TW200500509A - Method for producing single crystal and single crystal - Google Patents
Method for producing single crystal and single crystalInfo
- Publication number
- TW200500509A TW200500509A TW093112773A TW93112773A TW200500509A TW 200500509 A TW200500509 A TW 200500509A TW 093112773 A TW093112773 A TW 093112773A TW 93112773 A TW93112773 A TW 93112773A TW 200500509 A TW200500509 A TW 200500509A
- Authority
- TW
- Taiwan
- Prior art keywords
- single crystal
- pulling
- value
- defect zone
- represented
- Prior art date
Links
- 239000013078 crystal Substances 0.000 title abstract 8
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 230000007547 defect Effects 0.000 abstract 4
- 238000000034 method Methods 0.000 abstract 2
- 239000002994 raw material Substances 0.000 abstract 2
- 239000007788 liquid Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/203—Controlling or regulating the relationship of pull rate (v) to axial thermal gradient (G)
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/911—Seed or rod holders
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003135085A JP4151474B2 (ja) | 2003-05-13 | 2003-05-13 | 単結晶の製造方法及び単結晶 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200500509A true TW200500509A (en) | 2005-01-01 |
| TWI352136B TWI352136B (enExample) | 2011-11-11 |
Family
ID=33447168
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093112773A TW200500509A (en) | 2003-05-13 | 2004-05-06 | Method for producing single crystal and single crystal |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7582159B2 (enExample) |
| EP (1) | EP1624094B1 (enExample) |
| JP (1) | JP4151474B2 (enExample) |
| KR (1) | KR101107653B1 (enExample) |
| TW (1) | TW200500509A (enExample) |
| WO (1) | WO2004101868A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012171307A1 (zh) * | 2011-06-15 | 2012-12-20 | 安阳市凤凰光伏科技有限公司 | 铸造法生产类似单晶硅锭热场梯度改进装置 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4710247B2 (ja) * | 2004-05-19 | 2011-06-29 | 株式会社Sumco | 単結晶製造装置及び方法 |
| JP2006069841A (ja) * | 2004-09-02 | 2006-03-16 | Sumco Corp | 磁場印加式シリコン単結晶の引上げ方法 |
| JP4513798B2 (ja) * | 2006-10-24 | 2010-07-28 | 信越半導体株式会社 | 単結晶製造装置及び単結晶の製造方法 |
| JP5029184B2 (ja) * | 2007-07-19 | 2012-09-19 | 日立電線株式会社 | 半導体結晶の製造方法及びその製造装置 |
| JP5151628B2 (ja) * | 2008-04-02 | 2013-02-27 | 信越半導体株式会社 | シリコン単結晶ウエーハ、シリコン単結晶の製造方法および半導体デバイス |
| JP2012142455A (ja) | 2010-12-29 | 2012-07-26 | Siltronic Ag | アニールウエハの製造方法 |
| JP6107308B2 (ja) * | 2013-03-28 | 2017-04-05 | 信越半導体株式会社 | シリコン単結晶製造方法 |
| TWI771007B (zh) * | 2020-05-19 | 2022-07-11 | 環球晶圓股份有限公司 | 矽單晶錠的製造方法、矽單晶錠及其製造裝置 |
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| US3898051A (en) * | 1973-12-28 | 1975-08-05 | Crystal Syst | Crystal growing |
| US4108236A (en) * | 1977-04-21 | 1978-08-22 | United Technologies Corporation | Floating heat insulating baffle for directional solidification apparatus utilizing liquid coolant bath |
| US4178986A (en) * | 1978-03-31 | 1979-12-18 | General Electric Company | Furnace for directional solidification casting |
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| US4202400A (en) * | 1978-09-22 | 1980-05-13 | General Electric Company | Directional solidification furnace |
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| DE3107596A1 (de) * | 1981-02-27 | 1982-10-21 | Heliotronic Forschungs- und Entwicklungsgesellschaft für Solarzellen-Grundstoffe mbH, 8263 Burghausen | "verfahren zur herstellung von halbleiterscheiben" |
| US4409451A (en) * | 1981-08-31 | 1983-10-11 | United Technologies Corporation | Induction furnace having improved thermal profile |
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| US5116456A (en) * | 1988-04-18 | 1992-05-26 | Solon Technologies, Inc. | Apparatus and method for growth of large single crystals in plate/slab form |
| US5134261A (en) * | 1990-03-30 | 1992-07-28 | The United States Of America As Represented By The Secretary Of The Air Force | Apparatus and method for controlling gradients in radio frequency heating |
| KR100246712B1 (ko) * | 1994-06-02 | 2000-03-15 | 구마모토 마사히로 | 화합물 단결정의 제조방법 및 제조장치 |
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-
2003
- 2003-05-13 JP JP2003135085A patent/JP4151474B2/ja not_active Expired - Fee Related
-
2004
- 2004-04-26 WO PCT/JP2004/006003 patent/WO2004101868A1/ja not_active Ceased
- 2004-04-26 EP EP04729524.1A patent/EP1624094B1/en not_active Expired - Lifetime
- 2004-04-26 US US10/553,754 patent/US7582159B2/en not_active Expired - Lifetime
- 2004-04-26 KR KR1020057021320A patent/KR101107653B1/ko not_active Expired - Fee Related
- 2004-05-06 TW TW093112773A patent/TW200500509A/zh not_active IP Right Cessation
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012171307A1 (zh) * | 2011-06-15 | 2012-12-20 | 安阳市凤凰光伏科技有限公司 | 铸造法生产类似单晶硅锭热场梯度改进装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2004101868A1 (ja) | 2004-11-25 |
| KR20060003084A (ko) | 2006-01-09 |
| KR101107653B1 (ko) | 2012-01-20 |
| EP1624094A4 (en) | 2011-04-13 |
| JP4151474B2 (ja) | 2008-09-17 |
| JP2004338979A (ja) | 2004-12-02 |
| EP1624094B1 (en) | 2013-10-02 |
| US7582159B2 (en) | 2009-09-01 |
| US20070000429A1 (en) | 2007-01-04 |
| TWI352136B (enExample) | 2011-11-11 |
| EP1624094A1 (en) | 2006-02-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |