TW200407669A - Photosensitive curable paste composition and sintered article pattern using the same - Google Patents

Photosensitive curable paste composition and sintered article pattern using the same Download PDF

Info

Publication number
TW200407669A
TW200407669A TW092126506A TW92126506A TW200407669A TW 200407669 A TW200407669 A TW 200407669A TW 092126506 A TW092126506 A TW 092126506A TW 92126506 A TW92126506 A TW 92126506A TW 200407669 A TW200407669 A TW 200407669A
Authority
TW
Taiwan
Prior art keywords
paste composition
ethylenically unsaturated
pattern
unsaturated bond
photosensitive thermosetting
Prior art date
Application number
TW092126506A
Other languages
English (en)
Chinese (zh)
Other versions
TWI326394B (https=
Inventor
Masahisa Kakinuma
Hideaki Kojima
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Publication of TW200407669A publication Critical patent/TW200407669A/zh
Application granted granted Critical
Publication of TWI326394B publication Critical patent/TWI326394B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/34Filling pastes
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00Technologies relating to chemical industry
    • Y02P20/50Improvements relating to the production of bulk chemicals
    • Y02P20/582Recycling of unreacted starting or intermediate materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Inorganic Insulating Materials (AREA)
TW092126506A 2002-09-30 2003-09-25 Photosensitive curable paste composition and sintered article pattern using the same TW200407669A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002285548A JP2004123775A (ja) 2002-09-30 2002-09-30 感光性熱硬化性ペースト組成物

Publications (2)

Publication Number Publication Date
TW200407669A true TW200407669A (en) 2004-05-16
TWI326394B TWI326394B (https=) 2010-06-21

Family

ID=32278821

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092126506A TW200407669A (en) 2002-09-30 2003-09-25 Photosensitive curable paste composition and sintered article pattern using the same

Country Status (4)

Country Link
JP (1) JP2004123775A (https=)
KR (1) KR20040028570A (https=)
CN (1) CN1497345B (https=)
TW (1) TW200407669A (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI381781B (zh) * 2004-07-23 2013-01-01 Sumitomo Electric Industries 用雷射照射之導電性電路形成方法及導電性電路
TWI483977B (zh) * 2009-08-04 2015-05-11 Sekisui Chemical Co Ltd Inorganic fine particle dispersion paste

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100730474B1 (ko) * 2004-07-22 2007-06-19 엘지전자 주식회사 플라즈마 디스플레이 패널 제조용의 격벽형성 조성물
KR100709186B1 (ko) * 2005-06-29 2007-04-18 삼성에스디아이 주식회사 플라즈마 디스플레이 패널용 전극 형성용 조성물, 이로부터제조되는 전극 및 상기 전극을 포함하는 플라즈마디스플레이 패널
KR20070002554A (ko) * 2005-06-30 2007-01-05 엘지.필립스 엘시디 주식회사 액정표시장치 및 그 제조방법
EP2586804B1 (en) 2005-12-28 2014-04-02 Kaneka Corporation Photoradically and thermally radically curable composition
KR100895352B1 (ko) * 2006-11-15 2009-04-29 다이요 잉키 세이조 가부시키가이샤 흑색 페이스트 조성물, 및 그것을 이용한 블랙 매트릭스패턴의 형성 방법, 및 그 블랙 매트릭스 패턴
KR100871060B1 (ko) * 2007-05-11 2008-11-27 주식회사 두산 감광성 페이스트 및 이의 이용
KR100934078B1 (ko) * 2007-12-28 2009-12-24 주식회사 두산 오프셋 인쇄용 감광성 페이스트 및 이의 이용
KR101358254B1 (ko) * 2012-02-06 2014-02-06 하나마이크로(주) 기판 상에 기능성 조성물의 패턴을 형성하는 방법 및 그 방법에 의하여 형성된 기능성 패턴을 구비한 전자 장치
CN104170021B (zh) * 2012-05-22 2017-09-15 太阳控股株式会社 导电性组合物及由其形成有导电膜的电路基板
TWI472877B (zh) * 2012-11-20 2015-02-11 Chi Mei Corp 感光性樹脂組成物、彩色濾光片及其液晶顯示元件
JP6857125B2 (ja) * 2014-12-26 2021-04-14 ヘンケル・アクチェンゲゼルシャフト・ウント・コムパニー・コマンディットゲゼルシャフト・アウフ・アクチェンHenkel AG & Co. KGaA 焼結性接合材料およびそれを用いた半導体装置
CN104808441A (zh) * 2015-04-20 2015-07-29 北京欣奕华科技有限公司 组合物、黑矩阵及制备方法、显示装置
JP2017052822A (ja) * 2015-09-07 2017-03-16 三菱レイヨン株式会社 アクリル系樹脂組成物およびその製造方法
WO2022210785A1 (ja) * 2021-03-31 2022-10-06 デンカ株式会社 組成物、硬化体及び有機el表示装置
CN115119410A (zh) * 2022-06-21 2022-09-27 深圳市百柔新材料技术有限公司 一种高精密单面电路互联制作miniLED背光板的方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07114183A (ja) * 1993-10-15 1995-05-02 Sony Corp 光重合性組成物及びこれを用いた硬化塗膜パターンの形成方法
US5565302A (en) * 1995-04-21 1996-10-15 W. R. Grace & Co.-Conn. Process for preparing photosensitive resin composition
US5853957A (en) * 1995-05-08 1998-12-29 Tamura Kaken Co., Ltd Photosensitive resin compositions, cured films thereof, and circuit boards
JPH08328248A (ja) * 1995-06-02 1996-12-13 Nippon Paint Co Ltd 水現像性感光性樹脂組成物
US5874197A (en) * 1997-09-18 1999-02-23 E. I. Du Pont De Nemours And Company Thermal assisted photosensitive composition and method thereof
US6458509B1 (en) * 1999-04-30 2002-10-01 Toagosei Co., Ltd. Resist compositions
TW522435B (en) * 2000-05-23 2003-03-01 Toray Industries Slurry, display component and process for producing the display component

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI381781B (zh) * 2004-07-23 2013-01-01 Sumitomo Electric Industries 用雷射照射之導電性電路形成方法及導電性電路
TWI483977B (zh) * 2009-08-04 2015-05-11 Sekisui Chemical Co Ltd Inorganic fine particle dispersion paste

Also Published As

Publication number Publication date
CN1497345B (zh) 2010-04-21
KR20040028570A (ko) 2004-04-03
JP2004123775A (ja) 2004-04-22
TWI326394B (https=) 2010-06-21
CN1497345A (zh) 2004-05-19

Similar Documents

Publication Publication Date Title
TW200407669A (en) Photosensitive curable paste composition and sintered article pattern using the same
KR102548106B1 (ko) 감광성 도전 페이스트 및 도전 패턴 형성용 필름
TWI242109B (en) Photosensitive insulating paste composition and photosensitive film made therefrom
JP3838724B2 (ja) 感光性樹脂組成物およびその用途
TWI228264B (en) Photocurable paste composition and method forming inorganic calcinated round pattern therefrom
JPWO2008096782A1 (ja) 感光性樹脂組成物、転写フィルムおよびパターン形成方法
JP2009076233A (ja) パターン形成方法およびそれを用いた回路材料の製造方法
JP3841906B2 (ja) 感光性樹脂組成物およびその用途
JP2008124030A (ja) 導電性ペースト組成物、転写フィルムおよびプラズマディスプレイパネル
WO2006100825A1 (ja) ブラックマトリックス形成用光硬化性樹脂組成物、これを用いた感光性フィルム、ブラックマトリックスの形成方法、ブラックマトリックス及びそのブラックマトリックスを有するプラズマディスプレイパネル
TWI272450B (en) Photosensitive transfer film
JP2008274221A (ja) 無機粉体含有樹脂組成物、転写フィルムおよびフラットパネルディスプレイの製造方法
JP2000040462A (ja) ディスプレイ用基板の製造方法
JP2005174683A (ja) ガラスペーストおよび感光性フィルムならびにそれらを用いたディスプレイパネル用部材の製造方法。
JP3995172B2 (ja) 薄膜電極の形成法
WO2008072582A1 (ja) 無機粉体含有樹脂組成物、転写フィルムおよびフラットパネルディスプレ イ部材の製造方法
TW201041012A (en) Process for thick film circuit patterning
WO2005085360A1 (ja) 無機粉体含有組成物、転写フィルムおよび無機焼結体の形成方法
JPH10198034A (ja) 感光性樹脂組成物およびその用途
JP2002025432A (ja) 誘電体層及び障壁形成用樹脂組成物エレメント及びこれを用いたプラズマディスプレイパネル用基板の製造法
JP2002025431A (ja) 障壁形成用樹脂組成物エレメント及びこれを用いたプラズマディスプレイパネル用基板の製造法
JP2006272713A (ja) セラミックス基板の製造方法
JP3868576B2 (ja) 感光性樹脂組成物
JP2024076284A (ja) レジスト剥離液
JP2002025430A (ja) プラズマディスプレイパネル用基板の製造法

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees