JP2009260087A - Wafer processing apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of raising throughput in a whole apparatus and raising production efficiency. <P>SOLUTION: A processing part 3 includes: a first transporting chamber 8 and a second transporting chamber 9 which are arranged by vertical lamination; six first processing chambers 10 which are arranged in a line on one side of the first and second transporting chambers 8, 9; and six second processing chambers 11 which are arranged in a line on the other side of the first and second transporting chambers 8, 9. A first main transporting robot 12 is arranged on the first transporting chamber 8 so as to be reciprocatively travelable. A second main transporting robot 13 is arranged on the second transporting chamber 9 so as to be reciprocatively travelable. <P>COPYRIGHT: (C)2010,JPO&INPIT

Description

  The present invention relates to a substrate such as a semiconductor wafer, a liquid crystal display substrate, a plasma display substrate, an FED (Field Emission Display) substrate, an optical disk substrate, a magnetic disk substrate, a magneto-optical disk substrate, and a photomask substrate. A substrate processing apparatus that performs processing on the substrate.

  A single-wafer type substrate processing apparatus used in a manufacturing process of a semiconductor device includes an indexer unit and a processing unit as disclosed in Patent Document 1 below. In the apparatus of Patent Document 1, the processing unit is disposed so as to be surrounded by a plurality of (for example, four) processing chambers for performing processing on the substrate, and these processing chambers. And a main transfer robot for loading / unloading the substrate. The indexer unit includes a carrier holding unit that holds a carrier that can store a plurality of substrates in a stacked state, and an indexer robot that transfers the substrate between the carrier held by the carrier holding unit and the main transfer robot. Yes.

The main transfer robot and indexer robot are double-arm type equipped with an upper hand and a lower hand that can move forward and backward, respectively, and hold the processed substrate by the lower hand and hold the unprocessed substrate by the upper hand To work.
Further, the processing unit includes a shuttle transport mechanism that mediates delivery of the substrate between the indexer robot and the main transport robot. The shuttle transport mechanism includes an upper hand and a lower hand.

  The main transfer robot causes the upper hand to access the processing chamber and unloads the processed substrate from the processing chamber, and accesses the lower hand to the processing chamber to load the unprocessed substrate into the processing chamber. Further, the main transport robot transfers the processed substrate held by the upper hand to the upper hand of the shuttle transport mechanism and receives an unprocessed substrate from the lower hand of the shuttle transport mechanism by the lower hand.

The indexer robot holds the processed substrate in the upper hand and transports and stores it to the carrier, and unloads the unprocessed substrate from the carrier by the lower hand. Further, the indexer robot receives the processed substrate from the upper hand of the shuttle transport mechanism by the upper hand, and transfers the unprocessed substrate held by the lower hand to the lower hand of the shuttle transport mechanism.
JP 2006-278508 A

In such a substrate processing apparatus, it is desirable to provide a large number of processing chambers in order to increase the production capacity.
However, in the above-described configuration, the indexer robot operates to transport unprocessed substrates one by one from the carrier to the shuttle transport mechanism, and to transport processed substrates one by one from the shuttle transport mechanism to the carrier. . In the meantime, it is necessary to travel in the horizontal direction between the carrier and the shuttle transport mechanism. Due to such an operation, the substrate transfer speed in the indexer robot is not always sufficient, which is a bottleneck that limits the throughput of the substrate processing apparatus. Therefore, even if the number of processing chambers is increased, the throughput cannot be improved.

  On the other hand, since the main transfer robot is fixedly arranged and accesses the processing chambers arranged around it, if the number of processing chambers is increased, the processing chambers are arranged in multiple stages in the vertical direction. Become. However, the main transfer robot cannot hold one unprocessed substrate and one processed substrate, and if the processing chambers are arranged in multiple stages, it is necessary to move the hand up and down within a large stroke range. . Therefore, even if the transfer speed of the indexer robot can be improved, the substrate transfer speed of the main transfer robot may become a bottleneck.

  In addition, the multi-stage arrangement of the processing chambers is limited to about two stages at the most, and it is difficult to design a structure for making the multi-stage arrangement of three or more stages, and the height restriction in the clean room must be cleared. There is. Even if the structural design is possible, another problem arises that the assemblability and the maintainability deteriorate. Furthermore, if the number of stages is increased, it is necessary to increase the speed of the main transfer robot in the vertical movement of the hand, but this is not always easy due to the robot performance limit.

  SUMMARY OF THE INVENTION An object of the present invention is to provide a substrate processing apparatus that can improve the throughput of the entire apparatus and improve the production efficiency.

  According to the first aspect of the present invention, there is provided an indexer section (2) for holding a substrate container (C) for storing a substrate (W), and at least 4 for holding and transporting the substrate disposed in the indexer section. One indexer hand (18A, 18B, 18C, 18D; 72A, 72B, 73A, 73B), and an indexer substrate transport mechanism (6; 72, 73) that carries the substrate in and out of the substrate container with these four indexer hands. A first processing section (7A) in which a plurality of first processing chambers (10) for processing a substrate are arranged in a line along a predetermined arrangement direction along the horizontal direction, and for holding and transporting the substrate A pair of first hands (19A, 19B) are provided so as to be able to travel along the arrangement direction, and the first hand is accessed to each first processing chamber of the first processing unit. A first main transfer robot (12) for loading and unloading plates, a second processing section (7B) in which a plurality of second processing chambers (11) are arranged in a line along the arrangement direction, and holding a substrate A pair of second hands (20A, 20B) for transporting are provided, provided so as to be able to travel along the arrangement direction, and allowing the second hand to access each second processing chamber of the second processing unit. A second main transfer robot (13) for carrying in / out the substrate, and an access by the indexer hand, the first hand, and the second hand, and between the indexer substrate transfer mechanism and the first main transfer robot. And a substrate transfer mechanism (1, 15, 16, 17; 74, 75) that mediates transfer of the substrate between the indexer robot and the second main transfer robot. 71) a.

In addition, the alphanumeric characters in parentheses represent corresponding components in the embodiments described later. The same applies hereinafter.
According to the configuration of the first aspect, in the first processing unit, the plurality of first processing chambers are arranged in a line along a predetermined arrangement direction (horizontal direction). Therefore, even if the number of processing chambers is increased, the structural design does not become difficult. The substrate is carried in and out of each first processing chamber by a first main transfer robot provided so as to be able to travel along the arrangement direction. Since the first main transfer robot includes the pair of first hands, the first main transfer robot receives the processed substrate from the first processing chamber and the unprocessed substrate to the first processing chamber. Can pass. Further, the first main transfer robot can access the substrate transfer mechanism, receive an unprocessed substrate from the substrate transfer mechanism, and transfer a processed substrate to the substrate transfer mechanism. The first main transfer robot can access each first processing chamber by running in the horizontal direction, and it is not necessary to move the hand in a large stroke range in the vertical direction in order to access these processing chambers. Therefore, it is possible to easily increase the speed of hand movement between each first processing chamber and the substrate transfer mechanism. Further, even when the number of first processing chambers is increased, only the travel distance of the first main transfer robot is increased, and unlike the case where the vertical stroke is increased, there are few restrictions due to the performance limit of the robot.

  In the second processing unit, a plurality of second processing chambers are arranged in a line along the arrangement direction (horizontal direction). Therefore, even if the number of processing chambers is increased, the structural design does not become difficult. The substrate is carried in and out of each second processing chamber by a second main transfer robot provided so as to be able to travel along the arrangement direction. Since the second main transfer robot includes the pair of second hands, the second main transfer robot receives the processed substrate from the second processing chamber and the unprocessed substrate to the second processing chamber. Can pass. Further, the second main transfer robot can access the substrate transfer mechanism, receive an unprocessed substrate from the substrate transfer mechanism, and transfer a processed substrate to the substrate transfer mechanism. The second main transfer robot can access each of the second processing chambers by traveling in the horizontal direction, and it is not necessary to move the hand in a large stroke range in the vertical direction in order to access these processing chambers. Therefore, it is possible to easily increase the speed of hand movement between each second processing chamber and the substrate transfer mechanism. Further, even when the number of second processing chambers is increased, only the travel distance of the second main transfer robot is increased, and unlike the case where the vertical stroke is increased, there are few restrictions due to the performance limit of the robot.

  The indexer substrate transport mechanism can take out two unprocessed substrates from the substrate container using, for example, two indexer hands out of four indexer hands. Then, the indexer substrate transfer mechanism accesses the substrate transfer mechanism to transfer the two unprocessed substrates taken out from the substrate container to the substrate transfer mechanism, and from the substrate transfer mechanism, the processed two sheets are processed. Can receive the substrate.

In this case, the two substrates transferred from the indexer substrate transfer mechanism to the substrate transfer mechanism are transferred to the first main transfer robot and the second main transfer robot, and the first main transfer robot and the second main transfer robot. It is carried into the first processing chamber and the second processing chamber by the robot.
Further, the processed substrate processed in the first processing chamber and the processed substrate processed in the second processing chamber are unloaded by the first main transfer robot and the second main transfer robot, respectively, and the substrate transfer mechanism Is passed on. The indexer substrate transport mechanism receives, for example, two processed substrates from the substrate transfer mechanism using two of the four indexer hands, and uses the two processed substrates as a substrate container. Store.

  Therefore, the substrate transfer between the first processing unit and the substrate container and the substrate transfer between the second processing unit and the substrate container can be performed in parallel with each other, and the substrate per unit time. The number of transported sheets can be increased. For this reason, even when a relatively large number of processing chambers (for example, about 12) are arranged, the substrate can be smoothly moved between the individual processing chambers and the substrate container without causing the substrate conveyance stagnation. Can be transported. Thereby, the throughput of the whole apparatus can be improved and production efficiency can be improved.

  According to a second aspect of the present invention, the indexer substrate transport mechanism includes a first indexer robot (72) having a pair of first indexer hands (72A, 72B) and a pair of second indexer hands (73A, 73B). A second indexer robot (73), wherein the substrate transfer mechanism receives access by the first indexer hand and the first hand, and is connected between the first indexer robot and the first main transfer robot. The first substrate transfer unit (14, 15; 74) that mediates the transfer of the substrate, and the access by the second indexer hand and the second hand, and the second indexer robot and the second main transfer robot And a second substrate transfer unit (16, 17; 75) that mediates the transfer of the substrate between them. A substrate processing apparatus of claim 1, wherein.

  According to this configuration, the first indexer robot can take out the unprocessed substrate from the substrate container using the pair of first indexer hands and store the processed substrate in the substrate container. it can. The first indexer robot can receive a processed substrate from the first substrate transfer unit and can transfer an unprocessed substrate to the first substrate transfer unit.

  Further, the first main transfer robot can receive an unprocessed substrate from the first substrate transfer unit and transfer a processed substrate to the first substrate transfer unit using the first hand. Furthermore, the first main transfer robot can receive a processed substrate from the first processing chamber and can deliver an unprocessed substrate to the first processing chamber.

  On the other hand, the second indexer robot can take out the unprocessed substrate from the substrate container using the pair of second indexer hands and store the processed substrate in the substrate container. The second indexer robot can receive a processed substrate from the second substrate transfer unit and can transfer an unprocessed substrate to the second substrate transfer unit.

  The second main transfer robot can receive an unprocessed substrate from the second substrate transfer unit and transfer a processed substrate to the second substrate transfer unit using the second hand. Furthermore, the second main transfer robot can receive a processed substrate from the second processing chamber and can deliver an unprocessed substrate to the second processing chamber.

  Accordingly, the substrate transfer path (the first main transfer robot, the first substrate transfer unit, and the first indexer hand) between the substrate container and the first processing chamber, and the substrate between the substrate container and the second processing chamber. The transfer path (second main transfer robot, second substrate transfer unit, and second indexer hand) can be different paths that do not overlap each other. Thereby, it is possible to further suppress the occurrence of the substrate conveyance stagnation, and to further improve the throughput of the entire apparatus.

  Further, since the substrate transfer path between the substrate container and the first processing chamber and the substrate transfer path between the substrate container and the second processing chamber are separated, the substrate container and the first processing chamber are separated. Between the substrate transported between and the substrate transporter between the substrate container and the second processing chamber is prevented from adversely affecting at least one (for example, contamination of the processed substrate). be able to.

A third aspect of the present invention is the substrate processing according to the second aspect, wherein the first substrate transfer unit (14, 15) and the second substrate transfer unit (16, 17) are stacked in a vertical direction. Device.
According to the configuration of the third aspect, since the first substrate transfer unit and the second substrate transfer unit are stacked in the vertical direction, the area occupied by the substrate transfer mechanism can be reduced.

  If the indexer transport mechanism performs a substrate transfer operation at a predetermined substrate transfer position when the horizontal positions of the first and second substrate transfer units are different, the indexer transfer mechanism is configured so that the indexer hand faces each transfer unit. Must be rotated. On the other hand, if the first and second substrate transfer units are stacked in the vertical direction, the rotation operation of the indexer hand can be omitted, and the substrate transport speed can be further improved.

  According to a fourth aspect of the present invention, the first substrate transfer robot is configured such that the first processing chamber of the first processing unit and the second processing chamber of the second processing unit are arranged to be shifted in the vertical direction. The substrate according to any one of claims 1 to 3, wherein the second substrate transport robot travels in a first traveling region (8) and a second traveling region (9) that are stacked in a vertical direction. It is a processing device.

  According to this configuration, the first main transport robot and the second main transport robot each travel in the first travel region and the second travel region that are stacked in the vertical direction. Therefore, it is possible to reduce the apparatus size in the horizontal direction compared to the case where the first traveling area and the second traveling area are arranged side by side in the horizontal direction. Then, the first main transfer robot and the second main transfer robot carry the substrates in and out of the first processing chamber and the second processing chamber, which are arranged to be shifted in the vertical direction. As a result, the footprint of the apparatus can be reduced while maintaining the substrate transfer efficiency high.

  The configuration described in claim 4 is preferably combined with the configuration described in claim 3. In this case, it is preferable that the first substrate transfer unit is disposed at the height of the first travel region, and the second substrate transfer unit is disposed at the height of the second travel region. Thereby, the substrate transfer between the first main transfer robot and the first substrate transfer unit and the substrate transfer between the second main transfer robot and the second substrate transfer unit can be performed smoothly. In addition, the first and second main transfer robots and the first and second substrate transfer units are configured such that the first substrate transfer unit is opposed to the first traveling region and the second substrate transfer unit is opposed to the second traveling region. When the substrate is transferred to and from the unit, the operation of rotating the hands of the first and second main transfer robots so as to face the corresponding substrate transfer units becomes unnecessary. Thereby, the conveyance speed can be further improved.

  Furthermore, a substrate transfer position is set at a position facing the first and second travel areas with the first and second substrate transfer units interposed therebetween, and the indexer transfer mechanism and the first and second substrate transfer units are set at the substrate transfer position. It is preferable that the substrate is transferred between the two. Thereby, in the first and second substrate transfer units, the access direction from the first and second main transfer robots and the access direction from the indexer transfer mechanism are in a straight line in plan view. For this reason, in the first and second substrate transfer units, it is not necessary to perform the rotation operation of the substrates, so that their configuration can be simplified.

According to a fifth aspect of the present invention, in any one of the first to fourth aspects, the first substrate transport robot and the second substrate transport robot are arranged between the first processing unit and the second processing unit. The substrate processing apparatus according to claim 1.
According to this configuration, the first substrate transfer robot and the second substrate transfer robot are arranged between the first processing chamber of the first processing unit and the second processing chamber of the second processing unit. Therefore, a large number of processing chambers can be arranged in the apparatus without stacking the first processing chamber and the second processing chamber. When the first processing chamber and the second processing chamber are not stacked, it is not necessary to transport the substrate in the vertical direction, so that the substrate transportation stagnation hardly occurs. Thereby, board | substrate conveyance efficiency can be improved further.

Furthermore, if the amount of vertical displacement between the first processing chamber and the second processing chamber is adjusted, the apparatus can be downsized in the vertical direction as compared with the case where a plurality of processing chambers are stacked in the vertical direction. Is possible.
The configuration according to claim 6 is the substrate processing according to any one of claims 1 to 5, wherein the first processing unit and the second processing unit perform different processes on the substrate. Device.

According to this configuration, the first processing unit and the second processing unit can perform different processes on the substrate.
The configuration described in claim 6 is preferably combined with the configuration described in claim 2. Thereby, the conveyance path | route between a 1st process part and a substrate container and the conveyance path | route between a 2nd process part and a substrate container can be isolate | separated.

For example, when a 1st process part and a 2nd process part perform a mutually different process with respect to a board | substrate, an unprocessed board | substrate carried in to a 1st process part and a 2nd process part are carried. When an unprocessed substrate approaches, one substrate (substrate carried into the first processing unit) may adversely affect the other substrate (substrate carried into the second processing unit).
In this case, the substrate transport path between the substrate container and the first processing chamber and the substrate transport path between the substrate container and the second processing chamber are different paths that do not overlap each other. Then, it is possible to prevent one substrate from adversely affecting the other substrate during the substrate transport.

  More specifically, for example, the first processing unit performs a cleaning process on the substrate on which the copper wiring is formed, and the second processing unit cleans the substrate on which the copper wiring is not formed on the surface. Processing can be performed.

Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings.
FIG. 1 is a schematic plan view for explaining the layout of a substrate processing apparatus 1 according to one embodiment (first embodiment) of the present invention. 2 is a cross-sectional view taken along the section line II-II in FIG. FIG. 3 is a cross-sectional view taken along section line III-III in FIG.
The substrate processing apparatus 1 includes an indexer unit 2 and a processing unit 3 coupled to the indexer unit 2. The indexer unit 2 is a carrier holding unit capable of holding a carrier C as a substrate container capable of holding a plurality of substrates W (for example, semiconductor wafers) in a stacked state in an aligned state along a predetermined direction. 4 and an indexer robot (indexer substrate transport mechanism) 6 capable of traveling in an indexer transport path 5 having a length in a direction along the carrier holding portion 4 (Y direction).

A plurality (four in this embodiment) of carriers C can be held in the carrier holding portion 4. The carrier C can accommodate a plurality of substrates W in a stacked state in which a plurality of substrates W are arranged in the vertical direction with a predetermined interval between the unprocessed substrate W and the processed substrate W. Will be.
In FIGS. 1 and 2, a FOUP (Front Opening Unified Pod) that accommodates the substrate W in a sealed state is illustrated as the carrier C. However, in addition to this, a SMIF (Standard Mechanical Interface) pod, OC (Open Other forms of carriers such as (Cassette) can also be used.

  On the other hand, the processing unit 3 includes a first transfer chamber (first travel region) 8 and a second transfer that are stacked in the vertical direction (Z direction) along the horizontal direction (X direction) orthogonal to the indexer transfer path 5. Six first treatments arranged in a row along the first and second transfer chambers 8 and 9 on one side of the chamber (second travel region) 9 and the first transfer chamber 8 and the second transfer chamber 9 Six second chambers arranged in a line along the first and second transfer chambers 8 and 9 on the opposite side of the chamber 10 and the first and second transfer chambers 8 and 9 from the first processing chamber 10. The processing chamber 11, the first main transfer robot 12 that carries the substrate W into and out of the first processing chamber 10, the second main transfer robot 13 that carries the substrate W into and out of the second processing chamber 11, and the indexer unit 2 Between the first main transfer robot 12 and the indexer unit 2 and the second main transfer Comprises four first to fourth substrate transfer table 14, 15, 16, 17 as a substrate transfer mechanism that mediates the transfer of wafers W to and from the robot 13. The first and second substrate transfer tables 14 and 15 function as a first substrate transfer unit, and the third and fourth substrate transfer tables 16 and 17 function as a second substrate transfer unit.

A first processing section 7 </ b> A is formed by the six first processing chambers 10. The six first processing chambers 10 are arranged in a line along a horizontal direction (X direction) orthogonal to the indexer transport path 5. In each first processing chamber 10, a predetermined process is performed on the substrate W.
The six second processing chambers 11 form the second processing unit 7B. The six second processing chambers 11 are arranged in a line along the horizontal direction (X direction) orthogonal to the indexer transport path 5. In each second processing chamber 11, a predetermined process is performed on the substrate W.

  The first processing chamber 10 and the second processing chamber 11 have the same shape and size. The first processing chamber 10 and the second processing chamber 11 are arranged so as to be shifted in the vertical direction. Specifically, the first processing chamber 10 is arranged at a position approximately half the second processing chamber 11 higher than the second processing chamber 11. In this embodiment, the processing content of the first processing chamber 10 and the processing content of the second processing chamber 11 may be common to each other or may be different.

  The first main transfer robot 12 is disposed on the upper first transfer chamber 8 of the pair of transfer chambers 8 and 9, and moves on the first transfer chamber 8 along the horizontal direction orthogonal to the indexer transfer path 5. Travel back and forth. The first main transfer robot 12 causes the first upper hand 19A (described later) and the first lower hand 19B (described later) to access each of the first processing chambers 10 arranged in a row, so that the substrate W Carry in and out. Since the first main transfer robot 12 does not need to move the hand in a large vertical stroke range in order to access the first processing chamber 10, the first processing chamber 10 and first and second substrate transfer tables described later are used. 14 and 15 can be moved relatively quickly.

  The second main transfer robot 13 is disposed on the second transfer chamber 9 below the pair of transfer chambers 8 and 9, and moves on the second transfer chamber 9 along the horizontal direction perpendicular to the indexer transfer path 5. Travel back and forth. The second main transfer robot 13 causes the second upper hand 20A (described later) and the second lower hand 20B (described later) to access each of the second processing chambers 11 arranged in a row, so that the substrate W Carry in and out. Since the second main transfer robot 13 does not need to move the hand in a large vertical stroke range in order to access the second processing chamber 11, the second processing chamber 11 and third and fourth substrate transfer tables described later are used. The hand movement between 16 and 17 can be performed at a relatively high speed.

  The first to fourth substrate transfer tables 14, 15, 16, and 17 are formed by being stacked in the vertical direction, and the substrate W can be placed on the upper surface thereof. The uppermost first substrate transfer table 14 and the second substrate transfer table 15 second from the top are arranged at the height of the first transfer chamber 8 and opposite the first transfer chamber 8. The third third substrate transfer table 16 and the lowest fourth substrate transfer table 17 from the top are arranged at the height of the second transfer chamber 9 and opposite the second transfer chamber 9. For this reason, when the substrate W is transferred between the first and second main transfer robots 12 and 13 and the first to fourth substrate transfer tables 14 to 17, the first and second main transfer robots 12, It is not necessary to rotate the 13 hands 19A, 19B, 20A, 20B (described later) so as to face the corresponding substrate transfer tables 14-17.

Above the first processing chamber 10, a first upper fluid box 47 for supplying processing fluid (processing liquid and processing gas) to the first processing chamber 10 is arranged. The first upper fluid box 47 has a length along a horizontal direction (X direction) orthogonal to the indexer transport path 5, and supplies a processing fluid to all six first processing chambers 10.
Furthermore, the access position facing the first transfer chamber 8 with the first to fourth substrate transfer tables 14-17 interposed therebetween, and the second transfer chamber 9 with the first to fourth substrate transfer tables 14-17 interposed therebetween. At the access position, the substrate transfer between the indexer robot 6 and the first to fourth substrate transfer tables 14-17 is performed. Thereby, in the 1st-4th board | substrate delivery platforms 14-17, the access direction from the 1st and 2nd main transfer robots 12 and 13 and the access direction from the indexer robot 6 are on a straight line in planar view. Therefore, it is not necessary for the first to fourth substrate transfer tables 14 to 17 to rotate the substrate W, and such a rotating means is not coupled.

A second upper fluid box 48 for supplying a processing fluid (processing liquid and processing gas) to the second processing chamber 11 is disposed above the second processing chamber 11. The second upper fluid box 48 has a length along a horizontal direction (X direction) orthogonal to the indexer transport path 5, and supplies a processing fluid to all six second processing chambers 11.
Above the second upper fluid box 48, an electrical box 46 that houses electrical components of the processing chambers 10 and 11 and electrical components of the transfer robots 6, 12, and 13 is disposed.

A lower fluid box 49 such as a waste liquid processing mechanism and a processing liquid recovery processing mechanism is disposed below the first processing chamber 10 and the second transfer chamber 9.
FIG. 4A is a perspective view showing the configuration of the indexer robot 6. 4B is a rear view seen from the direction of arrow D in FIG. 4A.
The indexer robot 6 is a four-arm type robot that can move the four arms 21A, 21B, 21C, and 21D that are disposed so as to be shifted vertically in the horizontal direction independently of each other. The first hand 18A is coupled to the tip of the uppermost arm 21A. The second hand 18B is coupled to the tip of the second arm 21B from the top. A third hand 18C is coupled to the tip of the third arm 21C from the top. A fourth hand 18D is coupled to the tip of the lowest arm 21D.

The shapes of the arms 21A and 21C viewed from the upstream side in the advancing / retreating direction (back surface shape) are formed in a “U” shape, and the arms 21B and 21D are shaped as viewed from the downstream side in the advancing / retreating direction (front side) Shape) is formed in a “U” shape. The arm 21A is outside the arm 21C, and the arm 21B is outside the arm 21D.
The indexer robot 6 includes a rectangular parallelepiped arm holding portion 22 that holds the four arms 21A, 21B, 21C, and 21D, and a base portion 23 that supports the arm holding portion 22 from below. Two upper and lower rails 28 extending in the direction along the horizontal direction are formed on one side surface (the left rear side surface shown in FIG. 4A) along the advancing / retreating direction of the arm holding portion 22. The lower plate inner end portions of the arms 21A and 21C are fitted to the rail 28 on one side surface side. Further, two upper and lower rails 28 extending in the horizontal direction are formed on the other side surface (the front side surface shown in FIG. 4A) along the advancing / retreating direction of the arm holding portion 22. The lower plate inner ends of the arms 21B and 21D are fitted to the rail 28 on the other side surface.

The arm holding portion 22 includes an arm advance / retreat drive mechanism 24 for advancing and retracting the arms 21A, 21B, 21C, and 21D to advance and retract the first to fourth hands 18A to 18D.
The base unit 23 moves the arms 21A, 21B, 21C, and 21D around the vertical axis together with the arm holding unit 22, and moves the arms 21A, 21B, 21C, and 21D together with the arm holding unit 22. And an elevating drive mechanism 26. A traveling drive mechanism 27 for reciprocating the indexer robot 6 linearly along the indexer transport path 5 is coupled to the base unit 23.

FIG. 5 is a side view showing the configuration of the first main transfer robot 12.
The first main transfer robot 12 includes a first upper arm 30A and a first lower arm 30B, which are arranged so as to overlap vertically, and a first upper hand attached to the tips of the first upper arm 30A and the first lower arm 30B, respectively. 19A and the first lower hand 19B, an arm support part 37 for supporting the first upper arm 30A and the first lower arm 30B, a base part 31 for holding the arm support part 37, and a base part And running legs 32 provided below 31. The first upper hand 19A and the first lower hand 19B are coupled with an arm advance / retreat drive mechanism 33 for independently moving the first upper hand 19A and the first lower hand 19B linearly in the horizontal direction. .

The base 31 includes a rotation drive mechanism 34 that rotates the first upper hand 19A and the first lower hand 19B around the vertical axis together with the arm support 37, and the first upper hand 19A and the first lower hand 19B. An elevating drive mechanism 35 for elevating the entire support portion 37 is provided. A propulsion coil 36 is embedded in the traveling leg 32.
A travel rail 39 along the first transfer chamber 8 is disposed on the bottom surface of the first transfer chamber 8. The traveling rail 39 includes a base 40 and a pair of rails 41 disposed on the base 40.

  A magnet 38 in which N and S poles are alternately arranged with respect to the propulsion direction of the first transfer chamber 8 is embedded in the base 40. A linear motor 42 is formed by the magnet 38 and the propulsion coil 36. By driving the linear motor 42, the first main transfer robot 12 moves along the second transfer chamber 9 on the travel rail 39 of the first transfer chamber 8.

FIG. 6 is a side view showing the configuration of the second main transfer robot 13.
The second main transfer robot 13 includes a second upper arm 50A and a second lower arm 50B that are arranged so as to overlap vertically, and a second upper hand attached to the tips of the second upper arm 50A and the second lower arm 50B, respectively. 20A and the second lower hand 20B, an arm support part 57 for supporting the second upper arm 50A and the second lower arm 50B, a base part 51 for holding the arm support part 57, and a base part And traveling legs 52 provided below 51. The second upper hand 20A and the second lower hand 20B are coupled to an arm advance / retreat drive mechanism 53 for independently moving the second upper hand 20A and the second lower hand 20B linearly in the horizontal direction.

The base 51 includes a rotation drive mechanism 54 that rotates the second upper hand 20A and the second lower hand 20B around a vertical axis, and a lift drive mechanism 55 that moves the second upper hand 20A and the second lower hand 20B up and down. And. A propulsion coil 56 is embedded in the traveling leg 52.
A traveling rail 59 along the second transfer chamber 9 is disposed on the bottom surface of the second transfer chamber 9. The traveling rail 59 includes a base 60 and a pair of rails 61 disposed on the base 60.

A magnet 58 in which N poles and S poles are alternately arranged is embedded in the base 60. A linear motor 62 is formed by the magnet 58 and the propulsion coil 56. By driving the linear motor 62, the second main transfer robot 13 moves on the travel rail 59 along the second transfer chamber 9.
FIG. 7 is a block diagram showing an electrical configuration of the substrate processing apparatus 1.

  The substrate processing apparatus 1 includes a control device 70 having a configuration including a microcomputer. The control device 70 includes an arm advance / retreat drive mechanism 24, a rotation drive mechanism 25, a lift drive mechanism 26, a travel drive mechanism 27, an arm advance / retreat drive mechanism 33, a rotation drive mechanism 34, a lift drive mechanism 35, a linear motor 42, an arm advance / retreat. A drive mechanism 53, a rotation drive mechanism 54, a lift drive mechanism 55, and a linear motor 62 are connected as control targets.

In the substrate processing apparatus 1, the unprocessed substrate W accommodated in the carrier C is unloaded by the indexer robot 6.
FIG. 8 is an illustrative view for explaining the operation of taking out the substrate from the carrier C of the indexer robot 6.
For example, when the unprocessed substrate W is taken out from the carrier C, the control device 70 controls the arm advance / retreat drive mechanism 24 of the indexer robot 6 to retract the first to fourth hands 18A to 18D. Then, the control device 70 controls the travel drive mechanism 27 to move the indexer robot 6 along the indexer transport path 5 to an access position facing the carrier C. Further, the control device 70 controls the rotation driving mechanism 25 to rotate the arm holding portion 22 around the vertical axis so that the first to fourth hands 18A to 18D face the carrier C (FIG. 8A). reference). At this time, the first to fourth hands 18A to 18D do not hold the substrate W. In the carrier C, a plurality of unprocessed substrates W are supported on the support shelves 44, respectively. In FIG. 8, only the portion (cross section) of the support shelf 44 where the wafer W is supported is drawn for simplification of the drawing.

  The control device 70 controls the elevating drive mechanism 26 so that the second hand 18B faces the unprocessed substrate W (the upper substrate W shown in FIG. 8A) supported by the support shelf 44. Then, the control device 70 controls the arm advancing / retreating drive mechanism 24 to advance the second hand 18B below the unprocessed substrate W supported by the support shelf 44 (see FIG. 8B), and to move up and down By controlling the drive mechanism 26 to raise the second hand 18B, the unprocessed substrate W is scooped from the support shelf 44 of the carrier C (see FIG. 8C).

  Further, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the second hand 18B, and controls the lift drive mechanism 26 to control the unprocessed substrate W supported on the support shelf 44 (FIG. 8A The fourth hand 18D is made to face the lower substrate W) shown in FIG. Then, the control device 70 controls the arm advancing / retreating drive mechanism 24 to advance the fourth hand 18D (see FIG. 8D), and also controls the elevating drive mechanism 26 to raise the fourth hand 18D. As a result, the unprocessed substrate W is scooped from the support shelf 44 of the carrier C. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the fourth hand 18D (see FIG. 8E). Thus, removal of the unprocessed substrate W from the carrier C is achieved. In this case, the two substrates W can be taken out from the carrier C by a single substrate taking-out operation of the indexer robot 6.

  The removal of the substrate W by the second hand 18B and the removal of the substrate W by the fourth hand 18D may be performed simultaneously. That is, after the arm advance / retreat drive mechanism 24 is controlled and the second hand 18B and the fourth hand 18D are advanced simultaneously, the elevating drive mechanism 26 is controlled to raise the second hand 18B and the fourth hand 18D. Accordingly, the second hand 18B and the fourth hand 18D may be configured to simultaneously scoop two unprocessed substrates W from the support shelf 44 of the carrier C.

  The control device 70 controls the rotation drive mechanism 25 to rotate the indexer robot 6 about the vertical axis so that the first to fourth hands 18A to 18D face the processing unit 3 side, and then the travel drive mechanism 27 is moved. The indexer robot 6 is driven to travel on the indexer transport path 5 to the access position facing the first to fourth substrate transfer tables 14 to 17 and the lift drive mechanism 26 is controlled to control the indexer robot 6. The position is raised to an access position (substantially the same height as the first main transfer robot 12) facing the first substrate transfer table 14.

  FIG. 9 is an illustrative view for explaining a substrate transfer operation between the indexer robot 6 and the first to fourth substrate transfer tables 14 to 17. FIG. 9 illustrates the transfer of the substrate W between the indexer robot 6 and the first and second substrate transfer tables 14 and 15, and the indexer robot 6 and the third and fourth substrate transfer tables 16 and 17. The illustration of the delivery of the substrate W to and from is omitted.

The processed substrate W is placed on the first and third substrate transfer tables 14 and 16 before the substrate transfer operation with the indexer robot 6, but the substrate W is placed on the second and fourth substrate transfer tables 15 and 17. Is not placed.
When the first hand 18A faces the first substrate transfer table 14 (see FIG. 9A), the control device 70 controls the arm advance / retreat drive mechanism 24 to place the substrate W below the first substrate transfer table 14. The first hand 18A that is not held is advanced (see FIG. 9B), and the lift drive mechanism 26 is controlled to raise the first hand 18A, so that the first hand 18A has been processed. Scoop off the substrate W. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the first hand 18A (see FIG. 9C). As a result, the processed substrate W is transferred from the first substrate transfer table 14 to the first hand 18A.

  After the first hand 18 </ b> A is retracted, the control device 70 controls the elevating drive mechanism 26 so that the second hand 18 </ b> B faces the second substrate transfer table 15. The control device 70 controls the arm advancing / retracting drive mechanism 24 to advance the second hand 18B holding the unprocessed substrate W above the second substrate transfer table 15 (see FIG. 9D) and ascending / descending. By controlling the drive mechanism 26 and lowering the second hand 18B, the unprocessed substrate W is placed on the second substrate transfer table 15 (see FIG. 9E). Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the second hand 18B. As a result, the unprocessed substrate W is transferred from the second hand 18B to the second substrate transfer table 15.

  After the second hand 18B is retracted, the control device 70 controls the elevating drive mechanism 26 to move the indexer robot 6 to an access position (approximately the same height as the second main transfer robot 13) facing the third substrate transfer table 16. ). The control device 70 controls the arm advancing / retracting drive mechanism 24 to advance the third hand 18C not holding the substrate W below the third substrate transfer table 16, and also controls the lift drive mechanism 26 to The processed substrate W is scooped from the third substrate transfer table 16 by raising the three hands 18C. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the third hand 18C. As a result, the processed substrate W is transferred from the third substrate transfer table 16 to the third hand 18C.

  After the third hand 18 </ b> C is retracted, the control device 70 controls the elevating drive mechanism 26 so that the fourth hand 18 </ b> D faces the fourth substrate transfer table 17. The control device 70 controls the arm advancing / retreating drive mechanism 24 to advance the fourth hand 18D holding the unprocessed substrate W above the fourth substrate transfer table 17, and also controls the lifting drive mechanism 26. Then, the processed substrate W is placed on the fourth substrate transfer table 17 by lowering the second hand 18B. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the fourth hand 18D. As a result, the unprocessed substrate W is transferred from the fourth hand 18D to the fourth substrate transfer table 17. Thereafter, the control device 70 drives the travel drive mechanism 27 to cause the indexer robot 6 to travel to the access position facing the carrier C.

  In the above description, the substrate W is transferred between the hands 18A to 18D and the substrate transfer tables 14 to 17 in the order of the first hand 18A, the second hand 18B, the third hand 18C, and the fourth hand 18D. However, this order is only an example, and the substrate transfer operation between the hands 18A to 18D and the substrate transfer tables 14 to 17 may be performed in another order.

Further, the receiving operation of the substrate W of the first hand 18A and the third hand 18C may be performed simultaneously. Moreover, the delivery operation | movement of the board | substrate W of the 2nd hand 18B and the 4th hand 18D may be performed simultaneously.
After the substrate transfer operation between the indexer robot 6 and the substrate transfer tables 14 to 17, an unprocessed substrate W is placed on the second and fourth substrate transfer tables 15 and 17, and the first and first substrates The substrate W is not placed on the three substrate transfer tables 14 and 16. On the other hand, the processed substrate W is held in the first hand 18A and the third hand 18C of the indexer robot 6, and the substrate W is not held in the second hand 18B and the fourth hand 18D (FIG. 9 ( f)).

FIG. 10 is an illustrative view for explaining the operation of storing the substrate in the carrier C of the indexer robot 6.
After the indexer robot 6 reaches the access position facing the carrier C, the control device 70 controls the rotation driving mechanism 25 to rotate the arm holding portion 22 around the vertical axis so that the first to fourth hands 18A. -18D is made to oppose the carrier C (refer Fig.10 (a)).

  The control device 70 controls the elevating drive mechanism 26 so that the first hand 18 </ b> A is opposed to the support shelf 44 (above shown in FIG. 10A). Then, the control device 70 controls the arm advance / retreat drive mechanism 24 to advance the first hand 18A holding the processed substrate W above the support shelf 44 (see FIG. 10B). By controlling the elevating drive mechanism 26 to lower the second hand 18B, the processed substrate W is placed on the support shelf 44 of the carrier C (see FIG. 10C).

  Further, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the first hand 18A, and controls the elevating drive mechanism 26 to place the third hand on the support shelf 44 (downward as shown in FIG. 10A). 18C faces each other. Then, the control device 70 controls the arm advancing / retreating drive mechanism 24 to advance the third hand 18C (see FIG. 10D), and controls the elevating drive mechanism 26 to lower the third hand 18C. As a result, the processed substrate W is placed on the support shelf 44. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 24 to retract the third hand 18C (see FIG. 10E). Thus, storage of the processed substrate W in the carrier C is achieved.

  The storage of the substrate W by the first hand 18A and the storage of the substrate W by the third hand 18C may be performed simultaneously. That is, after the arm advance / retreat drive mechanism 24 is controlled and the first hand 18A and the third hand 18C are advanced simultaneously, the lift drive mechanism 26 is controlled, and the first hand 18A and the third hand 18C are lowered. Accordingly, the two processed substrates W may be simultaneously placed on the support shelf 44 of the carrier C from the first hand 18A and the third hand 18C. In this case, two substrates W can be simultaneously stored in the carrier C by one substrate transfer operation of the indexer robot 6.

FIG. 11 is an illustrative view for explaining a substrate transfer operation between the first and second main transfer robots 12 and 13 and the first to fourth substrate transfer tables 14 to 17.
As described above, after the substrate transfer operation from the indexer robot 6 to the first to fourth substrate transfer tables 14-17, the unprocessed substrate W is placed on the second and fourth substrate transfer tables 15, 17. The substrate W is not placed on the first and third substrate transfer tables 14 and 16.

The processed substrate W that has been processed in the first processing chamber 10 is unloaded by the first upper hand 19A of the first main transfer robot 12 and held by the first upper hand 19A. The control device 70 controls the linear motor 42 to cause the first main transfer robot 12 to travel in the first transfer chamber 8 to the access position facing the first and second substrate transfer tables 14 and 15.
When the first main transfer robot 12 reaches an access position facing the first and second substrate transfer tables 14 and 15 (see FIG. 11A), the control device 70 drives the arm of the first main transfer robot 12 to advance and retract. The mechanism 33 is controlled so that the first upper hand 19A holding the processed substrate W is advanced above the first substrate transfer table 14 (see FIG. 11B), and the elevation drive mechanism 35 is controlled. Then, the processed substrate W is placed on the first substrate transfer table 14 by lowering the first upper hand 19A. Thereafter, the control device 70 controls the arm advancing / retracting drive mechanism 33 to retract the first upper hand 19A and also controls the lifting drive mechanism 35 to oppose the first lower hand 19B to the second substrate transfer table 15. Lower to position. The control device 70 controls the arm advancing / retracting drive mechanism 33 to advance the first lower hand 19B not holding the substrate W below the second substrate transfer table 15 (see FIG. 11 (c)), and ascending / descending. By controlling the drive mechanism 35 and raising the first lower hand 19 </ b> B, the unprocessed substrate W is scooped from the second substrate transfer table 15. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 33 to retract the first lower hand 19B (see FIG. 11D). As a result, the processed substrate W held in the first upper hand 19A is transferred to the first substrate transfer table 14 and unprocessed from the second substrate transfer table 15 to the first lower hand 19B. The substrate W is delivered. In the first main transfer robot 12 after the substrate transfer operation, the unprocessed substrate W is held by the first lower hand 19B, and the first upper hand 19A does not hold the substrate W.

Thereafter, the control device 70 controls the linear motor 42 to cause the first main transfer robot 12 to travel in the first transfer chamber 8 to a position facing the intended first processing chamber 10. Then, the first main transfer robot 12 carries the unprocessed substrate W received from the second substrate transfer table 15 into the first processing chamber 10.
After the substrate transfer operation of the first main transfer robot 12, the processed substrate W is placed on the first substrate delivery table 14, and the substrate W is not placed on the second substrate delivery table 15.

  On the other hand, the processed substrate W that has been processed in the second processing chamber 11 is carried out by the second upper hand 20A of the second main transfer robot 13 and held by the second upper hand 20A. The control device 70 controls the linear motor 62 to cause the second main transfer robot 13 to travel in the second transfer chamber 9 to the access position facing the third and fourth substrate transfer tables 16 and 17.

  When the second main transfer robot 13 reaches the access position facing the third and fourth substrate transfer tables 16 and 17 (see FIG. 11E), the control device 70 drives the second main transfer robot 13 to advance and retract the arm. The mechanism 53 is controlled so that the second upper hand 20A holding the processed substrate W is advanced above the third substrate transfer table 16 (see FIG. 11F), and the lifting drive mechanism 55 is controlled. Then, the processed substrate W is placed on the third substrate transfer table 16 by lowering the second upper hand 20A. Thereafter, the control device 70 controls the arm advancing / retracting drive mechanism 53 to retract the second upper hand 20A and also controls the lifting drive mechanism 55 so that the second lower hand 20B faces the fourth substrate transfer table 17. Lower to position. The control device 70 controls the arm advancing / retracting drive mechanism 53 to advance the second lower hand 20B not holding the substrate W below the fourth substrate transfer table 17 (see FIG. 11G) and ascending / descending. By controlling the drive mechanism 55 and raising the second lower hand 20 </ b> B, the unprocessed substrate W is scooped from the fourth substrate transfer table 17. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 53 to retract the second lower hand 20B (see FIG. 11 (h)). As a result, the processed substrate W held in the second upper hand 20A is transferred to the third substrate transfer table 16 and unprocessed from the fourth substrate transfer table 17 to the second lower hand 20B. The substrate W is delivered. In the second main transfer robot 13 after the substrate transfer operation, the unprocessed substrate W is held by the second lower hand 20B, and the second upper hand 20A does not hold the substrate W.

Further, after the substrate transfer operation of the second main transfer robot 13, the processed substrate W is placed on the third substrate transfer table 16, and the substrate W is not placed on the fourth substrate transfer table 17. .
Thereafter, the control device 70 controls the linear motor 62 to cause the second main transfer robot 13 to travel in the second transfer chamber 9 to a position facing the intended second processing chamber 11. Then, the second main transfer robot 13 carries the unprocessed substrate W received from the fourth substrate transfer table 17 into the second processing chamber 11.

According to this embodiment, the substrate W transferred from the indexer robot 6 to the second substrate transfer table 15 is transferred to the first main transfer robot 12 and transferred into the first processing chamber 10. Further, the substrate W transferred from the indexer robot 6 to the fourth substrate transfer table 17 is transferred to the second main transfer robot 13 and transferred into the second processing chamber 11.
Further, the processed substrate W processed in the first processing chamber 10 is unloaded by the first main transfer robot 12 and transferred to the first substrate transfer table 14. The processed substrate W processed in the second processing chamber 11 is unloaded by the second main transfer robot 13 and transferred to the second substrate transfer table 15. Then, the indexer robot 6 receives the two processed substrates W from the first and third substrate transfer tables 14 and 16 using the first and third hands 18A and 18C, and the two processed substrates W The substrate W is stored in the carrier C using the first and third hands 18A and 18C.

  Therefore, the substrate transfer between the first processing chamber 10 and the carrier C and the substrate transfer between the second processing chamber 11 and the carrier C can be executed in parallel with each other. For this reason, even if the number of the processing chambers 10 and 11 is a relatively large number of twelve, the substrate W can be transferred between the individual processing chambers 10 and 11 and the carrier C without causing the transport stagnation of the substrate W. Can be transported smoothly. Thereby, the throughput of the whole substrate processing apparatus 1 can be improved, and production efficiency can be improved.

  In addition, the first main transfer robot 12 and the second main transfer robot 13 travel on the first transfer chamber 8 and the second transfer chamber 9 that are stacked in the vertical direction. Therefore, the horizontal size of the substrate processing apparatus 1 can be reduced as compared with the case where the first transfer chamber 8 and the second transfer chamber 9 are arranged side by side in the horizontal direction. Then, the first main transfer robot 12 and the second main transfer robot 13 carry the substrate W in and out of the first processing chamber 10 and the second processing chamber 11 that are arranged to be shifted in the vertical direction. Thereby, the footprint of the substrate processing apparatus 1 can be reduced while maintaining the transfer efficiency of the substrate W high.

  Further, when the first to fourth substrate transfer tables 14 to 17 have different horizontal positions in the longitudinal direction (Y direction) of the indexer transport path 5, the indexer robot 6 moves the substrate transfer tables 14 to 17 at the access position. When the substrate transfer operation is performed, it is necessary to rotate the first to fourth hands 18A to 18D so as to face the substrate transfer tables 14 to 17, respectively. In contrast, if the first to fourth substrate transfer tables 14 to 17 are stacked in the vertical direction, the rotating operation of the first to fourth hands 18A to 18D can be omitted. Thereby, a board | substrate conveyance speed can be improved further.

FIG. 12 is a schematic plan view for explaining the layout of the substrate processing apparatus 71 according to the second embodiment of the present invention. FIG. 13 is a cross-sectional view taken along section line XIII-XIII in FIG.
In the second embodiment, parts corresponding to those shown in the first embodiment are denoted by the same reference numerals as those in the first embodiment, and description thereof is omitted.

The substrate processing apparatus 71 according to the second embodiment is different from the substrate processing apparatus 1 of the above-described embodiment in that two double arm type indexer robots 72 are used instead of the four arm type indexer robot 6. , 73 (the first indexer robot 72 and the second indexer robot 73).
Further, another difference between the substrate processing apparatus 71 and the substrate processing apparatus 1 is that instead of the first to fourth substrate transfer tables 14 to 17, a pair of substrate transfer units 74 and 75 ( The first substrate transfer unit 74 and the second substrate transfer unit 75) are arranged so as to be shifted in the horizontal direction (Y direction).

  In the substrate processing apparatus 71 according to this embodiment, a cleaning process is performed on the substrate W having a copper wiring formed on the surface thereof in the first processing unit 7A, and a copper wiring is formed on the surface of the second processing unit 7B. A cleaning process is performed on the substrate W on which is not formed. The substrate W carried into the first processing chamber 10 of the first processing unit 7A is subjected to a planarization process by, for example, a CMP (Chemical Mechanical Polishing) process after the interlayer insulating film is coated with a copper film by a damascene process, for example. It is after being done. For this reason, the copper removed along with the polishing remains on the surface of the substrate W. In this case, the substrate W processed in the second processing unit 7B may be adversely affected.

The first and second indexer robots 72 and 73 are arranged side by side along the longitudinal direction (Y direction) of the indexer transport path 5.
The first indexer robot 72 is an articulated arm type robot capable of independently driving a pair of arms 81 and 82, and the first indexer robot 72 is shifted in the vertical direction at the tip of the arms 81 and 82. The upper indexer hand 72A and the first lower indexer hand 72B (see FIG. 15) are coupled to each other. The first indexer robot 72 includes an arm advance / retreat drive mechanism 85 that drives the arms 81 and 82 to advance and retract the first upper indexer hand 72A and the first lower indexer hand 72B independently. Further, the first indexer robot 72 includes an arm rotation drive mechanism (not shown) that rotates the arms 81 and 82 around the vertical axis, and a lift drive mechanism 87 (see FIG. 14) that moves the arms 81 and 82 up and down. Yes. The first indexer robot 72 is coupled to a first travel drive mechanism 78 for linearly reciprocating the first indexer robot 72 along the indexer transport path 5.

  The second indexer robot 73 is an articulated arm type robot that can independently drive a pair of arms 83 and 84, and the second indexer robot 73 is shifted in the vertical direction at the tip of the arms 83 and 84. The upper indexer hand 73A and the second lower indexer hand 73B (see FIG. 17) are coupled to each other. The second indexer robot 73 includes an arm advance / retreat drive mechanism 86 that drives the arms 83 and 84 to advance and retract the second upper indexer hand 73A and the second lower indexer hand 73B independently. Further, the second indexer robot 73 includes an arm rotation drive mechanism (not shown) that rotates the arms 83 and 84 around the vertical axis, and a lift drive mechanism 88 (see FIG. 14) that moves the arms 83 and 84 up and down. Yes. The second indexer robot 73 is coupled to a second travel drive mechanism 79 for causing the second indexer robot 73 to reciprocate linearly along the indexer transport path 5.

  The first substrate transfer unit 74 is for mediating transfer of the substrate W between the first indexer robot 72 and the first main transfer robot 12, and is disposed at substantially the same height as the first transfer chamber 8. The upper mounting table 74A and the lower mounting table 74B are provided. The upper mounting table 74A and the lower mounting table 74B can mount the substrate W on their upper surfaces, and are shifted in the vertical direction and shifted in the horizontal direction. Coupled to the first substrate transfer unit 74 is a first unit rotation drive mechanism 76 that rotates the upper mounting table 74A and the lower mounting table 74B around the vertical axis in order to change the posture of the upper mounting table 74A and the lower mounting table 74B. Yes.

  The second substrate transfer unit 75 is for mediating transfer of the substrate W between the second indexer robot 73 and the second main transfer robot 13, and is disposed at substantially the same height as the second transfer chamber 9. The upper mounting table 75A and the lower mounting table 75B are provided. The upper mounting table 75A and the lower mounting table 75B can mount the substrate W on the upper surface thereof, and are shifted in the vertical direction and shifted in the horizontal direction. Coupled to the second substrate transfer unit 75 is a second unit rotation drive mechanism 77 that rotates the upper mounting table 75A and the lower mounting table 75B about the vertical axis in order to change the posture of the upper mounting table 75A and the lower mounting table 75B. Yes.

  In the substrate processing apparatus 71, a substrate transfer path between the carrier C and the first processing chamber 10 (path through the first main transfer robot 12, the first substrate transfer unit 74, and the first indexer robot 72), the carrier The substrate transfer path between C and the second processing chamber 11 (the path passing through the second main transfer robot 13, the second substrate transfer unit 75, and the second indexer robot 73) is a different path that does not overlap each other. It has become.

FIG. 14 is a block diagram showing an electrical configuration of the substrate processing apparatus 71.
The controller 70 of the substrate processing apparatus 71 includes an arm advance / retreat drive mechanism 85, a lift drive mechanism 87, an arm advance / retreat drive mechanism 86, a lift drive mechanism 88, a first travel drive mechanism 78, a second travel drive mechanism 79, and a first unit. Rotation drive mechanism 76, second unit rotation drive mechanism 77, arm advance / retreat drive mechanism 33, rotation drive mechanism 34, elevating drive mechanism 35, linear motor 42, arm advance / retreat drive mechanism 53, rotation drive mechanism 54, elevating drive mechanism 55, and linear A motor 62 is connected as a control target.

  FIG. 15 is an illustrative view for explaining a substrate transfer operation between the first indexer robot 72 and the first substrate transfer unit 74. The processed substrate W is mounted on the upper mounting table 74A before the substrate transfer with the first indexer robot 72, but the substrate W is not mounted on the lower mounting table 74B. Further, in the first indexer robot 72 before the substrate transfer operation, the unprocessed substrate W having the copper wiring formed on the surface thereof is taken out from the carrier C and held by the first lower indexer hand 72B. The substrate W is not held in the upper indexer hand 72A.

  The control device 70 drives the first travel drive mechanism 78 to cause the first indexer robot 72 to travel on the indexer transport path 5 to the access position facing the first substrate transfer unit 74, and to move the lift drive mechanism 87. The first indexer robot 72 is controlled to move up and down to an access position (substantially the same height as the first main transfer robot 12) facing the first substrate transfer unit 74. In addition, the control device 70 drives the first unit rotation driving mechanism 76 to move the upper mounting table 74A and the lower mounting table 74B around the vertical axis so that the upper mounting table 74A and the lower mounting table 74B face the first indexer robot 72. Rotate to

  When the first indexer robot 72 reaches the access position (see FIG. 15A), the control device 70 controls the arm advance / retreat drive mechanism 85 to mount the first upper indexer hand 72A not holding the substrate W. While advancing below the mounting table 74A (see FIG. 15B), the lifting drive mechanism 87 is controlled to raise the first upper indexer hand 72A, thereby scooping up the unprocessed substrate W from the upper mounting table 74A. . Thereafter, the control device 70 controls the arm advancing / retracting drive mechanism 85 to retract the first upper indexer hand 72A and also controls the lifting / lowering drive mechanism 87 so that the first lower indexer hand 72B is opposed to the lower mounting table 74B. Lower to the position where The control device 70 controls the arm advance / retreat drive mechanism 85 to advance the first lower indexer hand 72B above the lower mounting table 74B (see FIG. 15C), and also controls the elevating drive mechanism 87 to 1 Lowered indexer hand 72B is lowered to place processed substrate W on lower mounting table 74B. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 85 to retract the first lower indexer hand 72B (see FIG. 15D). As a result, the unprocessed substrate W held in the first lower indexer hand 72B is transferred to the lower mounting table 74B, and the processed substrate W is received from the upper mounting table 74A to the first upper indexer hand 72A. Passed. In the first indexer robot 72 after the substrate transfer operation, the processed substrate W is held by the first upper indexer hand 72A, and the first lower indexer hand 72B does not hold the substrate W.

After the substrate transfer operation of the first indexer robot 72, an unprocessed substrate W having a copper wiring formed on the surface thereof is placed on the lower placement table 74B, and the substrate W is placed on the upper placement table 74A. Absent.
FIG. 16 is an illustrative view for explaining a substrate transfer operation between the first main transfer robot 12 and the first substrate transfer unit 74.

  The processed substrate W that has been processed in the first processing chamber 10 is unloaded by the first upper hand 19A of the first main transfer robot 12 and held by the first upper hand 19A. The control device 70 controls the linear motor 42 to cause the first main transfer robot 12 to travel in the first transfer chamber 8 to an access position facing the upper mounting table 74A and the lower mounting table 74B of the first substrate transfer unit 74. . Further, the control device 70 drives the first unit rotation driving mechanism 76 so that the upper mounting table 74A and the lower mounting table 74B are opposed to the first main transport robot 12 at the access position. The stage 74B is rotated around the vertical axis.

  When the first main transfer robot 12 reaches an access position facing the upper mounting table 74A and the lower mounting table 74B (see FIG. 16A), the control device 70 controls the arm advance / retreat drive mechanism 33 of the first main transfer robot 12. Then, the first upper hand 19A holding the processed substrate W is advanced above the upper mounting table 74A (see FIG. 16B), and the elevating drive mechanism 35 is controlled to control the first upper hand 19A. Is lowered, the processed substrate W is placed on the upper placement table 74A. Thereafter, the control device 70 controls the arm advancing / retracting drive mechanism 33 to retract the first upper hand 19A and controls the lifting drive mechanism 35 to lower the first lower hand 19B to a position facing the lower mounting table 74B. Let The control device 70 controls the arm advance / retreat drive mechanism 33 to advance the first lower hand 19B not holding the substrate W below the lower mounting table 74B (see FIG. 16C), and the elevating drive mechanism 35. Is controlled to raise the first lower hand 19B, thereby scooping up the unprocessed substrate W from the lower mounting table 74B. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 33 to retract the first lower hand 19B (see FIG. 16D). Thereby, the processed substrate W held by the first upper hand 19A is transferred to the upper mounting table 74A, and the unprocessed substrate W is transferred from the lower mounting table 74B to the first lower hand 19B. . In the first main transfer robot 12 after the substrate transfer operation, the unprocessed substrate W is held by the first lower hand 19B, and the first upper hand 19A does not hold the substrate W.

Thereafter, the control device 70 controls the linear motor 42 to cause the first main transfer robot 12 to travel in the first transfer chamber 8 to a position facing the intended first processing chamber 10. Then, the first main transfer robot 12 carries the unprocessed substrate W, on which the copper wiring is formed on the surface received from the lower mounting table 74B, into the first processing chamber 10.
FIG. 17 is an illustrative view for explaining a substrate transfer operation between the second indexer robot 73 and the second substrate transfer unit 75. The processed substrate W is placed on the upper placement table 75A before the substrate delivery with the second indexer robot 73, but the substrate W is not placed on the lower placement table 75B. Further, in the second indexer robot 73 before the transfer operation, an unprocessed substrate W on which no copper wiring is formed is held by the second lower indexer hand 73B. The substrate W is not held.

  The control device 70 drives the second travel drive mechanism 79 to cause the second indexer robot 73 to travel on the indexer transport path 5 to the access position facing the second substrate transfer unit 75. Further, the control device 70 drives the second unit rotation drive mechanism 77 to move the upper mounting table 75A and the lower mounting table 75B around the vertical axis so that the upper mounting table 75A and the lower mounting table 75B face the second indexer robot 73. Rotate to

  When the second indexer robot 73 reaches the access position (see FIG. 17A), the control device 70 controls the arm advance / retreat drive mechanism 86 to move the second upper indexer hand 73A not holding the substrate W, While advancing below the upper mounting table 75A (see FIG. 17B), the elevator drive mechanism 88 is controlled to raise the second upper indexer hand 73A, thereby scooping the unprocessed substrate W from the upper mounting table 75A. take. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 86 to retract the second upper indexer hand 73A and controls the elevating drive mechanism 88 to oppose the second lower indexer hand 73B to the lower mounting table 75B. Lower to the position where The control device 70 controls the arm advance / retreat drive mechanism 86 to advance the second lower indexer hand 73B above the lower mounting table 75B (see FIG. 17 (c)), and also controls the elevating drive mechanism 87 to (2) By lowering the lower indexer hand 73B, the processed substrate W is placed on the lower placement table 75B. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 86 to retract the second lower indexer hand 73B (see FIG. 17D). As a result, the unprocessed substrate W held by the second lower indexer hand 73B is transferred to the lower mounting table 75B, and the processed substrate W is transferred from the upper mounting table 75A to the second upper indexer hand 73A. It is. In the second indexer robot 73 after the substrate transfer operation, the processed substrate W is held by the second upper indexer hand 73A, and the second lower indexer hand 73B does not hold the substrate W.

After the substrate transfer operation of the second indexer robot 73, an unprocessed substrate W on which no copper wiring is formed is mounted on the lower mounting table 75B, and the substrate W is mounted on the upper mounting table 75A. Not.
FIG. 18 is an illustrative view for explaining a substrate transfer operation between the second main transfer robot 13 and the second substrate transfer unit 75.

  The processed substrate W that has been processed in the second processing chamber 11 is unloaded by the second upper hand 20A of the second main transfer robot 13 and held by the second upper hand 20A. The control device 70 controls the linear motor 62 to cause the second main transfer robot 13 to travel in the second transfer chamber 9 to an access position facing the upper mounting table 75A and the lower mounting table 75B of the second substrate transfer unit 75. .

  When the second main transfer robot 13 reaches the access position facing the upper mounting table 75A and the lower mounting table 75B (see FIG. 18A), the control device 70 controls the arm advance / retreat drive mechanism 53 of the second main transfer robot 13. Then, the second upper hand 20A holding the processed substrate W is advanced above the upper mounting table 75A (see FIG. 18B), and the elevating drive mechanism 55 is controlled to control the second upper hand 20A. , The processed substrate W is placed on the upper placement table 75A. Thereafter, the control device 70 controls the arm advancing / retracting drive mechanism 53 to retract the second upper hand 20A and also controls the lifting drive mechanism 55 to lower the second lower hand 20B to a position facing the lower mounting table 75B. . The control device 70 controls the arm advance / retreat drive mechanism 53 to advance the second lower hand 20B not holding the substrate W below the lower mounting table 75B (see FIG. 18C), and the elevating drive mechanism 55. And the second lower hand 20B is lifted to scrape the unprocessed substrate W from the lower mounting table 75B. Thereafter, the control device 70 controls the arm advance / retreat drive mechanism 53 to retract the second lower hand 20B (see FIG. 18D). As a result, the processed substrate W held by the second upper hand 20A is transferred to the upper mounting table 75A, and the unprocessed substrate W is transferred from the lower mounting table 75B to the second lower hand 20B. . In the first main transfer robot 12 after the substrate transfer operation, the unprocessed substrate W is held in the second lower hand 20B, and the second upper hand 20A does not hold the substrate W.

Thereafter, the control device 70 controls the linear motor 62 to cause the second main transfer robot 13 to travel in the second transfer chamber 9 to a position facing the intended second processing chamber 11. Then, the second main transfer robot 13 carries the unprocessed substrate W on which the copper wiring is not formed on the surface received from the lower mounting table 75B, into the second processing chamber 11.
As described above, according to the second embodiment, the substrate transfer path between the carrier C and the first processing chamber 10 and the substrate transfer path between the carrier C and the second processing chamber 11 are separated. can do. Thereby, generation | occurrence | production of the conveyance stagnation of the board | substrate W can be suppressed more, and the throughput of the whole substrate processing apparatus 1 can further be improved.

Further, since the substrate transfer path between the carrier C and the first processing chamber 10 and the substrate transfer path between the carrier C and the second processing chamber 11 are separated, the surface of the substrate C is transferred during the transfer of the substrate. It is possible to prevent the unprocessed substrate W on which the copper wiring is formed from adversely affecting the processed substrate W.
As mentioned above, although two embodiment of this invention was described, this invention can also be implemented with another form.

In the above-described second embodiment, the apparatus layout in which the board transfer units 74 and 75, the first indexer robot 72, and the first indexer robot 72 are combined has been described as an example. However, the board transfer units 74 and 75, The four-arm type indexer robot 6 according to the embodiment may be combined.
In addition, the substrate transfer units 74 and 75 may be configured to be movable up and down by being coupled to the substrate transfer units 74 and 75 with an elevation drive mechanism such as a ball screw. In this case, the first and second indexer robots 72 and 73 and the first and second substrate transfer at the access position (substrate transfer position) located in the middle in the vertical direction between the first transfer chamber 8 and the second transfer chamber 9. Substrate delivery between the units 74 and 75 can also be performed. In this case, the first substrate transfer unit 74 is moved up and down between the access position and the position facing the first transfer chamber 8, and the substrate W is transferred to and from the first indexer robot 72 at the access position. The substrate W is transferred to and from the first main transfer robot 12 at a position facing the first transfer chamber 8. The second substrate transfer unit 75 is moved up and down between the access position and a position facing the second transfer chamber 9, and transfers the substrate W to and from the second indexer robot 73 at the access position. The substrate W is transferred to and from the second main transfer robot 13 at a position facing the second transfer chamber 9. In this case, the vertical strokes of the indexer robots 72 and 73 can be reduced, and even if the robot has a performance limit, the indexer robots 72 and 73 and the first and second substrate transfer units 74 and 75 are used. Can be smoothly carried between the two.

  In addition, the substrate transfer between the first and second indexer robots 72 and 73 and the first and second substrate transfer units 74 and 75 may be performed at an access position substantially the same height as the second transfer chamber 9. it can. In this case, the first substrate transfer unit 74 is moved up and down between the access position and the position facing the first transfer chamber 8, and the substrate W is transferred to and from the first indexer robot 72 at the access position. The substrate W is transferred to and from the first main transfer robot 12 at a position facing the first transfer chamber 8. Further, the second substrate transfer unit 75 transfers the substrate W to and from the second indexer robot 73 at the access position without being moved up and down, and at the position facing the second transfer chamber 9 at the second position. The substrate W is transferred to and from the main transfer robot 13.

Of course, the board | substrate delivery units 74 and 75 may be the structure which raises / lowers integrally.
Furthermore, in the above-described second embodiment, the case where different processing is performed on the substrate W in the first processing unit 7A and the second processing unit 7B is taken as an example, but common processing is performed. May be.
In the first and second embodiments, the indexer hand (first to fourth hands 18A to 18D, first upper indexer hand 72A, first lower indexer hand 72B, second upper indexer hand 73A, second lower upper indexer hand 73B. ) Is described as an example, but the number of indexer hands may of course be five or more.

Although the case where the number of processing chambers 10 and 11 is six has been described as an example, the number is not limited to six and may be seven or more. Even when the number of processing chambers 10 and 11 is further increased, the travel distance of the main transfer robots 12 and 13 is only increased, so that there are few restrictions due to performance limitations of the main transfer robots 12 and 13.
In addition, various design changes can be made within the scope of matters described in the claims.

It is an illustrative top view for demonstrating the layout of the substrate processing apparatus which concerns on 1st Embodiment of this invention. It is sectional drawing seen from the cut surface line II-II of FIG. It is sectional drawing seen from the cut surface line III-III of FIG. It is a perspective view which shows the structure of the indexer robot shown in FIG. It is the rear view seen from the arrow D direction of FIG. 4A. It is a side view which shows the structure of the 1st main conveyance robot shown in FIG. It is a side view which shows the structure of the 2nd main conveyance robot shown in FIG. It is a block diagram which shows the electric constitution of the substrate processing apparatus shown in FIG. It is an illustration figure for demonstrating the board | substrate extraction operation | movement from the carrier of an indexer robot. It is an illustration figure for demonstrating the board | substrate delivery operation | movement between an indexer robot and the 1st-4th board | substrate delivery table. It is an illustration figure for demonstrating the board | substrate accommodation operation | movement to the carrier of an indexer robot. It is an illustration figure for demonstrating the board | substrate delivery operation | movement between the 1st and 2nd main transfer robot and the 1st-4th board | substrate delivery stand. It is an illustrative top view for demonstrating the layout of the substrate processing apparatus which concerns on 2nd Embodiment of this invention. It is sectional drawing seen from the cut surface line XIII-XIII of FIG. FIG. 13 is a block diagram showing an electrical configuration of the substrate processing apparatus shown in FIG. 12. It is an illustration figure for demonstrating the board | substrate delivery operation | movement between a 1st indexer robot and a 1st board | substrate delivery unit. It is an illustration figure for demonstrating the board | substrate delivery operation | movement between a 1st main conveyance robot and a 1st board | substrate delivery unit. It is an illustration figure for demonstrating the board | substrate delivery operation | movement between a 2nd indexer robot and a 2nd board | substrate delivery unit. It is an illustration figure for demonstrating the board | substrate delivery operation | movement between a 2nd main conveyance robot and a 2nd board | substrate delivery unit.

Explanation of symbols

1,71 Substrate processing equipment W Substrate C Carrier (Substrate container)
2 Indexer section 6 Indexer robot (indexer substrate transfer mechanism)
7A 1st process part 7B 2nd process part 8 1st conveyance chamber (1st travel area)
9 Second transfer chamber (second travel area)
DESCRIPTION OF SYMBOLS 10 1st processing chamber 11 2nd processing chamber 12 1st main transfer robot 13 2nd main transfer robot 14 1st board | substrate delivery stand (1st board | substrate delivery unit)
15 Second board transfer table (first board transfer unit)
16 3rd board transfer stand (2nd board transfer unit)
17 4th board transfer stand (2nd board transfer unit)
18A 1st hand (indexer hand)
18B 2nd hand (indexer hand)
18C 3rd hand (indexer hand)
18D 4th hand (indexer hand)
19A First upper hand 19B First lower hand 20A Second upper hand 20B Second lower hand 72 First indexer robot 72A First upper indexer hand 72B First lower indexer hand 73 Second indexer robot 73A Second upper indexer hand 73B Second 2 Lower indexer hand 74 First substrate transfer unit 75 Second substrate transfer unit

Claims (6)

An indexer unit for holding a substrate container for accommodating a substrate;
An indexer substrate transport mechanism that is disposed in the indexer unit and includes at least four indexer hands for holding and transporting the substrate, and the four indexer hands carry the substrate in and out of the substrate container;
A first processing section in which a plurality of first processing chambers for processing a substrate are arranged in a line along a predetermined arrangement direction along a horizontal direction;
A pair of first hands for holding and transporting the substrate is provided, is provided so as to be able to travel along the arrangement direction, and allows the first hand to access each first processing chamber of the first processing unit. A first main transfer robot for loading and unloading substrates;
A second processing section in which a plurality of second processing chambers are arranged in a line along the arrangement direction;
A pair of second hands for holding and transporting the substrate is provided, is provided so as to be able to travel along the arrangement direction, and allows the second hand to access each second processing chamber of the second processing unit. A second main transfer robot for loading and unloading substrates;
In response to access by the indexer hand, the first hand, and the second hand, between the indexer substrate transport mechanism and the first main transport robot, and between the indexer robot and the second main transport robot. And a substrate transfer mechanism that mediates transfer of the substrate. The indexer substrate transport mechanism includes a first indexer robot having a pair of first indexer hands, and a second indexer robot having a pair of second indexer hands,
The substrate delivery mechanism receives the access by the first indexer hand and the first hand, and mediates delivery of the substrate between the first indexer robot and the first main transfer robot. And a second substrate transfer unit that receives access by the second indexer hand and the second hand and mediates transfer of the substrate between the second indexer robot and the second main transfer robot. The substrate processing apparatus according to claim 1.   The substrate processing apparatus according to claim 2, wherein the first substrate transfer unit and the second substrate transfer unit are stacked in a vertical direction. The first processing chamber of the first processing unit and the second processing chamber of the second processing unit are arranged to be shifted in the vertical direction,
The substrate according to any one of claims 1 to 3, wherein the first substrate transport robot and the second substrate transport robot travel in a first traveling region and a second traveling region that are stacked in a vertical direction. Processing equipment.   The substrate processing according to claim 1, wherein the first substrate transfer robot and the second substrate transfer robot are arranged between the first processing unit and the second processing unit. apparatus.   The substrate processing apparatus according to claim 1, wherein the first processing unit and the second processing unit perform different processes on the substrate.

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