CN108526097A - Substrate cleaning apparatus - Google Patents
Substrate cleaning apparatus Download PDFInfo
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- CN108526097A CN108526097A CN201810402206.5A CN201810402206A CN108526097A CN 108526097 A CN108526097 A CN 108526097A CN 201810402206 A CN201810402206 A CN 201810402206A CN 108526097 A CN108526097 A CN 108526097A
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- Prior art keywords
- water
- direct
- substrate
- ejected wash
- washing room
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
- B08B3/022—Cleaning travelling work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/14—Removing waste, e.g. labels, from cleaning liquid; Regenerating cleaning liquids
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1316—Methods for cleaning the liquid crystal cells, or components thereof, during manufacture: Materials therefor
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- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The present invention provides a kind of substrate cleaning apparatus,Partition member by the way that frame shape is arranged marks off direct washing area and transition washing area in direct washing room,And the first recovery holes and the second recovery holes are respectively set to be recycled to used ejected wash water in the direct washing area bottom of direct washing room and transition washing sections bottom,Used ejected wash water in direct washing room can be divided into photoresist and foreign matter concentration height and low two parts,And optionally separately recycling uses,The high ejected wash water of purity can be directly entered direct water cyclic water tank from the first recovery holes,And photoresist and the high ejected wash water of impurity concentration then can selectively be recovered to direct water cyclic water tank or displacement water cyclic water tank by the second recovery holes,So as to effectively improve the service life of filter,And then improve the rate of transferring of equipment,Reduce producing line production cost.
Description
Technical field
The present invention relates to the processing procedure field of display more particularly to a kind of substrate cleaning apparatus.
Background technology
In display technology field, liquid crystal display (Liquid Crystal Display, LCD) and Organic Light Emitting Diode
The flat-panel monitors such as (Organic Light Emitting Diode, OLED) display gradually replace CRT monitor, extensively
General is applied to LCD TV, mobile phone, personal digital assistant, digital camera, computer screen or laptop screen etc..
Display panel is the important component of LCD, OLED.Whether the display surface of the display panel of LCD or OLED
Plate usually all has a thin film transistor (TFT) (Thin Film Transistor, TFT) substrate.By taking the display panel of LCD as an example,
It is mainly film (Color Filter, CF) substrate by TFT substrate, coloured silk and the liquid crystal layer and sealing frame that are configured between two substrates
Glue (Sealant) is constituted, and moulding process generally comprises：Leading portion array (Array) processing procedure (film, yellow light, etching and stripping
Film), stage casing is at box (Cell) processing procedure (TFT substrate is bonded with CF substrates) and back segment module group assembling processing procedure (driving IC and printing electricity
Road plate pressing).Wherein, leading portion Array processing procedures mainly form TFT substrate, in order to control the movement of liquid crystal molecule；Stage casing
Cell processing procedures mainly add liquid crystal between TFT substrate and CF substrates；Back segment module group assembling processing procedure mainly drives IC pressings
With the integration of printed circuit board, and then drive liquid crystal molecule rotation, show image.
At present in FPD manufacturing process, cleans, goes water drying, coating, prebake conditions, exposure, development and rear baking
It is the main process unit of yellow light processing procedure, wherein the effect of cleaning unit is the dust granules removed on glass substrate
(Particle), it is to remove the hydrophobicity of moisture and increase surface on substrate to go the effect of water drying unit, coater unit
Effect is one layer of photoresist of painting on substrate, and the effect of prebake conditions unit (its normal temperature is 90-130 DEG C) is except in removing photoresistance
Solvent and the adhesion for increasing photoresist and substrate, the effect of exposing unit are defined to photoresist on substrate using light shield (MASK)
Figure, the effect of developing cell are so that photoresist is left specific pattern on substrate and show figure, and the rear effect for toasting unit makes
Patterned photoresist further cures on the glass substrate.
Manufacturing process for cleaning before coating is high to the purity requirements of substrate, especially for low temperature polycrystalline silicon (Low
Temperature Poly Silicon, LTPS) processing procedure, the dust more than 1 μm remain on substrate will result in coating it is bad,
Therefore thoroughly clean up substrate surface before requiring coating, it, can be by the used water in rear end through filter because water consumption is larger
(Filter) leading portion use is supplied to after filtering.And developing manufacture process will produce largely due to the chemical reaction of photoresist and developer solution
Photoresist residue needs just clean up by two sections of washing processing procedures of displacement washing and straight washing, first in replacing washing room
It carries out liquid to rigid treated substrate interarea supply ejected wash water and utilize the liquid on ejected wash water displacement substrate, then direct
Pure water is supplied to the interarea of substrate in washing room and wash substrate, use pure water when cleaning base plate in direct washing room at this time
The water used in direct washing room is recovered to by (new water) in cleaning base plate in replacing washing room after Filter is filtered
Water in cyclic water tank is used as the water of ejected wash water (recirculated water), thus saves the usage amount of pure water；Cleaning before coating and development
Section washing can use Filter, in actual production, because development section recycling water in the concentration containing photoresist compared with
Height, develop section used in the Filter service life be often below average life (3 months), especially for flatness layer (PLN) make
Journey, Filter service lifes were less than 1 month, and Filter is expensive, and frequently replacement Filter can reduce the equipment rate of transferring,
Influence production capacity.Therefore existing washing water recovering mechanism need to be improved, the photoresist concentration in recycle-water is reduced, to improve Filter's
Service life reduces producing line production cost.
Invention content
The purpose of the present invention is to provide a kind of substrate cleaning apparatus, can effectively improve the service life of filter and then carry
The high equipment rate of transferring reduces producing line production cost.
To achieve the above object, the present invention provides a kind of substrate cleaning apparatus, including washing process room, transport mechanism and clear
Wash water feed mechanism；
Wherein, the washing process room include the laid out in parallel successively on substrate direction of transfer displacement washing room and directly
Washing room；
The transport mechanism is for transmitting substrate and running through the displacement washing room and direct washing room；
The ejected wash water feed mechanism is used to supply ejected wash water, the ejected wash water feed mechanism to the substrate transmitted
Include for substrate surface cleaning showers water multiple spray tubes and giving for conveying cleaning solution to the multiple spray tube
Liquid unit；
Bottom is equipped with partition member in the direct washing room, and the partition member is frame shape, and the partition member is in institute
State marked off in direct washing room corresponding in the partition member positioned at the direct washing area at middle part and corresponding to described
The transition washing area positioned at the direct washing area periphery outside partition member；
The direct washing room is respectively equipped with the first recovery holes in direct washing area bottom and transition washing sections bottom
With the second recovery holes, the displacement washing room bottom is equipped with third recovery holes；
The liquor charging unit has the direct water cyclic water tank and displacement water cyclic water tank for recovery and rinsing water；
The direct washing room in direct washing area used ejected wash water by the first recovery holes be assigned to
Direct water cyclic water tank；
The direct washing room in transition washing area used ejected wash water by the second recovery holes by selectivity
Distribution is to direct water cyclic water tank or replaces water cyclic water tank；
Used ejected wash water is assigned by third recovery holes to displacement water cyclic water tank in the displacement washing room；
The ejected wash water recycled in the direct water cyclic water tank is supplied in a plurality of spray tube by the liquor charging unit
A part to be cleaned to substrate, the liquor charging unit is supplied to pure water as ejected wash water in a plurality of spray tube
Another part is to clean substrate.
The transport mechanism has the loading end for bearing substrate, if the direction that the transmission device transmits substrate is
First direction, direction vertical with the first direction and parallel with the loading end of the transmission device is second direction, described
The loading end of transmission device with respect to the horizontal plane continuously decreases and oblique in a second direction, to incline to substrate
Inclined transmits.
The angle that the loading end of the transmission device is inclined relative to horizontal is 10-20 °.
The partition member is located in direct washing room below the transport mechanism, and the height of the partition member is not
Influence the operating of the transport mechanism above it.
The multiple spray tube includes being set to the displacement to wash indoor multiple displacement water sprayer tubes and set on described straight
In water receiving chamber wash on substrate direction of transfer multiple transition spray tubes of laid out in parallel and multiple direct water sprayer tubes successively；
The ejected wash water recycled in the direct water cyclic water tank is supplied to the displacement water sprayer tube by the liquor charging unit
And transition spray tube, to be cleaned to substrate, pure water is supplied to the direct water spray by the liquor charging unit
Pipe is to clean substrate.
The liquor charging unit by the ejected wash water in the direct water cyclic water tank send to the displacement water sprayer tube and
The drive access of transition spray tube is equipped with filter.
The liquor charging unit is equipped with is sent to the drive access of the direct water cyclic water tank with to from described straight by pure water
The ejected wash water of water receiving chamber wash recycling is diluted.
Each spray tube is equipped with multiple nozzles, and each spray tube is sprayed by multiple nozzles thereon to substrate surface
Ejected wash water.
The direct washing room in transition washing area used ejected wash water by three-way switch valve in direct water
It is selectively transmitted between cyclic water tank and displacement water cyclic water tank.
The substrate cleaning apparatus is used for the developing manufacture process in display panel manufacturing process.
Beneficial effects of the present invention：The substrate cleaning apparatus of the present invention, bottom is equipped with the separation of frame shape in direct washing room
Component, the partition member are marked off in the direct washing room corresponding to the direct washing positioned at middle part in partition member
Region and corresponding to partition member outside the transition washing area positioned at direct washing area periphery, and in the direct washing room
It is respectively equipped with the first recovery holes and the second recovery holes, the direct water in direct washing area bottom and transition washing sections bottom
Chamber wash used ejected wash water in direct washing area is assigned by the first recovery holes to direct water cyclic water tank, described
Direct washing room used ejected wash water in transition washing area is distributed by selectivity to direct water by the second recovery holes
Cyclic water tank or displacement water cyclic water tank, the present invention divide direct water by the way that the partition member of frame shape is arranged in direct washing room
Region and transition washing area are washed, and is set respectively in the direct washing area bottom of direct washing room and transition washing sections bottom
The first recovery holes and the second recovery holes are set to be recycled to used ejected wash water, can will have been used in direct washing room
Ejected wash water be divided into photoresist and foreign matter concentration height and low two parts, and optionally separately recycling uses, high clear of purity
Wash water can be directly entered direct water cyclic water tank from the first recovery holes, and photoresist and the high ejected wash water of impurity concentration can then pass through
Two recovery holes are selectively recovered to direct water cyclic water tank or displacement water cyclic water tank, so as to effectively improve filter
Service life, and then the rate of transferring of equipment is improved, reduce producing line production cost.
For further understanding of the features and technical contents of the present invention, it please refers to below in connection with the detailed of the present invention
Illustrate and attached drawing, however, the drawings only provide reference and explanation, is not intended to limit the present invention.
Description of the drawings
Below in conjunction with the accompanying drawings, it is described in detail by the specific implementation mode to the present invention, technical scheme of the present invention will be made
And other advantageous effects are apparent.
In attached drawing,
Fig. 1 is the schematic front view of substrate cleaning apparatus of the present invention；
Fig. 2 is the schematic top plan view of substrate cleaning apparatus of the present invention.
Specific implementation mode
Further to illustrate the present invention technological means and its effect taken, below in conjunction with the embodiment of the present invention and
Its attached drawing is described in detail.
Referring to Fig. 1, the present invention provides a kind of substrate cleaning apparatus, for the development system in display panel manufacturing process
Journey, including washing process room 1, transport mechanism 2 and ejected wash water feed mechanism 3；
Wherein, the washing process room 1 includes 11 He of displacement washing room of the laid out in parallel successively on 5 direction of transfer of substrate
Direct washing room 12；
The transport mechanism 2 is for transmitting substrate 5 and running through the displacement washing room 11 and direct washing room 12；
The ejected wash water feed mechanism 3 is used to supply ejected wash water to the substrate 5 transmitted, and the ejected wash water supplies machine
Structure 3 include for 5 surface spraying ejected wash water of substrate multiple spray tubes 31 and for being conveyed clearly to the multiple spray tube 31
The liquor charging unit 32 of washing lotion；
The multiple spray tube 31 includes the multiple displacement water sprayer tubes 311 being set in the displacement washing room 11 and is set to
In the direct washing room 12 on 5 direction of transfer of substrate successively multiple transition spray tubes 312 of laid out in parallel and it is multiple directly
Water sprayer tube 313；
Bottom is equipped with partition member 15 in the direct washing room 12, and the partition member 15 is frame shape, the separation structure
Part 15 is marked off in the direct washing room 12 corresponding to the direct washing area positioned at middle part in the partition member 15
121 and corresponding to the partition member 15 outside the transition washing area 122 for being located at the periphery of the direct washing area 121；
The direct washing room 12 is respectively equipped in 121 bottom of direct washing area and 122 bottom of transition washing area
One recovery holes 123 and the second recovery holes 124,11 bottom of displacement washing room are equipped with third recovery holes 113；
The liquor charging unit 32 has the direct water cyclic water tank 321 and displacement water cyclic water tank for recovery and rinsing water
322；
The used ejected wash water in direct washing area 121 of the direct washing room 12 passes through the first recovery holes 123
It is assigned to direct water cyclic water tank 321；
The used ejected wash water in transition washing area 122 of the direct washing room 12 passes through the second recovery holes 124
It is distributed to direct water cyclic water tank 321 or displacement water cyclic water tank 322 by selectivity；
Used ejected wash water is assigned by third recovery holes 113 to displacement water cycle in the displacement washing room 11
Water tank 322；
The ejected wash water recycled in the direct water cyclic water tank 321 is supplied to the displacement water and sprayed by the liquor charging unit 32
To be cleaned to substrate 5, the liquor charging unit 32 is supplied to pure water as ejected wash water for shower pipe 311 and transition spray tube 312
The direct water sprayer tube 313 is to clean substrate 5.
Specifically, the transport mechanism 2 has the loading end for bearing substrate 5, if the transport mechanism 2 is to substrate 5
The direction of transmission is first direction X, the direction vertical and parallel with the loading end of the transport mechanism 2 with the first direction X
Loading end for second direction Y, the transport mechanism 2 with respect to the horizontal plane continuously decreases and inclined on Y in a second direction
Shape, to carry out tilting transmission to substrate 5.
Specifically, the angle that the loading end of the transport mechanism 2 is inclined relative to horizontal is 10-20 °.
It should be noted that those skilled in the art have found during existing substrate cleaning apparatus use, substrate 5 into
When row manufacturing process for cleaning, because substrate 5 is to be inclined by about 15 ° of angles to forward, in direct washing room 12 after cleaning, 5 surface of substrate
On ejected wash water can under the ABC location streams indicated in Fig. 2, thereon the uninterrupted of ejected wash water be A>B>C, the purity of ejected wash water
For A>B>C, the present invention is by by existing strip-like design being frame shape by partition member 15, and in the direct water of direct washing room 12
It washes 121 bottom of region and 122 bottom of transition washing area and the first recovery holes 123 and the second recovery holes 124 is respectively set to
Used ejected wash water is recycled, and used ejected wash water in direct washing room 12 can be divided into photoresist and foreign matter concentration is high
With low two parts, and optionally separately recycling uses, and the high ejected wash water of purity can be directly entered from the first recovery holes 123
Direct water cyclic water tank 321, and photoresist and the high ejected wash water of impurity concentration then can selectively be returned by the second recovery holes 124
Direct water cyclic water tank 321 or displacement water cyclic water tank 322 are received, to especially for flatness layer processing procedure, effectively improve
The service life of filter, and then the rate of transferring of equipment is improved, reduce producing line production cost.
Specifically, the partition member 15 is located in direct washing room 12 below the transport mechanism 2, and the separation
The height of component 15 does not influence the operating of the transport mechanism 2 above it.
Specifically, the transport mechanism 2 includes multiple transfer rollers 21 arranged side by side, and the multiple transfer roller 21 is constituted for holding
The loading end of carried base board 5.
Specifically, the liquor charging unit 32 is sending the ejected wash water in the direct water cyclic water tank 321 to described set
The drive access for changing water sprayer tube 311 and transition spray tube 312 is equipped with filter 325.
Specifically, the liquor charging unit 32 is equipped with the drive access that pure water is sent to the direct water cyclic water tank 321
To be diluted to the ejected wash water recycled from the direct washing room 12.
Specifically, each spray tube 31 is equipped with multiple nozzles 301, and each spray tube 31 passes through multiple nozzles thereon
301 to 5 surface spraying ejected wash water of substrate.
Specifically, the used ejected wash water in transition washing area 122 of the direct washing room 12 is cut by threeway
It changes valve 16 and is selectively transmitted between direct water cyclic water tank 321 and displacement water cyclic water tank 322.
In conclusion the substrate cleaning apparatus of the present invention, bottom is equipped with the partition member of frame shape in direct washing room, described
Partition member mark off in the direct washing room corresponding in partition member positioned at the direct washing area at middle part and right
Should be in the transition washing area positioned at direct washing area periphery outside partition member, and the direct washing room is interior in direct water
It washes sections bottom and transition washing sections bottom is respectively equipped with the first recovery holes and the second recovery holes, the direct washing room is straight
Used ejected wash water in washing area is connect to be assigned to direct water cyclic water tank, the direct washing by the first recovery holes
Room used ejected wash water in transition washing area is distributed by selectivity to direct water cyclic water tank by the second recovery holes
Or displacement water cyclic water tank, the present invention by be arranged frame shape partition member come divide direct washing room direct washing area and
Transition washing area, and be respectively set first time in the direct washing area bottom of direct washing room and transition washing sections bottom
Batter and the second recovery holes recycle used ejected wash water, can be by used ejected wash water in direct washing room
It is divided into photoresist and foreign matter concentration height and low two parts, and optionally separately recycling uses, the high ejected wash water of purity can be from
First recovery holes are directly entered direct water cyclic water tank, and photoresist and the high ejected wash water of impurity concentration can then pass through the second recovery holes
It is selectively recovered to direct water cyclic water tank or displacement water cyclic water tank, so as to effectively improve the use longevity of filter
Life, and then the rate of transferring of equipment is improved, reduce producing line production cost.
The above for those of ordinary skill in the art can according to the technique and scheme of the present invention and technology
Other various corresponding change and deformations are made in design, and all these change and distortions should all belong to the appended right of the present invention
It is required that protection domain.
Claims (10)
1. a kind of substrate cleaning apparatus, which is characterized in that supply machine including washing process room (1), transport mechanism (2) and ejected wash water
Structure (3)；
Wherein, the washing process room (1) is included on substrate (5) direction of transfer the displacement washing room (11) of laid out in parallel successively
With direct washing room (12)；
The transport mechanism (2) is for transmitting substrate (5) and running through the displacement washing room (11) and direct washing room (12)；
The ejected wash water feed mechanism (3) is used to supply ejected wash water to the substrate (5) transmitted, and the ejected wash water supplies machine
Structure (3) include for substrate (5) surface spraying ejected wash water multiple spray tubes (31) and for the multiple spray tube
(31) the liquor charging unit (32) of cleaning solution is conveyed；
The interior bottom of the direct washing room (12) is equipped with partition member (15), and the partition member (15) is frame shape, the separation
Component (15) marks off in the direct washing room (12) is located at the direct of middle part corresponding in the partition member (15)
Washing area (121) and correspond to the transition positioned at direct washing area (121) periphery of the partition member (15) outside
Washing area (122)；
The direct washing room (12) is respectively equipped in direct washing area (121) bottom and transition washing area (122) bottom
First recovery holes (123) and the second recovery holes (124), displacement washing room (11) bottom are equipped with third recovery holes (113)；
The liquor charging unit (32) has direct water cyclic water tank (321) and displacement water cyclic water tank for recovery and rinsing water
(322)；
The direct washing room (12) used ejected wash water in direct washing area (121) passes through the first recovery holes
(123) it is assigned to direct water cyclic water tank (321)；
The direct washing room (12) used ejected wash water in transition washing area (122) passes through the second recovery holes
(124) it is distributed to direct water cyclic water tank (321) or displacement water cyclic water tank (322) by selectivity；
Used ejected wash water is assigned by third recovery holes (113) to displacement water cycle in the displacement washing room (11)
Water tank (322)；
The ejected wash water recycled in the direct water cyclic water tank (321) is supplied to a plurality of spray by the liquor charging unit (32)
The part in (31) is managed to be cleaned to substrate (5), pure water is supplied to institute by the liquor charging unit (32)
Another part in a plurality of spray tube (31) is stated to be cleaned to substrate (5).
2. substrate cleaning apparatus as described in claim 1, which is characterized in that the transport mechanism (2) has for carrying base
The loading end of plate (5), if the direction that the transport mechanism (2) transmits substrate (5) is first direction (X), with the first party
The direction vertical and parallel with the loading end of the transport mechanism (2) to (X) is second direction (Y), the transport mechanism (2)
Loading end with respect to the horizontal plane continuously decreases and oblique on (Y) in a second direction, to carry out tilting to substrate (5)
Transmission.
3. substrate cleaning apparatus as claimed in claim 2, which is characterized in that the loading end of the transport mechanism (2) relative to
The inclined angle of horizontal plane is 10-20 °.
4. substrate cleaning apparatus as described in claim 1, which is characterized in that the partition member (15) is in direct washing room
(12) it is located at below the transport mechanism (2) in, and the height of the partition member (15) does not influence the transport mechanism above it
(2) operating.
5. substrate cleaning apparatus as claimed in claim 2, which is characterized in that the multiple spray tube (31) includes set on described
It replaces multiple displacement water sprayer tubes (311) in washing room (11) and is passed in substrate (5) in the direct washing room (12)
Send on direction multiple transition spray tubes (312) of laid out in parallel and multiple direct water sprayer tubes (313) successively；
The ejected wash water recycled in the direct water cyclic water tank (321) is supplied to the displacement water and sprayed by the liquor charging unit (32)
Shower pipe (311) and transition spray tube (312) are to clean substrate (5), and the liquor charging unit (32) is using pure water as cleaning
Water is supplied to the direct water sprayer tube (313) to be cleaned to substrate (5).
6. substrate cleaning apparatus as described in claim 1, which is characterized in that the liquor charging unit (32) is by the direct water
Ejected wash water in cyclic water tank (321) sends the drive access of the displacement water sprayer tube (311) and transition spray tube (312) to
It is equipped with filter (325).
7. substrate cleaning apparatus as described in claim 1, which is characterized in that the liquor charging unit (32) is equipped with and transmits pure water
It is dilute to be carried out to the ejected wash water recycled from the direct washing room (12) to the drive access of the direct water cyclic water tank (321)
It releases.
8. substrate cleaning apparatus as described in claim 1, which is characterized in that each spray tube (31) is equipped with multiple nozzles
(301), each spray tube (31) is by multiple nozzles (301) thereon to substrate (5) surface spraying ejected wash water.
9. substrate cleaning apparatus as described in claim 1, which is characterized in that the direct washing room (12) is in transition water wash zone
Used ejected wash water is recycled by three-way switch valve (16) in direct water cyclic water tank (321) and displacement water in domain (122)
Water tank is selectively transmitted between (322).
10. substrate cleaning apparatus as described in claim 1, which is characterized in that for the development in display panel manufacturing process
Processing procedure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810402206.5A CN108526097A (en) | 2018-04-28 | 2018-04-28 | Substrate cleaning apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810402206.5A CN108526097A (en) | 2018-04-28 | 2018-04-28 | Substrate cleaning apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108526097A true CN108526097A (en) | 2018-09-14 |
Family
ID=63476293
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810402206.5A Pending CN108526097A (en) | 2018-04-28 | 2018-04-28 | Substrate cleaning apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109659261A (en) * | 2018-12-19 | 2019-04-19 | 武汉华星光电半导体显示技术有限公司 | Substrate etch equipment and its processing system |
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| JP2005064312A (en) * | 2003-08-18 | 2005-03-10 | Dainippon Screen Mfg Co Ltd | Substrate processing method and substrate processor |
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| CN101847567A (en) * | 2009-03-26 | 2010-09-29 | 北京京东方光电科技有限公司 | Device for cleaning base plate |
| CN102194657A (en) * | 2010-03-18 | 2011-09-21 | 大日本网屏制造株式会社 | Device for cleaning and treating substrate |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109659261A (en) * | 2018-12-19 | 2019-04-19 | 武汉华星光电半导体显示技术有限公司 | Substrate etch equipment and its processing system |
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Application publication date: 20180914 |