TW200504890A - Compound semiconductor, method for producing same and compound semiconductor device - Google Patents

Compound semiconductor, method for producing same and compound semiconductor device

Info

Publication number
TW200504890A
TW200504890A TW093116558A TW93116558A TW200504890A TW 200504890 A TW200504890 A TW 200504890A TW 093116558 A TW093116558 A TW 093116558A TW 93116558 A TW93116558 A TW 93116558A TW 200504890 A TW200504890 A TW 200504890A
Authority
TW
Taiwan
Prior art keywords
buffer layer
compound semiconductor
layer
ingap buffer
ingap
Prior art date
Application number
TW093116558A
Other languages
English (en)
Other versions
TWI360186B (zh
Inventor
Kenji Kohiro
Kazumasa Ueda
Toshimitsu Abe
Masahiko Hata
Original Assignee
Sumitomo Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co filed Critical Sumitomo Chemical Co
Publication of TW200504890A publication Critical patent/TW200504890A/zh
Application granted granted Critical
Publication of TWI360186B publication Critical patent/TWI360186B/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76—Unipolar devices, e.g. field effect transistors
    • H01L29/772—Field effect transistors
    • H01L29/778—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface
    • H01L29/7782—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET
    • H01L29/7783—Field effect transistors with two-dimensional charge carrier gas channel, e.g. HEMT ; with two-dimensional charge-carrier layer formed at a heterojunction interface with confinement of carriers by at least two heterojunctions, e.g. DHHEMT, quantum well HEMT, DHMODFET using III-V semiconductor material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02367—Substrates
    • H01L21/0237—Materials
    • H01L21/02387—Group 13/15 materials
    • H01L21/02395—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02455—Group 13/15 materials
    • H01L21/02461—Phosphides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02439—Materials
    • H01L21/02455—Group 13/15 materials
    • H01L21/02463—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02436—Intermediate layers between substrates and deposited layers
    • H01L21/02494—Structure
    • H01L21/02496—Layer structure
    • H01L21/02505—Layer structure consisting of more than two layers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02518—Deposited layers
    • H01L21/02521—Materials
    • H01L21/02538—Group 13/15 materials
    • H01L21/02546—Arsenides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Recrystallisation Techniques (AREA)
TW093116558A 2003-06-13 2004-06-09 Compound semiconductor, method for producing same and compound semiconductor device TW200504890A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003169408 2003-06-13
JP2004127685 2004-04-23

Publications (2)

Publication Number Publication Date
TW200504890A true TW200504890A (en) 2005-02-01
TWI360186B TWI360186B (zh) 2012-03-11

Family

ID=33554410

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093116558A TW200504890A (en) 2003-06-13 2004-06-09 Compound semiconductor, method for producing same and compound semiconductor device

Country Status (4)

Country Link
US (1) US20070158684A1 (zh)
KR (1) KR20060026866A (zh)
TW (1) TW200504890A (zh)
WO (1) WO2004112111A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107112197A (zh) * 2014-10-30 2017-08-29 应用材料公司 用于改善具有敏感层及反应层的膜堆叠物的方法与结构

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI489626B (zh) * 2012-08-24 2015-06-21 Visual Photonics Epitaxy Co Ltd Bipolar high electron mobility transistor
US10489424B2 (en) 2016-09-26 2019-11-26 Amazon Technologies, Inc. Different hierarchies of resource data objects for managing system resources
TWI640648B (zh) * 2017-11-24 2018-11-11 行政院原子能委員會核能硏究所 以有機金屬化學氣相沉積法製作磷化銦鎵磊晶層的方法
CN110517948B (zh) * 2019-07-26 2021-12-21 中国科学院微电子研究所 一种硅衬底上外延InP半导体的方法及制得的半导体器件
CN113314398B (zh) * 2021-05-25 2024-02-06 中国科学院苏州纳米技术与纳米仿生研究所 在GaP/Si衬底上外延生长InGaAs薄膜的方法及InGaAs薄膜

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3114809B2 (ja) * 1989-05-31 2000-12-04 富士通株式会社 半導体装置
US5492860A (en) * 1992-04-17 1996-02-20 Fujitsu Limited Method for growing compound semiconductor layers
JP3270945B2 (ja) * 1992-06-04 2002-04-02 富士通株式会社 ヘテロエピタキシャル成長方法
JPH07254732A (ja) * 1994-03-15 1995-10-03 Toshiba Corp 半導体発光装置
JP2000260978A (ja) * 1999-03-04 2000-09-22 Nec Corp 電界効果トランジスタ及びその製造方法
JP2002217499A (ja) * 2001-01-19 2002-08-02 Sharp Corp 半導体レーザ素子、その製造方法、およびそれを用いた光ピックアップ
JP2002319589A (ja) * 2001-04-20 2002-10-31 Hitachi Ltd 半導体装置およびこれを用いた電力増幅器
JP2002343802A (ja) * 2001-05-16 2002-11-29 Hitachi Ltd 半導体装置およびそれを搭載した電子装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107112197A (zh) * 2014-10-30 2017-08-29 应用材料公司 用于改善具有敏感层及反应层的膜堆叠物的方法与结构

Also Published As

Publication number Publication date
US20070158684A1 (en) 2007-07-12
WO2004112111A1 (ja) 2004-12-23
KR20060026866A (ko) 2006-03-24
TWI360186B (zh) 2012-03-11

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees