage base (2) 70 in the Y direction. Furthermore, the relative movement of the third rack 132 provided on the upper carriage base (1) 60 relative to the upper carriage base (2) 70 is transmitted to the third pinion 133 and the fifth pinion 135, and the rotation of the fifth pinion 135 is transmitted. The fifth rack 136 provided on the upper carriage base (3) 80 is slid in the Y direction. The upper carriage base (1) 60 to the upper carriage base (3) 80 are slid and moved in the Y direction by the transmission mechanism of the rack and pinion mechanism, and the upper carriage base (3) 80 can be moved greatly.

  FIG. 14 is a configuration diagram showing the relationship between the drive mechanisms in the X direction, the Y direction, and the Z direction in the present embodiment. In this figure, the lower support for the drive mechanism in which the first direction drive mechanism in the X direction in FIG. 9 and the second and third direction drive mechanisms in the Y and Z directions in FIGS. The part concerning 30 is taken out and shown. The X-axis rotation drive unit 91, the Y-axis rotation drive unit 92, and the Z-axis rotation drive unit 93 are provided outside the central transfer chamber 10. Since the X-axis rotary drive unit 91, the Y-axis rotary drive unit 92, and the Z-axis rotary drive unit 93 are in the atmosphere, they pass through a bearing 90 having a rotary vacuum seal function such as a magnetic fluid seal or an O-ring seal. Then, the rotational force is introduced into the substrate transfer carriage 20 in the central transfer chamber 10 in a vacuum state.

  The X-axis rotation drive unit 91, the Y-axis rotation drive unit 92, and the Z-axis rotation drive unit 93 are provided as one set for each first substrate transport carriage 20. When there are two first substrate transport carts 20 in the X direction, one set is installed at a position shifted so as not to interfere with each other, such as up and down in the Y direction and the Z direction. Similarly, two sets of the X-axis rotation driving unit 91 and the Y-axis rotation driving unit 92 are provided as one set, and one set is provided for each second substrate transport carriage 20. When there are two second substrate transport carts 20 in the X direction, one set is installed at a position shifted so as not to interfere with each other, such as up and down in the Y direction and the Z direction. When the lower support 30 and the carriage base 50 are moved, the tracks 14 and 15 provided in the central transfer chamber 10 are used and can be moved smoothly along the tracks 14 and 15.

  The substrate transfer carriage 20 is moved to an appropriate position in the X direction by the operation shown in FIGS. 9 and 10 by the X-axis rotation drive unit 91 fixed to the central transfer chamber 10. Thereafter, the upper carriage base is moved to an appropriate height in the Z direction by the operation shown in FIG. The upper carriage base (upper carriage base (1) 60 to upper carriage base (3) 80) is moved in the Y direction by the operation shown in FIG. 12 and FIG. The substrate 2 is carried into or out of any one of the load chamber 11, the unload chamber 13, and the film forming chambers 12-1 to 12-4.

  As described above with reference to FIGS. 9 to 14, the driving force can be transmitted to the substrate transfer carriage 20 in the X, Y, and Z directions from the outside of the vacuum container serving as the central transfer chamber 10. At that time, driving in the X direction secures the movement of the lower support 30 and the carriage base 50 that is movable in the central transfer chamber 10 by a distance twice that of the lower support 30, while moving the Y direction and Z in the moving carriage base 50. Rotation for driving in the direction can be transmitted. Here, the driving rotational force in the X, Y, and Z directions can be introduced from the outside of the vacuum vessel via the bearing 90 having a vacuum rotational sealing function. Therefore, driving in the vacuum vessel can be easily and reliably realized without using a special mechanism such as a vacuum motor in the central transfer chamber 10.

  Further, at one end of the central transfer chamber 10, drive shafts for introducing rotation (example: ball screw 32, fifth and third ball splines 101, 111 can be provided in the X direction, the Y direction, and the Z direction. Since the above driving is possible, the configuration as the apparatus is unified, and the maintainability is improved.

  FIG. 15 is a schematic diagram showing the configuration of each film forming chamber according to the present embodiment. Since the film forming chambers 12-1 to 12-4 have the same configuration, the film forming chamber 12 will be described below. It is the figure seen from the side surface of the film forming chamber. The film forming chamber 12 includes a film forming chamber main body 156, a counter electrode 152, a soaking plate 155, a soaking plate holding mechanism 161, a discharge electrode 153, a deposition preventing plate 154, a support portion 157, a high-frequency power transmission path 162, and a matching unit 163. , A high vacuum exhaust part 174 and a low vacuum exhaust part 172 are provided. In addition, in this figure, the structure regarding gas supply is abbreviate | omitted. Although the board | substrate 2 has described the state installed horizontally, as above-mentioned, it is 0 degree (horizontal) or more, 15 degrees or less, or 75 degrees or more so that it may correspond to the angle at the time of conveyance of the board | substrate 2. It is preferable to install at 90 ° (vertical) or less.

  The film forming chamber main body 156 is a vacuum container, and forms a thin film on the substrate 2 inside. The counter electrode 152 is a conductive plate made of a non-magnetic material having holding means (not shown) that can hold the substrate 2. When performing self-cleaning, it is desirable to use nickel alloy, aluminum, or aluminum alloy because of fluorine radical resistance. The counter electrode 152 is an electrode (example: ground side) facing the discharge electrode 153. The counter electrode 152 has one surface in close contact with the surface of the soaking plate 155 and the other surface in close contact with the surface of the substrate 2 during film formation. The heat equalizing plate 155 circulates a heat medium of a non-conductive medium whose temperature is controlled inside, or incorporates a temperature-controlled heater, thereby controlling its own temperature so that the whole is generally uniform. It has a function of making the temperature of the counter electrode 152 in contact with the temperature uniform. The corresponding electrode 152 contains a plurality of substrate lift pins 151 that lift the substrate 2 when the substrate 2 is carried in and out. The soaking plate holding mechanism 161 holds the soaking plate 155 and the counter electrode 152 so as to be substantially parallel to the bottom surface of the film forming chamber 156. During film formation, the soaking plate 155, the counter electrode 152, and the substrate 2 are brought close to the discharge electrode 153. Thereby, the distance d between the substrate 2 and the discharge electrode 153 can be set to 3 mm to 20 mm, for example.

  The discharge electrode 153 may be configured by arranging the rod-shaped electrodes substantially in parallel and combining the rod-shaped electrodes substantially orthogonal to the rod-shaped electrodes at both ends, and may be divided into a plurality of electrode units. When the discharge electrode 153 is divided and configured, it is preferably divided and formed according to the number of feeding points. High-frequency power is supplied from power supply points 158 and 159 connecting the high-frequency power transmission paths 162a and 162b, respectively, and plasma of the source gas is generated between the discharge electrode 153 and the counter electrode 152 to form a film on the substrate 2. To do. The deposition preventing plate 154 is grounded and limits the range in which the film is formed by suppressing the range in which the plasma spreads. The support portion 157 holds the discharge electrode 153 in an insulating manner so as to be substantially parallel to the deposition preventing plate 154 and the upper surface of the film forming chamber body 156. Matching devices 163 (163a, 163b) match impedances on the output side, and discharge high-frequency power from a high-frequency power source (not shown) via high-frequency power transmission path 164 (164a, 164b) via high-frequency power transmission path 162 to discharge electrode 153. Power transmission.

  When the temperature of the discharge electrode 153 is adjusted, the high-frequency power transmission path 162 can supply power using, for example, a thin tube provided at the center of the circular tube and a heat medium through the periphery. It is. A heat medium is supplied to the power feed point 159 side of the discharge electrode 153, and the heat medium is sent from the power feed point 158 side of the discharge electrode 153 to the heat medium supply device. By controlling the temperature of the heat medium with the heat medium supply device, the temperature of the discharge electrode 153 can be controlled to a desired temperature, and the heat balance in the film forming chamber body 156 can be appropriately maintained. Thereby, the warp deformation accompanying the temperature difference of the board | substrate 2 can be suppressed, and there exists an effect which aims at the uniformity of a film forming characteristic.

FIG. 16 is a schematic view showing a method for carrying in and carrying out a substrate between the substrate transport carriage and the film forming chamber according to the present embodiment.
First, when the substrate 2 for starting film formation is carried in, the film forming chamber body 156 is evacuated from the high vacuum exhaust part 174 and the gate valve 17 is opened. A method for carrying the substrate 2 into the film forming chamber 12 using the upper carriage base (3) 80 after the substrate carrying carriage 20 has been moved to a predetermined position will be described. The substrate 2 is placed on the upper carriage base (3) 80 of the board transfer carriage 20. The upper carriage base (1) 60 is guided by the guide rail 53 on the carriage base 50, and the upper carriage base (2) 70 is guided by the guide rail 63 on the upper carriage base 60 (1), and the upper carriage base (3). 80 is guided by the guide rail 73 on the upper carriage base (2) 70, and is extended into the film forming chamber 12 in the Y direction with respect to the substrate transport carriage 20 by the second direction driving mechanism in the Y direction. The substrate 2 is carried into the film forming chamber body 156. However, in FIG. 12, the description of the configuration regarding the guide rails 53, 63, 73 is omitted for easy understanding of the drawing.

  The counter electrode 152 has a plurality of substrate lift pins 151 raised halfway, and is ready to receive the substrate 2. A sensor (not shown) of the upper carriage base (3) 80 detects that the upper carriage base (1) 60, the upper carriage base (2) 70, and the upper carriage base (3) 80 have extended to predetermined lengths. When it is determined that the substrate 2 has been inserted into the film forming chamber body 156, the substrate support 81 of the upper carriage base (3) 80 is removed. Alternatively, in the upper carriage base (3) 80, when a specific portion is pushed in by a straight drive force that is vacuum-sealed with an O-ring seal or the like from the outside of the central transfer chamber 10, the substrate is moved by the link mechanism provided on the substrate support 81 The support 81 can be opened (the substrate 2 is held in the closed state using the force of the spring without being pushed in), and the substrate 2 can be held and not held (delivered). As a result, the substrate 2 can be moved to the plurality of substrate lift pins 151 of the counter electrode 152 only by being placed on the upper carriage base (3) 80.

The plurality of substrate lift pins 151 provided on the counter electrode 152 of the film forming chamber body 156 are operated. When a sensor (not shown) of the film forming chamber main body 156 detects that the substrate 2 has reached a predetermined position, the plurality of substrate lift pins 151 are additionally raised upward from the upper carriage base (3) 80 to the substrate 2. Lift up. A sensor (not shown) of the upper carriage base (3) 80 detects that the substrate 2 has been lifted, and the upper carriage base (1) 60 to the upper carriage base (3) by the second direction driving mechanism in the Y direction. 80 is returned to the position on the cart base 50 and the lift cart base 50a. When a sensor (not shown) of the film forming chamber main body 156 detects that the upper cart base (1) 60 to the upper cart base (3) 80 have come out of the film forming chamber main body 156, the plurality of lift pins 151 are connected to the counter electrode. Stored in 152. Thereby, the substrate 2 is placed on the counter electrode 152.
The method of unloading the substrate 2 from the film forming chamber 12 by the upper carriage base (3) 80 of the substrate transfer carriage 20 is to evacuate the film forming chamber main body 156 from the high vacuum exhaust section 174 after the film forming process is completed. Since the reverse of the method for loading the substrate 2 is performed, the description thereof is omitted.

  As described above, when the substrate 2 is carried into and out of the film forming chamber 12, the upper carriage base (1) 60 to the upper carriage base (3) 80 are slid and moved in the Y direction by the transmission mechanism of the rack and pinion mechanism. The upper carriage base (3) 80 capable of holding the substrate 2 is moved greatly. Then, the substrate 2 can be transferred onto the substrate lift pin 151 by raising the substrate lift pin 151 with the counter electrode 151 after the opening operation of the substrate support 81. Thereafter, the substrate 2 can be disposed on the counter electrode 152 by lowering the substrate lift pins 151 with the counter electrode 152. The substrate 2 after film formation can be carried out in the reverse operation.

  Note that FIGS. 12, 13, and 16 show the case where the substrate 2 is held in a horizontal state. However, the present invention is not particular about the case where the substrate 2 is held horizontally. For example, even when the substrate 2 is inclined by θ (7 to 15 °) from the vertical direction, the same effect can be obtained and effective.

  In the present invention, by using a plurality of substrate transfer carts, the standby time of the substrate transfer cart and the film forming chamber can be suppressed, the substrate transfer speed can be increased, and the tact time can be shortened. In addition, since the plurality of substrate transfer carts are simply driven in the XYZ directions, a plurality of substrate transfer carts are used, but adjustment between them is easy. Furthermore, by applying to a parallel type vacuum processing apparatus, the central transfer chamber 210 is additionally extended, and it becomes easy to cope with an increase in the number of film forming chambers 12.

  A ball screw, a ball spline, a related gear, and the like that realize the drive mechanism described in FIGS. 9 to 14 are basic configurations for realizing the present embodiment. Therefore, conventionally known members such as gears can be added, deleted, and converted within the scope of the technical idea shown in the drive mechanism of the present embodiment.

FIG. 17 is a configuration diagram showing another application example of the vacuum processing apparatus according to the present embodiment.
This vacuum processing apparatus includes a central transfer chamber 210, a plurality of film forming chambers 212-1 to 212-3, a load chamber 211, a plurality of film forming chambers 212-4 to 212-6, and an unload chamber 213. And a first substrate transfer carriage 220-1 and a second substrate transfer carriage 220-2.

  The central transfer chamber 210 includes a first transfer region 210-1 and a second transfer region 210-2 that extend in the X direction and are adjacent to each other. The plurality of film forming chambers 212-1 to 212-3 are connected along the X direction on the first transfer region 210-1 side of the central transfer chamber 210 and vacuum-process the substrate 2. The load chamber 211 receives a substrate from the substrate loader 207 and supplies it to the central transfer chamber 210. It is provided adjacent to the plurality of film forming chambers 212-1 to 212-3. The plurality of film forming chambers 212-4 to 212-6 are connected along the X direction to the second transfer region 210-1 side of the central transfer chamber 210, and vacuum process the substrate 2. The unload chamber 213 receives the substrate from the central transfer chamber 210 and supplies it to the substrate unloader 221. It is provided adjacent to the plurality of film forming chambers 212-4 to 212-6. Gate valves 216, 218, 217-1 to 217-6 are provided between the load chamber 211, the unload chamber 213, and the plurality of film forming chambers 212-1 to 212-6 and the central transfer chamber 210. .

  The first substrate transfer cart 220-1 moves along the X direction in the first transfer region 210-1 of the central transfer chamber 210. At this time, the first substrate transfer carriage 220-1 uses the drive mechanism excluding the Z direction shown in FIGS. 9 to 14 to cross the adjacent transfer areas in the Y direction and the upper carriage base (1) 60 to By driving the upper carriage base (3) 80, the plurality of film forming chambers 212-1 to 212-3, the plurality of film forming chambers 212-4 to 212-6, and the load chamber 211 and the unload chamber 213 Thus, the substrate 2 can be carried in or out.

  Similarly, the second substrate transfer cart 220-2 moves in the second transfer region 210-2 of the central transfer chamber 210 along the X direction. The second substrate transfer carriage 220-2 uses an upper carriage base (1) 60 to an upper carriage base in the Y direction across adjacent transfer areas by using a drive mechanism excluding the Z direction shown in FIGS. (3) By driving 80, the plurality of film forming chambers 212-1 to 212-3 and the plurality of film forming chambers 212-4 to 212-6, and the substrate 2 with respect to the load chamber 211 and the unload chamber 213. Can be carried in or out.

  In this case, even if the central transfer chamber 10 is not arranged in two upper and lower stages, it is relatively simple by providing two substrate transfer measures that are driven in parallel in the Y direction and performing transfer processing with two substrate transfer carts. With this configuration, the substrate transfer speed can be significantly improved. Since the conveyance speed can be improved based on the configuration of the prior art shown in FIG.

  The present invention is not limited to the embodiments described above, and it is obvious that the embodiments can be appropriately modified or changed within the scope of the technical idea of the present invention.

FIG. 1 is a schematic diagram showing a conventional cluster type vacuum processing system. FIG. 2 is a schematic view showing a conventional vacuum processing apparatus. FIG. 3 is a block diagram showing the configuration of the vacuum processing apparatus according to the embodiment of the present invention. FIG. 4 is a schematic cross-sectional view showing the configuration of the vacuum processing apparatus according to the embodiment of the present invention. FIG. 5 is a schematic diagram showing the operation of each substrate transport cart according to the present embodiment. FIG. 6 is a schematic diagram showing another operation of each substrate transport cart according to the present embodiment. FIG. 7 is a schematic diagram showing the definition of the substrate inclination and the sectional area of the vacuum processing apparatus according to the present embodiment. FIG. 8 is a graph showing the relationship between the inclination of the substrate and the cross-sectional area of the vacuum processing apparatus according to this embodiment. FIG. 9 is a configuration diagram showing a driving mechanism in the X direction according to the present embodiment. FIG. 10 is a configuration diagram showing the operation of the driving mechanism in the X direction according to the present embodiment. FIG. 11 is another configuration diagram showing the drive mechanism in the X direction according to the present embodiment. FIG. 12 is a configuration diagram showing a drive mechanism in the Y direction and the Z direction according to the present embodiment. FIG. 13 is a configuration diagram showing a multi-stage rack and pinion drive mechanism among the drive mechanisms in the Y direction according to the present embodiment. FIG. 14 is a configuration diagram showing the relationship between drive mechanisms in the X direction, Y direction, and Z direction in the present embodiment. FIG. 15 is a schematic diagram showing the configuration of each film forming chamber according to the present embodiment. FIG. 16 is a schematic view showing a method for carrying in and carrying out a substrate between the substrate transport carriage and the film forming chamber according to the present embodiment. FIG. 17 is a configuration diagram showing another application example of the vacuum processing apparatus according to the present embodiment.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Vacuum processing apparatus 2 Substrate 10 Central transfer chamber 10-1 Lower center transfer chamber 10-2 Upper center transfer chamber 10a Retraction area 11 Load chamber 12-1 to 12-4 Film forming chamber 13 Unload chamber 14, 15 Track 16- 1, 16-2, 17-1 to 17-4, 18-1, 18-2 Gate valve 20 Substrate transport cart 20-1 to 20-2 First substrate transport cart 20-3 to 20-4 Second substrate transport Dolly 20-1a to 20-4a, 60, 70, 80 Upper dolly base 20-1b to 20-4b, 50 Dolly base 20-1c to 20-2c, 50a Elevating dolly base 22-1 to 22-2, 26, 27-1 to 27-4, 28 Opening 23-1 to 23-3 Position 30 Lower support 31 Multi-stage ball screw drive mechanism 32, 38, 48, 123 First to fourth ball screws 32a, 38a, 48a, 12 a First to fourth nuts 32b, 38b, 48b, 123b First to fourth screw shafts 33, 35, 36, 37, 43, 45, 46, 47, 102, 103, 105, 106, 112, 113, 115 116, Gears 34, 44, 101, 104, 111, 114, 125 First to seventh ball splines 34a, 44a, 101a, 104a, 111a, 114a, 125a First to seventh slide outer cylinders 34b, 44b, 101b 104b, 111b, 114b, 125b 1st to 7th spline shaft 40 Auxiliary lower support 51, 53, 63, 73 Guide rail 90 Vacuum seal bearing 91 X-axis rotation drive unit 92 Y-axis rotation drive unit 93 Z-axis Rotation drive unit 94 Multi-stage rack and pinion drive mechanism 95 Multi-stage spline drive mechanism 96 Multi-stage spline drive Mechanisms 108, 118, 125, 129, 134 First to fifth rotating shafts 107, 117, 121, 124 First to fourth bevel gears 126, 128, 130, 133, 135 First to fifth pinions 127, 119, 131, 132, 136 First to fifth racks 151 Substrate lift pin 152 Counter electrode 153 Discharge electrode 154 Depositing plate 155 Heat equalizing plate 156 Film forming chamber body 157 Supporting portion 158, 159 Power supply point 161 Heat equalizing plate holding mechanism 162 High frequency power supply Transmission path 163 Matching device 164 High-frequency power transmission path 172 Low vacuum exhaust section 174 High vacuum exhaust section 210 Central transfer chamber 212-1 to 212-6 Film forming chamber 211 Load chamber 213 Unload chamber 220-1 First substrate transfer carriage 220 -2 Second substrate transfer carriage 216, 218, 217-1 to 217-6 Gate valve

Claims (11)

A transfer chamber including a first transfer area and a second transfer area extending in the first direction and adjacent to each other;
A plurality of first processing chambers that are connected along the first direction to the first transfer region side of the transfer chamber and vacuum-process the substrate;
A plurality of second processing chambers that are connected along the first direction to the second transfer region side of the transfer chamber and vacuum-process the substrate;
A first substrate transfer carriage that moves along the first direction in the first transfer region of the transfer chamber;
A second substrate transfer carriage that moves along the first direction in the second transfer region of the transfer chamber;
The first substrate transport carriage carries the substrate into or out of at least one of the plurality of second processing chambers and the plurality of first processing chambers,
The said 2nd board | substrate conveyance trolley carries in and carries out the said board | substrate with respect to these 2nd process chamber. Vacuum processing apparatus. The vacuum processing apparatus according to claim 1,
Each of the first substrate transport cart and the second substrate transport cart is:
A carriage base movable in the first direction;
A vacuum processing apparatus comprising: a first direction drive mechanism for moving the cart base in the first direction. The vacuum processing apparatus according to claim 2,
The first direction drive mechanism includes:
A first rotation driving unit fixed to the transfer chamber;
A lower support for assisting movement of the carriage base;
A first ball screw extending in the first direction, rotated by a first rotation driving unit from one end side, and coupled to the lower support through a first nut;
The first spline shaft extends in the first direction, and the rotation of the gear on the other end side of the first ball screw is transmitted through the gear of the first slide outer cylinder, and the first spline shaft is rotatable. A first ball spline fixed to the lower support;
The second screw shaft extends in the first direction, the rotation of the gear at the end of the first ball spline is transmitted through the gear at the end, and is coupled to the carriage base through the second nut. And a second ball screw fixed to the lower support so that the second screw shaft is rotatable. The vacuum processing apparatus according to claim 2,
The first direction drive mechanism includes:
A first rotation driving unit fixed to the transfer chamber;
A lower support and an auxiliary lower support for assisting movement of the carriage base;
A first ball screw extending in the first direction, rotated by a first rotation driving unit from one end side, and coupled to the lower support through a first nut;
The first spline shaft extends in the first direction, and the rotation of the gear on the other end side of the first ball screw is transmitted through the gear of the first slide outer cylinder, and the first spline shaft is rotatable. A first ball spline fixed to the lower support;
The second screw shaft extends in the first direction, the rotation of the gear at the end of the first ball spline is transmitted through the gear at the end, and the second nut is connected to the auxiliary lower support through the second nut. A second ball screw coupled and fixed to the lower support so that the second screw shaft is rotatable;
The second spline shaft extends in the first direction, and the rotation of the gear at the end of the second ball screw is transmitted via a gear rotatably coupled to the lower support and a gear of the second slide outer cylinder. And a second ball spline in which the second spline shaft is rotatably fixed to the auxiliary lower support,
The third screw shaft extends in the first direction, and the rotation of the gear at the end of the second ball spline is transmitted through the gear at the end, and is coupled to the carriage base through the third nut. And a third ball screw fixed to the auxiliary lower support so that the third screw shaft is rotatable. The vacuum processing apparatus according to claim 2,
The plurality of first processing chambers and the plurality of second processing chambers are connected so as to extend in a second direction from the transfer chamber,
Each of the first substrate transport cart and the second substrate transport cart is:
An upper carriage base provided on the carriage base, movable in the second direction and capable of placing the substrate;
A second direction drive mechanism for moving the upper carriage base in the second direction;
The first direction driving mechanism moves the cart base in the first direction, and the second direction driving mechanism moves the upper cart base in the second direction. The vacuum processing apparatus according to claim 5, wherein
The second direction drive mechanism is
A second rotation driving unit fixed to the transfer chamber;
A lower support for assisting movement of the carriage base;
A third spline shaft extends in the first direction, is rotated by a second rotation drive unit from one end side, and the third spline shaft is rotatably coupled to the lower support through a third slide outer cylinder. 3 ball splines,
The fourth spline shaft extends in the first direction, the rotation of the gear of the third slide outer cylinder of the third ball spline is transmitted through the gear at the end, and the fourth spline shaft is rotatable. A fourth ball spline fixed to the lower support;
The other of the first rotating shafts extending in the first direction coupled to the gear of the fourth slide outer cylinder of the fourth ball spline via the gear at one end and rotatably coupled to the carriage base. A first bevel gear provided at the end of the
A first pinion coupled to the first bevel gear via a second bevel gear at one end and coaxially coupled to a second rotating shaft extending in the third direction;
A vacuum processing apparatus comprising: a first rack provided on the upper carriage base, extending in the second direction, and coupled to the first pinion. The vacuum processing apparatus according to claim 5, wherein
The plurality of first processing chambers and the plurality of second processing chambers are connected to different positions in the third direction with respect to the transfer chamber,
At least one of the first substrate transport cart and the second substrate transport cart is
The carriage base is provided below the upper carriage base, and includes a lifting carriage base movable in the third direction;
A third direction drive mechanism for moving the lifting carriage base in the third direction;
The first direction driving mechanism moves the cart base in the first direction, the third direction driving mechanism moves the lifting cart base in the third direction, and the second direction driving mechanism A vacuum processing apparatus for moving the upper carriage base in the second direction. The vacuum processing apparatus according to claim 7,
The third direction drive mechanism is
A third rotation driving unit fixed to the transfer chamber;
A lower support for assisting movement of the carriage base;
A fifth spline shaft extends in the first direction, is rotated by a third rotation driving unit from one end side, and the fifth spline shaft is rotatably coupled to the lower support through a fifth slide outer cylinder. 5 ball splines,
The sixth spline shaft extends in the first direction, the rotation of the gear of the fifth slide outer cylinder of the fifth ball spline is transmitted through the gear at the end, and the sixth spline shaft is rotatable. A sixth ball spline fixed to the lower support;
The other end of the third rotating shaft extending in the first direction coupled to the gear of the sixth slide outer cylinder of the sixth ball spline via the gear at one end and rotatably coupled to the carriage base. A third bevel gear provided in the section;
A fourth screw shaft extends in the third direction, and is coupled to the third bevel gear via the fourth bevel gear at the end, and is coupled to the elevating carriage base via a fourth nut. Provide vacuum processing equipment. The vacuum processing apparatus according to any one of claims 1 to 8,
There are a plurality of the first substrate transport cart and the second substrate transport cart,
The transfer chamber includes a standby region in which the plurality of first processing chambers and the plurality of second processing chambers are not connected, and at least one of the first substrate transfer carriage and the second substrate transfer carriage can wait. Processing equipment. In the vacuum processing apparatus according to any one of claims 1 to 9,
The plurality of first processing chambers and the plurality of second processing chambers process the substrate within a predetermined angle from a horizontal state or a horizontal state,
The first substrate transfer carriage and the second substrate transfer carriage hold the substrate within a predetermined angle from a horizontal state or a horizontal state. In the vacuum processing apparatus according to any one of claims 1 to 10,
A transfer chamber including a first transfer area and a second transfer area extending in the first direction and adjacent to each other;
A load chamber provided on the first transfer region side of the transfer chamber;
An unload chamber provided on the second transfer region side of the transfer chamber,
The vacuum processing apparatus, wherein unloading of the substrate from the load chamber by the first substrate transfer carriage and loading of the substrate into the unload chamber by the second substrate transfer carriage can be performed simultaneously.

Images