TW200426160A - Dicarboxylic acid monoester compound, method for producing same and polymer thereof - Google Patents

Dicarboxylic acid monoester compound, method for producing same and polymer thereof Download PDF

Info

Publication number
TW200426160A
TW200426160A TW093108370A TW93108370A TW200426160A TW 200426160 A TW200426160 A TW 200426160A TW 093108370 A TW093108370 A TW 093108370A TW 93108370 A TW93108370 A TW 93108370A TW 200426160 A TW200426160 A TW 200426160A
Authority
TW
Taiwan
Prior art keywords
dicarboxylic acid
acid monoester
polymer
monoester compound
general formula
Prior art date
Application number
TW093108370A
Other languages
English (en)
Chinese (zh)
Inventor
Jyun Iwashita
Toshikazu Tachikawa
Masatoshi Yoshida
Motohiro Arakawa
Tadayosi Ugamura
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Nippon Catalytic Chem Ind
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd, Nippon Catalytic Chem Ind filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200426160A publication Critical patent/TW200426160A/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/52—Esters of acyclic unsaturated carboxylic acids having the esterified carboxyl group bound to an acyclic carbon atom
    • C07C69/593—Dicarboxylic acid esters having only one carbon-to-carbon double bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/10—Esters
    • C08F22/12—Esters of phenols or saturated alcohols
    • C08F22/16—Esters having free carboxylic acid groups
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2602/00—Systems containing two condensed rings
    • C07C2602/36—Systems containing two condensed rings the rings having more than two atoms in common
    • C07C2602/42—Systems containing two condensed rings the rings having more than two atoms in common the bicyclo ring system containing seven carbon atoms
TW093108370A 2003-03-28 2004-03-26 Dicarboxylic acid monoester compound, method for producing same and polymer thereof TW200426160A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003092766 2003-03-28
JP2004051607A JP2004315791A (ja) 2003-03-28 2004-02-26 ジカルボン酸モノエステル化合物およびその製造方法ならびに重合体
PCT/JP2004/004081 WO2004087636A1 (ja) 2003-03-28 2004-03-24 ジカルボン酸モノエステル化合物およびその製造方法ならびに重合体

Publications (1)

Publication Number Publication Date
TW200426160A true TW200426160A (en) 2004-12-01

Family

ID=33134303

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093108370A TW200426160A (en) 2003-03-28 2004-03-26 Dicarboxylic acid monoester compound, method for producing same and polymer thereof

Country Status (3)

Country Link
JP (1) JP2004315791A (ja)
TW (1) TW200426160A (ja)
WO (1) WO2004087636A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4638378B2 (ja) * 2005-06-07 2011-02-23 信越化学工業株式会社 レジスト下層膜材料並びにそれを用いたパターン形成方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4812872B1 (ja) * 1967-06-28 1973-04-24
JPH06279543A (ja) * 1991-08-31 1994-10-04 Hakusui Chem Ind Ltd 新規イタコン酸ジエステル誘導体及び該誘導体を重合成分として含む重合体
JP3797505B2 (ja) * 1997-02-28 2006-07-19 富士写真フイルム株式会社 ポジ型感光性組成物
JP4102014B2 (ja) * 2000-10-03 2008-06-18 富士フイルム株式会社 感光性平版印刷版

Also Published As

Publication number Publication date
JP2004315791A (ja) 2004-11-11
WO2004087636A1 (ja) 2004-10-14

Similar Documents

Publication Publication Date Title
KR100526736B1 (ko) 락톤 구조를 갖는 (메트)아크릴레이트 화합물, 그의중합체, 레지스트 재료 및 패턴 형성 방법
JP5032362B2 (ja) ヒドロキシフェニルアクリレート系モノマーおよびポリマー
GB2320718A (en) Bicycloalkene photoresist copolymers
JPH04251259A (ja) 新規なレジスト材料及びパタ−ン形成方法
CN114245792A (zh) 化合物、聚合物、组合物、膜形成用组合物、图案形成方法、绝缘膜的形成方法及化合物的制造方法、以及含碘乙烯基聚合物及其乙酰化衍生物的制造方法
JP6820233B2 (ja) ポリマー、該ポリマーを含有するレジスト組成物及びそれを用いたデバイスの製造方法
TW201818155A (zh) 阻劑組成物及阻劑圖型形成方法與高分子化合物
TW535033B (en) Novel photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same
JP3869166B2 (ja) フォトレジスト単量体とその製造方法、フォトレジスト共重合体とその製造方法、フォトレジスト組成物、フォトレジストパターン形成方法、および、半導体素子
US7041838B2 (en) (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns
CN111302959A (zh) 一种带酯键的酸扩散抑制剂及其制备方法与光刻胶组合物
CN113717314B (zh) 一种光敏成膜树脂、光刻胶组合物及其制备方法
TW572891B (en) Novel photoresist monomers, polymers thereof, and photoresist compositions containing the same
JP4065684B2 (ja) 重合体、化学増幅型レジスト組成物、および、パターン形成方法
TW202241836A (zh) 化合物、聚合物、組成物、膜形成用組成物、圖型之形成方法、絕緣膜之形成方法及化合物之製造方法
JP2008111120A (ja) スルホニル基を含むフォトレジストモノマー、ポリマー及びこれを含むフォトレジスト組成物
CN112041353A (zh) 新型二官能(甲基)丙烯酸酯化合物和聚合物
JP4071021B2 (ja) ラクトン構造を有する（メタ）アクリレート化合物、その重合体、レジスト材料及びパターン形成方法
TWI274230B (en) Novel photoresist monomer, polymer thereof and photoresist composition containing it
KR100527411B1 (ko) 신규한 옥세판-2-온 구조를 함유하는 단량체, 이들의중합체를 함유하는 포토레지스트 조성물 및 그 제조방법과포토레지스트 패턴의 형성 방법
TW200426160A (en) Dicarboxylic acid monoester compound, method for producing same and polymer thereof
JP3997382B2 (ja) 脂環構造を有する新規エステル化合物及びその製造方法
JP3805564B2 (ja) 新規な（メタ）アクリル酸エステル、新規なノルボルネン誘導体、およびそれらから誘導される新規なポリマー
TW201817750A (zh) 高分子化合物之製造方法
TW524803B (en) Novel ester compounds having alicyclic and oxirane structures and method for preparing the same