TW200404337A - Substrate processing apparatus - Google Patents

Abstract

The purpose of the present invention is to provide a kind of apparatus that can reduce the used amount of processing liquid, have less liquid waste, maintain high processing efficiency, and suppress the contamination of component in liquid circulation path to the minimum. In the direction perpendicular to the conveying direction, the substrate 1 is conveyed in an inclined state relative to the horizontal plane. In the vicinity of the position right below the lower side edge of substrate on the inner bottom plane of the water washing processing tank 10, the isolation plate is erect along the substrate conveying direction so as to separate the inner bottom portion of the water washing processing tank and divide it into the followings: the recycling tank portion 24 for recycling pure water that expels from the pure water expelling nozzle 14 without flowing through the substrate face; and the exhausted liquid tank portion 26 for accommodating the used pure water that is expelled from pure water expelling nozzle to flow toward the lower substrate side and falls from the edge. Therefore, pure water recycled inside the recycling tank portion can be used again; and the used pure water flowing inside the exhausted liquid tank portion is exhausted.

Description

200404337 Description of the invention: [Technical field to which the invention belongs] The present invention relates to the handling of substrates such as glass substrates for flat panel devices (FPDs), semiconductor wafers, and printed substrates, and the substrates are cleaned, developed, and engraved. And peeling substrate processing equipment. [Previous technology] In the process of FPD, semiconductor device, printed circuit board and other processes, 'If the substrate is treated with a chemical, the substrate is washed with pure water, and the chemical attached to the substrate is replaced with pure water. A horizontal conveying type processing device that conveys horizontally one by one while discharging pure water and soil substrate for water washing. FIG. 19 schematically shows a schematic configuration of the processing apparatus. The processing device shown in FIG. 19 is provided with a water-washing treatment tank. It has a carrying inlet 12 and a carrying-out outlet (not shown in the figure). Inside the water-washing treatment tank, there are arranged a number of transportations not shown in the figure. roller. In addition, a plurality of pure water discharge nozzles 4 for spraying pure water are arranged in parallel on the upper and lower sides of the conveying path L of the substrate 丨 indicated by a double-dotted dotted line inside the washing treatment tank 10. On the side of the carrying inlet 12 of the washing treatment tank 10, a medicine treatment tank 16 'is provided adjacent to the washing treatment tank 10, and a transportation path sandwiching the substrate inside the medicine treatment tank 16 is provided with a plurality of spray sprays arranged side by side. The medicament is discharged from the rental nozzle 18. Then, the 'substrate i is carried into the washing processing tank from the medicine processing tank 16 through the carrying inlet 12 and is carried in the horizontal direction by the carrying roller support. It is carried from the washing processing tank 10 through the carrying outlet. Drying section (not shown). In addition, a liquid recovery port 52 is also formed at the bottom of the water-washing treatment tank 10, which

83980 200404337 allows the liquid at the bottom of the substrate 1 to flow down to the water-washing treatment tank 10, and a liquid recovery pipe 54 is connected to the liquid recovery port 52. The liquid recovery pipe 54 is connected to a recovery tank 58 which collects the recovered liquid 56 in a flow path. In addition, the recovery tank 58 is connected to one end of the liquid-feeding pipe 60, and the top of the liquid-feeding pipe 60 is connected to a pure water discharge nozzle 14 not shown in the figure. A filter 62 and a pump 64 are inserted into the liquid-feeding pipe 60, respectively. In addition, a piping for supplying pure water for replenishing pure water is connected to the recovery tank 5 8, but the processing device of the above structure is not shown in the figure. The substrate 1 on which the medicine 2 is attached is carried in from the medicine processing tank 16. In the water-washing treatment tank 丨 〇, in the water-washing treatment tank 〖〇, the substrate 1 is transported by the conveying roller, and at the same time, the pure water discharge nozzle 丨 4 sprays pure water on the upper and lower sides of the substrate 1, and the medicine attached to the substrate 1 2 Replace with pure water. At this time, the pure water sprayed on the surface of the substrate 1 and the medicine 2 attached to the upper surface of the substrate 1 flowed down to the bottom of the water washing treatment tank 10. The mixed liquid of pure water and medicine flowing down the bottom of the water washing treatment tank 10 is directed toward the liquid recovery port 5 2 to the bottom of the water washing treatment tank 10, and flows from the liquid recovery port 52 to the recovery tank through the liquid recovery pipe 54. Within 58. Then, the recovered liquid 56 collected in the redundancy of the recovery tank flows back to the pure water discharge nozzle 14 through the liquid feeding pipe 60 for reuse. In this way, recycle pure water. As described above, a device for circulating a mixed liquid of pure water and a medicine to simultaneously perform substrate processing, because the mixed liquid of pure water and a medicine is reused and replaced with a medicine attached to the substrate 1, the concentration of the medicine gradually increases, and Replacement efficiency gradually decreases. In addition, because the medicine-containing liquid circulates through the liquid recovery pipe 54, the recovery tank 58, and the liquid feeding pipe 60, the inner surface of the recovery tank "83980 200404337, the liquid recovery pipe 54 and the liquid feeding pipe 60, There is a problem such as contamination inside 64. In addition, when the mixed liquid of pure water and medicine at the bottom of the water washing treatment tank 10 flowing down from the substrate 1 is discharged from the water washing treatment tank 10 as a waste liquid, the amount of waste liquid increases. In addition, waste liquid treatment costs are required. In addition, the use of pure water also increases, leading to problems such as increased operating costs. In addition, in the process of forming a wiring pattern on a substrate, a photoresist film formed on the surface of the substrate is developed. In this case, a roller conveying type image processing apparatus is used which is arranged horizontally one by one on the substrate and is transported by a conveying roller. The substrate is coated with a developing solution, and after a certain period of time has elapsed after the application of the liquid, the developing reaction is stopped. A schematic structure of the development processing apparatus is shown. The development processing apparatus shown in FIG. 20 includes a development processing tank 110, which includes an inlet-side opening 112a and an outlet-side opening 112. b, a plurality of conveying rollers not shown in the figure are arranged in parallel inside the developing processing tank 110. The substrate 1 is carried into the developing processing tank through the entrance-side opening 112a! 10 plants, and is horizontally supported by the conveying roller. Carry it in the direction, and then carry it out of the development processing tank through the outlet-side opening 11 2b 'and send it to the next washing processing tank. 丨 4. Near the entrance-side opening l12a in the development processing tank 1 j 〇 Neshao A developing liquid discharge nozzle 116 is arranged. In addition, near the exit opening 112 b inside the developing processing tank 11 〇, directly above a conveying roller, opposite to the conveying roller, it is arranged to contact and be supported by The liquid removal roller 11 8 on the upper side of the substrate 1 that is transported by the rollers. In addition, there is also a transport roller near the exit opening 1 of the processing tank 丨 丨 〇 in a direction perpendicular to the substrate 1 transport direction. It is tilted upwards, and an air knife is installed instead of the liquid removal roller. 18. Adjacent to the water-washing treatment tank 114 provided in the development processing tank 83980 200404337 π〇, the substrate 1 is conveyed by a double-dotted dotted line. L, a plurality of water ejection nozzles 12 for spraying pure water on the upper and lower sides of the substrate 1 are arranged on the upper and lower sides of the substrate 1. In addition, the bottom of the imaging processing tank 1 丨 〇 is formed with a substrate 丨 flowing into the imaging processing Inner bottom of the tank 110 is a liquid recovery port 906 where the imaging liquid flows out, and the liquid recovery port 906 is connected to a liquid recovery pipe 908. The liquid recovery pipe 908 is connected to the collection and recovery of the recovery liquid 910. Tank 912. In addition, the recovery tank 912 is connected to one end of the liquid-feeding throwing pipe 914, and the liquid-feeding dispenser 9 1 44 is connected to the developing liquid discharge nozzle 丨 6. The liquid-feeding pipes 914 are inserted respectively. There are filter 916 and pump 918. The liquid recycling system T 908, the recovery tank 912, the liquid feeding pipe 914, the filter 91 16 and the pump 91 8 are configured as a liquid recycling system. In the development processing device of this structure, the substrate 1 on which the exposed photoresist film is formed on the surface passes through the development liquid discharge nozzle 116 disposed near the entrance-side opening 112a of the development processing tank 丨 丨. In the lower position, the slit-shaped discharge port on the lower end surface of the developing liquid discharge nozzle 116 discharges the developing solution 3 on the entire substrate in a curtain shape. The liquid-coated substrate 丨 develops a photoresist film during transportation by a transportation roller. When the substrate 丨 is transported to the vicinity of the outlet-side opening 112b of the development processing tank 11o, the development liquid 3 is removed from the substrate 1 by the liquid removing roller ι8, and then carried out from the development processing tank 丨 丨 0. Then, the substrate 1 is sent to the next water-washing processing tank 114, and the developing reaction of the photoresist film is completely stopped by cleaning with pure water. During this developing process, the used developing liquid flows from the substrate to the bottom of the developing processing tank 11o, and the substrate 1 does not pass directly under the developing liquid discharge nozzle 116 from 83980.

200404337 The developing liquid discharge nozzle 1 1 6 discharges the developing liquid in the bottom of the developing processing tank 1 1 0 without directly flowing from the substrate surface to the liquid recovery port 906 to the bottom of the developing processing tank 1 10 From the liquid recovery port 906, it flows into the recovery tank 9 1 2 through the liquid recovery pipe 9 0 8. Then, the developing solution 910 which has flowed into the recovery tank 9 1 2 and collected is sent to the developing solution discharge nozzle through the liquid feeding pipe 914 and reused. In this way, the developing solution is recycled. When the processing liquid (developing liquid in the above example) is circulated and the substrate is processed as described above, when the substrate or the reaction product of the substrate covering and the developing liquid is dissolved in the developing liquid, even if it is reused The developer solution does not cause special problems. However, when a substance that does not dissolve in the developing solution is produced by reacting with the developing solution, and when the developing solution is circulated and used, the inner surface of the recovery tank 91 2, the liquid recovery pipe 908 and the liquid feeding pipe are present. The inside surface of 914 and the inside of pump 918 are contaminated by insoluble matter. There is also a problem that the filter 9 1 6 inserted in the liquid-dispensing agent 9 14 immediately causes clogging, and even the substrate cannot be processed while the developing solution is circulated. In addition, when the development liquid is not circulated and is discharged from the bottom of the development processing tank i 1 0 and discarded, "although there is no such problem", when the base is not passed directly below the development liquid discharge nozzle 116, it is self-developed. The image liquid discharge nozzle ι6 is discharged and directly flows down to the bottom of the processing tank U0, and the developing liquid is discarded together, so there is a problem that the utilization efficiency of the developing liquid is reduced. The above problems are not limited to the development processing equipment, but may also occur in processing equipment such as Fajing, Silk 刿, 〃, and No ^ ^ scraping processing. In view of the above circumstances, the present invention is deficient-the purpose is to provide a treatment liquid that can maintain the high utilization efficiency of pure water and the like. Thousands reduction: > The amount of treatment liquid used, waste liquid

iM 83980 -10- 200404337 is too small and can be mixed up. ”The processing efficiency is maintained, and the substrate in the liquid circulation path / 5F dye is suppressed to a minimum. The second objective of the present invention is to provide a processing method that can advance the processing time; dry A & sacrifice% of the same soil, to maintain the utilization efficiency of the processing liquid, and not cause problems in the liquid tank ring system. Device. And following [invention content] The invention on the page of "Please Patent Scope" is a substrate processing device that transports the substrate horizontally by a transport mechanism in the processing tank, and at the same time discharges the processing liquid onto the substrate from the physical fluid discharge mechanism to process the substrate. It has a liquid circulation system, which is provided separately: a recovery path, which is recovered and discharged from the processing liquid discharge mechanism, and is hardened and discharged directly from the substrate surface, and the track path is collected from the foregoing. The processing liquid discharge mechanism discharges onto the substrate, and flows on the substrate toward the end perpendicular to the substrate conveying direction. The used processing liquid flows down from the edge; the processing liquid recovered in the recovery path is returned to the processing liquid. The discharge mechanism is provided with a liquid discharge path, which discharges the used processing liquid collected in the aforementioned liquid discharge path. The invention of the second patent application category is a substrate processing device which is disposed in a processing tank by a transfer mechanism. The substrate is conveyed in a horizontal direction, and the processing liquid is discharged from the processing liquid discharge mechanism onto the substrate to process the substrate. The system is a system for transporting substrates in a state inclined to the horizontal plane in a direction perpendicular to the substrate conveying direction by the aforementioned conveying mechanism, and the lower side edge of the substrate is conveyed on the inner bottom surface of the processing tank at an inclined angle ( Near the position immediately below, a partition is erected along the conveying direction of the substrate, and the bottom of the processing tank is separated by the partition, and is divided into: a recovery tank portion, which is a return fiber 83980 -11-200404337 received from the aforementioned treatment liquid discharge The draining mechanism directly discharges the processing solution without passing through the substrate surface; and the draining tank portion, which contains the used place that flows from the processing liquid discharging mechanism to the substrate and flows to the lower side of the substrate and flows down from the edge, Physical fluid; and returns the processing liquid recovered in the aforementioned recovery tank section to the aforementioned processing and liquid discharge mechanism 'and has a liquid discharge path, which discharges the used processing liquid flowing into the aforementioned drain tank section. Item 3 of the scope of patent application For the invention, for example, the substrate processing apparatus of the second patent application range, wherein the upper end of the aforementioned partition plate is arranged close to the edge of the lower side of the substrate that is slantly conveyed. The invention claimed in item 4 of the scope of patent application is a substrate processing apparatus which transfers a substrate in a horizontal state to a horizontal direction by a conveying mechanism in a processing tank 'while processing liquid is discharged from the processing liquid discharge mechanism onto the substrate to process the substrate' It is characterized by having a liquid circulation system, which is located near the positions directly below the edges of the two sides of the substrate being transported on the inner bottom surface of the processing tank. The inner bottom of the processing tank is divided into a collection tank section, which is a processing liquid recovered from the aforementioned processing liquid discharge mechanism and directly flows down without passing through the substrate surface; and a pair of rows ^ tanks are stored in The processing liquid discharge mechanism discharges the used processing liquid to the substrate on both sides of the substrate. The used processing liquid flows down from the two edges, and returns the processing liquid recovered in the recovery tank to the processing liquid discharge mechanism. The liquid discharge path is used to discharge the used treatment liquid that has flowed into each of the aforementioned liquid discharge tank portions. The invention of the fifth scope of the patent application, such as the meaning of the fourth scope of the patent application, is a board processing device, which is arranged such that the upper ends of the aforementioned partitions are close to the edge of the rain side of the 83980 -12-200404337 substrate. For the invention claimed in item 6 of the scope of patent application, such as the substrate processing apparatus of any one of items 2 to 5 of the scope of patent application, wherein the substrate carrying inlet side on the inner bottom surface of the aforementioned processing tank is along the substrate carrying direction A width direction partition plate is erected in the direction of the cross, and the width direction partition partitions the inner bottom of the processing tank to form a carrying inlet side drain tank portion, which is stored on the side edge of the front end of the substrate carried into the processing tank. The liquid also discharges the processing liquid that has flowed into the liquid discharge tank portion on the side of its inlet port. The invention claimed in item 7 of the present invention, such as the substrate processing apparatus of claim 6 in which the aforementioned application port is connected to the above-mentioned liquid discharge tank portion. The invention of claim 8 in the scope of patent application is a substrate processing apparatus for processing a substrate in a processing tank by carrying the substrate in a horizontal direction by a conveying mechanism, and at the same time discharging the processing liquid from the processing liquid discharge mechanism onto the substrate to process the substrate. The liquid circulation system uses the aforementioned conveying mechanism to convey the substrate in a state inclined to the horizontal plane in a direction perpendicular to the substrate conveying direction, and directly below the lower edge of the substrate in the inclined conveyance inside the processing tank. Near the position, a liquid discharge duct is horizontally arranged along the conveying direction of the substrate, which is used to store the used processing liquid discharged from the processing liquid discharge mechanism onto the substrate and flow to the lower side of the substrate. The processing liquid discharge mechanism discharges the liquid directly from the substrate surface, and the processing liquid recovered at the bottom of the processing tank is returned to the processing liquid discharge mechanism, and has a liquid discharge path for discharging and flowing into the liquid discharge duct. Past treatment fluid. The 9th invention in the patent scope of the machine application is a substrate processing device, which is carried in the horizontal direction of the substrate in a horizontal state by a transport mechanism in the 83980 200404337 processing tank. At the same time, the processing liquid is discharged from the processing liquid discharge mechanism onto the substrate. The processing substrate is characterized by having a liquid circulation system, which is located near the positions directly below the edges of both sides of the substrate being transported inside the processing tank. Each pair of drainage pipes is provided along the substrate transporting direction. The processing liquid discharge mechanism is discharged onto the substrate, flows to both sides of the substrate, and the used processing liquid flows down from both edges, and is discharged from the processing liquid discharge mechanism. The processing liquid discharge mechanism directly flows down from the substrate surface and is recovered in The processing liquid at the bottom of the processing tank is returned to the processing liquid discharge mechanism, and is provided with a liquid discharge path for discharging the used processing liquid which is respectively sludged into each of the liquid discharge ducts. For the invention with the scope of patent application No. 10, such as the substrate processing equipment with scope of the patent application No. 4, 5, or 9, the above-mentioned transfer mechanism is used to raise the height of the center of the substrate in a direction perpendicular to the substrate transfer direction. The substrate is supported and transported at both ends of the substrate. For an invention with a scope of patent application No. Π, such as a substrate processing device with scope of patent application No. 4, 5, or 9, wherein the substrate from the aforementioned processing liquid discharge mechanism to the substrate is perpendicular to the substrate conveying direction. The substrates on both sides of the substrate are tilted to discharge the processing liquid. For the invention with the scope of patent application No. 12, such as the substrate processing equipment with scope of the patent application No. 4, 5, or 9, the auxiliary liquid discharge path is provided, which is before and after the substrates transported by the aforementioned transport mechanism. Near the bottom edge of the two sides, they are arranged along the direction perpendicular to the substrate conveying direction. For the auxiliary drainage conduit, it is stored from the front and back edges of the substrate. To move horizontally in synchronization with the movement of the substrate

83980 200404337 supports the pair of auxiliary drainage ducts by moving them, and discharges the used treatment liquid flowing down into each of the aforementioned auxiliary drainage ducts. The invention of item 13 of the scope of patent application 'is based on the front page of the scope of patent application, the board processing device' wherein the aforementioned processing tank is a water washing place where the substrate is washed with pure water and a processing tank is provided, which is provided with a pharmaceutical processing tank. The substrate adjacent to the water-washing processing tank is carried on the inlet side, and the substrate is processed with a medicine. The invention in item 14 of the scope of application for a patent is a substrate processing apparatus that carries substrates in a processing tank and simultaneously discharges processing liquid from the processing liquid discharge mechanism onto the substrate to process the substrate. It is characterized by providing a processing liquid circulation mechanism, which is formed Recovery tank. Alas, it is separated from the inside of the processing tank, and is recovered and discharged from the processing liquid discharge mechanism, and the processing liquid that has not directly flowed down from the substrate surface is provided. In addition, a recovery container is arranged below the processing liquid discharge mechanism. The processing liquid discharged by the processing liquid discharge mechanism, which directly flows down from the substrate surface, returns the processing liquid recovered in the recovery tank portion or the recovery container to the processing liquid discharge mechanism to circulate the processing liquid and set a drainage path. It is discharged from the processing liquid discharge mechanism onto the substrate, and the used processing liquid flows into the bottom of the processing tank from the substrate. For the invention with the scope of patent application No. 15, for example, the substrate processing device with scope of the patent application No. 14 includes a cleaning mechanism for cleaning the aforementioned processing tank that is in contact with the used processing liquid flowing down from the substrate with a cleaning solution. The inner wall surface or the components inside the treatment tank. The invention of claim 4 in the patent scope No. 16 is, for example, a substrate processing device in the scope of patent application No. 15 in which a water washing treatment tank with pure water for base and plate washing is provided adjacent to the aforementioned treatment tank. Used pure water for the aforementioned 83980

-15- 200404337 The cleaning mechanism is used as a cleaning solution. The invention of Shen Qiao's patent scope item ", such as the application of the substrate processing device of any one of the patent scope item 14 to item 16 A, wherein the branch of the forehead drainage path branches the knife manifold and the machine pathwise to the aforementioned processing Fluid circulation mechanism, and the flow path switching mechanism is inserted at the branch position. The 18th "Invention of the Patent Scope of the Patent Application," for the substrate processing device of the "Scope of Application for Patent Application", declares the above-mentioned liquid discharge path divergent, and connects the flow path of the branch path to the above-mentioned processing liquid circulation mechanism, and introduces the difference position. The insertion path switching mechanism passes the used processing liquid flowing down from the substrate through the above-mentioned liquid discharge path and through the above-mentioned branch path to the above-mentioned processing liquid circulation mechanism to recycle the used processing liquid, and the cleaning mechanism uses the processing liquid as the Washing solution. Claim the invention of item 19 of the patent scope, such as the substrate processing equipment of the scope of application for the patent item No. 4 and 'where a tank for collecting the processing liquid recovered in the aforementioned recovery tank section or in the recovery of mushrooms is provided, and the tank is additionally equipped to manage the Management device for processing liquid composition in the tank. In the substrate processing apparatus of the invention described in claim 1 of the patent scope, the substrate is processed in the processing tank by horizontally transporting the substrate by a transport mechanism, and at the same time, the processing liquid is discharged from the processing liquid discharge mechanism to the substrate to process the substrate. Then, the processing liquid used for processing flows toward the end in a direction perpendicular to the substrate conveying direction: flowing down from the edge of the substrate. The used processing liquid flowing down from the edge of the substrate is collected in the liquid discharge path and discharged through the liquid discharge path. In addition, the processing liquid discharged from the processing liquid discharge mechanism and directly flowing down from the substrate surface is recovered in the recovery path and returned to the processing liquid discharge mechanism for reuse through the liquid circulation system. Therefore, the used treatment liquid is not reused and discarded, so the substrate processing efficiency fiber. ^ 3 98〇-16- 200404337 The rate will not be reduced. In addition, the used treatment liquid does not pass through the liquid circulation system, 'So contamination of the components of the liquid circulation system is also minimized. In addition, since the processing liquid recovered in the recovery path is reused, the high utilization efficiency of the processing liquid is maintained, the amount of processing liquid used is reduced, and the amount of waste liquid is also small. In the substrate processing apparatus of the invention of claim 4 in the second scope of the patent, the substrate is transported and discharged from the processing liquid discharge mechanism onto the substrate in a state inclined to the horizontal plane in a direction perpendicular to the conveying direction, and is used for substrate processing. The liquid flows to the lower side of the substrate and flows down from the edge of the substrate. At this time, a partition is erected near the lower edge of the substrate. The partition divides the inner bottom of the processing tank into a recovery tank and a drain tank, so it flows down from the edge of the substrate. The used treatment liquid flows into the drainage tank portion and is discharged through the drainage channel. In addition, it is discharged from the processing liquid discharge mechanism. The processing liquid that has not been directly lowered from the substrate surface is recovered in the recovery tank portion, and is returned to the processing liquid discharge mechanism for reuse by the circulation system. Therefore, the used processing liquid is not reused and discarded, so the processing efficiency of the substrate is not reduced. In addition, because the used processing liquid does not flow through the liquid circulation system, the contamination of various components of the liquid circulation system is also suppressed. Minimal. In addition, since the processing liquid recovered in the recovery tank is reused, maintaining high utilization efficiency of the processing liquid 'reduces the use of the processing liquid and reduces the amount of waste liquid. The substrate processing apparatus of the invention in the third aspect of the patent application, the used processing liquid flowing to the lower side of the substrate and flowing down from the edge of the substrate surely flows into the drain tank portion 'and does not flow over the upper end of the partition plate into the recovery tank portion. The substrate processing device of the invention applying for the fourth item of the patent scope is in the processing tank -17- 83980 200404337. The substrate is transported horizontally by the transport mechanism, and the processing liquid is discharged from the processing liquid discharge mechanism to the substrate for processing. Substrate. Then, the processing liquid for substrate processing is caused to flow on both sides of the substrate, and flows down from both edges of the substrate, respectively. At this time, partitions are respectively arranged near the positions directly below the edges of the two sides of the substrate. The inner bottom of the processing tank is separated by each partition to separate the recovery tank and a pair of drain tanks. The used treatment liquid flowing down from the edge flows into each of the drainage tank portions and is discharged through the drainage channel. In addition, the processing liquid discharged from the processing liquid discharge mechanism, and the processing liquid that has not directly flowed down through the substrate surface, is collected in the recovery tank portion, and is sent to the processing liquid discharge mechanism for reuse by the liquid circulation system. Therefore, the used processing liquid is not reused and discarded ', so the processing efficiency of the substrate will not be reduced. In addition, because the used processing liquid does not flow through the liquid circulation system, the contamination of the components of the liquid circulation system and the system is also contaminated. Keep it to a minimum. In addition, since the treatment liquid recovered in the commercial tank is reused, the high utilization rate of the treatment liquid is maintained, the amount of the treatment liquid used is reduced, and the amount of the waste liquid is also reduced. The substrate processing device of the invention of claim 5 in the scope of patent application, the used processing liquid flowing to both sides of the substrate and flowing down from the two edges of the substrate surely flows into the respective drainage tank portions, and does not flow over the upper end of the partition plate to the recovery tank. Inside. The substrate processing device of the invention in the sixth scope of the patent application, near the substrate carrying inlet, uses the processing liquid attached to the substrate for the previous processing, and sprays it from the front edge of the U.S. board. When the processing liquid discharged on the substrate in front of the substrate conveying direction is sprinkled from the front edge of the substrate, a width-direction partition plate is erected on the substrate conveyance inlet side, and the inner bottom of the processing tank is separated by the width-direction partition plate. The carrying-in-side draining tank portion 83980 -18- 200404337 is formed, so the liquid spilled from the edge of the front end of the substrate flows into the carrying-in-side draining tank portion and exits. In the device according to the seventh aspect of the patent application, the liquid flowing into the discharge tank portion on the inlet side and the used treatment liquid flowing into the discharge tank portion are discharged through the discharge path. Item 8 of the scope of patent application ^ It is carried in a state inclined to the horizontal plane in a direction perpendicular to the conveying direction. Therefore, the processing liquid used for substrate processing is discharged from the processing liquid discharge mechanism to the substrate, and flows to the lower side of the substrate. And flow down from the edge of the substrate. At this time, since the liquid discharge duct is horizontally arranged near the lower edge of the lower side of the substrate, the used processing liquid flowing from the edge of the substrate flows into the liquid discharge duct and is discharged through the liquid discharge path. . In addition, the processing liquid discharged from the processing liquid discharge mechanism, and the processing liquid directly flowing down from the substrate surface is recovered at the bottom of the processing tank, and returned to the processing liquid discharge mechanism for reuse through the liquid circulation system. Therefore, the used processing liquid is not reused and discarded, so the processing efficiency of the substrate is not reduced. In addition, because the used processing liquid does not flow through the body circulation system, the contamination of various components of the liquid circulation system is also suppressed. Minimal. In addition, since the processing liquid recovered at the bottom of the processing tank is reused ', the high utilization efficiency of the processing liquid is maintained, the amount of processing liquid used is reduced, and the amount of waste liquid is also small. The substrate processing device applying the invention of claim 9 in the patent scope, in the processing tank, the substrate is transported in a horizontal state by a conveying mechanism in a horizontal state, and the material is disposed to be discharged from the processing liquid discharge mechanism onto the substrate to process the substrate. Then, the substrate processing (processing liquid flows to both sides of the substrate, and from the two sides of the substrate 83980 -19- 200404337 4 edge edge knifes at this time near the position directly below the edge edges of both sides of the substrate along the substrate transport direction There are liquid drainage ducts, so the used processing fluid from the two edges of the substrate flows into each drainage duct, and is discharged through the drainage path. It is also discharged from the processing fluid discharge mechanism, and directly flows down from the substrate surface. The processing liquid is recovered to the bottom of the processing tank, and is returned to the processing liquid discharge mechanism for reuse through the liquid circulation system. The used processing liquid is not reused and discarded, so the processing efficiency of the substrate will not be reduced. In addition, 'Because the used processing liquid does not flow through the liquid circulation system, the contamination of the components of the liquid circulation system is also minimized. limit. In addition, because the treatment liquid recovered in the treatment tank "Inner Shao Shao" was reused, the high utilization efficiency of the treatment liquid was maintained, the amount of treatment liquid used was reduced, and the amount of waste liquid was also reduced. The substrate processing device of the invention applying for item 1Q of the patent range, because the substrate is transported in the direction perpendicular to the conveying direction, with the central portion higher than the two end portions, so it is discharged from the processing liquid discharge mechanism and used on the substrate. The processing liquid processed on the substrate is left and right at the center portion of the substrate, and does not stay on the substrate, but flows from the central portion on the substrate to the two end portions, and flows down from the edge of the substrate. The substrate processing apparatus of the invention claimed in item 11 of the patent scope, because the two ends of the substrate in the direction perpendicular to the substrate conveying direction are respectively spaced, and the processing liquid is discharged to the substrate surface. The processing liquid is formed to flow toward both ends, and the processing liquid is flowed to both ends of the substrate, and flows down from the edge of the substrate. The substrate processing device of the invention with the scope of application for patent No. 12 is used when the substrate is transferred from the processing liquid discharge mechanism to the substrate when being transported by the conveying mechanism. The processing liquid used for substrate processing is based on the substrate 83980 -20-200404337. The side edges are sprinkled separately, and a pair of auxiliary drainage ducts are arranged along the direction perpendicular to the substrate conveying direction near the positions directly below the side edges of the front and rear ends of the substrate. The movement of the substrate is synchronized and supported in a horizontal direction. Therefore, the used treatment liquid sprayed from the side edges of the front and rear ends of the substrate is discharged into each auxiliary drainage conduit and discharged through the auxiliary drainage path. The substrate processing device of the invention claimed in item 13 of the patent scope is used in the chemical processing tank to apply the chemical used for substrate processing to the substrate. The substrate is cleaned with pure water in the water processing tank and removed from the substrate. Replace with pure water. The substrate processing device of the invention claimed in item 14 of the patent scope is discharged from the processing liquid discharge mechanism, and the processing liquid directly flowing down from the substrate surface is recovered in the recovery tank or the recovery container of the processing tank, and is circulated by the processing liquid. The mechanism returns from the recovery tank or the recovery container to the processing liquid discharge mechanism for recycling. Since the processing solution does not pass through the substrate surface, it does not contain insoluble matter. Therefore, the inner surface of the tank, the inner surface of the piping, and the inner surface of the pump do not cause contamination by the insoluble matter in the liquid circulation system. In addition, the used processing liquid discharged from the processing liquid discharge mechanism onto the substrate and flowing into the bottom of the processing tank from the substrate is discharged through the liquid discharge path. Therefore, it does not pose a problem even if insoluble substances are contained in the treatment liquid. Since the substrate processing device of the invention claimed in item 15 of the patent scope, the inner wall surface of the processing tank or the components inside the processing tank that are in contact with the used processing liquid flowing down from the substrate are cleaned by the cleaning solution through the cleaning mechanism. Therefore, even if the used treatment solution contains insoluble matter, the insoluble matter adheres to the inside of the treatment tank 83980 '21-200404337, and the insoluble matter is washed away. Therefore, contamination of the inner wall surface of the processing tank or components inside the processing tank is prevented. Since the substrate processing device of the invention in the scope of the patent application No. 16 is adjacent to ten thousand; the processing tank "water washing | settling tank uses ㉟ 纟 pure water for the cleaning mechanism as the cleaning liquid, so the cleaning liquid is saved. The substrate processing device of the invention claimed in item 17 of the patent scope is machine-mounted into the processing tank from the substrate < when the used processing liquid containing insoles contains insoluble matter, the used processing liquid is directly discharged through the liquid discharge path. In addition, when the non-dissolved substance is not contained in the used processing solution flowing from the substrate into the bottom of the processing tank, the flow path switching mechanism is used to flow the used processing solution from the drain path into the branch path. The flow path 'used processing liquid flows into the processing liquid circulation mechanism through the branch path. Due to the percentage and the type of substrate, if the used processing solution does not contain insoluble matter, the amount of processing solution can be reduced by recycling the used processing solution. According to the invention of the invention, the substrate processing device of item 18 in the β patent, when the used processing liquid flowing from the substrate into the bottom of the processing tank contains non-dissolved substances, the used processing liquid is directly discharged through the liquid discharge path. In addition, when the non-dissolved matter is not contained in the used processing solution flowing from the substrate into the bottom of the processing tank, the flow path switching mechanism is used to flow the used processing solution from the drainage path into the branch path. Cut ⑽⑽ 路 'used the treatment fluid flowing through the branching path to the treatment fluid circulation mechanism. Therefore, depending on the type of substrate, etc., when the used processing liquid does not contain insoluble matter, it is possible to reduce the amount of hard processing by circulating the processing liquid that disperses the materials. And when the used processing liquid flowing down from the substrate is recycled, the mechanism is used as a cleaning liquid before the system is used, so ’is also used everywhere.

83980 -22- 200404337 The processing liquid (cleaning liquid) for cleaning the inner wall surface of the processing tank or the components inside the processing tank can be used for substrate processing and cleaning the inner wall surface of the processing tank. The substrate processing apparatus of the invention applying for the item No. 19 of the patent scope, because the processing liquid composition in the tank is managed by the management device, so the circulating contaminated and deteriorated processing liquid can be avoided for substrate processing. [Embodiment] < 1. First Embodiment > Hereinafter, a first embodiment of the present invention will be described with reference to Figs. 1 to 13. 1 to 3 show an example of the first embodiment of the present invention, and Fig. 丨 is a schematic plan view showing a schematic structure of a substrate processing apparatus, and Figs. 2 and 3 are cross-sectional views as viewed from the direction of arrows II-II in the figure} And a sectional view viewed from the direction of the IIMII arrow. The structure and operation of the main part of the substrate processing apparatus for substrate processing are the same as those of the previous apparatus described in FIG. 19, so the diagram! The symbols used in FIG. 19 are also marked on the same components in FIG. 3 to FIG. 3, and repeated description is omitted. In this substrate processing apparatus, each of the conveyance rollers arranged in parallel inside the water-washing treatment tank 10 is respectively supported in a slanted manner in a direction perpendicular to the substrate conveyance direction, but it is not shown in the figure. display. Therefore, as shown in Fig. 3, the substrate 1 is transported in a horizontal direction in an inclined state in a direction perpendicular to the transport direction. In addition, in FIG. 2, for convenience, the substrate 丨 is not depicted in an inclined state. In addition, due to the pure water discharged from the pure water discharge nozzle 14, the substrates in the water treatment tank 10 are not carried into the water treatment tank 10 from the medicine treatment tank 16! The pure water discharge nozzle 14a located at the position closest to the carrying inlet 12 of the washing treatment tank 10 among the pure water discharge nozzles 14 is shown in FIG. To the substrate! Carrying direction

83980 -23-200404337 There is a discharge port for discharging pure water in front. In addition, the inner bottom of the water-washing processing tank 10 of the substrate processing apparatus is partitioned by the partition 20 and the width-direction partition 22, and the bottom is partitioned into a recovery tank portion 24 and an L-shaped row. Liquid tank section 2 6. The partition plate 20 is located near the position directly below the lower side edge of the substrate 1 slantly conveyed on the inner bottom surface of the water treatment tank 10, and stands upright along the conveyance direction of the substrate 1. As shown in FIG. 3 (a), the upper end of the partition plate 20 is preferably arranged close to the lower edge of the substrate 1. In addition, the width direction partition plate 22 is located on the side of the inlet 1 12 of the substrate 1 on the inner bottom surface of the water-washing treatment tank 10, and stands upright in a direction perpendicular to the conveyance direction of the substrate j. Therefore, one end of the partition 22 in the width direction is connected to one end of the partition 20 in a fishing shape. A liquid recovery port 28 is formed at the bottom of the recovery tank portion 24 of the water washing treatment tank 10, and a liquid recovery pipe 30 is connected to the liquid recovery port 28 in communication. The liquid bean recovery pipe 30 is connected to a recovery tank 34 for collecting the recovery liquid 32. In addition, the recovery tank 34 is connected to one end of the liquid-feeding pipe 36 through which the filter 38 and the pump 40 are inserted. The top end of the liquid-feeding pipe 36 is connected to the pure water discharge nozzles 14 and 14a. Not shown. In addition, a liquid discharge port ο is formed at the bottom of the liquid discharge tank Shao 26 of the water washing treatment tank 10, and a liquid discharge pipe 44 is connected to the liquid discharge port 42 in communication. The substrate processing apparatus having the above structure, as shown in FIG. 3 (a), when the substrate 1 passes the setting position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 丨 4 to the substrate 1 is adhered to The medicament 2 on the substrate 1 flows to the lower side of the substrate 1 at the same time and flows down from the edge of the substrate 1. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower side of the substrate 1 passes through the lower side of the substrate 1 83980-24-200404337 and faces the lower side of the substrate 1, and flows down from the edge of the substrate 1. The mixed liquid of pure water and medicine flowing down from the edge of the substrate 1 flows into the drainage tank portion 26 'from the drainage tank portion 26 and flows into the drainage tube 44 through the liquid drainage port 42' and passes through the drainage tube 4 4 Discharge as waste liquid. Further, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower surface side of the substrate 1 drips from the lower surface of the substrate 1 'and flows into the recovery tank portion 24. Then, a relatively small amount of pure water recovered in the recovery tank portion 24 flows from the recovery tank portion 24 into the liquid recovery pipe 30 through the liquid recovery port 28 and flows into the recovery tank 34 through the liquid recovery pipe 30. Then, the recovered liquid 32 collected in the recovery tank 34 is returned to the pure water discharge nozzles 14 and 14a through the liquid feeding pipe 36 and reused. At this time, the pure water discharged from the lower pure water discharge nozzle 14 at this time was partially returned to the recovery tank 34 'after contacting the substrate 1, but there was substantially nothing wrong with it. That is, due to gravity acting on the medicine adhered to the lower surface of the substrate 1, compared with the upper surface, only a small amount of the medicine was originally attached to the lower surface. Therefore, the pure water in contact with the bottom surface of the substrate 1 contains only a small amount of medicine, and even if it is returned to the recovery tank 34 for reuse, there is nothing wrong with it. In addition, there are liquid-removing rollers used to remove the medicine attached to the substrate 丨 in the medicine treatment tank 16. At this time, less medicine is attached to the substrate placed in the water-washing treatment tank 丨 0. Nothing wrong. In addition, as shown in FIG. 3 (b), the substrate 1 has not passed the setting position of the pure water discharge nozzle 丨 4, and the pure water discharged from the pure water discharge nozzle 14 has not passed through the substrate! It flows directly into the recovery tank portion 24. A large amount of pure water recovered after flowing into the recovery tank portion 24 flows from the recovery tank Sha 24 through the liquid recovery port 28 into the liquid recovery pipe 30, and flows into the recovery tank "through the liquid recovery pipe 30." The recovered liquid (pure water) 32 collected in the recovery tank 34 is sent back to the pure water discharge nozzle 14 through the liquid-dispensing -25- 83980 200404337 pipe 36, and "reused." At this time, almost pure water flows into the drain tank portion 26, and the amount of waste liquid discharged from the drain tank portion 26 through the drain pipe 44 is extremely small. In addition, near the moving inlet 丨 2 of the washing treatment tank 丨 〇, the substrate attached to the medicine from the medicine treatment tank 16 into the washing treatment tank 丨 0, and from the pure water discharge nozzle 14a to the front of the substrate 丨 in the transport direction The pure water is discharged, so the pure water discharged onto the substrate i flows to the side of the substrate 1 at the same time as the medicine 2 attached to the substrate 1 and is sprinkled from the front edge of the substrate 1. The mixed liquid of pure water and medicine from the edge of the front edge of the substrate 1 flows into the partitioned drain tank section 26 from the recovery tank Shao 24 through the width direction partition plate 22 and is inside the drain tank section 26 The bottom surface flows toward the liquid discharge port 42. Then, it flows out of the liquid discharge tank portion 26 into the liquid discharge pipe 44 through the liquid discharge port 42 and is discharged through the liquid discharge pipe 44 as waste liquid. As mentioned above, since most of the used substrate water is not reused, it is discarded as a waste liquid together with the medicament. Pure substrate water is used in the cleaning process of the substrate 1, so the processing efficiency of the substrate 1 is not reduced. . In addition, since the mixed liquid of pure water and medicine has not flowed into the liquid recovery pipe 30, the recovery tank 34, the liquid delivery pipe 36, and the pump 40, the contamination of these components by the medicine is minimized. limit. In addition, since pure water recovered in the recovery tank portion 24 is reused, the amount of pure water used can be reduced, and the amount of waste liquid is also small. In the substrate processing apparatus described above, among the pure water discharge nozzles 14, the pure water discharge nozzles 14 a provided at the position closest to the carrying inlet 12 of the water-washing treatment tank 10 are used to discharge pure water toward the substrate 1 in the direction of transportation. Way to configure the exhaust port. In addition, '-26- 83980 200404337 can prevent pure water from flowing into the chemical processing tank 16 on the upper side through the upper surface of the substrate 1 in the water processing tank 10. It is also possible to install gas near the port 1 2 of the water processing tank 10 The knife, however, has a device with such a structure. As described in the above embodiment, the drainage tank portion 26 must be formed into an L-shape so that pure water is sprayed from the side edge of the front end of the substrate 1 carried into the water treatment tank 10 And the medicine flows into the liquid discharge tank portion 26. Conversely, in order to avoid excessive amounts of pure water and medicine spraying from the side edges of the front end of the substrate 1 carried into the water-washing treatment tank 10, as shown in the schematic plan view of FIG. A partition plate 46 is erected along the conveying direction of the substrate 1 over the entire length of the water processing tank 10, and the bottom of the water processing tank 10 is divided into a recovery tank portion 48 and a drainage tank portion 50 by the partition plate 46. . The first embodiment discards the liquid discharged through the liquid discharge pipe 44 as waste liquid. However, the liquid discharged in the present invention is not necessarily waste liquid. For example, when two water-washing treatment tanks are continuously provided downstream of the chemical treatment tank, the following structure can be adopted when the present invention is applied to the two water-washing treatment tanks. That is, the water washing treatment tank on the downstream side uses pure water that has not been used for water washing. In the downstream water washing treatment tank, the liquid discharged from the drain pipe 44 is sent to the upstream water washing treatment tank 'without exhaust gas. The upstream water washing treatment tank can be used as a new liquid for water washing. This is because a large amount of medicine is adhered to the substrate carried into the water-washing treatment tank on the upstream side, and the substrate carried into the water-washing treatment tank on the downstream side has been washed once in the water-washing treatment tank on the upstream side, and the amount of attached medicine is extremely small. Furthermore, in the water-washing treatment tank on the downstream side, the liquid discharged from the liquid discharge pipe 44 contains only a very small amount of medicine ', so it can be used as a new liquid in the water-washing treatment tank on the upstream side. In this way, the liquid discharged from the drainage pipe 44 in the downstream water washing treatment tank is sent to the upper 83980, 27-200404337. The heart side water washing treatment tank is reused, which can further reduce the amount of pure water used. In addition, in the above-mentioned example, the liquid discharge tank portion 26 is an L-shaped shape in which a portion formed by the partition plate 20 and a portion formed by the width direction partition plate 22 communicate with each other. A drain pipe is separately provided for each part, and the two drain pipes are connected to the recovery tank 34. Next, FIG. 5 and FIG. 6 show other examples of the first embodiment of the present invention. FIG. 5 is a schematic plan view showing a schematic structure of a substrate processing apparatus, and FIG. 6 is a cross-sectional view viewed from the direction of arrows VI-VI in FIG. In this substrate processing apparatus, the structure and operation of the main components for performing substrate processing are also the same as those of the previous apparatus described with reference to FIG. 19, and therefore repeated descriptions are omitted. In addition, the components in FIG. 5 and FIG. 6 with the same symbols as those used in FIGS. 1 to 3 show the same components having the same functions as the components described in FIGS. 1 to 3, and the repeated descriptions are omitted. In this substrate processing apparatus, each of the conveyance rollers arranged in parallel inside the water-washing treatment tank 10 is separately supported so as to be inclined in a direction perpendicular to the conveyance direction of the substrate 1, but it is not shown in the figure. As shown in FIG. 6, the substrate 1 is transported in a horizontal direction in an inclined state in a direction perpendicular to the transport direction. Then, the substrate processing apparatus is provided inside the water-washing processing tank with a drainage pipe 66 horizontally along the conveyance direction of the substrate 1. The liquid discharge duct 66 is disposed near a position directly below the edge of the lower side of the substrate 1 that is carried obliquely. In addition, a liquid discharge port 68 is formed at the bottom of the liquid discharge duct 66, and a liquid discharge pipe 70 is connected to the liquid discharge port 68. A liquid recovery port 72 is formed in the bottom of the water treatment tank 10, and a liquid recovery pipe 74 is connected to the liquid recovery port 72. Therefore, 83980-28 · 200404337 is the same as the device shown in Figs. 1 to 3. The liquid recovery pipe 74 is connected to the recovery tank for collecting the recovery liquid. The recovery tank is connected to a filter and a pump respectively. One end of the liquid piping, and the top end of the liquid feeding piping is connected to the pure water discharge nozzles 14 and 14 a, but it is not shown in the figure. The substrate processing apparatus having the above structure is shown in FIG. 6 on the substrate! When passing the setting position of the pure water discharge nozzle 14, the pure water 'discharged from the pure water discharge nozzle 14 to the substrate 1 and the medicine 2 attached to the upper surface of the substrate 1 flow to the lower side of the substrate 1 at the same time, and from the substrate 1 Margin shed. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower side of the substrate 1 flows through the lower side of the substrate 1 facing the lower side of the substrate 1 and flows down from the edge of the substrate 1. The mixed liquid of pure water and medicine flowing down from the edge of the substrate 1 flows into the drainage pipe 66. The self-draining pipe 6 6 flows into the drainage pipe 70 through the liquid drainage port 6 8 and passes through the drainage pipe 70 Discharge as waste liquid. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower surface side of the substrate 1 drips from the lower surface of the substrate 1, and the mud enters the bottom of the water washing treatment tank 10. Then, a relatively small amount of pure water recovered from the inner bottom of the water washing treatment tank 10 is sludged from the inner bottom of the water washing treatment tank through the liquid recovery port 72 into the liquid recovery pipe, and flows into the liquid recovery pipe 74 Inside the recovery tank. Then, the recovered liquid collected in the recovery tank is returned to the pure water discharge nozzles 14, 14a through the liquid feeding pipe for reuse. In addition, when the substrate 1 does not pass through the setting position of the pure water discharge nozzle 1-4, the pure water discharged from the pure water discharge nozzle 14 directly flows into the water washing treatment tank 10 without passing through the substrate 1 surface. Most of the pure water recovered by flowing into the bottom of the water treatment tank 10 is recovered from the bottom of the water treatment tank through the liquid recovery port 72 and flows into the liquid recovery pipe 74, and flows into the liquid recovery pipe 74.

MS 83980 -29 · 200404337 in the recovery tank. Then, the recovered liquid (pure water) collected in the recovery tank is returned to the pure water discharge nozzles 14 and 14a through the liquid feeding pipe for reuse. At this time, almost no pure water flows into the drainage pipe 66, and the amount of waste liquid discharged from the drainage pipe 66 through the drainage pipe 70 is extremely small. As described above, the substrate processing apparatus is also discarded as a waste liquid together with the medicament because most of the used pure water has not been reused, and pure water is used during the cleaning treatment of the substrate 1. Therefore, the processing efficiency of the substrate 1 is not high. reduce. In addition, since the mixed liquid of pure water and medicine does not flow into the liquid recovery pipe 74, the recovery tank, the liquid feeding pipe, and the inside of the system, the contamination of these components by the medicine is minimized. In addition, pure water recovered in the bottom of the water treatment tank is reused, so the amount of pure water can be reduced, and the amount of waste liquid is small. Next, FIG. 7 and FIG. 8 show another example of the first embodiment of the present invention. FIG. 7 is a schematic plan view showing a schematic structure of a substrate processing apparatus, and FIG. 8 is a cross-sectional view viewed from the direction of arrows VIII-VIII in FIG. The structure and operation of the main part of the substrate processing apparatus in this substrate processing apparatus are also the same as those of the conventional apparatus described with reference to FIG. 19, and therefore repeated descriptions are omitted. In addition, the components in FIG. 7 and FIG. 8 marked with the same symbols as those used in FIGS. 1 to 3 show the same components having the same functions as the components described above in FIGS. 1 to 3, and repeated descriptions are omitted. In this substrate processing apparatus, a plurality of conveyance rollers arranged in parallel inside the water-washing treatment tank 10 are horizontally and separately supported, but it is not shown in the figure. As shown in FIG. 8, the substrate 1 is conveyed in a horizontal state in a horizontal direction. Then, the holmium substrate processing device is located in the bottom of the water-washing treatment tank. 10, separated by a pair of partitions% 83980 -30-200404337 7 6 b and the width-direction partition 7 8, and the bottom of the water-washing treatment tank 10 is partitioned. A recovery tank portion 80, a pair of drain tank portions 82a, 82b, and a port-side drain tank portion 84 are formed. A pair of partition plates 76a, 76b are provided near the positions directly below the edges of both sides of the substrate 1 conveyed in the horizontal state on the inner bottom surface of the water-washing treatment tank 10, respectively, and are standing along the conveying direction of the substrate 1. As shown in FIG. 8, the upper ends of the pair of partition plates 76a and 76b are preferably arranged adjacent to the edges of both sides of the substrate 1, respectively. In addition, the width-wise partition plate 78 is provided on the substrate inlet side of the bottom surface of the water-washing treatment tank 10, and is standing upright in a direction perpendicular to the substrate 1 conveyance direction. The two end portions of the widthwise partition plate 78 are hook-shapedly connected to one end of each pair of partition plates 76a and 76b, and the pair of drain groove portions 82a and 82b and the inlet-side drain groove portion 84 are connected to each other. Fluid communication. A liquid recovery port 86 is formed at the bottom of the recovery tank portion 80 of the water-washing treatment tank 10. The liquid recovery port 86 is connected to a liquid recovery pipe 88 in communication. Similar to the device shown in Figs. 1 to 3, the liquid recovery pipe 88 flow path is connected to the recovery tank for collecting the recovery liquid, and the communication tank is connected to one end of the liquid feeding pipe through the filter tank and the system respectively. The top end of the liquid feeding pipe is connected to the pure water discharge nozzles 14 and 14a in communication, but it is not shown in the figure. A liquid discharge port 90 is formed at the bottom of the liquid discharge tank portion 82a of the water treatment tank 10. A liquid discharge pipe 92 is connected to the liquid discharge port 90. A substrate processing apparatus having the above structure, as shown in FIG. 8, when the substrate 1 passes the setting position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 丨 4 onto the substrate 1 is attached to the substrate 1. The above medicine 2 flows to both sides of the substrate 1 at the same time, and flows down from both edges of the substrate 1 respectively. In addition, since pure 83980

-31-200404337 Water discharge nozzle 14 A part of the pure water discharged to the lower side of the substrate 1 flows through both sides of the substrate 1 facing the substrate 1 and flows down from both edges of the substrate 1. The mixed liquid of pure water and medicine flowing down from the two edges of the substrate 1 flows into the respective drainage tank portions 82a and 82b, and flows from the drainage tank portions 82a and 82b into the drainage tube 9 through the liquid drainage port 90. 2 and discharged through the drain pipe 92 as waste liquid. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower surface side of the substrate 1 drips from the lower surface of the substrate 1 and flows into the recovery tank section §0. Then, a smaller amount of pure water recovered in the recovery tank portion 80 flows from the recovery tank portion 80 through the liquid recovery port 86 into the liquid recovery pipe 88, and flows into the recovery tank through the liquid recovery pipe 88. Then, the recovered liquid collected in the recovery tank is returned to the pure water discharge nozzle 14, 14a through the liquid-feeding pipe for reuse. In addition, when the substrate 1 does not pass the installation position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 14 directly flows into the recovery tank portion 80 without passing through the substrate 1 surface. A large amount of pure water recovered by flowing into the recovery tank portion 80 flows from the recovery tank portion 80 through the liquid recovery port 86 into the liquid recovery pipe 88, and flows into the recovery tank through the liquid recovery pipe 88. Then, the recovered liquid (pure water) collected in the recovery tank is returned to the pure water discharge nozzles 14, 14a through the liquid feeding pipe for reuse. At this time, almost no pure water flows into the drainage tanks 82a, 82b, and the amount of waste liquid discharged from the drainage tank parts 82a, 82b through the drainage pipe 92 is extremely small. In addition, in the vicinity of the carrying inlet of the water washing treatment tank 10, in order to obtain the substrate 1 which is carried into the water washing treatment tank 10 from the medicine treatment tank 16 and adheres the medicine, the pure water discharge nozzle 14a is discharged forward of the substrate 1 in the carrying direction of the substrate 1. Pure water, the pure water discharged onto the substrate 1 and the medicine 2 attached to the substrate 1 flow toward the front side of the substrate 1 at the same time, and are sprinkled from the front edge of the substrate 1. From the substrate 丨 Front end 32-83980 200404337 78 of pure water and medicine sprayed from the side edge of the self-recovery tank part 80 is separated and carried into the inner side of the side drain tank part 8 4; The liquid flows into the liquid discharge port 90 through the inside of the liquid discharge tank portion 84 on the inlet side of the width-wise partition. Then, 'from the liquid discharge tank part 82a, it flows into the liquid discharge pipe through the liquid discharge port 90,' and is discharged as waste liquid through the liquid discharge pipe 92. This substrate processing apparatus is also the same as the apparatus shown in FIG. The processing efficiency can be obtained without reducing the substrate! In addition, the components such as the liquid recovery piping 88, the recovery tank, the liquid delivery piping, and the pump are minimized from being contaminated by chemicals, and the purity of water can be reduced. The use amount and the amount of waste liquid are also small. In addition, FIG. 9 and FIG. 10 show another example of the first embodiment of the present invention, and FIG. 9 is a schematic plan view showing a schematic structure of a substrate processing apparatus, and FIG. FIG. 9 is a cross-sectional view viewed in the direction of the arrow X-X in FIG. 9. In the substrate processing apparatus, the structure and operation of the main part of the substrate processing are also the same as those of the previous apparatus described in FIG. 9, and therefore repeated description is omitted. The components marked with the same symbols as those used in FIGS. 1 to 3 in 9 and FIG. 〇 show the same components having the same functions as the components described above in FIGS. 1 to 3, and repeated descriptions are omitted here. In this substrate processing apparatus, each of the conveyance rollers arranged in parallel inside the water-washing treatment tank 10 is horizontally and separately supported, but it is not shown in the figure. As shown in FIG. 10, the substrate 1 is oriented horizontally. It is transported in the horizontal direction. Then, the substrate processing apparatus is provided with a pair of drainage pipes 94a and 94b in the water-washing treatment tank 10 along the transport direction of the substrate 1. The pair of drainage pipes 94a and 9 4b are disposed separately. Near the edges of the two sides of the substrate 1 being carried in a horizontal state at the position of 83980 -33-200404337. In addition, liquid discharge outlets 96a, 96b are formed at the bottom of each of the liquid discharge conduits 94a, 9 and each liquid. Liquid discharge pipes 98a and 98b are connected to the discharge ports 96a and 96b, respectively. In addition, a liquid recovery port is formed at the bottom of the water treatment tank 10, and a liquid recovery port is connected to the liquid recovery port 1⑽. Piping 丨 〇2. Therefore, similar to the device shown in FIG. 1 to FIG. 3, the liquid recovery piping 102 flow path is connected to a recovery tank for collecting the recovery liquid, and a filter and a pump are respectively connected to the recovery tank. Of One end of the liquid-feeding pipe, and the top end of the liquid-feeding pipe is connected to the pure water discharge nozzles 14 and 14a, but it is not shown in the figure. The substrate processing apparatus having the above structure is shown in FIG. When the substrate 1 passes the setting position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 14 to the substrate 1 flows to the two sides of the substrate 1 at the same time as the medicine 2 attached to the substrate 1, and then The two edges of the substrate 1 respectively flow down. In addition, part of the pure water discharged from the pure water discharge nozzle 14 to the lower side of the substrate 1 flows through both sides of the substrate 1 facing the substrate 1 and flows from both edges of the substrate 1 The mixed liquid of pure water and medicine flowing down from the two edges of the substrate 1 flows into each of the drainage conduits 94a, 94b, and flows into the drainage through the drainage outlets 96a, 96b from each of the drainage conduits 94a, 94b. The tubes 98a, 98b are discharged through the drain pipes 98a, 98b as waste liquid. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower surface side of the substrate 1 drips from the lower surface of the substrate 1 and flows into the bottom of the water-washing treatment tank 10. Then, a smaller amount of pure water recovered from the bottom of the water-washing treatment tank 10 flows from the bottom of the water-washing treatment tank 10 to the liquid recovery pipe 100 through the liquid recovery port 100 and passes through the liquid recovery pipe 10 2 Flow into the recovery tank. Then, the recovered liquid collected in the recovery tank is returned to the pure water discharge nozzles 14 and 14a through the 83980 -34- 200404337 liquid feeding pipe for reuse. In addition, when the substrate 1 does not pass the setting position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 14 directly flows into the bottom of the water-washing treatment tank 10 without passing through the substrate 1 surface. Much pure water recovered flowing into the bottom of the water treatment tank 10 and recovered from the bottom of the water treatment tank 10 through the liquid recovery port 100 flows into the liquid recovery pipe 102 and flows into the liquid recovery pipe 102 Inside the recovery tank. Then, the recovered liquid (pure water) collected in the recovery tank is returned to the pure water discharge nozzle 14 and 14a through the liquid-feeding pipe for reuse. At this time, there is almost no pure water flowing in and out of the drainage pipes 94a, 9 and the amount of waste liquid discharged from the drainage pipes 94a, 94b through the drainage pipes 9 8 a, 9 8 b is extremely small. This substrate processing apparatus is also the same as the apparatus shown in FIG. 5 and FIG. 6, and the processing efficiency of the substrate 1 is not reduced. In addition, the inside of the liquid recovery pipe 102, the recovery tank, and the liquid delivery pipe. The internal and other components can be contaminated by pharmaceuticals to a minimum. In addition, the amount of pure water can be reduced, and the amount of waste liquid is small. As shown in the embodiment shown in FIG. 7 and FIG. 8 and the embodiment shown in FIG. 9 and FIG. 10, when the substrate 1 is transported in a horizontal state in a horizontal direction, 7 angles 14 are sprayed from pure water to the substrate 1 The mixed liquid of pure water and medicine discharged from above may not easily flow on the substrate 1. In this case, as shown in the schematic side view of FIG. U, it is only necessary to form abutting on the central portion of the lower surface of the substrate 1, and the diameter of the conveying roller 104 supporting the substrate 1 is larger than the lower ends of the substrate 丨The diameter of the transporting rollers 106 and 106 supporting the substrate 1 may be a structure that supports and transports the substrate 丨 in a direction perpendicular to the transporting direction, such that the central portion is higher than both end portions. By forming such a structure, the mixed liquid of pure water from the pure water discharge nozzle 14 to the substrate 丨 -35-83980 200404337 and the medicine on the surface of the substrate are divided into the left and right at the center of the substrate 1 and do not stay on the substrate 1 on the substrate 1, and flows from the central portion to the two end portions on the substrate 1, and flows down from both edges of the substrate 1. In addition, as shown in the schematic side view of FIG. 12, a structure in which the pure water discharge nozzles 4 are arranged with their discharge ports facing both ends of the substrate 1 can be formed. The pure water is discharged from each of the pure water discharge nozzles 14 toward the surface of the substrate 1 and the substrate 1 is inclined toward both end portions in a direction perpendicular to the conveying direction to discharge pure water. Therefore, the pure water discharged from each pure water discharge nozzle 14 onto the substrate i Water forms flows to both ends, and pure water is mixed with the medicine, flows to both ends on the substrate 1, and flows down from the edges of the substrate 1. In addition, as shown in the schematic plan view of the substrate processing apparatus of FIG. 13, near the positions directly below the edge edges of the front and rear ends of the substrate 1 transported in the horizontal direction in the horizontal direction, respectively, along the vertical directions perpendicular to the transportation direction. A pair of auxiliary drainage ducts 108a and 108b are arranged in the direction to form a structure that supports the pair of auxiliary drainage ducts 108a and 108b in a horizontal movement in synchronization with the movement of the substrate 1. When a substrate processing apparatus having such a structure is transported to the substrate 1, the substrate 1 is discharged from the pure water discharge nozzle 14 onto the substrate 1, and the pure water used for cleaning the substrate 1 and mixed with the medicine is even from the front and back side edges of the substrate 1. While spraying separately, the mixed liquid of pure water and medicine sprayed from the side edges of the front and back sides of the substrate 1 flows into each of the auxiliary drainage pipes 108a and 108b, and is connected to each of the auxiliary drainage pipes 108a. , 108b's auxiliary drainage path (not shown) is discharged. In addition, in the first embodiment, a substrate processing apparatus provided with a water-washing processing tank 10 adjacent to the chemical processing tank 16 is described, but the present invention is also applicable to

83980 -36- 200404337 Substrate processing such as peeling It is used for other cleaning, developing, and engraving devices. < 2. Second Embodiment Mode > Next, a second embodiment of the present invention will be described with reference to FIG. 14 to FIG. 18. Figure M shows the second embodiment of the present invention, which is a schematic side view showing a schematic structure of a development processing apparatus of a substrate processing apparatus. In the development processing device, the structure and operation disk of the main part of the development processing of the development processing shown in FIG. 20 are the same. Therefore, the same components in FIG. 14 are marked with the symbols used in FIG. 20 and repeated description is omitted. In this development processing apparatus, a recovery tank portion 122 is formed below the development liquid discharge nozzle U6 to partition the inside of the development processing tank 110. Instead of forming the recovery tank portion 122, a recovery barrel (recovery container) may be disposed below the developing liquid discharge nozzle 116. In the recovery tank portion 122, when the substrate 丨 does not pass the position directly below the developing solution discharge nozzle 116, the developing solution discharged from the developing solution discharge nozzle 丨 6 is directly recovered without flowing through the substrate 1 surface ( (See Figure 15). A liquid recovery port 124 is formed on the bottom of the recovery tank portion 122 and flows into the inner bottom of the recovery tank portion 122 from the substrate 1. The liquid recovery port 124 is connected to the liquid recovery port 1 24 by a liquid recovery pipe 12. A liquid recovery pipe 126 is connected to a recovery tank 130 for collecting the recovered developing liquid 128 in the flow path. Further, one end of the liquid-feeding pipe 132 is connected to the recovery tank 130, and a developing liquid discharge nozzle 116 is connected to the top end of the liquid-feeding pipe 132. A pump 134 is inserted into the liquid feeding pipe 1 3 2 and a filter is inserted as necessary, but it is not shown in the figure. These liquid recovery piping 126, recovery tank 130, liquid feeding piping 132, and pump 1 3 4 constitute a liquid circulation system. 83980 -37- 200404337 In addition, as shown in FIG. 14, a liquid discharge port 136 is formed at the bottom of the development processing tank 110 and the recovery tank part 1 22. The liquid discharge port 136 is provided by the liquid removing roller 118 from the substrate. 1 is removed, etc., and the imaging fluid flowing from the substrate 1 into the development processing tank Π 0 flows out, and the liquid discharge port 1 36 is connected to a liquid discharge pipe 138. Further, a cleaning nozzle 14o is disposed inside the development processing tank 110, which discharges the cleaning liquid to the bottom surface of the development processing tank 110, and cleans the bottom surface of the development processing tank 110. In addition, a cleaning nozzle for cleaning components such as a conveyance roller and the like disposed inside the development processing tank 110 is also provided, but it is not shown in the figure. In the cleaning nozzle 140, a cleaning solution is supplied from a cleaning solution supply source. In the example shown in FIG. 4, a water-washing treatment tank provided at the bottom of the developing processing tank 11 〇 is formed with a drainage port 1 42 ′, which is used for cleaning the substrate 1 and flows into the water-washing processing tank. 11 4 The pure water at the inner bottom flows out, and a water recovery pipe 144 is connected to the drainage port 1 42. The flow path of the water recovery pipe 144 is connected to the water recovery tank 14 6 'The water washing treatment tank π 4 is used. Pure water 1 4 8 is collected in a water recovery tank 146. Then, one end of the water supply pipe 150 is connected to the water recovery tank 146, and the top end of the water supply pipe 150 is connected to the cleaning nozzle 140. The water recovery tank is connected to the water recovery tank through a pump 152 inserted in the water supply pipe 150. The pure water 148 in 146 is supplied to the cleaning nozzle 140. In the development processing device having the above structure, the development liquid 3 discharged from the development liquid discharge nozzle 丨 j 6 and directly flowing down from the substrate 1 surface is recovered in the recovery tank portion 1 2 of the development processing tank 110. Inside. The developing liquid recovered in the recovery tank portion 1 2 2 passes through the liquid recovery pipe 1 2 6 and flows into the recovery tank 1 3 0 to be collected. Then, the developer liquid 1 2 8 in the recovery tank 130 is sent to the developer liquid through the feed pipe 1 32 2 to the developer liquid 83980 -38- 200404337 and the discharge nozzle 1 1 6. Since the developing solution used in this way does not pass through the surface of the substrate 1, the developing solution does not contain insoluble matter, the inner surface of the recovery tank 1 30, the inner surface of the liquid recovery pipe 126, and the liquid feeding pipe 1 32. The inside of the pump 134 and the like are not contaminated with insoluble matter. In addition, the self-developing liquid discharge nozzle Π 6 is discharged onto the substrate 1, and the used developing liquid flowing into the bottom of the developing processing tank 110 from the substrate i is discharged from the liquid discharge port 136 through the drain pipe 138. . Therefore, the developer does not cause any problem even if it contains non-soluble matter. In addition, the inner bottom surface of the development processing tank 110 in contact with the used developing solution, and the liquid discharge pipe 138 are sent to the cleaning nozzle 14 through the water recovery pipe 146 through the water supply pipe 150 and self-washed. The pure water 148 discharged from the clean nozzle 140 is washed to prevent contamination. In addition, if a member in contact with the substrate 丨 does not intend to attach pure water to the liquid removing roller 118, such a member may be cleaned by using a treatment liquid. Fig. 15 shows an example of a cleaning mechanism of a development processing tank different from that shown in Fig. 14, which is a schematic side view showing a schematic structure of a 7F development processing apparatus. In FIG. 15, those with the same symbols as those used in FIG. 14 are the same members having the same functions as the above-mentioned members described in the figure, and repeated descriptions are omitted. In addition, FIG. 15 shows that the substrate 1 has not passed through the developing solution. At the position directly below the discharge nozzle 116, the developing solution 3 discharged from the developing solution discharging nozzle 116 directly flows down and is recovered in the recovery tank 130. The device shown in FIG. 15 is adjacent to the developing processing tank 154 The side of the water treatment tank 158 is high, and the side of the recovery tank 122 is low, so that the inner bottom surface 1 56 of the development processing tank Η # is inclined. Then, a cleaning nozzle 160 is set at a position where the water treatment tank 58 becomes high. The development processing tank with the 122 side lowered in the recovery tank section 54 bottom 83980 -39- 200404337 part forms a liquid discharge port 1 62, and the liquid discharge port 1 62 is connected to a liquid discharge pipe 1 64. In addition, it is subjected to water washing treatment Inside the tank i 58 is disposed a water recovery barrel 1 6 6 which is recovered from a transport path [that sandwiches a substrate], and a plurality of water spray nozzles 120 disposed on the upper and lower sides thereof are sprayed on the upper and lower sides of the substrate 1 Pure water. Water recovery bucket 1 6 6 At the position of the washing nozzle 160, the bottom of the water recovery bucket 16 and the washing nozzle 160 are connected by a water supply pipe 16 flow path. The water supply pipe 168 diverges in the middle as a water suction pipe 17o. An opening / closing valve 172 is inserted into the suction pipe 170. In addition, a drainage port 1 7 4 is formed at the bottom of the washing treatment tank} 58, and a drainage pipe 1 7 6 is connected to the drainage port 1 7 4. The device having the structure, the pure water recovered in the water recovery barrel 1 6 6 is sent to the cleaning nozzle 160 through the water supply pipe 168, and the cleaning nozzle 16 is directed to the inner bottom surface 1 of the development processing tank 1 5 4 Pure water is discharged from the upper part. Pure water discharged from the inner bottom surface 156 of the development processing tank 154 flows into the inner bottom surface 156 along the inclination of the inner bottom surface 156. Thus, the inner bottom surface 156 of the entire development processing tank 154 passes through The pure water is washed. Then, the pure water that has flowed to the vicinity of the recovery tank section 1 22 is discharged from the liquid discharge port 162 at the bottom of the development processing tank 154 through the drain pipe 164. Next, FIG. 16 shows a second type of the present invention. Another example of the embodiment is a schematic side view showing a schematic structure of a development processing apparatus In FIG. 6, those with the same reference numerals as those used in FIG. 14 are the same components with the same functions as the components described in FIG. 14, and repeated descriptions are omitted. The device shown in FIG. 16 'Midway the piping 178 for liquid discharge which is connected to the liquid discharge port 136 of the development processing tank 11 〇 is divergent, and the flow path at the top of the diverted return liquid pipe 180 is connected to the recovery tank 30 and discharged. The diverting position of the pipe 1 78 is used to insert the flow path switching valve 丨 82. In addition, the flow path 83980 -40-200404337 is split midway between the price 130 and the developing liquid discharge nozzle 116. The distal end of the branched cleaning liquid feeding pipe 184 is connected to the cleaning nozzle M0 in communication. Then, an on-off control valve 186 is inserted into the washing liquid feeding pipe 184, and an on-off control valve 188 is inserted into a water feeding pipe 150 that connects the water recovery tank 146 and the washing nozzle 140 to the flow path. The device not constructed by Ba Bei Figure 16 is self-board! When inflow into the development processing tank 1⑺ < In the bottom of the used development solution contains no insoluble matter, such as when the development process covers the substrate of the dissolving green coating mold, etc., the flow path switching valve 182 is switched and operated. In a state where the drain pipe 178 is in communication with the return liquid pipe 180, the used developing liquid flows from the drain pipe 178 to the return liquid pipe 180. At this time, by closing the on-off control valve 1 88 interposed in the water-supplying pipe 15, it is possible to prevent the used developing solution from being mixed with pure water. In this way, the used developer system is passed through the drain pipe 1 7 8 and the liquid return pipe! 80% was recovered into the recovery tank 130. Then, when the used developing solution is placed on the substrate and not directly below the developing solution discharge nozzle 116, the developing solution discharge nozzle ij 6 is discharged and directly flows down 'and recovered to the developing image in the recovery tank 130. The fluid is recycled together. At this time, when it is necessary to clean the bottom surface of the development processing tank 1 10, etc., open the opening and closing control valve 186 inserted in the cleaning liquid feeding pipe 184, and recover one of the development liquid 1 28 in the recovery tank 130. Shao Fen is sent to the washing nozzle 140 through the washing liquid feeding pipe 184, and the developing liquid is discharged from the washing nozzle 140 to clean the bottom surface and the like in the developing processing tank 丨 j 〇. In addition, if the type of the substrate to be processed is changed, the non-dissolved matter contained in the used developing solution flows from the substrate 1 into the bottom of the developing processing tank 110. For substrates of coating molds, etc., switch between 83980 -41-200404337 for liquid discharge pipe 1 78 and liquid return

You can also use pure water and treatment solution together to operate the flow path switching valve 1 82, 180. When the flow path switching valve 1 82, 180 is not connected, insert it into the opening / closing control sample of the water supply pipe 1 50. 'F nozzle 1 4 will be used in the water treatment tank 11 4 0, perform imaging with the pure water. In addition, when the used developing solution is discharged, the bottom surface and the like of the developing processing tank 110 are washed. "Figure 17 shows an example in which various developing liquids are used to set the developing liquid discharge mouth, which is a schematic side view showing a schematic structure of a developing processing device. In Fig. 17, Kuang 1 and Fig. 14 and Those with the same symbols in Figure 6 are the same components that have the same functions as the components described in Figure 14 and Figure 16, and duplicate descriptions are omitted. Figure 17 The imaging fluid used by the device not shown in Figure 7 There are two developing liquid discharge nozzles 11 6a, 11 6b, and two recovery tanks 122 a, 122b are formed in the developing processing tank 1! 0 according to the developing liquid type. In addition, depending on the developing liquid type There are a liquid circulation system and a developing liquid washing system. The symbols used in Figure 7 are explained below, where 124a and 124b are liquid recovery ports, 126a and 126b are liquid recovery pipes, and 130a and 130b are respectively recovered and collected. Recovery tanks for different types of imaging liquids 128a, 128b, 132a, 132b are piping for liquid delivery through pumps 134a, 134b, and 136a, 136b are liquid discharge ports. In addition, 178a, 178b are piping for liquid discharge, 180a and 180b are liquid return pipes 1 82a and 1 82b are flow path switching valves, and 1 84a and 1 84b are pipings for cleaning and delivering liquid, which are respectively opened and closed 83980 -42- 200404337 control valves 186a and 186b. In addition, liquid recovery pipes 126a and 26b Opening and closing control valves 190a, 190b, 192a, and 192b are respectively inserted in the piping 178a and 17 讣 for liquid discharge. The device shown in Fig. 17 is opened and closed by inserting the liquid recovery pipes 126a and 126b respectively. One of the control valves 190a, 190b, and close the other, and open one of the opening and closing control valves 192a, 192b inserted in each of the drainage pipes 1 7a, 1 7b, and close the other, according to The type of developing liquid used is to perform the above-mentioned processing operation in the device shown in Fig. 16. In addition, Fig. 18 shows that other developing liquids that can be used for processing operation are other conventional complaints. It is a developing processing device. A schematic side view of a schematic structure. Those in FIG. 18 marked with the same symbols as those used in FIGS. 14, 16, and 17 are the same members having the same functions as the members described in FIGS. 14, 16, and 17. , And its repeated description is omitted. There is only one developing liquid discharge nozzle 1 丨 6, and for different types of developing liquid, the developing liquid discharge nozzle i 丨 6 is shared. In addition, only one recovery tank portion is formed in the developing processing tank 110. 22, and different types of developing liquid are recovered through the same recovery tank Shao 12 2. Then, the liquid feeding pipes 13 are connected to the liquid feeding pipes 1 3 2 connected to the developing liquid discharge nozzle 116. 2a and 132b are combined, and the liquid feeding pipes 132a and 132b are respectively connected to recovery tanks 130a and 130b for recovering and collecting different types of developing liquids 128a and 128b. In addition, the liquid-feeding pipe 132 is branched near the top end, and a bypass pipe 1 94 connected to the developer discharge nozzle 116 is connected to the downstream side and the bypass pipe 1 94 at the branching position of the liquid-feeding pipe 1 32. Opening-closing control valves 196a and 196b are respectively inserted above. In addition, 1Ϊ is formed at the bottom of the recovery tank portion 122. 83980 -43-200404337 A liquid discharge port 198 'is connected to the liquid discharge port 198, and an outlet pipe 900 is connected to the liquid discharge pipe 198. An opening and closing is inserted into the liquid discharge pipe 900. Between ^. The device shown in FIG. 18 is also opened and closed in the same manner as the device shown in FIG. 17 with the π Xiang_ 1 lower meaning device inserted through each of the liquid recovery deployments A κ k, e 126a, and 126b. Control one side of 190a, 190b, and close the other side, close the other side, and open the opening and closing control valve 192a, 19 holes, which are inserted in each drainage pipe 178a, 178b. The type of the developing solution is shown in FIG. 16 to perform the above-mentioned processing operation on the Z device 2. Then, when the type of the developing liquid is changed, the device opens the on-off valve 902 inserted in the liquid discharge pipe 900 to discharge the two developing liquids remaining in the recovery tank Shao 122. And by opening the opening and closing control valve 196b interposed in the bypass pipe 1 94, the flow of the developing liquid supplied to the developing liquid discharge nozzle 116 is increased to shorten the time required for liquid replacement and improve the processing efficiency. At the end of the liquid ° replacement, the on-off valve 902 inserted in the liquid discharge pipe 900 and the on-off control valve 196b inserted in the bypass pipe 194 are closed, respectively. In addition, in the second embodiment described above, for the collection and recovery of the processing liquid I recovery tanks 130, 130a, and 130b, a management device for managing the components of the processing liquid in the recovery tanks 130, 130a, and 130b should be attached. If the management device is an imaging processing device, the processing liquid in the recovery tanks 13, 13a, and 13b is analyzed, and the components of the developing liquid (such as TMAH) and the dissolved photoresist (resin) are measured respectively. When the concentration of each component is different from the required value, the new liquid and high-concentration liquid of the developing solution must be added to the treatment liquid in the recovery tank 13o, 3a, 13b. Or, if necessary, dispose of the treatment liquid in the recovery tanks 13a, 13a, and 13b, and perform the action of keeping the values within the required range. Alternatively, it is also possible to replenish a certain amount of new liquid at a specific time of 83980-44-200404337 for the treatment liquid in the recovery tanks 130, 13 0a, 130b, or to discard only a certain amount of the recovery tanks 13〇, i3〇1 After the treatment liquid in 3Ob, a certain amount of new liquid is replenished. During the development process, if the same processing solution (development solution) is continuously circulated and used continuously, the development solution will deteriorate due to contact with the air due to the circulating operation of the development solution and the photoresist will dissolve in the development solution. The developing solution is gradually deteriorated in the liquid, so it is advisable to attach a management device as described above. However, when the developing solution is used in the case where the recovered developing solution is used to clean the processing tank, the developing solution is particularly liable to deteriorate. It is especially suitable to set up management devices as described above to prevent pollution and deterioration in the above-mentioned places. In addition, in the second embodiment, when an insoluble matter is generated, and when an insoluble matter which affects the use of a processing liquid for silver-plating is generated, specifically, it corresponds to a development process such as coating to form an organic flattening agent. Coating liquid for film or color filter photoresist for substrate. In general, the coating pattern formed by the coating liquid for forming an organic flattening film and ocher green does not peel off even after the subsequent process. Conversely, when non-dissolved matter is not generated, and when non-dissolved matter which is affected by the recycling of the treatment liquid is not generated, specifically, the tongue is equivalent to the imaging process, such as coating with a general positive and negative photoresist Etc., the substrate of the coating solution completely dissolved in the developing solution. Generally, the positive photoresist and negative photoresist are subjected to a dicing process for the formed film pattern in a subsequent process. In addition, in the second embodiment, the development processing apparatus is described. However, the present invention is also suitable for a substrate processing apparatus that performs processing such as cleaning, scouring, and peeling using ozone water or the like. [Effects of the invention] 83980 -45 · 200404337 / In the case of using the substrate processing apparatus of each of the inventions of patent patent No. 丨, 2, 4, 8 and 9, it can maintain high utilization efficiency of the treatment liquid such as pure water and reduce Handle the amount of funeral, and the amount of liquid is small. In addition, the M heart rate of the substrate can be maintained and the cold dyeing of each member of the liquid circulation path can be suppressed to a minimum. The substrate processing apparatus of the invention claimed in claim 3 can surely discharge the waste liquid flowing toward the lower side of the substrate and flowing down from the edge of the substrate. '' 'The substrate processing device of the invention applying for the fifth item of the patent scope can surely discharge the used processing liquid that flows to both sides of the substrate and flows down from both edges of the substrate as waste liquid.基板 The substrate processing device of the invention claimed in item 6 of the patent scope can discharge the liquid spilled from the front edge of the substrate near the entrance of the substrate 'as a waste liquid. The substrate processing device of the invention claimed in item 7 of the patent scope can discharge the liquid sprayed from the edge of the front end of the substrate and the used processing liquid flowing into the draining tank portion near the carrying inlet of the substrate as waste liquid. The substrate processing device of the invention with the scope of patent application No. 10 & U can discharge from the processing liquid discharge mechanism to the substrate, and the processing liquid used for the substrate processing does not stay on the substrate, but flows to both ends of the substrate. And flow down from the edge of the substrate. The substrate processing device of the invention with the scope of application for the patent No. 12 can discharge the used processing liquid, which is sprinkled from the front and back side edges of the substrate, as waste liquid when the substrate is transferred. The substrate processing device of the invention claimed in item 13 of the patent scope can be used in the treatment tank 83980 -46-200404337 to apply the medicine attached to the substrate in the treatment tank, and remove it from the substrate in the water treatment treatment tank. Reduce the use of pure water in the water replacement process. The substrate processing device _ for the invention of the 14th invention filed for patent II ®, because the processing liquid can be circulated for substrate processing at the same time, and only the liquid used for processing can be separated and discharged. Therefore, the utilization efficiency of the processing liquid can be maintained, and No problems occur in the circulatory system. Therefore, no complicated control is required during processing. The substrate processing device of the invention claimed in claim 15 can prevent the internal wall surface or the components inside the processing tank from being contaminated. The substrate processing device of the invention in claim 16 of the patent scope can save the cleaning liquid for preventing the inner wall surface of the processing tank or the components inside the processing tank from being contaminated. 2. The substrate processing device of the invention claimed in item 17 of the scope of the patent application, due to the different types of substrates, when the used processing solution does not contain non-dissolved substances, the used processing solution can be used by laminating, so the processing can be reduced. The amount of liquid used. According to the invention of the eighteenth patent, the substrate processing device of the invention, because the type of the substrate is different, when the used processing liquid does not contain insoluble matter, the used processing liquid can be used throughout, so the processing liquid can be reduced. Its usage. Therefore, when the used processing liquid flowing down from the substrate is recycled, the processing liquid used for cleaning the inner wall surface of the processing tank or the components inside the processing tank can also be recycled, which can be used for substrate 'processing and cleaning the internal wall surface of the processing tank. Therefore, the processing liquid (washing liquid) can also be saved. The substrate processing device of the invention applying for item 19 of the patent range is used for substrate processing because it does not circulate the processing liquid of 5 to 5 dyes or deteriorate, so the processing quality of the substrate can be maintained. 83980 -47 · 200404337 [Brief description of the drawing] | ^ | 1 γ hand g head 1 ~ 717 A schematic plan view of a schematic structure of a substrate processing apparatus as an example of the first embodiment of the present invention. FIG. 2 is a cross-sectional view viewed from the direction of arrows 1 to 11 in FIG. 1. Figures () '(b) are cross-sectional views as viewed from the direction of arrows ΗZ-ΗΙ in Figure 1. "Back". ≫ A schematic plan view showing a schematic structure of a substrate processing apparatus according to another example of the first embodiment of the present invention. Figs. Are schematic plan views showing a schematic structure of a substrate processing apparatus according to another example of the first embodiment of the present invention. Fig. 6 is a cross-sectional view viewed from the direction of arrows VI-VI in Fig. 5. Θ is a schematic plan view showing a schematic structure of a substrate processing apparatus according to another example of the first embodiment of the present invention. Fig. 8 is an arrow VIII-VIII from Fig. 7 Sectional view viewed from the direction. Fig. 9 is a schematic plan view showing a schematic structure of a substrate processing apparatus according to another example of the first embodiment of the present invention. Fig. 10 is a cross-sectional view viewed from the direction of arrows XX in Fig. 9 When the 7F conveys the substrate in a horizontal state, the pure water discharged onto the substrate easily flows to a part of the substrate processing apparatus of the structural example used for the substrate. Fig. 12 also shows pure water discharged onto the substrate. A schematic side view of a part of a substrate processing apparatus of another configuration example that is easy to flow to a substrate. Fig. 13 is a schematic plan view showing a modification of the substrate processing apparatus shown in Fig. 9 FIG. 14 is a schematic side view showing a schematic structure of a development processing device of a processing device of 83980 -48- 200404337, which is an example of the second embodiment of the present invention. A schematic side view of a schematic structure of a development processing apparatus of an example of the tank cleaning mechanism different from that shown in Fig. 14. Fig. 16 is a schematic construction of a development processing apparatus showing another example of the second embodiment of the present invention. Fig. 11 is a schematic side view showing the schematic structure of a development processing device in which various developing liquids used in the second embodiment are provided with a developing liquid discharge nozzle. Figure 18 shows a second embodiment. Various side views of a schematic structure of a development processing apparatus of other examples in which various developing liquids can be used for processing. Fig. 19 A side view showing a schematic structure of a conventional substrate processing apparatus. Fig. 20 A mode display A side view of a schematic structure of a conventional development processing apparatus. [Description of Representative Symbols] 1 Substrate 2 Chemical 3 Development solution 10 Washing treatment tank 12 Carrying inlet 14 Pure water discharge nozzle 16 Medicine treatment tank 18 Medicine discharge nozzle 20, 46, 76a, 7 6b Separator 22, 78 Width separator 83980 -49- 200404337 24, 48, 80 26, 50, 82a, 82b 28, 72, 86, 100 30, 74, 88, 102 32 34 36 42, 68, 90, 96a, 96b 44, 70, 92, 98a, 98b 66, 94a, 94b 84 104, 106 108a, 108b 110, 154 114, 158 116, 116a, 116b 118 120 122, 122a, 122b 124, 124a, 124b 126, 126a, 126b 128, 128a, 128b Liquid recovery port liquid recovery port liquid recovery port liquid recovery pipe recovery liquid recovery pipe Liquid discharge port Drain pipe Drain pipe Carry-in side side Drain tank part transfer drum Auxiliary drain duct Imaging treatment tank Washing treatment tank Imaging liquid discharge nozzle Dewatering drum water spray nozzle Recovery tank part Liquid recovery port Liquid recovery port Developed liquid for piping recovery-50- 83980 200404337 130, 130a, 130b Recovery tanks 132, 132a, 132b Pipes 134, 152, 134a for liquid delivery, pumps 134b 136, 162, 136a, liquid discharge ports 136b 138, 164, 178 , 178a, 178b 140, 160 drain nozzle for liquid discharge 1 42 Drain outlet 144 Water recovery piping 146 Water recovery tank 148 Recovered pure water 150 Water supply piping 156 Inner bottom surface of the processing tank 166 Water recovery tank 168 Water supply piping 180, 180a, 180b Liquid return piping 182, 182a 182b Flow path switching valves 184, 184a, 184b Pipes for cleaning and feeding 1 86, 1 88, 1 86a, On-off control valves 186b, 190a, 190b, 192a, 192b, 196a, 196b 83980 -51-200404337 194 Bypass Pipe 98 Liquid discharge port 900 Liquid discharge pipe 902 On-off valve 83980 -52-

Claims (1)

200404337 Scope of patent application: 1 A substrate processing device, which is attached to the processing; ft + e,, and the price of the substrate is transported by the transport mechanism in a horizontal direction, while the processing liquid ^ ^ r is discharged from the complaint mechanism The liquid is processed on the substrate by a substrate, which is characterized by a liquid circulation system and is located in the district. "You ^ knife δ is set again. The recovery path is also collected and discharged from the aforementioned processing liquid discharge mechanism. ,, Π ,, · Nita substrate liquid directly flowing down from the substrate surface, and the drain path, which is collected from the aforementioned processing liquid discharge mechanism and discharged onto the substrate, on the substrate, in a direction that is straight to the substrate. End flow 'Self-relaxing edge'> 'Under the cloud' / Hit m on y,. 豕 逯 machine used used processing liquid; return the processing liquid recovered in the aforementioned recovery path to the aforementioned processing liquid discharge mechanism 'and have The liquid discharge path is used to discharge the used processing liquid collected in the aforementioned liquid discharge path. 2 · A substrate processing device which transfers the substrate in a horizontal direction by a transfer mechanism in a processing tank, and simultaneously removes the processing liquid from the processing liquid. The discharge mechanism discharges the processing liquid from the substrate to process the substrate, and is characterized by having a liquid circulation system for transferring the substrate in a state inclined to a horizontal plane in a direction perpendicular to the substrate conveying direction by the aforementioned conveying mechanism, and Near the position directly below the lower side edge of the substrate that is slanted and transported on the inner bottom surface of the processing tank, a partition plate is set up along the substrate transport direction to separate the inner bottom of the processing tank with the partition plate and divide into: a recovery tank And a liquid discharge tank unit for collecting the processing liquid discharged from the processing liquid discharge mechanism to the substrate and flowing to the lower side of the substrate. The used processing liquid from the edge; and recovered in the aforementioned recovery tank portion 83980 trays 1. < The processing liquid is returned to the processing liquid discharge mechanism, and has a liquid discharge path, which discharges and flows into the liquid discharge tank portion For example, the substrate processing device of the scope of patent application No. 2, wherein the substrate with the upper end of the aforementioned partition plate closer to the inclined conveyance is more A substrate processing device is arranged in a processing tank to transfer a substrate in a horizontal state to a horizontal direction by a conveying mechanism, and at the same time, a processing liquid is discharged from the processing liquid discharge mechanism to the substrate to process the substrate. It is equipped with a liquid circulation system, which is located near the positions directly below the edges of the two sides of the substrate being transported on the inner bottom surface of the aforementioned processing tank, and the partitions are erected along the substrate transporting direction and separated by each partition. The inner bottom of the processing tank is divided into: a recovery tank part, which recovers the processing liquid discharged from the aforementioned processing liquid discharge mechanism and directly flows down from the substrate surface; and a pair of night tanks, which are discharged from the processing liquid. The mechanism discharges the used processing liquid to the substrate, flows to both sides of the substrate, and flows down from the two edges respectively; and returns the processing liquid recovered in the recovery tank portion to the processing liquid discharge mechanism, and has a liquid discharge path, It is used to discharge the used treatment liquid flowing into each of the above-mentioned liquid discharge tank portions. For example, the substrate processing apparatus according to the scope of patent application No. 4 is arranged in such a manner that the upper ends of the aforementioned separators are close to the edges of both sides of the substrate being transported. For example, the substrate processing device f in any one of the items 2 to 5 of the scope of application for a patent, wherein the substrate carrying inlet side on the inner bottom surface of the aforementioned processing tank is provided with a widthwise interval along the direction where 耆 intersects the substrate carrying direction. The plate partitions the inner bottom of the processing tank with its 200404337 width direction partition to form a carrying-in-side draining tank portion, which stores the liquid spilled from the edge of the front end of the substrate carried into the processing tank, and also discharges and flows into it. Treatment liquid in the mouth side drainage tank. 7. The substrate processing apparatus according to item 6 of the patent application, wherein the carrying-in-side draining tank portion is communicated with the draining tank portion. 8. A substrate processing apparatus for processing a substrate in a processing tank by carrying the substrate in a horizontal direction by a transport mechanism, and simultaneously discharging the processing liquid from the processing liquid discharge mechanism onto the substrate to process the substrate, characterized in that: a liquid circulation system is provided. By the aforementioned conveying mechanism, the substrate is conveyed in a state inclined to the horizontal plane in a direction perpendicular to the substrate conveying direction, and near the position directly below the lower edge of the substrate in the inclined conveyance inside the processing tank, along the substrate A liquid discharge duct is horizontally arranged in the conveying direction, and the liquid discharge pipe is stored on the substrate and discharged from the processing liquid discharge mechanism to the lower side of the substrate, and the used processing liquid flowing down from the edge is discharged from the processing liquid discharge mechanism. The processing liquid recovered at the bottom of the processing tank without being directly flowed down from the substrate surface is returned to the processing liquid discharge mechanism, and is provided with a liquid discharge path for discharging the used processing liquid flowing into the liquid discharge duct. 9. A substrate processing device for processing a substrate in a processing tank by a conveying mechanism in a horizontal state and conveying the substrate in a horizontal state, and at the same time discharging the processing liquid from the processing liquid removal mechanism onto the substrate to process the substrate, characterized in that: it has a liquid circulation The system is located near the positions directly below the edges of the two sides of the substrate inside the aforementioned processing tank, and a pair of drainage pipes are set up along the direction of the substrate #, I, and are transported from the aforementioned processing. Liquid discharge mechanism to SII 83980 200404337 The used processing liquid discharged from the substrate, flowing to both sides of the substrate, and flowing down from the two edges respectively, and will be discharged from the aforementioned processing liquid discharge mechanism, and directly flow down without going through the substrate surface. 'Recovered in the aforementioned processing tank The processing liquid at the inner bottom is returned to the processing liquid discharge mechanism, and is provided with a liquid discharge path for discharging the used processing liquid which is respectively sludged into each of the liquid discharge ducts. 10. The substrate processing device according to item 4, 5, or 9 of the scope of the patent application, wherein the above-mentioned conveying mechanism is in a direction perpendicular to the substrate conveying direction, with the center of the substrate south of the substrate and the two ends of the substrate. Support and carry the substrate. 11. The substrate processing apparatus according to claim 4, 5, or 9, wherein the two ends of the substrate are positioned on the substrate from the processing liquid discharge mechanism to the substrate, and the substrate surface faces the direction perpendicular to the substrate conveyance direction. Tilt each to discharge the treatment liquid. 1 2. The substrate processing device according to item 4, 5, or 9 of the scope of the patent application, which has an auxiliary liquid discharge path, which is located on the side edges of the front and rear ends of the substrate carried by the aforementioned carrying mechanism. Near the position directly below, a pair of auxiliary drainage ducts are arranged along the direction perpendicular to the substrate conveying direction, which are used to store the used treatment liquid sprinkled from the front and back side edges of the substrate to synchronize with the movement of the substrate The pair of auxiliary drainage conduits are supported in a horizontally moving manner, and the used treatment liquid flowing down into each of the aforementioned auxiliary drainage conduits is discharged. 13. If the patent scope please! 83980 200404337 The substrate processing device of item, wherein the aforementioned processing tank is a water-washing processing tank for washing the substrate with pure water, and is provided with a medicine processing tank, which is adjacent to the side of the substrate-carrying inlet of the water-washing processing tank; 14. 15. 16. 17. 18. Physical substrate. A substrate processing device is used for processing substrates in a processing tank while discharging the processing liquid onto the substrates from a processing liquid discharge mechanism, and is characterized in that: a processing liquid circulation mechanism is provided for forming a recovery tank part; The processing liquid discharged from the processing liquid discharge mechanism is separated from the inside of the processing tank, and the processing liquid directly flows down from the substrate surface. In addition, a recovery container is arranged below the processing hard discharge mechanism, which is collected from the processing liquid discharge mechanism. Discharge the processing liquid directly flowing down from the substrate surface, and return the processing liquid recovered in the recovery tank or the recovery container to the processing liquid discharge mechanism to circulate the processing liquid; and set a liquid discharge path, which is discharged from the The processing liquid discharge mechanism discharges onto the substrate, and the used processing liquid flows into the inner bottom of the processing tank from the substrate. For example, the substrate processing device of the scope of application for patent No. 14 includes a cleaning mechanism, which uses a cleaning liquid to clean the inner wall surface of the aforementioned processing tank or the components inside the processing tank that are in contact with the used processing liquid flowing down from the substrate. . For example, the substrate processing device of the scope of application for patent No. 15, in which a water washing processing tank for cleaning the substrate with pure water is provided adjacent to the processing tank, and the pure water used in the water washing processing tank is used by the foregoing cleaning mechanism as a cleaning liquid. . For example, in the substrate processing apparatus of any one of the scope of application for patents Nos. 14 to 16, the liquid discharge path is divided, the branch flow path is connected to the processing liquid circulation mechanism, and the flow path switching mechanism is inserted at the branch position. . For example, the substrate processing device of the 15th patent application, in which the above-mentioned row 83980.doc 200404337 fluid path is diverged, the divergent path flow path is connected to the aforementioned processing liquid circulation mechanism, and the flow path switching mechanism is inserted at the divergent position. When the used processing liquid flowing down from the substrate is passed through the liquid discharge path and sent to the processing liquid circulation mechanism through the branch path to recycle the used processing liquid, the cleaning mechanism uses the processing liquid as a cleaning liquid. 19. The substrate processing apparatus according to item 14 of the scope of application for a patent, wherein a tank for collecting the processing liquid recovered in the aforementioned recovery tank section or the recovery container is provided, and the S tank is provided with a management device for managing the composition of the processing liquid in the tank. 83980