TW200507232A - Bonding method and bonding device - Google Patents
Bonding method and bonding deviceInfo
- Publication number
- TW200507232A TW200507232A TW093119860A TW93119860A TW200507232A TW 200507232 A TW200507232 A TW 200507232A TW 093119860 A TW093119860 A TW 093119860A TW 93119860 A TW93119860 A TW 93119860A TW 200507232 A TW200507232 A TW 200507232A
- Authority
- TW
- Taiwan
- Prior art keywords
- bonded object
- bonding
- holding member
- bonding surface
- bonded
- Prior art date
Links
Classifications
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- H—ELECTRICITY
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K20/00—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating
- B23K20/02—Non-electric welding by applying impact or other pressure, with or without the application of heat, e.g. cladding or plating by means of a press ; Diffusion bonding
- B23K20/023—Thermo-compression bonding
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Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003270304A JP2005026608A (ja) | 2003-07-02 | 2003-07-02 | 接合方法および接合装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200507232A true TW200507232A (en) | 2005-02-16 |
Family
ID=33562610
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093119860A TW200507232A (en) | 2003-07-02 | 2004-06-30 | Bonding method and bonding device |
Country Status (7)
Country | Link |
---|---|
US (1) | US20070105459A1 (zh) |
EP (1) | EP1641036A4 (zh) |
JP (1) | JP2005026608A (zh) |
KR (1) | KR100691759B1 (zh) |
CN (1) | CN100356538C (zh) |
TW (1) | TW200507232A (zh) |
WO (1) | WO2005004225A1 (zh) |
Families Citing this family (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101779270B (zh) * | 2007-08-10 | 2013-06-12 | 株式会社尼康 | 基板贴合装置及基板贴合方法 |
JP4288297B1 (ja) * | 2008-01-09 | 2009-07-01 | 三菱重工業株式会社 | 圧力制御装置および圧力制御方法 |
US20100089978A1 (en) * | 2008-06-11 | 2010-04-15 | Suss Microtec Inc | Method and apparatus for wafer bonding |
US8950459B2 (en) | 2009-04-16 | 2015-02-10 | Suss Microtec Lithography Gmbh | Debonding temporarily bonded semiconductor wafers |
CN102460677A (zh) * | 2009-04-16 | 2012-05-16 | 休斯微技术股份有限公司 | 用于临时晶片接合和剥离的改进装置 |
JP4831842B2 (ja) | 2009-10-28 | 2011-12-07 | 三菱重工業株式会社 | 接合装置制御装置および多層接合方法 |
US9859141B2 (en) | 2010-04-15 | 2018-01-02 | Suss Microtec Lithography Gmbh | Apparatus and method for aligning and centering wafers |
US9837295B2 (en) | 2010-04-15 | 2017-12-05 | Suss Microtec Lithography Gmbh | Apparatus and method for semiconductor wafer leveling, force balancing and contact sensing |
KR101151256B1 (ko) | 2010-10-13 | 2012-06-14 | 앰코 테크놀로지 코리아 주식회사 | 반도체 패키지 제조용 2단 본딩 툴 및 이의 위치 셋팅 방법 |
JP5129848B2 (ja) * | 2010-10-18 | 2013-01-30 | 東京エレクトロン株式会社 | 接合装置及び接合方法 |
JP5892682B2 (ja) * | 2011-04-27 | 2016-03-23 | アピックヤマダ株式会社 | 接合方法 |
TWI564106B (zh) | 2011-03-28 | 2017-01-01 | 山田尖端科技股份有限公司 | 接合裝置以及接合方法 |
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EP4230337A3 (en) * | 2013-12-18 | 2023-11-15 | Aster Co., Ltd. | An apparatus for manufacturing a coil and a coil manufacturing method |
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US10497667B2 (en) | 2017-09-26 | 2019-12-03 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for bond wave propagation control |
US11152328B2 (en) * | 2018-12-13 | 2021-10-19 | eLux, Inc. | System and method for uniform pressure gang bonding |
KR20210037431A (ko) * | 2019-09-27 | 2021-04-06 | 삼성전자주식회사 | 본딩 헤드, 이를 포함하는 다이 본딩 장치 및 이를 이용한 반도체 패키지의 제조 방법 |
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US5188280A (en) * | 1989-04-28 | 1993-02-23 | Hitachi Ltd. | Method of bonding metals, and method and apparatus for producing semiconductor integrated circuit device using said method of bonding metals |
GB2241914B (en) * | 1990-03-16 | 1993-10-13 | Secr Defence | Diffusion bonding process for aluminium-lithium alloys |
SE465399B (sv) * | 1990-05-16 | 1991-09-02 | Perstorp Ab | Saett vid tillverkning av flerlagermoensterkort |
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JP3120695B2 (ja) * | 1995-05-19 | 2000-12-25 | 株式会社日立製作所 | 電子回路の製造方法 |
US5883361A (en) * | 1995-11-29 | 1999-03-16 | Ipsen International, Inc. | Diffusion bonding furnace having a novel press arrangement |
US5668058A (en) * | 1995-12-28 | 1997-09-16 | Nec Corporation | Method of producing a flip chip |
JPH1022184A (ja) * | 1996-06-28 | 1998-01-23 | Sony Corp | 基板張り合わせ装置 |
US6326313B1 (en) * | 1999-04-21 | 2001-12-04 | Advanced Micro Devices | Method and apparatus for partial drain during a nitride strip process step |
JP4598914B2 (ja) * | 2000-03-10 | 2010-12-15 | 東レエンジニアリング株式会社 | チップ実装方法および装置 |
JP4822577B2 (ja) * | 2000-08-18 | 2011-11-24 | 東レエンジニアリング株式会社 | 実装方法および装置 |
US6464129B2 (en) * | 2000-12-22 | 2002-10-15 | Triumph Group, Inc. | Method of diffusion bonding superalloy components |
US20030175520A1 (en) * | 2002-03-13 | 2003-09-18 | Grutta James T. | Formed composite structural members and methods and apparatus for making the same |
JP2003318220A (ja) * | 2002-04-26 | 2003-11-07 | Toray Eng Co Ltd | 実装方法および実装装置 |
-
2003
- 2003-07-02 JP JP2003270304A patent/JP2005026608A/ja active Pending
-
2004
- 2004-06-29 CN CNB2004800006394A patent/CN100356538C/zh not_active Expired - Fee Related
- 2004-06-29 WO PCT/JP2004/009160 patent/WO2005004225A1/ja active Application Filing
- 2004-06-29 EP EP04746629A patent/EP1641036A4/en not_active Withdrawn
- 2004-06-29 US US10/563,131 patent/US20070105459A1/en not_active Abandoned
- 2004-06-29 KR KR1020057025381A patent/KR100691759B1/ko not_active IP Right Cessation
- 2004-06-30 TW TW093119860A patent/TW200507232A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
CN100356538C (zh) | 2007-12-19 |
JP2005026608A (ja) | 2005-01-27 |
KR100691759B1 (ko) | 2007-03-12 |
EP1641036A1 (en) | 2006-03-29 |
WO2005004225A1 (ja) | 2005-01-13 |
US20070105459A1 (en) | 2007-05-10 |
EP1641036A4 (en) | 2007-11-21 |
KR20060028439A (ko) | 2006-03-29 |
CN1698190A (zh) | 2005-11-16 |
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