TW200405895A - Method for preparing organofunctional silanes - Google Patents
Method for preparing organofunctional silanes Download PDFInfo
- Publication number
- TW200405895A TW200405895A TW092125639A TW92125639A TW200405895A TW 200405895 A TW200405895 A TW 200405895A TW 092125639 A TW092125639 A TW 092125639A TW 92125639 A TW92125639 A TW 92125639A TW 200405895 A TW200405895 A TW 200405895A
- Authority
- TW
- Taiwan
- Prior art keywords
- dichlorosilane
- allyl
- silane
- group
- methanol
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 14
- 150000004756 silanes Chemical class 0.000 title claims description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 30
- MJVFSDBAXDCTOC-UHFFFAOYSA-N dichloro(prop-2-enyl)silicon Chemical compound Cl[Si](Cl)CC=C MJVFSDBAXDCTOC-UHFFFAOYSA-N 0.000 claims abstract description 6
- LFRDHGNFBLIJIY-UHFFFAOYSA-N trimethoxy(prop-2-enyl)silane Chemical compound CO[Si](OC)(OC)CC=C LFRDHGNFBLIJIY-UHFFFAOYSA-N 0.000 claims abstract description 4
- 150000001298 alcohols Chemical class 0.000 claims abstract description 3
- 239000003054 catalyst Substances 0.000 claims abstract description 3
- -1 alkenyl alkoxy silane Chemical compound 0.000 claims description 14
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 13
- 229910000077 silane Inorganic materials 0.000 claims description 11
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 9
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 8
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 claims description 5
- 239000004575 stone Substances 0.000 claims description 5
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 claims description 4
- 239000011541 reaction mixture Substances 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- OKSORCOJXAAYCO-UHFFFAOYSA-N C1(=CC=CC=2C3=CC=CC=C3CC12)[SiH](Cl)Cl Chemical compound C1(=CC=CC=2C3=CC=CC=C3CC12)[SiH](Cl)Cl OKSORCOJXAAYCO-UHFFFAOYSA-N 0.000 claims description 2
- GKBKTZVWTWAFSW-WEVVVXLNSA-N [(e)-but-2-enyl]-triethoxysilane Chemical compound CCO[Si](OCC)(OCC)C\C=C\C GKBKTZVWTWAFSW-WEVVVXLNSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- KTHXBEHDVMTNOH-UHFFFAOYSA-N cyclobutanol Chemical compound OC1CCC1 KTHXBEHDVMTNOH-UHFFFAOYSA-N 0.000 claims description 2
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 claims description 2
- XCIXKGXIYUWCLL-UHFFFAOYSA-N cyclopentanol Chemical compound OC1CCCC1 XCIXKGXIYUWCLL-UHFFFAOYSA-N 0.000 claims description 2
- SBBSZEVKXDNBPD-UHFFFAOYSA-N hex-5-enyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)CCCCC=C SBBSZEVKXDNBPD-UHFFFAOYSA-N 0.000 claims description 2
- ZNKMIWQRYUNHQO-UHFFFAOYSA-N tributoxy(hex-5-enyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)CCCCC=C ZNKMIWQRYUNHQO-UHFFFAOYSA-N 0.000 claims description 2
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 claims description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims 2
- 239000000126 substance Substances 0.000 claims 2
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 claims 1
- PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 claims 1
- 208000027697 autoimmune lymphoproliferative syndrome due to CTLA4 haploinsuffiency Diseases 0.000 claims 1
- YHAYSVXJJPHCRO-UHFFFAOYSA-N but-3-enyl(dichloro)silane Chemical compound Cl[SiH](Cl)CCC=C YHAYSVXJJPHCRO-UHFFFAOYSA-N 0.000 claims 1
- 239000001273 butane Substances 0.000 claims 1
- XXQBIYASOABGRU-UHFFFAOYSA-N butoxy-dimethoxy-propylsilane Chemical compound CCCCO[Si](OC)(OC)CCC XXQBIYASOABGRU-UHFFFAOYSA-N 0.000 claims 1
- PLTKQPNYFHYCNQ-UHFFFAOYSA-N dibutoxy(ethyl)silane Chemical compound CCCCO[SiH](CC)OCCCC PLTKQPNYFHYCNQ-UHFFFAOYSA-N 0.000 claims 1
- UOZZKLIPYZQXEP-UHFFFAOYSA-N dichloro(dipropyl)silane Chemical compound CCC[Si](Cl)(Cl)CCC UOZZKLIPYZQXEP-UHFFFAOYSA-N 0.000 claims 1
- KGTZBTUOZOIOBJ-UHFFFAOYSA-N dichloro(ethenyl)silicon Chemical compound Cl[Si](Cl)C=C KGTZBTUOZOIOBJ-UHFFFAOYSA-N 0.000 claims 1
- KPNMBZFXKPFKIG-UHFFFAOYSA-N dichloro(hex-1-enyl)silane Chemical compound C(CCC)C=C[SiH](Cl)Cl KPNMBZFXKPFKIG-UHFFFAOYSA-N 0.000 claims 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 claims 1
- CWAFVXWRGIEBPL-UHFFFAOYSA-N ethoxysilane Chemical compound CCO[SiH3] CWAFVXWRGIEBPL-UHFFFAOYSA-N 0.000 claims 1
- MGRFFMPZKFUEMI-UHFFFAOYSA-N ethyl(trihexoxy)silane Chemical compound CCCCCCO[Si](CC)(OCCCCCC)OCCCCCC MGRFFMPZKFUEMI-UHFFFAOYSA-N 0.000 claims 1
- CZZBVPSIWUGVPZ-UHFFFAOYSA-N ethyl(tripentoxy)silane Chemical compound CCCCCO[Si](CC)(OCCCCC)OCCCCC CZZBVPSIWUGVPZ-UHFFFAOYSA-N 0.000 claims 1
- CBMQCPWLFRMMJK-UHFFFAOYSA-N hexan-2-yl(trimethoxy)silane Chemical compound CCCCC(C)[Si](OC)(OC)OC CBMQCPWLFRMMJK-UHFFFAOYSA-N 0.000 claims 1
- PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 claims 1
- 235000021286 stilbenes Nutrition 0.000 claims 1
- BOQKSZHIZRXDSX-UHFFFAOYSA-N tri(cyclobutyloxy)-hex-5-enylsilane Chemical compound C1CCC1O[Si](OC1CCC1)(CCCCC=C)OC1CCC1 BOQKSZHIZRXDSX-UHFFFAOYSA-N 0.000 claims 1
- MCYUVGRLYLUXOV-UHFFFAOYSA-N tricyclopentyloxy(propyl)silane Chemical compound C1CCCC1O[Si](OC1CCCC1)(CCC)OC1CCCC1 MCYUVGRLYLUXOV-UHFFFAOYSA-N 0.000 claims 1
- FZKBLKJILDHPGO-UHFFFAOYSA-N triethoxy(hexan-2-yl)silane Chemical compound CCCCC(C)[Si](OCC)(OCC)OCC FZKBLKJILDHPGO-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 16
- 238000002360 preparation method Methods 0.000 description 6
- 239000000376 reactant Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 238000004817 gas chromatography Methods 0.000 description 3
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 2
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 238000006198 methoxylation reaction Methods 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- SOHAVULMGIITDH-ZXPSTKSJSA-N (1S,9R,14E)-14-(1H-imidazol-5-ylmethylidene)-2,11-dimethoxy-9-(2-methylbut-3-en-2-yl)-2,13,16-triazatetracyclo[7.7.0.01,13.03,8]hexadeca-3,5,7,10-tetraene-12,15-dione Chemical compound C([C@]1(C2=CC=CC=C2N([C@@]21NC1=O)OC)C(C)(C)C=C)=C(OC)C(=O)N2\C1=C\C1=CNC=N1 SOHAVULMGIITDH-ZXPSTKSJSA-N 0.000 description 1
- UUFQTNFCRMXOAE-UHFFFAOYSA-N 1-methylmethylene Chemical compound C[CH] UUFQTNFCRMXOAE-UHFFFAOYSA-N 0.000 description 1
- LCEFZBBJNYLCJE-UHFFFAOYSA-N 1-propoxy-9h-fluorene Chemical compound C1C2=CC=CC=C2C2=C1C(OCCC)=CC=C2 LCEFZBBJNYLCJE-UHFFFAOYSA-N 0.000 description 1
- 125000000069 2-butynyl group Chemical group [H]C([H])([H])C#CC([H])([H])* 0.000 description 1
- OSDWBNJEKMUWAV-UHFFFAOYSA-N Allyl chloride Chemical compound ClCC=C OSDWBNJEKMUWAV-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 235000007516 Chrysanthemum Nutrition 0.000 description 1
- 244000189548 Chrysanthemum x morifolium Species 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- SOHAVULMGIITDH-UHFFFAOYSA-N Oxaline Natural products O=C1NC23N(OC)C4=CC=CC=C4C3(C(C)(C)C=C)C=C(OC)C(=O)N2C1=CC1=CN=CN1 SOHAVULMGIITDH-UHFFFAOYSA-N 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- DHGDZMPKIODDCE-AATRIKPKSA-N [(e)-but-2-enyl]-trimethoxysilane Chemical compound CO[Si](OC)(OC)C\C=C\C DHGDZMPKIODDCE-AATRIKPKSA-N 0.000 description 1
- 125000003342 alkenyl group Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- YLDVAZYZSYKKOT-UHFFFAOYSA-N diethoxy(4-methylheptan-4-yloxy)silane Chemical compound C(CC)C(C)(O[SiH](OCC)OCC)CCC YLDVAZYZSYKKOT-UHFFFAOYSA-N 0.000 description 1
- IBWXKMBLEOLOLY-UHFFFAOYSA-N dimethoxy(prop-2-enyl)silicon Chemical compound CO[Si](OC)CC=C IBWXKMBLEOLOLY-UHFFFAOYSA-N 0.000 description 1
- PWOZXQOZUNMWKG-UHFFFAOYSA-N ethenyl(tripentoxy)silane Chemical compound CCCCCO[Si](OCCCCC)(OCCCCC)C=C PWOZXQOZUNMWKG-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 1
- CGQIJXYITMTOBI-UHFFFAOYSA-N hex-5-enyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCCC=C CGQIJXYITMTOBI-UHFFFAOYSA-N 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- GRVDJDISBSALJP-UHFFFAOYSA-N methyloxidanyl Chemical compound [O]C GRVDJDISBSALJP-UHFFFAOYSA-N 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- ZMYXZXUHYAGGKG-UHFFFAOYSA-N propoxysilane Chemical compound CCCO[SiH3] ZMYXZXUHYAGGKG-UHFFFAOYSA-N 0.000 description 1
- PKCXIVOWTJJGFQ-UHFFFAOYSA-N propyl chlorite Chemical compound Cl(=O)OCCC PKCXIVOWTJJGFQ-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- SGCFZHOZKKQIBU-UHFFFAOYSA-N tributoxy(ethenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C=C SGCFZHOZKKQIBU-UHFFFAOYSA-N 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- JPMBLOQPQSYOMC-UHFFFAOYSA-N trimethoxy(3-methoxypropyl)silane Chemical compound COCCC[Si](OC)(OC)OC JPMBLOQPQSYOMC-UHFFFAOYSA-N 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/188—Preparation; Treatments not provided for in C07F7/20 by reactions involving the formation of Si-O linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Silicon Polymers (AREA)
Description
200405895 玖、發明說明: 【發明所屬之技術領域】 本發明係關於經由燒氧基化(反應),更特定言之,柄由 甲氧基化(反應)製備某些有機官能性矽烷。 【先前技術】 有機官能性矽烷在各種應用中有用,包括其使用作為還 原劑、甲矽烷基化劑、拒水劑、偶合劑、交連劑及作為製 備具有不同稠度的聚矽氧烷之單體。因此,經常需要關於 其製備之更有效方法及關於製備此等矽烷之更簡化和較價 廉方法。 雖然現代技術發展水準包括經由烷氧化三氯矽烷用以製 備矽烷之所熟知方法,舉例而言,美國專利2,927,938號 (I960年3月8曰),但是在公開領域中未顯示關於經由烷氧化 不飽和之二氯矽烷而製備含有不飽和基團之有機官能性矽 烷〈方法。一般,該烯基官能性烷氧基矽烷係由CJrignard反 應予以製備,以Gdgnard反應包括烯丙基氯與鎂,和四烷氧 f矽烷例如四甲氧基矽烷和四乙氧基矽烷的反應,舉例而 言’如美國專利3,403,050號(1968年9月24日)中所述。 【發明内容】 本發明係關於經由單晞基二氯矽烷與單羥基醇產生反應 而:成烯基烷氧基矽烷來製造有機官能性矽烷之方法。、 上=~基二氯矽烷例如烯丙基二氯矽烷及單羥基醇例如甲 醇是在最佳之反應組份中。關於此點,可能獲得烯丙基三 甲氧基矽烷。 本各月的此等和其他特徵自考慮詳細敘述將變得顯然可 200405895 見。 【實施方式】 根據本發明,該方法包括經由單烯基二氯矽烷與單羥基 醇產生反應來製備有機官能性矽烷例如缔基烷氧基矽烷。 該方法以方程式予以舉例說明如下: R1 H R2 C====C-[-C--]3rSi—Cl + y R3—〇H ——-Η Η H Cl
R1 H C===lC+C^Si+OR3]y + yHC|
Η Η H 上述方程式中,R1代表氫或具有1-6個碳原子之烷基基團 例如甲基、乙基、丙基、異丙基、丁基、異丁基、戊基和 己基或R1可能是環烷基基團例如環丁基、環戊基和環己 基,R2代表氫;R3代表含1-6個碳原子之烷基基團例如甲 基、乙基、丙基、異丙基、丁基、異丁基、戊基和己基, 壞燒基基團例如環丁基、環戊基和環己基或烯丙基基團;X 是0-4;而y是3。 適當單埽基二氣矽烷的某些代表性實例包括乙埽基二氣 石夕燒 CHfCHSiHCl2、烯丙基二氯矽烷 CH2=CHCH2SiHCl2、2- 丁婦基二氣5夕燒CH3CH=CHCH2SiHCl2、3 - 丁晞基二氯碎燒 CHfCHC^CHJiHCl2及 5-烯基二氯矽烷 CH尸CH(CH2)4SiHCl2。 可採用之某些代表性單羥基醇包括甲醇、乙醇、丙醇、 200405895 井丙醇、環丁醇、環戊醇、環己醇及烯丙(基)醇。 例如此等之組份可產生各種烯基烷氧基矽烷例如乙烯基 二甲氧基石夕燒、乙錦基三乙氧基石夕燒、乙錦基三丙氧基石夕 烷、乙烯基三丁氧基矽烷、乙烯基三戊氧基矽烷、乙烯基 二己氧基石夕燒、婦丙基三甲氧基石夕垸、稀丙基三乙氧基石夕 烷、烯丙基三丙氧基矽烷、烯丙基三丁氧基矽烷、烯丙基 二戊氧基珍烷、烯丙基三己氧基矽烷、2_丁烯基三甲氧基 矽烷、2-丁埽基三乙氧基矽烷、2_丁烯基三丙氧基矽烷、 2- 丁烯基三丁氧基矽烷、2_丁埽基三成氧基矽烷、2•丁烯基 二己氧基矽烷、5-己烯基三曱氧基矽烷、5_己缔基三乙氧 基矽烷、5-己烯基三丙氧基矽烷、5_己埽基三丁氧基矽烷_5_ 己烯基三成氧基矽烷及5_己烯基三己氧基矽烷。 基於使用何種醇,可製備之某些另外缔基烷氧基矽烷包 括埽丙基三環丁氧基錢、晞丙基三環戊氧基錢、缔丙 基環己婦氧基錢、晞丙基三埽丙氧基㈣、3•丁缔芙三 丁氧基錢、3·丁烯基三戊氧基錢'3·丁晞基三己:: 梦燒、3_丁埽基三丁氧基㈣、3_ 丁缔基三戊氧基錢: 3- 丁烯基三己氧她、3_ 丁埽基三埽丙氧基石夕垸、 基二丁氧基錢、2_丁埽基三戊氧基錢、m希基 乳基矽烷、2-丁埽基三晞丙氧基矽烷、5_己烯基三 基核、%己缔基三環戊氧基錢、5_己埽基三環 基矽烷及5-己烯基三埽丙氧基矽烷。 :此:在本發明的較佳具體實施例之特別一者中 丙基一氯石夕燒與甲醇反岸而產 Μ 1 [而產生烯丙基三甲A基矽烷和 200405895 氯’如下列方程式中所示: + 3 CH3〇h —— ^\^Si(OCH3)3 + 3HCI 原料單體烯丙基二氯矽烷市面上有售, 同時與烯丙基氣和氫氯酸反應予以製備, 國專利5,338,876號(1994年8月16日)中所述, 列方程式: 或其可使元素矽 舉例而言,如美 其反應係依照下 + HCI + Si__ :據本發明所使用之單晞基二氣矽烷和單羥基醇的相對 數量可變更。當並不要求該反應在化學計量條件下予以進 =時,最好該反應使用化學計量過量的單羥基醇予以音 她。因此,最佳是使用約O.ii 1〇%化學計量過量之單羥基來 進行該反應。該反應不需用觸媒,同時該程序可分批:半 連續或連續進行,以批式處理最佳。 單烯基二氯矽烷與單羥基醇間之接觸可在負80至350它間 爻溫度下發生,較佳在20至25〇t,但是最佳在約室溫下, 即·· 20至25°C/68-77QF。 最適宜反應時間基於反應物、反應溫度及單烯基二氯石夕 烷和單羥基醇的濃度可變更。通常,延長反應物的接觸時 間超過約24小時並無利益,但是同樣,通常亦無害,除非 採用極低溫度。關於本文中所使用之大多數的特別反應 200405895 物,實定量產率可在約4小時内獲得。 該反應可在大氣壓、真空壓力或超大氣壓下進行。此處 亦然,條件的選擇多半是邏輯的事情,基於反應物的性質 和可供利用之設備。非揮發性反應物特別適應於在大氣壓 下加熱(使用或不使用回流設備)。在通常溫度下係氣態之 反應物較佳在自生壓力或感生壓力下,以大體上恆定體積 產生反應。最佳結果係由維持所有反應物呈液相而獲得。 實例 為了更詳細舉例說明本發明,特舉出下列實例。 實例1 -製備烯丙基三甲氧基石夕燒 此實例中所使用之裝置包含倚靠在加熱罩上之三頸1〇〇 笔升圓底燒瓶、具有磁性攪拌棒之起重機,一具加成漏斗, 一具回流冷凝為,一支溫度計及氮氣入口系統。 將12.6克/0.9莫耳的晞丙基二氯矽烷裝載入該燒瓶中。將 8.57克/0.26莫耳的甲醇裝載入加成漏斗中。然後將甲醇在室 溫下逐滴加至燒瓶中之烯丙基二氯矽烷中。將甲醇添加至 燒瓶中需要約20分鐘完成。觀察到:該反應是略呈放熱。 產生氯化氫並經由使用氮氣噴佈自燒瓶中移出。利用氣相 層析(GC)分析反應混合物顯示··其含有約4〇% Gc區域百分 數之締丙基二甲氧基矽烷,而其餘是未反應之甲醇和3_甲 氧基丙基三甲氧基矽烷CH3〇(CH2)3Si(〇CH3)3。缔丙基三甲氧 基石夕k之存在於反應混合物中係由氣相層析/質譜法 (GC/MS)分析予以證實。 只要不脫離本發明的基本特徵,其他變更可對於本文中 200405895 所述之化合物、組合物及方法作成。本文中所特別舉例說 明之本發明的具體實施例僅是例示並無意欲作為對於本發 明範圍之限制,除去如附隨之申請專利範圍所界定者以外。
Claims (1)
- 200405895 拾、申清專利範圍·· L 一種製備有機官能性矽烷之方法,包括 使單埽基二氯矽烷與具有1至6個碳原子之單經基醇產 生反應而形成烯基烷氧基矽烷,並將該烯基烷氧基矽烷 與反應混合物分離。 2.如申請專利範圍第1項之方法,其中該單烯基二氯矽烷係 由下列各化合物組成之群中選出:乙烯基二氣矽垸、缔 丙基二氯矽烷、2-丁烯基二氣矽烷、3-丁烯基二氯矽烷 及%己烯基二氯矽烷。 上如申請專利範圍第1項之方法,其中該單羥基醇係由下列 各醇組成之群中選出:甲醇、乙醇、丙醇、異丙醇、缔 丙醇、環丁醇、環戊醇及環己醇。 4·如申請專利範圍第丨項之方法,其中該烯基烷氧基矽烷係 由下列各種矽烷組成之群中選出:乙晞基三甲氧基矽 、七乙:^基一乙氧基石夕坑、乙埽基三丙氧基石夕燒、乙埽 基二丁氧基矽烷、乙晞基三戊氧基矽烷、乙晞基三己氧 基矽烷、烯丙基三甲氧基矽烷、烯丙基三乙氧基矽烷、 埽丙基二丙氧基矽燒、烯丙基三丁氧基石夕燒、埽丙基三 戊氧基矽燒.、烯丙基三己氧基矽垸、2 -丁烯基三甲氧基 矽烷、2 - 丁烯基三乙氧基矽烷、2 - 丁婦基三丙氧基矽烷二 2· 丁埽基三丁氧基矽烷、2-丁埽基三戊氧基矽烷、2_丁 、希基二己氧基石夕燒、5 -己埽基三甲氧基矽垸、5 _己晞基 三乙氧基矽烷、5-己烯基三丙氧基矽烷、5_己烯基三丁 氧基矽烷、5-己烯基三戊氧基矽烷、5_己烯基三己氧基 矽烷、晞丙基三環丁氧基矽烷、婦丙基三環戊氧基矽烷、 200405895 烯丙基環己晞氧基矽烷、烯丙基三烯丙氧基矽烷、3 _ 丁 烯基三丁氧基矽烷、3-丁埽基三戊氧基矽烷、3_丁烯基 二己氧基矽烷、3 -丁婦基三丁氧基矽垸、3_ 丁婦基三戊 氧基矽垸、3-丁烯基三己氧基矽烷、%丁缔基三烯丙氧 基梦燒、2-丁埽基三丁氧基矽烷、丁烯基三戊氧基矽 燒、2 - 丁缔基二己氧基矽垸、2 - 丁烯基三缔丙氧基矽垸、 5-己烯基三環丁氧基矽烷、%己烯基三環戊氧基矽烷、 5-己烯基三環己埽氧基矽烷及%己烯基三埽丙氧基矽 烷。 5. —種製備婦丙基三甲氧基矽烷之方法,包括在室溫下, 不需要觸媒,使晞丙基二氯矽烷與甲醇(產生)反應,及 將埽丙基三甲氧基矽烷與反應混合物分離。 200405895 柴、指定代表圖: (一) 本案指定代表圖為:第()圖。 (二) 本代表圖之元件代表符號簡單說明: 捌、本案若有化學式時,請揭示最能顯示發明特徵的化學式:
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US3403050A (en) | 1964-12-28 | 1968-09-24 | Stauffer Chemical Co | Water repellent compositions for porous substrates |
US4173576A (en) * | 1975-07-23 | 1979-11-06 | Dynamit Nobel Aktiengesellschaft | Process for the esterification of chlorosilanes |
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