CN1280876C - Substrate processing apparatus - Google Patents
Substrate processing apparatus Download PDFInfo
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- CN1280876C CN1280876C CNB03107541XA CN03107541A CN1280876C CN 1280876 C CN1280876 C CN 1280876C CN B03107541X A CNB03107541X A CN B03107541XA CN 03107541 A CN03107541 A CN 03107541A CN 1280876 C CN1280876 C CN 1280876C
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- 239000000758 substrate Substances 0.000 title claims abstract description 584
- 238000011282 treatment Methods 0.000 claims abstract description 658
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 200
- 239000007788 liquid Substances 0.000 claims abstract description 189
- 238000011084 recovery Methods 0.000 claims abstract description 134
- 238000005406 washing Methods 0.000 claims abstract description 103
- 230000004087 circulation Effects 0.000 claims abstract description 44
- 239000012530 fluid Substances 0.000 claims description 330
- 235000014347 soups Nutrition 0.000 claims description 66
- 239000007921 spray Substances 0.000 claims description 52
- 238000004140 cleaning Methods 0.000 claims description 37
- 238000007599 discharging Methods 0.000 claims description 35
- 230000001351 cycling effect Effects 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 8
- 239000002699 waste material Substances 0.000 abstract description 34
- 238000005192 partition Methods 0.000 abstract 2
- 208000028659 discharge Diseases 0.000 description 158
- 239000000243 solution Substances 0.000 description 155
- 238000002347 injection Methods 0.000 description 81
- 239000007924 injection Substances 0.000 description 81
- 238000004064 recycling Methods 0.000 description 67
- 238000011144 upstream manufacturing Methods 0.000 description 8
- 230000003252 repetitive effect Effects 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 229920002120 photoresistant polymer Polymers 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000011109 contamination Methods 0.000 description 4
- 238000006073 displacement reaction Methods 0.000 description 4
- 239000003814 drug Substances 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000005530 etching Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000005764 inhibitory process Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- 210000000689 upper leg Anatomy 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000005571 horizontal transmission Effects 0.000 description 1
- 239000010808 liquid waste Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The invention discloses a substrate processing apparatus, which can reduce the usage amount of processing liquid, reduce the amount of waste liquid, maintain high processing efficiency and inhibit the pollution of components in a liquid circulation path to the minimum. A substrate (1) is transferred in a posture inclined with respect to a horizontal plane in a direction perpendicular to a transfer direction, a partition plate (20) is erected along the substrate transfer direction in the vicinity of a position directly below an edge of a lower side of the substrate on an inner bottom surface of a water washing treatment tank (10), the inner bottom of the water washing treatment tank is partitioned by the partition plate, and the water washing treatment tank is divided into a recovery tank section (24) for recovering pure water discharged from a pure water discharge nozzle (14) and flowing down without passing through the substrate surface and a drain tank section (26) for receiving used pure water discharged from the pure water discharge nozzle, flowing to the lower side of the substrate and flowing down from the edge, and the pure water recovered in the recovery tank section is recycled and discharged into the used pure water in the drain tank section.
Description
Technical field
The present invention relates to a kind of while transmit flat-panel monitor (FPD) with the substrate of glass substrate, semiconductor wafer, printed circuit board (PCB) etc. to substrate clean, development, etching, the substrate board treatment of handling such as peel off.
Background technology
In the manufacturing process of FPD, semiconductor wafer, printed circuit board (PCB) etc., for example, after the employing soup has carried out substrate handling, with pure water substrate is cleaned, to be replaced as attached to the soup on the substrate under the situation of pure water, be to use by transfer roller substrate is transmitted to horizontal direction one by one, and the horizontal transmission formula processing unit that the ejection pure water is washed on substrate.One of the general configuration of this processing unit is illustrated among Figure 19.
Processing unit shown in Figure 19 possesses and has the washing treatment trough 10 of moving into mouth 12 and taking out of mouthful (not shown), in the inside of washing treatment trough 10, though not shown, be equipped with a plurality of transfer rollers side by side.And, in the inside of washing treatment trough 10,, set a plurality of pure water injection nozzles 14 that spray pure water to the upper and lower surface of substrate 1 respectively on the both sides up and down of the transfer path L of the substrate shown in two chain line 1.Moving on mouthful 12 1 sides of washing treatment trough 10, with washing treatment trough 10 in abutting connection be provided with soup treatment trough 16, inside at soup treatment trough 16, on the both sides up and down of the transfer path L of substrate 1, a plurality of medical liquid spraying nozzles 18 that spray soup to the upper and lower surface of substrate 1 have been set respectively.And substrate 1 is moved in the washing treatment trough 10 by moving into mouthful 12 quilts from soup treatment trough 16, and along continuous straight runs transmits under the supporting of transfer roller, takes out of in washing treatment trough 10 by taking out of mouth, to following dried portion (not shown) transmission.
And the liquids recovery mouth 52 being formed with the liquid outflow that makes on the inner bottom part that flows to washing treatment trough 10 from substrate 1 on the bottom of washing treatment trough 10 is connected with liquids recovery pipe arrangement 54 on this liquids recovery mouth 52.Liquids recovery pipe arrangement 54 is connected and stores on the recycling can 58 that reclaims liquid 56.And, be connected with an end of liquor charging pipe arrangement 60 on the recycling can 58, though not shown, the front end of liquor charging pipe arrangement 60 is connected on the pure water injection nozzle 14.On this liquor charging pipe arrangement 60, add filter 62 and pump 64 respectively.Though not shown, on recycling can 58, be connected with the pure water supplying tubing that is used for replenishing pure water.
In the processing unit of said structure, when the substrate 1 that is attached with soup 2 on upper surface is moved in washing treatment trough 16 in the soup treatment trough 16, in washing treatment trough 10, transmit substrate 1 by transfer roller on one side and spray pure water from pure water injection nozzle 14 to the upper and lower surface of substrate 1 on one side, will be replaced as pure water attached to the soup on the substrate 12.At this moment, to the pure water that sprays on the surface of substrate 1 with flow to attached to the soup on the upper surface of substrate 12 washing treatment trough 10 inner bottom part on.The pure water and the mixed liquor of soup that flow on the inner bottom part of washing treatment trough 10 flow to liquids recovery mouth 52 on the inner bottom part of washing treatment trough 10, flow in the recycling cans 58 from liquids recovery mouth 52 by liquids recovery pipe arrangement 54.Then, being stored in recovery liquid 56 in the recycling can 58 returns pure water injection nozzle 14 by liquor charging pipe arrangement 60 and utilizes.Thereby pure water is recycled.
As mentioned above, in the device of substrate being handled while the mixed liquor circulation that makes pure water and soup,, and replace attached to the soup on the substrate 1 owing to the mixed liquor of pure water and soup is utilized once more, so the concentration of soup increases gradually, displacement efficiency reduces gradually.And, owing to make the liquid that contains soup by liquids recovery pipe arrangement 54, recycling can 58 and 60 circulations of liquor charging pipe arrangement, so have the inner surface of inner surface, liquids recovery pipe arrangement 54 and the liquor charging pipe arrangement 60 of recycling can 58, the contaminated problems such as inside of pump 64.
On the other hand, when the pure water on will flowing to the inner bottom part of washing treatment trough 10 from substrate 1 and the mixed liquor of soup are discharged in washing treatment trough 10 as waste liquid, exist the use amount of waste liquid amount increase, the rising of liquid waste processing expense and pure water also to increase and the problem of operating cost increase.
And, for example on substrate, form in the technology of wiring graph, under the situation that the photoresist film that forms on the surface to substrate develops, be to adopt to transmit substrate 1 by transfer roller a slice a slice horizontally, and on substrate, spill developer solution, begin to transmission roll-type development processing apparatus from spilling developer solution through after the stipulated time developing reaction being stopped.One of the general configuration of this development processing apparatus is illustrated among Figure 20.
Development processing apparatus shown in Figure 20 possesses the development treatment groove 110 with entrance side opening 112a and outlet side opening 112b, though not shown, be equipped with a plurality of transfer rollers side by side in the inside of development treatment groove 110.Substrate 1 is moved in the development treatment groove 110 by entrance side opening 112a, is transmitted to horizontal direction by the transfer roller supporting, takes out of in development treatment groove 110 by outlet side opening 112b, is sent to following washing treatment trough 114.Near the entrance side opening 112a of development treatment groove 110 inside, be equipped with developer solution injection nozzle 116.And, near the outlet side opening 112b of developer solution treatment trough 110 inside, be equipped with and the contacted mangle roller 118 of upper surface one side relatively with transfer roller directly over a transfer roller by transfer roller supporting and the substrate 1 that transmits to ground.In addition, also can replace mangle roller 118 is set, and near the transfer roller the outlet side opening 112b that is provided in development treatment groove 110 is tilted in the direction vertical with the direction of transfer of substrate 1, air knife perhaps is set.Setting on the washing treatment trough of putting 114,, descend thereon and be equipped with a plurality of spray nozzles 120 that on the upper and lower surface of substrate 1, spray pure water on the both sides respectively across the transfer path L of the substrate 1 shown in two chain line with development treatment groove 110 adjacency.
And the bottom of development treatment groove 110 is provided with to make from substrate 1 and flows to the liquids recovery mouth 906 that the developer solution on development treatment groove 110 inner bottom parts flows out, and is connected with liquids recovery pipe arrangement 908 on this liquids recovery mouth 906.Liquids recovery pipe arrangement 908 is connected on the recycling can 912 that stores the developer solution 910 that reclaims.And an end of liquor charging pipe arrangement 914 is connected on the recycling can 912, and the front end of liquor charging pipe arrangement 914 is connected on the developer solution injection nozzle 116.On this liquor charging pipe arrangement 914, add filter 916 and pump 918 respectively.By liquids recovery pipe arrangement 908, recycling can 912, liquor charging pipe arrangement 914, filter 916 and pump 918 constitute fluid circulation system.
In the development processing apparatus of this structure, when the substrate 1 that forms the photoresist film exposed from the teeth outwards by near the developer solution injection nozzle 116 the entrance side opening 112a that is provided in development treatment groove 110 under during the position, the developer solution 3 that is ejected into from 116 one-tenth curtain shapes of developer solution injection nozzle on the whole width of substrate 1 accumulates from the teeth outwards.The substrate 1 that has accumulated liquid carries out the developing reaction of photoresist film during being transmitted by transfer roller.When substrate 1 is sent near the outlet side opening 112b of development treatment groove 110, by mangle roller 118 developer solution 3 is removed from substrate 1, afterwards, in development treatment groove 110, take out of.Then, be sent to following washing treatment trough 114, the developing reaction of photoresist film stopped fully by washing with pure water.
When development treatment, flow to from substrate 1 after the use on the inner bottom part of development treatment groove 110 developer solution and substrate 1 not by developer solution injection nozzle 116 under the time from 116 ejections of developer solution injection nozzle, the developer solution that do not flow directly to via the face of substrate 1 on the inner bottom part of development treatment groove 110 flows to liquids recovery mouth 906 on the inner bottom part of development treatment groove 110, from liquids recovery mouth 906 by flowing in the recycling cans 912 in the liquids recovery pipe arrangement 908.Then, flow in the recycling can 912 and be stored in wherein developer solution 910 and be sent to developer solution injection nozzle 116 by liquor charging pipe arrangement 914 and utilize again.Like this, developer solution is recycled.
Above-mentioned this in the device that treatment fluid (being developer solution in above-mentioned example) circulation is handled substrate, under the reaction product of substrate or deposit from substrate and developer solution is dissolved in situation in the developer solution, even utilize the developer solution after using also no problem again.But, generating with developer solution reaction and be not dissolved under the situation of the material in the developer solution, when the developer solution circulation is used, will produce the inner surface of inner surface, liquids recovery pipe arrangement 908 or the liquor charging pipe arrangement 914 of recycling can 912, the inside of pump 918 etc. by the non-dissolved matter pollution problems.And, also exist the filter 916 be installed on the liquor charging pipe arrangement 914 very fast blocked, under serious situation, while can not make the developer solution circulation carry out the problem of processing substrate.
On the other hand, discharge when discarded from the inner bottom part of development treatment groove 110 when not making developer solution circulation, though can not produce the problems referred to above, but since substrate 1 not by developer solution injection nozzle 116 under the time also go out of use together from developer solution injection nozzle 116 ejection and the developer solution that intactly flows on the inner bottom part of development treatment groove 110, so the problem that exists the utilance of developer solution to reduce.Above-mentioned problem does not exist only in the development processing apparatus, might take place in processing unit such as cleaning, etching, lift-off processing yet.
The present invention proposes in view of the above problems, its the 1st purpose is to provide a kind of substrate board treatment, can keep the high usage of treatment fluids such as pure water, reduce the use amount of treatment fluid, reduce waste liquid amount, keep high treatment effeciency simultaneously, the pollution of each parts in the circulating path of liquid is reduced to Min..
The 2nd purpose of the present invention is to provide a kind of substrate board treatment, while can make the treatment fluid circulation carry out the processing of substrate, keeps the high usage of treatment fluid, also can not have problems in the circulatory system.
Summary of the invention
Technical solution of the present invention 1 is a kind of substrate board treatment, in treatment trough, by connecting gear substrate is transmitted to horizontal direction, and spray treatment fluid to substrate from treatment fluid ejection mechanism, substrate is handled, it is characterized in that, possess to be distinguished into with reclaiming path and discharge opeing path and be provided with, turn back to fluid circulation system in the above-mentioned treatment fluid ejection mechanism with being recovered to treatment fluid in the above-mentioned recovery path, wherein, described recovery path is reclaimed from the ejection of above-mentioned treatment fluid ejection mechanism, the treatment fluid that does not intactly flow down via real estate, described discharge opeing path are collected and to be sprayed to substrate from above-mentioned treatment fluid ejection mechanism, flow in end to the direction vertical with the direction of transfer of substrate on substrate, treatment fluid after the use that flows down from edge.
Technical solution of the present invention 2 is a kind of substrate board treatment, in treatment trough, by connecting gear substrate is transmitted to horizontal direction, and spray treatment fluid to substrate from treatment fluid ejection mechanism, substrate is handled, it is characterized in that, by above-mentioned connecting gear, transmit substrate with the posture that on the direction vertical, is inclined relative to horizontal with the direction of transfer of substrate, simultaneously, near position under the low lateral edges place of substrate on the inner bottom surface of above-mentioned treatment trough, that tilt to transmit, along the upright demarcation strip of establishing of the direction of transfer of substrate; The inner bottom part of separating treatment trough by this demarcation strip, it is distinguished into recovery slot part and discharge opeing slot part, wherein, described recovery slot part reclaims treatment fluid ejection, that intactly do not flow down via real estate from above-mentioned treatment fluid ejection mechanism, described discharge opeing slot part receive spray to substrate from treatment fluid ejection mechanism, at the treatment fluid after low side flow, the use that flows down from edge on the substrate; Possess the treatment fluid that will be recovered in the above-mentioned recovery slot part and return fluid circulation system in the above-mentioned treatment fluid ejection mechanism, and possess the discharge opeing stream of discharging the treatment fluid after the use that flows in the above-mentioned discharge opeing slot part.
Being characterized as in the substrate board treatment that technical scheme 2 is put down in writing of technical solution of the present invention 3, the upper end of above-mentioned demarcation strip are configured to the edge near low side of the substrate that tilts to transmit.
Technical solution of the present invention 4 is a kind of substrate board treatment, in treatment trough, substrate is transmitted to horizontal direction with flat-hand position by connecting gear, and spray treatment fluid to substrate from treatment fluid ejection mechanism, substrate is handled, it is characterized in that, on the inner bottom surface of above-mentioned treatment trough, under the edge of the substrate both sides that are transmitted near the position, direction of transfer along substrate is provided with demarcation strip respectively, the inner bottom part of separating treatment trough by each demarcation strip respectively, it is distinguished into recovery slot part and discharge opeing slot part, wherein, described recovery slot part reclaims from the ejection of above-mentioned treatment fluid ejection mechanism, the treatment fluid that does not intactly flow down via real estate, described discharge opeing slot part reception sprays to substrate from treatment fluid ejection mechanism, on substrate to two side flow, treatment fluid after the use that flows down respectively from two edges; Possess the treatment fluid that will be recovered in the above-mentioned recovery slot part and turn back to fluid circulation system in the above-mentioned treatment fluid ejection mechanism, and possess the discharge opeing stream that discharge flows to the treatment fluid after the use in above-mentioned each discharge opeing slot part respectively.
Being characterized as in the substrate board treatment that technical scheme 4 is put down in writing of technical solution of the present invention 5, the upper end of above-mentioned each demarcation strip are configured to the edge of approaching substrate both sides of transmitting respectively.
Being characterized as in technical scheme 2 to 5 in each substrate board treatment of putting down in writing of technical solution of the present invention 6, on the inner bottom surface of above-mentioned treatment trough, the removing on the inlet side of substrate, found the demarcation strip of establishing Width along the direction that the direction of transfer with substrate intersects, the inner bottom part of separating treatment trough by the demarcation strip of this Width, what form to receive the liquid that flows down from the front edge of moving into the substrate in the treatment trough moves into oral-lateral discharge opeing slot part, and will flow to this treatment fluid of moving in the oral-lateral discharge opeing slot part and discharge.
Being characterized as in the substrate board treatment that technical scheme 6 is put down in writing of technical solution of the present invention 7, the above-mentioned oral-lateral discharge opeing slot part of moving into is connected with above-mentioned discharge opeing slot part.
Technical solution of the present invention 8 is a kind of substrate board treatment, in treatment trough, by connecting gear substrate is transmitted to horizontal direction, and spray treatment fluid to substrate from treatment fluid ejection mechanism, substrate is handled, it is characterized in that, by above-mentioned connecting gear, transmit substrate with the posture that is inclined relative to horizontal in the direction vertical with the direction of transfer of substrate, simultaneously in the inside of above-mentioned treatment trough, the substrate that tilts to transmit is than near the position under the edge of hanging down a side, along the direction of transfer horizontally set discharge opeing chute of substrate, described discharge opeing chute receives and sprays to substrate from above-mentioned treatment fluid ejection mechanism, on substrate to low side flow, treatment fluid after the use that flows down from edge; Possess will from the ejection of above-mentioned treatment fluid ejection mechanism, intactly do not flow down the treatment fluid that is recycled on the above-mentioned treatment trough inner bottom part and return fluid circulation system the above-mentioned treatment fluid ejection mechanism via real estate, and possess the discharge opeing stream of discharging the treatment fluid after the use that flows in the above-mentioned discharge opeing chute.
Technical solution of the present invention 9 is a kind of substrate board treatment, in treatment trough, substrate is transmitted to horizontal direction with flat-hand position by connecting gear, and spray treatment fluid to substrate from treatment fluid ejection mechanism, substrate is handled, it is characterized in that, in the inside of above-mentioned treatment trough, under the edge of the substrate both sides of transmitting near the position, along a pair of discharge opeing chute of the direction of transfer horizontally set of substrate, described discharge opeing chute receives and sprays to substrate from above-mentioned treatment fluid ejection mechanism, on substrate to two side flow, treatment fluid after the use that flows down respectively from two edges; Possess will from the ejection of above-mentioned treatment fluid ejection mechanism, intactly do not flow down the treatment fluid that is recycled on the above-mentioned treatment trough inner bottom part and return fluid circulation system the above-mentioned treatment fluid ejection mechanism via real estate, and possess the discharge opeing stream that discharge flows to the treatment fluid after the use in above-mentioned each discharge opeing chute respectively.
Being characterized as in technical scheme 4,5 or 9 substrate board treatments of being put down in writing of technical solution of the present invention 10, on above-mentioned connecting gear direction that the direction of transfer of substrate supporting Cheng Zaiyu substrate is vertical, the central portion of substrate is higher than the both ends of substrate.
Being characterized as in technical scheme 4,5 or 9 substrate board treatments of being put down in writing of technical solution of the present invention 11, with respect to substrate surface respectively the mode that tilts of the substrate both ends on the direction vertical with the direction of transfer of substrate spray treatment fluid from above-mentioned treatment fluid ejection mechanism to substrate.
Being characterized as of technical solution of the present invention 12 in technical scheme 4, in 5 or 9 substrate board treatments of being put down in writing, near position under the lateral edges place, rear and front end of the substrate that transmits by above-mentioned connecting gear, along the direction vertical with the direction of transfer of substrate, set the auxiliary discharge opeing chute of the treatment fluid after the use that a pair of reception flows down respectively from the rear and front end lateral edges of substrate, this a pair of auxiliary discharge opeing chute is supported to moving of substrate synchronously moves, possess the auxiliary discharge opeing stream that discharge flows to the treatment fluid after the use in above-mentioned each auxiliary discharge opeing chute respectively to horizontal direction.
Being characterized as in the substrate board treatment that technical scheme 1 is put down in writing of technical solution of the present invention 13, above-mentioned treatment trough is removed the adjacent ground connection of inlet side with the substrate of this washing treatment trough the soup treatment trough of substrate being handled with soup is set for the washing treatment trough with the pure water cleaning base plate.
Technical solution of the present invention 14 is a kind of substrate board treatment, in treatment trough, discharge treatment fluid from treatment fluid ejection mechanism to substrate while transmitting substrate, substrate is handled, it is characterized in that, the inner bottom part of separating above-mentioned treatment trough, form to reclaim from the ejection of above-mentioned treatment fluid ejection mechanism, the recovery slot part of the treatment fluid that does not intactly flow down via real estate, and, below above-mentioned treatment fluid ejection mechanism, set recovery from the ejection of treatment fluid ejection mechanism, the returnable of the treatment fluid that does not intactly flow down via real estate, the treatment fluid that will be recovered in above-mentioned recovery slot part or the returnable is set returns above-mentioned treatment fluid ejection mechanism, make the treatment fluid cycling mechanism of treatment fluid circulation, and be provided with that discharge sprays to substrate from above-mentioned treatment fluid ejection mechanism, flow to the discharge opeing stream of the treatment fluid after the use on the above-mentioned treatment trough inner bottom part from substrate.
Being characterized as in the substrate board treatment that technical scheme 14 is put down in writing of technical solution of the present invention 15, possess wiper mechanism, this wiper mechanism with cleaning fluid clean with the use that flows down from substrate after the internal face of the contacted above-mentioned treatment trough of treatment fluid or the parts of treatment trough inside.
Being characterized as in the substrate board treatment that technical scheme 15 is put down in writing of technical solution of the present invention 16, adjacent ground connection with above-mentioned treatment trough is provided with the washing treatment trough with the pure water cleaning base plate, and the pure water after this washing treatment trough uses uses as cleaning fluid in above-mentioned wiper mechanism.
Being characterized as in technical scheme 14 to 16 in each substrate board treatment of putting down in writing of technical solution of the present invention 17 makes above-mentioned discharge opeing stream branch, will divide branch road to be connected on the above-mentioned treatment fluid cycling mechanism, installs the stream switching mechanism on branch location additional.
Being characterized as in the substrate board treatment that technical scheme 15 is put down in writing of technical solution of the present invention 18, make above-mentioned discharge opeing stream branch, to divide branch road to be connected on the above-mentioned treatment fluid cycling mechanism, on branch location, install the stream switching mechanism additional, allow treatment fluid circulation time after using being sent to above-mentioned treatment fluid cycling mechanism by above-mentioned discharge opeing stream, via above-mentioned minute branch road by the treatment fluid after the use that will flow down from substrate, treatment fluid uses as cleaning fluid in above-mentioned wiper mechanism.
Being characterized as in technical scheme 14 of technical solution of the present invention 19 put down in writing in the substrate board treatment, be provided with and store the jar that is recovered to the treatment fluid in above-mentioned recovery slot part or the returnable, on this jar, set up the management devices that the treatment fluid composition in this jar is managed.
In the substrate board treatment of technical solution of the present invention 1, in treatment trough, substrate is transmitted to horizontal direction, and spray treatment fluid to substrate from treatment fluid ejection mechanism by connecting gear, substrate is handled.And the treatment fluid that uses in the processing substrate flows to the end of the direction vertical with the direction of transfer of substrate, flows down from the edge of substrate.Treatment fluid after the use that the edge of substrate flows down is collected in the discharge opeing path, discharges by the discharge opeing path.On the other hand, be recycled to the recovery path, turn back in the treatment fluid ejection mechanism by fluid circulation system and utilize again from treatment fluid ejection mechanism treatment fluid ejection, that intactly do not flow down via real estate.Therefore, owing to can not being reused, the treatment fluid after using do not go out of use, so the treatment effeciency of substrate can be not lower, and, because the treatment fluid after using can not flow by fluid circulation system, so the pollution of each parts also is reduced to Min. in the fluid circulation system.On the other hand, be reused owing to be recovered to the treatment fluid that reclaims in the path, so kept high treatment fluid utilization ratio, reduced the use amount of treatment fluid, waste liquid amount also reduces.
In the substrate board treatment of technical solution of the present invention 2, owing to transmit substrate with the posture that on the direction vertical, is inclined relative to horizontal with direction of transfer, so from treatment fluid ejection mechanism treatment fluid that spray to substrate, that be used for processing substrate on substrate to a lower side flow, flow down from the edge of substrate.At this moment, near because the upright demarcation strip of establishing position under the edge of hanging down a side of substrate, by this demarcation strip the inner bottom part of treatment trough is distinguished into and reclaims slot part and discharge opeing slot part, so the treatment fluid after the use that flows down from the edge of substrate flows in the discharge opeing slot part, discharges by the discharge opeing stream.On the other hand, be recycled in the recovery slot part, turn back in the treatment fluid ejection mechanism by fluid circulation system and utilize again from treatment fluid ejection mechanism treatment fluid ejection, that intactly do not flow down via real estate.Therefore, do not discard owing to the treatment fluid after using can not be reused, thus the treatment effeciency of substrate can not reduce, and, because the treatment fluid after using can not flow by fluid circulation system, so the pollution of each parts also is reduced to Min. in the fluid circulation system.On the other hand, be reused owing to be recovered to the treatment fluid that reclaims in the slot part, so kept high treatment fluid utilization ratio, reduced the use amount of treatment fluid, waste liquid amount also reduces.
In the substrate board treatment of technical solution of the present invention 3, flow to reliably in the discharge opeing slot part at the treatment fluid after low side flow, the use that flows down from the edge of substrate on the substrate, can not cross the upper end of demarcation strip and flow to and reclaim in the slot part.
In the substrate board treatment of technical solution of the present invention 4, in treatment trough, with flat-hand position substrate is transmitted to horizontal direction, and spray treatment fluid to substrate from treatment fluid ejection mechanism by connecting gear, substrate is handled.And, be used for treatment fluid after the processing substrate on substrate to two side flow, flow down respectively from the two edges of substrate.At this moment, near the upright respectively demarcation strip of establishing position under the place, substrate both sides of the edge, the inner bottom part of separating treatment trough by each demarcation strip, it is distinguished into recovery slot part and a pair of discharge opeing slot part, so the treatment fluid after the use that flows down respectively from the two edges of substrate flows in each discharge opeing slot part, discharges by the discharge opeing stream.On the other hand, be recycled in the recovery slot part, turn back in the treatment fluid ejection mechanism by fluid circulation system and utilize again from treatment fluid ejection mechanism treatment fluid ejection, that intactly do not flow down via real estate.Therefore, do not discard owing to the treatment fluid after using can not be reused, thus the treatment effeciency of substrate can not reduce, and, because the treatment fluid after using can not flow by fluid circulation system, so the pollution of each parts also is reduced to Min. in the fluid circulation system.On the other hand, be reused owing to be recovered to the treatment fluid that reclaims in the slot part, so kept high treatment fluid utilization ratio, reduced the use amount of treatment fluid, waste liquid amount also reduces.
In the substrate board treatment of technical solution of the present invention 5, flow to reliably in each discharge opeing slot part at the treatment fluid after two side flow, the use that flows down respectively from the two edges of substrate on the substrate, the upper end that can not cross demarcation strip flows to reclaims in the slot part.
In the substrate board treatment of technical solution of the present invention 6, near moving into the mouth of substrate, used in the processing of prime, attached to the treatment fluid on the substrate when the front edge of substrate flows down, perhaps the treatment fluid that sprays to substrate towards the place ahead of substrate direction of transfer from treatment fluid ejection mechanism is when the front edge of substrate flows down, because mouthful edge-on demarcation strip that is provided with Width of moving at substrate, demarcation strip by this Width is separated the inner bottom part of treatment trough, oral-lateral discharge opeing slot part is moved in formation, so the liquid that flows down from the front edge of substrate flows to and moves in the oral-lateral discharge opeing slot part and be discharged from.
In the substrate board treatment of technical solution of the present invention 7, the treatment fluid that flows to after the use of liquid in flowing to the discharge opeing slot part of moving in the oral-lateral discharge opeing slot part is discharged by the discharge opeing stream.
In the substrate board treatment of technical solution of the present invention 8, because substrate is to transmit with the posture that is inclined relative to horizontal in the horizontal direction, thus from treatment fluid ejection mechanism to substrate spray be used for treatment fluid after the processing substrate on substrate to low side flow, flow down from the edge of substrate.At this moment, because near position under the edge of the low side of substrate, be horizontally arranged with the discharge opeing chute,, discharge by the discharge opeing stream so the treatment fluid after the use that flows down from the edge of substrate flows in the discharge opeing chute along the direction of transfer of substrate.On the other hand, spray the inner bottom part that mechanism's treatment fluid that discharge, that intactly do not flow down via real estate is recycled to treatment trough, turn back in the treatment fluid ejection mechanism by fluid circulation system and utilize again from treatment fluid.Therefore, do not discard owing to the treatment fluid after using can not be reused, thus the treatment effeciency of substrate can not reduce, and, because the treatment fluid after using can not flow by fluid circulation system, so the pollution of each parts also is reduced to Min. in the fluid circulation system.On the other hand, be reused owing to be recovered to the treatment fluid of treatment trough inner bottom part, so kept high treatment fluid utilization ratio, reduced the use amount of treatment fluid, waste liquid amount also reduces.
In the substrate board treatment of technical solution of the present invention 9, in treatment trough, with flat-hand position substrate is transmitted to horizontal direction, and spray treatment fluid to substrate from treatment fluid ejection mechanism by connecting gear, substrate is handled.And, be used for treatment fluid after the processing substrate on substrate to two side flow, flow down respectively from the two edges of substrate.At this moment, because near position under the edge of substrate both sides, direction of transfer along substrate is horizontally arranged with the discharge opeing chute respectively, so the treatment fluid after the use that flows down respectively from the two edges of substrate flows in each discharge opeing chute, discharges by the discharge opeing stream.On the other hand, spray the inner bottom part that mechanism's treatment fluid ejection, that intactly do not flow down via real estate is recycled to treatment trough, turn back in the treatment fluid ejection mechanism by fluid circulation system and utilize again from treatment fluid.Therefore, do not discard owing to the treatment fluid after using can not be reused, thus the treatment effeciency of substrate can not reduce, and, because the treatment fluid after using can not flow by fluid circulation system, so the pollution of each parts also is reduced to Min. in the fluid circulation system.On the other hand, be reused owing to be recovered to the treatment fluid of reason groove inner bottom part, so kept high treatment fluid utilization ratio, reduced the use amount of treatment fluid, waste liquid amount also reduces.
In the substrate board treatment of technical solution of the present invention 10, since substrate be supported on the direction vertical with direction of transfer, central portion is higher than both ends ground and transmits, so the treatment fluid that sprays to substrate from treatment fluid ejection mechanism, be used for after the processing substrate separates on the central portion of substrate to the left and right, can not be trapped on the substrate, on substrate, flow, flow down from the edge of substrate to both ends from middle body.
In the substrate board treatment of technical solution of the present invention 11, owing to be to spray treatment fluid in the mode of the substrate both ends lopsidedness on the direction vertical respectively with the direction of transfer of substrate with respect to substrate surface, so the treatment fluid that sprays to substrate from treatment fluid ejection mechanism forms respectively the stream thigh towards both ends, treatment fluid flows to both ends respectively on substrate, flows down from the edge of substrate.
In the substrate board treatment of technical solution of the present invention 12, when transmitting substrate by connecting gear, even spray to substrate from treatment fluid ejection mechanism, the treatment fluid that is used for after the processing substrate flows down respectively from the rear and front end lateral edges of substrate, because near position under the lateral edges place, the rear and front end of substrate, set a pair of auxiliary discharge opeing chute along the direction vertical with the direction of transfer of substrate, this a pair of auxiliary discharge opeing chute is supported to moving of substrate and synchronously moves to horizontal direction, so the treatment fluid after the use that flows down respectively from the rear and front end lateral edges of substrate flows in each auxiliary discharge opeing chute, discharges by auxiliary discharge opeing stream.
In the substrate board treatment of technical solution of the present invention 13, in the soup treatment trough, be used for processing substrate, attached to the soup on the substrate by the washing treatment trough be removed with the pure water cleaning base plate, replaced by pure water.
In the substrate board treatment of technical solution of the present invention 14, be recycled to the recovery slot part or returnable of treatment trough from treatment fluid ejection mechanism treatment fluid ejection, that intactly do not flow down via real estate, turn back to the treatment fluid ejection mechanism from reclaiming slot part or returnable by the treatment fluid cycling mechanism, it is recycled.And this treatment fluid is not because via real estate, so can not contain non-dissolved matter.Therefore, do not worry to take place in the fluid circulation system, such problem is polluted by non-dissolved matter in the inner surface of jar, the inner surface of pipe arrangement, the inside of pump etc., on the other hand, the treatment fluid after the use from the treatment fluid ejection mechanism inner bottom part that spray to substrate, from the substrate upper reaches to treatment trough is discharged from by the discharge opeing stream.Therefore, also no problem even in this treatment fluid, contain non-dissolved matter.
In the substrate board treatment of technical solution of the present invention 15, owing to pass through wiper mechanism, with cleaning fluid clean with the use that flows down from substrate after the internal face of the contacted treatment trough of treatment fluid or the parts of treatment trough inside, even so contain non-dissolved matter in the treatment fluid after use, on the parts of this non-dissolved matter attached to the internal face of treatment trough or treatment trough inside, this non-dissolved matter is also washed off.Therefore, prevented the pollution of the parts of the internal face of treatment trough or treatment trough inside.
In the substrate board treatment of technical solution of the present invention 16 and since with the adjacent washing treatment trough of treatment trough in pure water after using in flushing machine, use as cleaning fluid, so saved cleaning fluid.
In the substrate board treatment of technical solution of the present invention 17, when containing non-dissolved matter from the treatment fluid after the use of substrate upper reaches to the treatment trough inner bottom part, the treatment fluid after will using by the discharge opeing stream is intactly discharged.On the other hand, when from the treatment fluid of substrate upper reaches to the treatment trough inner bottom part, not containing non-dissolved matter, treatment fluid after will using by the stream switching mechanism in the discharge opeing stream in minute branch road the inflow place switch stream, the treatment fluid after the use flows to the treatment fluid cycling mechanism by a minute branch road.Like this, when in because of the treatment fluid after different use of kind of substrate, not containing non-dissolved matter, recycle, reduced the use amount of treatment fluid by the treatment fluid after will using.
In the substrate board treatment of technical solution of the present invention 18, when containing non-dissolved matter from the treatment fluid after the use of substrate upper reaches to the treatment trough inner bottom part, the treatment fluid after will using by the discharge opeing stream is intactly discharged.On the other hand, when from the treatment fluid of substrate upper reaches to the treatment trough inner bottom part, not containing non-dissolved matter, treatment fluid after will using by the stream switching mechanism flows into to divide in the discharge opeing stream and switches stream in the branch road, treatment fluid after the use flows to the treatment fluid cycling mechanism by a minute branch road, like this, when in because of the treatment fluid after different use of kind of substrate, not containing non-dissolved matter, recycle, reduced the use amount of treatment fluid by the treatment fluid after will using.And, when treatment fluid after the use that substrate flows down is recycled, because treatment fluid uses as cleaning fluid in wiper mechanism, so the treatment fluid (cleaning fluid) that is used in after the parts of the internal face of treatment trough or treatment trough inside clean also circulates, can in the cleaning of the processing of substrate and treatment trough internal face etc., use.
In the substrate board treatment of technical solution of the present invention 19, be used for managing, so can eliminate the problem that the treatment fluid of contaminated or deterioration is used for the processing of substrate circularly by the composition of management devices to the treatment fluid in the jar.
When using the substrate board treatment of technical solution of the present invention 1, technical scheme 2, technical scheme 4, technical scheme 8 and technical scheme 9, can keep the utilization ratio of high treatment fluids such as pure water, reduce the use amount of treatment fluid, waste liquid amount can also reduce simultaneously.And, when keeping high processing substrate efficient, the pollution of each parts in the circulating path of liquid can also be suppressed at Min..
In the substrate board treatment of technical solution of the present invention 3, can be reliably will discharge as waste liquid at the treatment fluid after low side flow, the use that flows down from the edge of substrate on the substrate.
In the substrate board treatment of technical scheme 5, can be reliably will discharge as waste liquid at the treatment fluid after two side flow, the use that flows down respectively from the two edges of substrate on the substrate.
In the substrate board treatment of technical solution of the present invention 6, can discharge as waste liquid near the liquid that will flow down from the front edge of substrate the mouth of moving into of substrate.
In the substrate board treatment of technical solution of the present invention 7, the treatment fluid after near the use of liquid in flowing to the discharge opeing slot part that can will flow down from the front edge of substrate the moving into mouthful of substrate is discharged as waste liquid.
In the substrate board treatment of technical solution of the present invention 10 and technical scheme 11, can make spray to substrate from treatment fluid ejection mechanism, be used for treatment fluid after the processing substrate and can be detained ground and flow respectively to the both ends of substrate at substrate, flow down from the edge of substrate.
In the substrate board treatment of technical solution of the present invention 12, the treatment fluid after the use that flows down respectively from the rear and front end lateral edges of substrate when substrate transmits can be discharged as waste liquid.
In the substrate board treatment of technical solution of the present invention 13, in the soup treatment trough, use, remove from substrate in the treatment trough in washing, the processing by the pure water displacement, can reduce the use amount of pure water attached to the soup on the substrate.
When using the substrate board treatment of technical solution of the present invention 14, can be while making treatment fluid circulation the carrying out processing of substrate, and, because can be only with fluid separation applications, the discharge used in handling, so can keep high treatment fluid utilization ratio, can in fluid circulation system, not have problems simultaneously.And, when handling, also need not to carry out complicated control.
In the substrate board treatment of technical solution of the present invention 15, can prevent the pollution of the parts of internal face or treatment trough inside.
In the substrate board treatment of technical solution of the present invention 16, can save for the pollution of the parts of the internal face that prevents treatment trough or treatment trough inside and the cleaning fluid that uses.
In the substrate board treatment of technical solution of the present invention 17, owing to not containing non-dissolved matter in the treatment fluid after using, the treatment fluid after the use can be recycled, so can reduce the use amount of treatment fluid because of the kind of substrate is different.
In the substrate board treatment of technical solution of the present invention 18, owing to not containing non-dissolved matter in the treatment fluid after using, the treatment fluid after the use can be recycled, so can reduce the use amount of treatment fluid because of the kind of substrate is different.And, in the time will recycling from the treatment fluid after the use that substrate flows down, the treatment fluid of cleaning that is used in the parts of the internal face of treatment trough or treatment trough inside also circulates, be used for the cleaning of the processing of substrate and treatment trough internal face etc., so also can save treatment fluid (cleaning fluid).
In the substrate board treatment of technical solution of the present invention 19, be used for the processing of substrate owing to needn't worry the treatment fluid circulation of contaminated or deterioration, so can keep the processing quality of substrate.
Description of drawings
Fig. 1 illustrates an example of the present invention's the 1st execution mode, is the vertical view that schematically illustrates the substrate board treatment general configuration.
Fig. 2 is that II-II among Fig. 1 is to cutaway view.
Fig. 3 is that III-III among Fig. 1 is to cutaway view.
Fig. 4 illustrates another example of the present invention's the 1st execution mode, is the vertical view that schematically illustrates the substrate board treatment general configuration.
Fig. 5 illustrates another example of the present invention's the 1st execution mode, is the vertical view that schematically illustrates the substrate board treatment general configuration.
Fig. 6 is that VI-VI among Fig. 5 is to cutaway view.
Fig. 7 illustrates another example of the present invention's the 1st execution mode, is the vertical view that schematically illustrates the substrate board treatment general configuration.
Fig. 8 is that VIII-VIII among Fig. 7 is to cutaway view.
Fig. 9 illustrates another example of the present invention's the 1st execution mode, is the vertical view that schematically illustrates the substrate board treatment general configuration.
Figure 10 is that X-X among Fig. 9 is to cutaway view.
Figure 11 illustrate with horizontal posture with substrate when horizontal direction transmits, the configuration example that is used to make the pure water that is ejected on the substrate to flow on substrate easily is the end view that schematically illustrates a substrate board treatment part.
Figure 12 illustrates other configuration examples that are used to make the pure water that is ejected on the substrate to flow easily on substrate, be the end view that schematically illustrates a substrate board treatment part.
Figure 13 is the vertical view that schematically illustrates the modified example of the substrate board treatment shown in Fig. 9.
Figure 14 illustrates an example of the present invention's the 2nd execution mode, is the end view that schematically illustrates as the development processing apparatus general configuration of one of substrate board treatment.
Figure 15 illustrates the wiper mechanism and different example shown in Figure 14 of development treatment groove, is the end view that schematically illustrates the development processing apparatus general configuration.
Figure 16 illustrates another example of the present invention's the 2nd execution mode, is the end view that schematically illustrates the development processing apparatus general configuration.
Figure 17 illustrates the example that the developer solution injection nozzle is set according to the kind of the developer solution that uses in the 2nd execution mode, is the end view that schematically illustrates the development processing apparatus general configuration.
Figure 18 illustrates other examples that can handle operation according to the kind of the developer solution that uses in the 2nd execution mode, is the end view that schematically illustrates the development processing apparatus general configuration.
Figure 19 is the end view that schematically illustrates an example of existing substrate board treatment general configuration.
Figure 20 is the end view that schematically illustrates an example of existing substrate board treatment general configuration.
Embodiment
1. the 1st execution mode
Below, referring to figs. 1 through Figure 13 the present invention's the 1st execution mode is illustrated.
Fig. 1 to Figure 13 illustrates an example of the present invention's the 1st execution mode, and Fig. 1 is the vertical view that schematically illustrates the substrate board treatment general configuration, Fig. 2 and Fig. 3 be II-II among Fig. 1 to cutaway view and III-III to cutaway view.In this substrate board treatment,,, omit the explanation of its repetition so in Fig. 1 to Fig. 3, identical parts are also put on the symbol that adopts among Figure 19 owing to the structure of the major part of carrying out processing substrate is identical with the conventional device that Figure 19 is described with action.
In this substrate board treatment, though not shown, a plurality of transfer rollers that are provided in washing treatment trough 10 inside side by side all are supported in the direction vertical with the direction of transfer of substrate 1 and tilt.And as shown in Figure 3, substrate 1 is to transmit to horizontal direction with the posture that tilts in the direction vertical with its direction of transfer.In addition, among Fig. 2,, do not depict substrate 1 as the inclination posture for the ease of expression.And, flow in the soup treatment trough 16 of upstream side via the upper surface of in soup treatment trough 16, moving into the substrate 1 in the washing treatment trough 10 in order not make from the pure water of pure water injection nozzle 14 ejections, as shown in Figure 2, be arranged in the pure water injection nozzle 14 apart from mouthful 12 nearest locational pure water injection nozzle 14a that move into of washing treatment trough 10 and dispose ejiction opening in mode towards the place ahead ejection pure water of the direction of transfer of substrate 1.In addition, in this substrate board treatment, the inner bottom part of washing treatment trough 10 is separated the demarcation strip 22 of plate 20 and Width to be separated, and the inner bottom part of washing treatment trough 10 is divided into the discharge opeing slot part 26 that reclaims slot part 24 and L font.
Demarcation strip 20 is located at substrate 1 on the inner bottom surface of washing treatment trough 10, that be tilted transmission than on the position under the edge of hanging down a side along the direction of transfer of substrate 1 is upright.The upper end of demarcation strip 20 preferably is configured to the edge near low side of substrate 1 shown in Fig. 3 (a).And the demarcation strip 22 of Width is along upright mouthful 12 1 sides of moving into that are located at substrate 1 of the direction vertical with the direction of transfer of substrate 1.And an end of the demarcation strip 22 of Width is connected on the end of demarcation strip 20 with being hook-type.
And the bottom of the recovery slot part 24 of washing treatment trough 10 is provided with liquids recovery mouth 28, is connected with liquids recovery pipe arrangement 30 on this liquids recovery mouth 28.Liquids recovery pipe arrangement 30 is connected and stores on the recycling can 34 that reclaims liquid 32.And, on recycling can 34, be connected with an end of the liquor charging pipe arrangement 36 that has installed filter 38 and pump 40 respectively additional, though not shown, the front end of liquor charging pipe arrangement 36 is connected on pure water injection nozzle 14, the 14a.On the other hand, the bottom of the discharge opeing slot part 26 of washing treatment trough 10 is provided with liquid outlet 42, is connected with discharging tube 44 on this liquid outlet 42.
In possessing the substrate board treatment of said structure, shown in Fig. 3 (a), when substrate 1 by pure water injection nozzle 14 the position is set the time, from pure water injection nozzle 14 to the pure water of substrate 1 ejection with attached to the soup on the upper surface of substrate 12 on substrate 1 to a lower side flow, flow down from the edge of substrate 1.And the part of the pure water that sprays to the lower surface of substrate 1 from pure water injection nozzle 14 is along the lower surface of the substrate 1 low side flow to substrate 1, flows down from the edge of substrate 1.The pure water that flows down from the edge of substrate 1 and the mixed liquor of soup flow in the discharge opeing slot part 26, flow out in discharging tube 44 by liquid outlets 42 in discharge opeing slot part 26, by discharging tube 44, are discharged from as waste liquid.And,, flow to and reclaim in the slot part 24 to the part of the pure water of lower surface one side of substrate 1 ejection lower surface drippage from pure water injection nozzle 14 from substrate 1.Then, be recovered to a spot of pure water that reclaims in the slot part 24 and flow out in liquids recovery pipe arrangement 30 by liquids recovery mouth 28, flow in the recycling can 34 by liquids recovery pipe arrangement 30 from reclaiming in the slot part 24.Like this, be stored in the recycling can 34 recovery liquid 32 by liquor charging pipe arrangement 36 turn back to pure water injection nozzle 14,14a is reused.In addition, though turn back to recycling can 34 from the pure water of pure water injection nozzle 14 ejection of downside running into substrate 1 its part of back this moment, in fact can not produce unfavorable condition.That is, in attached to the soup on the lower surface of substrate 1,, only adhered to a spot of soup on the lower surface because the effect of gravity is compared with upper surface.Therefore, the pure water of running on the lower surface of substrate 1 only contains considerably less soup, so even turning back to recycling can 34 utilizes again, in fact also can not produce unfavorable condition.And, because in soup treatment trough 16, sometimes also adopt the mangle roller remove attached to the soup on the lower surface of substrate 1, enter the soup that adheres on the lower surface in the washing treatment trough 10, substrate 1 in this case still less, so in fact can not produce unfavorable condition.
On the other hand, shown in Fig. 3 (b), when substrate 1 not by pure water injection nozzle 14 the position is set the time, intactly do not flow to from the pure water of pure water injection nozzle 14 ejection and to reclaim in the slot part 24 via the surface of substrate 1.Flow to a large amount of pure water that is recovered in the recovery slot part 24 and flow out in liquids recovery pipe arrangement 30 by liquids recovery mouths 28, flow in the recycling can 34 by liquids recovery pipe arrangement 30 from reclaiming in the slot part 24.Then, be stored in the recycling can 34 recovery liquid (pure water) 32 by liquor charging pipe arrangement 36 turn back to pure water injection nozzle 14,14a is reused.In this case, pure water can flow in the discharge opeing slot part 26 hardly, and is also considerably less from discharge opeing slot part 26 interior waste liquid amount by discharging tube 44 discharges.
And, near moving into mouthfuls 12 of washing treatment trough 10, because from pure water injection nozzle 14a, the substrate 1 that move in the washing treatment trough 10 in the soup treatment trough 16 relatively towards the place ahead of the direction of transfer of substrate 1, is attached with soup sprays pure water, so be ejected on the substrate 1 pure water with attached to the soup on the upper surface of substrate 12 on substrate 1 forwards an effluent arrive, flow down from the front edge of substrate 1.The pure water that flows down from the front edge of substrate 1 and the mixed liquor of soup flow to by the demarcation strip 22 of Width in the discharge opeing slot part 26 that reclaims slot part 24 and separate, and flow to liquid outlet 42 on the inner bottom surface of discharge opeing slot part 26.Then, in discharge opeing slot part 26, in discharging tube 44, flow out,, discharge as waste liquid by discharging tube 44 by liquid outlet 42.
As mentioned above, in this substrate board treatment,, in the clean of substrate 1, use pure water, so the treatment effeciency of substrate 1 can not reduce because the pure water after using almost no longer utilizes and discharges as waste liquid with soup.And, since the mixed liquor of pure water and soup can be liquids recovery pipe arrangement 30 in, in the recycling can 34, in the liquor charging pipe arrangement 36 and the internal flow of pump 40, so but Min. these parts of inhibition by liquid medicine contamination.On the other hand, utilized once more owing to be recovered to the pure water that reclaims in the slot part 24, thus the use amount of pure water is reduced, and reduced waste liquid amount.
In above-mentioned substrate board treatment, the locational pure water injection nozzle 14a that moves into mouth 12 that is arranged on the most close washing treatment trough 10 in the pure water injection nozzle 14 disposes ejiction opening in the mode towards direction of transfer the place ahead of substrate 1 ejection pure water.And, for pure water is flowed in the soup treatment trough 16 of upstream side via the upper surface of the substrate of moving in washing treatment trough 10 1, also can washing treatment trough 10 move into mouthfuls 12 near air knife is set, but in possessing the device of this structure, will be as described in the above-mentioned execution mode, discharge opeing slot part 26 is made the L font, the pure water and the soup that flow down from the front edge of substrate 1 from the treatment trough 10 to washing that move in are flow in the discharge opeing slot part 26.And under the very not many situations of the amount of pure water that flows down from the front edge that moves into to the substrate of washing in the treatment trough 10 1 and soup, shown in the vertical view of Fig. 4, the demarcation strip 22 of Width also can be set, on the total length of washing treatment trough 10,, divide into recovery slot part 48 and discharge opeing slot part 50 by the inner bottom part that this demarcation strip 46 will be washed treatment trough 10 along the upright demarcation strip 46 of establishing of the direction of transfer of substrate 1.
In the 1st execution mode, discarded as waste liquid by the liquid that discharging tube 44 is discharged, but in the present invention, and do not mean that the liquid of discharge must be waste liquid just.For example, be provided with continuously in the downstream of soup treatment trough under the situation of two washing treatment troughs, can consider the present invention is used for two washing treatment troughs, become following structure.That is, in the washing treatment trough in downstream, use new pure water in order to wash without use.Like this, the liquid of discharging from discharging tube 44 in the washing treatment trough in downstream is not waste liquid, but is sent to the washing treatment trough of upstream side, in the washing treatment trough of upstream side, can be used for washing as new liquid.This is owing to adhered to a large amount of soups on the substrate in moving into the washing treatment trough of upstream side, and the substrate of moving in the washing treatment trough in downstream has cleaned the cause that the soup that adheres to is considerably less in the washing treatment trough of upstream side.Also can be described as, in the washing treatment trough in downstream, the liquid of discharging from discharging tube 44 only contains very small amount of soup, is the degree that can use as new liquid in the washing treatment trough of upstream side.Like this, be sent to by the liquid of will be in the washing treatment trough in downstream discharging from discharging tube 44 the washing treatment trough of upstream side and utilize again, can further reduce the use amount of pure water.
And, in above-mentioned example, be discharge opeing slot part 26 to be made make the part that forms by demarcation strip 20 and be the L font, but also can from these two parts, discharging tube be set respectively, both sides' discharging tube is connected on the recycling can 34 by the partially communicating integral body that the demarcation strip 22 of Width forms.
Fig. 5 and Fig. 6 illustrate another example of the present invention's the 1st execution mode, and Fig. 5 is the vertical view that schematically illustrates the substrate board treatment general configuration, and Fig. 6 is that VI-VI among Fig. 5 is to cutaway view.In this substrate board treatment, owing to the structure of the major part of carrying out processing substrate is also identical with the conventional device that Figure 19 is described with action, so the repetitive description thereof will be omitted.And the parts that indicate the Reference numeral identical with the Reference numeral that uses among Fig. 1 to Fig. 3 in Fig. 5 and Fig. 6 are represented to have and the parts of above-mentioned parts identical function that Fig. 1 to Fig. 3 is described, omit the explanation to its repetition.
In this substrate board treatment, though not shown, a plurality of transfer rollers that are provided in washing treatment trough 10 inside side by side also all are supported in the direction vertical with the direction of transfer of substrate 1 and tilt.As shown in Figure 6, substrate 1 is to transmit to horizontal direction with the posture that tilts in the direction vertical with its direction of transfer.Like this, in this substrate board treatment, in the inside of washing treatment trough 10, along the direction of transfer horizontally set discharge opeing chute 66 of substrate 1.This discharge opeing chute 66 be configured in obliquely the substrate 1 that transmits low side edge under near the position.And the bottom of discharge opeing chute 66 is provided with liquid outlet 68, is connected with discharging tube 70 on this liquid outlet 68.
On the other hand, the inner bottom part of washing treatment trough 10 is provided with liquids recovery mouth 72, is connected with liquids recovery pipe arrangement 74 on this liquids recovery mouth 72.Though it is not shown, but it is the same with the device shown in Fig. 1 to Fig. 3, liquids recovery pipe arrangement 74 is connected and stores on the recycling can that reclaims liquid, be connected with an end of the liquor charging pipe arrangement that has installed filter and pump respectively additional on recycling can, the front end of liquor charging pipe arrangement is connected on pure water injection nozzle 14, the 14a.
In possessing the substrate board treatment of said structure, as shown in Figure 6, when substrate 1 by pure water injection nozzle 14 the position is set the time, from pure water injection nozzle 14 to the pure water of substrate 1 ejection with attached to the soup on the upper surface of substrate 12 on substrate 1 to a lower side flow, flow down from the edge of substrate 1.And the part of the pure water that sprays to the lower surface of substrate 1 from pure water injection nozzle 14 is along the lower surface of the substrate 1 low side flow to substrate 1, flows down from the edge of substrate 1.The pure water that flows down from the edge of substrate 1 and the mixed liquor of soup flow in the discharge opeing chute 66, flow out in discharging tube 70 by liquid outlets 68 in discharge opeing chute 66, by discharging tube 70, are discharged from as waste liquid.And, to the part of the pure water of lower surface one side of substrate 1 ejection lower surface drippage, flow to the inner bottom part of washing treatment trough 10 from pure water injection nozzle 14 from substrate 1.Then, a spot of pure water that is recovered to the inner bottom part of washing treatment trough 10 flows out in liquids recovery pipe arrangement 74 by liquids recovery mouth 72 from the inner bottom part of washing treatment trough 10, flows in the recycling cans by liquids recovery pipe arrangement 74.Like this, be stored in the recycling can recovery liquid by the liquor charging pipe arrangement turn back to pure water injection nozzle 14,14a is reused.
On the other hand, when substrate 1 not by pure water injection nozzle 14 the position is set the time, intactly do not flow to the inner bottom part of washing treatment trough 10 via the surface of substrate 1 from the pure water of pure water injection nozzle 14 ejection.The a large amount of pure water that is recovered of inner bottom part that flows to washing treatment trough 10 flows out in liquids recovery pipe arrangement 74 by liquids recovery mouth 72 from the inner bottom part of washing treatment trough 10, flows in the recycling can by liquids recovery pipe arrangement 74.Then, be stored in the recycling can recovery liquid (pure water) by the liquor charging pipe arrangement turn back to pure water injection nozzle 14,14a is reused.In this case, pure water can flow in the discharge opeing chute 66 hardly, and is also considerably less from discharge opeing chute 66 interior waste liquid amount by discharging tube 70 discharges.
As mentioned above, in this substrate board treatment,, in the clean of substrate 1, use pure water, so the treatment effeciency of substrate 1 can not reduce because the pure water after using almost no longer utilizes and discharges as waste liquid with soup.And, since the mixed liquor of pure water and soup can be liquids recovery pipe arrangement 74 in, in the recycling can, in the liquor charging pipe arrangement and the inside of pump etc. flows, so but these parts of Min. ground inhibition by liquid medicine contamination.On the other hand, utilized once more owing to be recovered to the pure water of the inner bottom part of washing treatment trough 10, thus the use amount of pure water is reduced, and reduced waste liquid amount.
Fig. 7 and Fig. 8 illustrate another example of the present invention's the 1st execution mode, and Fig. 7 is the vertical view that schematically illustrates the substrate board treatment general configuration, and Fig. 8 is that VIII-VIII among Fig. 7 is to cutaway view.In this substrate board treatment, owing to the structure of the major part of carrying out processing substrate is also identical with the conventional device that Figure 19 is described with action, so the repetitive description thereof will be omitted.And the parts that indicate the Reference numeral identical with the Reference numeral that uses among Fig. 1 to Fig. 3 in Fig. 7 and Fig. 8 are represented to have and the parts of above-mentioned parts identical function that Fig. 1 to Fig. 3 is described, omit the explanation to its repetition.
In this substrate board treatment, though not shown, a plurality of transfer rollers that are provided in washing treatment trough 10 inside side by side also all are to be supported along horizontal direction, and as shown in Figure 8, substrate 1 is to transmit to horizontal direction with horizontal posture.Like this, in this substrate board treatment, the inner bottom part of washing treatment trough 10 is separated by the demarcation strip 78 of a pair of demarcation strip 76a, 76b and Width, the inner bottom part of washing treatment trough 10 is distinguished into reclaims slot part 80 and a pair of discharge opeing slot part 82a, 82b and move into oral-lateral discharge opeing slot part 84.
Under the edge of substrate 1 both sides that a pair of dividing plate 76a, 76b transmit on the upright inner bottom part that is located at washing treatment trough 10 of the direction of transfer of substrate 1, with horizontal posture respectively near the position.The upper end of demarcation strip 76a, 76b preferably disposes to the edge of close substrate 1 both sides respectively as shown in Figure 8.And, the substrate 1 of the demarcation strip 78 of Width on the upright inner bottom surface that is located at washing treatment trough 10 of the direction vertical with the direction of transfer of substrate 1 remove inlet side.Like this, the both ends of the demarcation strip 78 of Width are connected on the end of each demarcation strip 76a, 76b with being hook-type respectively, and a pair of discharge opeing slot part 82a, 82b and the discharge opeing slot part 84 of moving into oral-lateral are interconnected and are connected on the stream.
And the bottom of the recovery slot part 80 of washing treatment trough 10 is provided with liquids recovery mouth 86, is connected with liquids recovery pipe arrangement 88 on this liquids recovery mouth 86.Though it is not shown, but liquids recovery pipe arrangement 88 is the same with the device shown in Fig. 1 to Fig. 3, be connected and store on the recycling can that reclaims liquid, an end that is connected to the liquor charging pipe arrangement that has installed filter and pump respectively additional is led at the recycling can upper reaches, and the front end of liquor charging pipe arrangement is connected on pure water injection nozzle 14, the 14a.On the other hand, the bottom of the discharge opeing slot part 82a of washing treatment trough 10 is provided with liquid outlet 90, is connected with discharging tube 92 on this liquid outlet 90.
In having the substrate board treatment of said structure, as shown in Figure 8, when substrate 1 by pure water injection nozzle 14 the position is set the time, from pure water injection nozzle 14 to the pure water of substrate 1 ejection with attached to the soup on the upper surface of substrate 12 on substrate 1 to two side flow, the two edges from substrate 1 flow down respectively.And, from pure water injection nozzle 14 to the part of the pure water of lower surface one side of substrate 1 ejection along the lower surface of substrate 1 to 1 liang of side flow of substrate, flow down from the two edges of substrate 1.The pure water that flows down from the two edges of substrate 1 and the mixed liquor of soup flow to respectively in each discharge opeing slot part 82a, 82b respectively, flow out in discharging tube 92 by liquid outlet 90 in discharge opeing slot part 82a, 82b, by discharging tube 92, are discharged from as waste liquid.And,, flow to and reclaim in the slot part 80 to the part of the pure water of lower surface one side of substrate 1 ejection lower surface drippage from pure water injection nozzle 14 from substrate 1.Then, be recovered to a spot of pure water that reclaims in the slot part 80 and flow out in liquids recovery pipe arrangement 88 by liquids recovery mouth 86, flow in the recycling can by liquids recovery pipe arrangement 88 from reclaiming slot part 80.Like this, be stored in the recycling can recovery liquid by the liquor charging pipe arrangement turn back to pure water injection nozzle 14,14a is reused.
On the other hand, when substrate 1 not by pure water injection nozzle 14 the position is set the time, intactly do not flow to from the pure water of pure water injection nozzle 14 ejection and to reclaim in the slot part 80 via the surface of substrate 1.Flow to a large amount of pure water that is recovered in the recovery slot part 80 and flow out in liquids recovery pipe arrangement 88 by liquids recovery mouths 86, flow in the recycling cans by liquids recovery pipe arrangement 88 from reclaiming in the slot part 80.Then, be stored in the recycling can recovery liquid (pure water) by the liquor charging pipe arrangement turn back to pure water injection nozzle 14,14a is reused.In this case, pure water can flow in discharge opeing slot part 82a, the 82b hardly, and the waste liquid amount of discharging by discharging tube 92 in discharge opeing slot part 82a, the 82b is also considerably less.
And, near moving into the mouth of washing treatment trough 10, the substrate 1 that move in the washing treatment trough 10 in the soup treatment trough 16 relatively towards the place ahead of the direction of transfer of substrate 1, is attached with soup sprays pure water, so be ejected into pure water on the substrate 1 with attached to the soup on the upper surface of substrate 12 side flow forwards on substrate 1, flow down from the front edge of substrate 1.The pure water that flows down from the front edge of substrate 1 and the mixed liquor of soup flow to by the demarcation strip 78 of Width from reclaiming moving in the oral-lateral emissions groove liquid portion 84 that slot part 80 separates, flow to liquid outlet 90 on the inner bottom surface of moving into oral-lateral discharge opeing slot part 84.Then, in discharge opeing slot part 82a, in discharging tube 92, flow out,, discharge as waste liquid by discharging tube 92 by liquid outlet 90.
In this substrate board treatment, also identical with the device shown in Fig. 1 to Fig. 3, the treatment effeciency of substrate 1 can not reduce, and, but Min. ground suppresses in the liquids recovery pipe arrangement 88, in the recycling can, in the liquor charging pipe arrangement and the parts such as inside of pump by liquid medicine contamination.On the other hand, the use amount of pure water be can obtain to reduce, and the effect and the effect of waste liquid amount reduced.
Fig. 9 and Figure 10 illustrate another example of the present invention's the 1st execution mode, and Fig. 9 is the vertical view that schematically illustrates the substrate board treatment general configuration, and Figure 10 is that X-X among Fig. 9 is to cutaway view.In this substrate board treatment, owing to the structure of the major part of carrying out processing substrate is also identical with the conventional device that Figure 19 is described with action, so the repetitive description thereof will be omitted.And the parts that indicate the Reference numeral identical with the Reference numeral that uses among Fig. 1 to Fig. 3 in Fig. 9 and Figure 10 are represented to have and the parts of above-mentioned parts identical function that Fig. 1 to Fig. 3 is described, omit the explanation to its repetition.
In this substrate board treatment, though not shown, a plurality of transfer rollers that are provided in washing treatment trough 10 inside side by side also all are supported to level, and as shown in figure 10, substrate 1 is to transmit to horizontal direction with horizontal posture.Like this, in this substrate board treatment, in the inside of washing treatment trough 10, along a pair of discharge opeing chute of direction of transfer horizontally set 49a, the 49b of substrate 1.This a pair of discharge opeing chute 94a, 94b are configured in respectively with near the position under the edge of substrate 1 both sides of horizontal posture transmission.And, on the bottom of each discharge opeing chute 94a, 94b, be respectively arranged with liquid outlet 96a, 96b, on each liquid outlet 96a, 96b, be connected with discharging tube 98a, 98b respectively.
On the other hand, the inner bottom part of washing treatment trough 10 is provided with liquids recovery mouth 100, is connected with liquids recovery pipe arrangement 102 on this liquids recovery mouth 100.Though it is not shown, but it is the same with the device shown in Fig. 1 to Fig. 3, liquids recovery pipe arrangement 102 is connected and stores on the recycling can that reclaims liquid, be connected with an end of the liquor charging pipe arrangement that has installed filter and pump respectively additional on recycling can, the front end of liquor charging pipe arrangement is connected on pure water injection nozzle 14, the 14a.
In possessing the substrate board treatment of said structure, as shown in figure 10, when substrate 1 by pure water injection nozzle 14 the position is set the time, from pure water injection nozzle 14 to the pure water of substrate 1 ejection with attached to the soup on the upper surface of substrate 12 on substrate 1 to two side flow, the two edges from substrate 1 flow down respectively.And the part of the pure water that sprays to the lower surface of substrate 1 from pure water injection nozzle 14 is along the lower surface of substrate 1 two side flow to substrate 1, and the two edges from substrate 1 flow down respectively.The pure water that flows down from the two edges of substrate 1 and the mixed liquor of soup flow in each discharge opeing chute 94a, 94b respectively, in each discharge opeing chute 94a, 94b, in discharging tube 98a, 98b, flow out by liquid outlet 96a, 96b, by discharging tube 98a, 98b, be discharged from as waste liquid.And, to the part of the pure water of lower surface one side of substrate 1 ejection lower surface drippage, flow to the inner bottom part of washing treatment trough 10 from pure water injection nozzle 14 from substrate 1.Then, a spot of pure water that is recovered to the inner bottom part of washing treatment trough 10 flows out in liquids recovery pipe arrangement 102 by liquids recovery mouth 100 from the inner bottom part of washing treatment trough 10, flows in the recycling cans by liquids recovery pipe arrangement 102.Then, be stored in the recycling can recovery liquid by the liquor charging pipe arrangement turn back to pure water injection nozzle 14,14a is reused.
On the other hand, when substrate 1 not by pure water injection nozzle 14 the position is set the time, intactly do not flow to the inner bottom part of washing treatment trough 10 via the surface of substrate 1 from the pure water of pure water injection nozzle 14 ejection.The a large amount of pure water that is recovered of inner bottom part that flows to washing treatment trough 10 flows out to liquids recovery pipe arrangement 102 in by liquids recovery mouth 100 from the inner bottom part of washing treatment trough 10, in liquids recovery pipe arrangement 102 inflow recycling cans.Then, be stored in the recycling can recovery liquid (pure water) by the liquor charging pipe arrangement turn back to pure water injection nozzle 14,14a is reused.In this case, pure water can flow in discharge opeing chute 94a, the 94b hardly, and the waste liquid amount of discharging by discharging tube 98a, 98b in discharge opeing chute 94a, the 94b is also considerably less.
In this substrate board treatment, also the same with the device shown in Fig. 5 and Fig. 6, the treatment effeciency of substrate 1 can not reduce, and, but Min. ground suppresses in the liquids recovery pipe arrangement 102, in the recycling can, in the liquor charging pipe arrangement and the parts such as inside of pump by liquid medicine contamination.On the other hand, the use amount of pure water be can obtain to reduce, and the effect and the effect of waste liquid amount reduced.
As the execution mode as shown in the execution mode as shown in Fig. 7 and Fig. 8 or Fig. 9 and Figure 10, with horizontal posture when horizontal direction transmits substrate 1, exist from pure water injection nozzle 14 and be difficult to the possibility that flows at substrate 1 to the mixed liquor of the pure water of substrate 1 ejection and soup.In this case, shown in the end view of Figure 11, can adopt will connect with the central portion of the lower surface of substrate 1, the diameter of the transfer roller 104 of supporting substrates 1 make greater than respectively with the diameter of the transfer roller 106,106 of the lower surface both ends butt of substrate 1, supporting substrates 1, with substrate 1 be supported to its direction of transfer on central portion be higher than the structure that ground, both ends transmits.Owing to adopt this structure, from pure water injection nozzle 14 to the mixed liquor of the pure water of substrate 1 ejection and soup about the central portion of substrate 1 is divided into, can on substrate 1, not be detained, and on substrate 1, flow, flow down from the two edges of substrate 1 to both ends from middle body.
And, also can be shown in the end view of Figure 12, employing is configured to the structure of its ejiction opening towards the both ends of substrate 1 respectively with each pure water injection nozzle 14, by adopting this structure, because pure water is to spray to substrate 1 obliquely towards both ends respectively in the direction vertical with direction of transfer from the surface of each injection nozzle 14 with respect to substrate 1, so be ejected into the stream thigh that forms the pure water on the substrate 1 respectively towards both ends from each injection nozzle 14, pure water and soup mix and flow to both ends on substrate 1, flow down from the edge of substrate 1.
And, also can be shown in the vertical view of expression substrate board treatment among Figure 13, employing with horizontal posture near position under the lateral edges place, rear and front end of the substrate 1 that horizontal direction transmits, be equipped with a pair of auxiliary discharge opeing chute 108a, 108b along the direction vertical respectively, and be supported to the structure that synchronously moves that moves of this a pair of auxiliary discharge opeing chute 108a, 108b and substrate 1 to horizontal direction with direction of transfer.In possessing the substrate board treatment of this structure, when substrate 1 is transmitted, even the pure water that has mixed to substrate 1 cleaning ejection, that be used for substrate 1 and with soup from pure water injection nozzle 14 flows down from the rear and front end lateral edges of substrate 1 respectively, the pure water that flows down from the both end sides edge of substrate 1 and the mixed liquor of soup flow to respectively in each auxiliary discharge opeing chute 108a, 108b respectively, are discharged from by the auxiliary discharge opeing path (not shown) that is connected on each auxiliary discharge opeing chute 108a, 108b.
In addition, in the 1st execution mode, be that the substrate board treatment that possesses washing treatment trough 10 in abutting connection with ground with soup treatment trough 16 is illustrated, but the present invention also go for cleaning in addition, development, etching and the substrate board treatment of handling such as peel off.
2. the 2nd execution mode
Below, be illustrated with reference to 14 to 18 pairs of the 2nd execution modes of the present invention of accompanying drawing.
Figure 14 illustrates an example of the present invention's the 2nd execution mode, is the end view that schematically illustrates as the development processing apparatus general configuration of one of substrate board treatment.In this development processing apparatus, owing to the structure of the major part of carrying out development treatment is identical with the conventional device that Figure 20 is described with action, so in Figure 14 to same parts be marked with Figure 20 in the identical Reference numeral of Reference numeral that uses, omit its repeat specification.
In this development processing apparatus, below developer solution injection nozzle 116, the inside of development treatment groove 110 is separated, be provided with and reclaim slot part 122.In addition, recovering tray (returnable) also can be set and recovery slot part 122 be set below developer solution injection nozzle 116 with replacement.In this recovery slot part 122, reclaim have when substrate 1 not by developer solution injection nozzle 116 under during the position from 116 ejections of developer solution injection nozzle, the developer solution (with reference to Figure 15) that intactly do not flow down via the surface of substrate 1.The bottom of reclaiming slot part 112 is provided with from substrate 1 and flows to the liquids recovery mouth 124 that the developer solution on the inner bottom part of accumulator tank portion 122 flows out, and is connected with liquids recovery pipe arrangement 126 on this liquids recovery mouth 124.Liquids recovery pipe arrangement 126 is connected on the recycling can 130 that stores the developer solution 128 that is recovered.And, on recycling can 130, being connected with an end of liquor charging pipe arrangement 132, the front end of liquor charging pipe arrangement 132 is connected on the developer solution injection nozzle 116.On this liquor charging pipe arrangement 132, add pump 134, though not shown, also add filter as required.Constitute fluid circulation system by liquids recovery pipe arrangement 126, recycling can 130, liquor charging pipe arrangement 132 and pump 134.
And, as shown in figure 14, the bottom that distinguishes with recovery slot part 122 on the development treatment groove 110 is provided with liquid outlet 136, the developer solution that is used on the inner bottom part 1 that remove from substrate by mangle roller 118, flow to development treatment groove 110 from substrate 1 flows out, and is connected with discharge opeing pipe arrangement 138 on this liquid outlet 136.
In addition, be equipped with the washer jet 140 that cleans towards the inner bottom surface of development treatment groove 110 ejection cleaning fluid, to the inner bottom surface of development treatment groove 110 in the inside of development treatment groove 110.And, though not shown, also can be provided for the washer jet that the parts such as transfer roller that set are cleaned in the inside of development treatment groove 110.Supply cleaning fluids from the cleaning fluid source of supply to washer jet 140.In the example shown in Figure 14, the discharge outlet 142 that be provided with the cleaning that is used for substrate 1 with development treatment groove 110 in abutting connection with the bottom of the washing treatment trough 114 that is provided with, the pure water on the inner bottom part that flows to washing treatment trough 114 flows out, on this discharge outlet 142, be connected with water and reclaim pipe arrangement 144, water is reclaimed pipe arrangement 144 be connected on the water recovery tank 146, the pure water 148 that will use in washing treatment trough 144 is recovered in the water recovery tank 146 and stores.Then, an end that send water pipe arrangement 150 is connected on the water recovery tank 146, the front end that send water pipe arrangement 150 is connected on the washer jet 140, the pure water 148 in the water recovery tank 146 is supplied to washer jet 140 by being installed at the pump 152 that send on the water pipe arrangement 150.
In having the development processing apparatus of said structure, be recycled to the recovery slot part 122 of development treatment groove 110 from developer solution injection nozzle 116 developer solutions 3 ejection, that intactly do not flow down, be recycled to the developer solution that reclaims in the slot part 122 and flow into recycling can 130 interior storages by liquids recovery pipe arrangement 126 via the surface of substrate 1.Then, the developer solution 128 in the recycling can 130 is sent to developer solution injection nozzle 116 by liquor charging pipe arrangement 132.Because the developer solution that recycles like this is not via the surface of substrate 1, so in developer solution, can not contain non-dissolved matter, thereby the inside of the inner surface of the inner surface of recycling can 130, liquids recovery pipe arrangement 126 or liquor charging pipe arrangement 132 and pump 134 etc. can not polluted by non-dissolved matter.
On the other hand, the developer solution that flows to substrate 1 ejection, from substrate 1 after the use on the inner bottom part of development treatment groove 110 from developer solution injection nozzle 116 is discharged from by discharge opeing pipe arrangement 138 from liquid outlet 136.Therefore, can not have problems even contain non-dissolved matter in its developer solution yet.And the inner bottom surface of the development treatment groove 110 that contact with developer solution after using or discharge opeing pipe arrangement 138 etc. are sent to washer jet 140 and from pure water 148 cleanings of washer jet 140 ejections, have been prevented pollution by sending water pipe arrangement 150 from water recovery tank 146.In addition, not wanting to make under the parts that contact with substrate 1, the situation that for example mangle roller 118 is adhered to by pure water, can use treatment fluid that this parts are cleaned.
Figure 15 illustrates the wiper mechanism and different example shown in Figure 14 of development treatment groove, is the end view that schematically illustrates the development processing apparatus general configuration.In Figure 15, the parts that indicate the Reference numeral identical with the Reference numeral that uses among Figure 14 are to have and same parts to the parts identical function of Figure 14 explanation, and the repetitive description thereof will be omitted.In addition, Figure 15 represents that substrate 1 is not by intactly being recycled to state in the recycling can 130 from the developer solution 3 of developer solution injection nozzle 116 ejections during the position under the developer solution injection nozzle 116.
In device shown in Figure 15, make the inner bottom surface 156 of development treatment groove 154 be inclined to washing treatment trough 158 1 side height, recovery slot part 122 1 sides of development treatment groove 154 adjacency low.Then, on the high position of washing treatment trough 158 1 sides, washer jet 160 is set, on the low position of recovery slot part 122 1 sides, liquid outlet 162 is set, on this liquid outlet 162, be connected with discharge opeing pipe arrangement 164.And, inside at washing treatment trough 158, be equipped with recovery and be provided in its up and down water recovering tray 166 of the pure water that sprays to the upper and lower surface of substrate 1 of a plurality of spray nozzles 120 on the both sides from transfer path L across substrate 1, this water recovering tray 166 is configured on the position that is higher than washer jet 160, by sending water pipe arrangement 168 bottom of water recovering tray 166 is connected with washer jet 160.Send water pipe arrangement 168 to be branched off into excretory duct 170 halfway, on this excretory duct 170, add open and close valve 172.And the bottom of washing treatment trough 158 is provided with discharge outlet 174, is connected with drainage piping 176 on this discharge outlet 174.
In the device of structure shown in Figure 15, the pure water that is recovered in the water recovering tray 166 is sent to washer jet 160 by sending water pipe arrangement 168, sprays pure water from washer jet 160 to the inner bottom surface 156 of development treatment groove 154.The pure water of ejection flows along being tilted on the inner bottom surface 156 of inner bottom surface 156 on the inner bottom surface 156 of development treatment groove 154.Therefore, the integral body on the inner bottom surface 156 of development treatment groove 154 is cleaned by pure water.Then, flowing near recovery slot part 122 pure water discharges by discharge opeing pipe arrangement 164 from the liquid outlet 162 of development treatment groove 154 bottoms.
Figure 16 illustrates another example of the present invention's the 2nd execution mode, is the end view that schematically illustrates the development processing apparatus general configuration.In Figure 16, the parts that indicate the Reference numeral identical with the Reference numeral that uses among Figure 14 are to have and same parts to the parts identical function of Figure 14 explanation, and the repetitive description thereof will be omitted.
In device shown in Figure 16, make discharge opeing pipe arrangement 178 branch halfway on the liquid outlet 136 that is connected development treatment groove 110 bottoms, the front end that returns liquid pipe arrangement 180 of branch is connected on the recycling can 130, flow channel switching valve 182 is installed on the branch location of discharge opeing pipe arrangement 178.And, make liquor charging pipe arrangement 132 branch halfway that be communicated with to connect recycling can 130 and developer solution injection nozzle 116, the front end of the cleaning liquor charging pipe arrangement 184 of branch is connected on the washer jet 140.Then, open and close control valve 186 is installed on the cleaning liquor charging pipe arrangement 184, and, open and close control valve 188 is installed at connection connects sending on the water pipe arrangement 150 of water recovery tank 146 and washer jet 140.
In possessing the device of structure shown in Figure 16, when not containing non-dissolved matter the developer solution after the use of the inner bottom part that flows to development treatment groove 110 from substrate 1, when for example the substrate that coating has been formed the resist coated film of lysotype carries out development treatment etc., flow path transfer valve 182 carries out handover operation, make discharge opeing pipe arrangement 178 and return liquid pipe arrangement 180 to be connected state, the developer solution after the use flows into back in the liquid pipe arrangement 180 in discharge opeing pipe arrangement 178.In this case, be installed at the open and close control valve 188 that send on the water pipe arrangement 150 by closing, the developer solution after the use does not mix with pure water.So, the developer solution after the use is recycled in the recycling can 130 by discharge opeing pipe arrangement 178 and time liquid pipe arrangement 180.Then, with the developer solution after using and substrate 1 not by under the developer solution injection nozzle 116 during the position from 116 ejections of developer solution injection nozzle, and intactly flow down the developer solutions that are recycled in the recycling can 130 and recycle together.At this moment, when needs clean the inner bottom surface etc. of development treatment groove 110, open the open and close control valve 186 that is installed on the liquor charging pipe arrangement 184, the part of the developer solution 128 in the recycling can 130 is sent to washer jet 140 by cleaning liquor charging pipe arrangement 184, from washer jet 140 ejection developer solutions, the inner bottom surface of development treatment groove 110 etc. is cleaned.
On the other hand, kind change when the substrate that carries out development treatment, when containing non-dissolved matter the developer solution after substrate 1 flows to the use of inner bottom part of development treatment groove 10, when for example the substrate that coating is formed with non-lysotype resist coated film carries out development treatment etc., flow path transfer valve 182 carries out handover operation, make discharge opeing pipe arrangement 178 and return liquid pipe arrangement 180 to be connected state not, the developer solution after the use is discharged from by discharge opeing pipe arrangement 178.In this case, make the open and close control valve 186 that is installed on the cleaning liquor charging pipe arrangement 184 be installed at the open and close control valve 188 that send on the water pipe arrangement 150 for opening in the closed condition, identical with the device shown in Figure 14, to be sent to washer jet 140 at the pure water after washing be used for the washing of substrate 1 in the treatment trough 114, carry out the cleaning of the inner bottom surface etc. of development treatment groove 110 with this pure water.And, under the situation of the developer solution after discharge using, can use pure water and treatment fluid simultaneously, carry out the cleaning of the inner bottom surface etc. of development treatment groove 110.
Figure 17 illustrates the example that is provided with the developer solution discharge nozzle according to the kind of the developer solution that uses, and is the end view that schematically illustrates the development processing apparatus general configuration.In Figure 17, the parts that indicate the Reference numeral identical with the Reference numeral that uses among Figure 14 and Figure 16 are to have and same parts to the parts identical function of Figure 14 and Figure 16 explanation, and the repetitive description thereof will be omitted.
In device shown in Figure 17, be provided with two developer solution injection nozzle 116a, 116b according to the kind of employed developer solution, and be provided with two according to the kind development treatment groove 110 of developer solution and reclaim slot part 122a, 122b.And, be respectively arranged with fluid circulation system and developer solution purging system according to the kind of developer solution.If describe with the Reference numeral that uses among Figure 17, then 124a, 124b are the liquids recovery mouth, 126a, 126b are the liquids recovery pipe arrangement, 130a, 130b reclaim the recycling can that stores diverse developer solution 128a, 128b respectively, 132a, 132b are for having installed the liquor charging pipe arrangement of pump 134a, 134b respectively additional, and 136a, 136b are liquid outlet.And 178a, 178b are the discharge opeing pipe arrangement, and 180a, 180b are back the liquid pipe arrangement, and 182a, 182b are flow channel switching valve, and 184a, 184b are for having installed the cleaning liquor charging pipe arrangement of open and close control valve 186a, 186b respectively additional.And, on liquids recovery pipe arrangement 126a, 126b and discharge opeing pipe arrangement 178a, 178b, add separately open and close control valve 190a, 190b, 192a, 192b respectively.
In device shown in Figure 17, by opening among open and close control valve 190a, the 190b that is installed at respectively on each liquids recovery pipe arrangement 126a, 126b and closing another, open among open and close control valve 192a, the 192b that is installed at respectively on each discharge opeing pipe arrangement 178a, 178b simultaneously and close another, can in device shown in Figure 16, carry out above-mentioned processing operation according to the kind of employed developer solution.
Figure 18 illustrates other execution modes that can handle operation according to the kind of employed developer solution, is the end view that schematically illustrates the development processing apparatus general configuration.In Figure 18, the parts that indicate the Reference numeral identical with the Reference numeral that uses among Figure 14, Figure 16 and Figure 17 are to have and same parts to the parts identical function of Figure 14, Figure 16 and Figure 17 explanation, and the repetitive description thereof will be omitted.
In device shown in Figure 180, a developer solution injection nozzle 116 only is set, for the shared developer solution injection nozzle 116 of diverse developer solution, and, in development treatment groove 110, also only be provided with one and reclaim slot part 122, reclaim diverse developer solution by identical recovery slot part 122.Then, be connected to be communicated with on the liquor charging pipe arrangement 132 on the developer solution injection nozzle 116 in connection and connect each liquor charging pipe arrangement 132a, 132b and make its interflow, described liquor charging pipe arrangement 132a, 132b are communicated with respectively to be connected respectively and reclaim on recycling can 130a, the 130b that stores diverse developer solution 128a, 128b.And, make liquor charging pipe arrangement 132 near front end place branch, the bypass pipe 194 that is connected on the developer solution discharge nozzle 116 is set, on the branch location downstream of liquor charging pipe arrangement 132 and bypass pipe 194, add open and close control valve 196a, 196b respectively.And the bottom of reclaiming slot part 122 is provided with liquid outlet 198, is communicated with on this liquid outlet 198 and connects discharge opeing pipe arrangement 900, adds open and close valve 902 on this discharge opeing pipe arrangement 900.
In device shown in Figure 180, also the same with the device shown in Figure 17, by opening among open and close control valve 190a, the 190b that is installed at respectively on each liquids recovery pipe arrangement 126a, 126b and closing another, open among open and close control valve 192a, the 192b that is installed at respectively on each discharge opeing pipe arrangement 178a, 178b simultaneously and close another, can in device shown in Figure 16, carry out above-mentioned processing operation according to the kind of employed developer solution.Then, in this device,, open the open and close valve 902 that is installed on the discharge opeing pipe arrangement 900, make to remain in the developer solution discharge of reclaiming in the slot part 122 when the kind time-like that changes developer solution.And, by opening the open and close control valve 196b that is installed on the bypass pipe 194, the flow of the developer solution that is sent to developer solution injection nozzle 116 is increased, can shorten the time of liquid displacement, improve treatment effeciency.When liquid displacement finishes, close open and close valve 902 that is installed on the discharge opeing pipe arrangement 900 and the open and close control valve 196b that is installed on the bypass pipe 194 respectively in advance.
In addition, in the above-described 2nd embodiment, preferably set up the recycling can 130 that stores the treatment fluid that reclaims, the management devices that 130a, 130b carry out the composition management of the treatment fluid in recycling can 130,130a, the 130b.This management devices is under the situation that for example is development processing apparatus, analyze the treatment fluid in recycling can 130,130a, the 130b, measure respectively wherein and developer solution (for example TMAH) the molten resist of depositing of composition (resin) composition and each concentration, when these values have departed from desirable value, add the new liquid or the high concentration liquid of developer solution in the treatment fluid in recycling can 130,130a, 130b, and, as required, it is also conceivable that the treatment fluid in discarded recycling can 130,130a, the 130b, perhaps carry out these values are remained on the action of desired value.And, also can in the treatment fluid of certain moment in recycling can 130,130a, 130b, replenish a certain amount of new liquid, perhaps that the treatment fluid in recycling can 130,130a, the 130b is discarded a certain amount of, and replenish a certain amount of new liquid etc.
Under the situation of development treatment, when when continuing to handle, making identical treatment fluid (developer solution) when recycling, because do action along with developer solution, developer solution contacts and deterioration with air, perhaps dissolve in the medium developer solution of developer solution deterioration gradually because of resist, so preferably set up above-mentioned management devices, but also adopt under the situation of developer solution in clean the purposes of developing trough inside etc. with the developer solution that reclaims, developer solution is deterioration especially easily.Therefore, above-mentioned management devices is set preferably, prevents that treatment fluid from polluting or deterioration.
And, in the 2nd execution mode, under the situation that generates non-dissolved matter, even generate under the situation of the non-dissolved matter that becomes fault when treatment fluid is recycled, specifically, be equivalent to the substrate that has for example applied the coating liquid that is used to form organic planarization film or colored resist of color filter manufacturing usefulness etc. is carried out the situation of development treatment.Can not be stripped from the coating liquid of organic planarization film formation usefulness or the common formed overlay film of the colored resist technology afterwards yet.On the contrary, under the situation that does not generate non-dissolved matter, even under the situation that does not generate the non-dissolved matter that becomes fault when treatment fluid is recycled, specifically, with respect to carrying out the situation of development treatment to having applied the substrate that fully is dissolved in the coating liquid in the developer solution.Common positive resist or negative resist are in afterwards the technology overlay film figure that forms to be carried out lift-off processing.
In addition, in the 2nd execution mode, development processing apparatus is illustrated, but the present invention also goes for cleaning, etching, peel off etc. in the substrate board treatment of handling.
Claims (19)
1. a substrate board treatment in treatment trough, transmits substrate by connecting gear to horizontal direction, and sprays treatment fluid from treatment fluid ejection mechanism to substrate, and substrate is handled, it is characterized in that,
Possess to be distinguished into with reclaiming path and discharge opeing path and be provided with, turn back to fluid circulation system in the above-mentioned treatment fluid ejection mechanism with being recovered to treatment fluid in the above-mentioned recovery path, wherein, treatment fluid ejection, that intactly do not flow down via real estate from above-mentioned treatment fluid ejection mechanism is reclaimed in described recovery path, and the treatment fluid after the use that sprays to substrate from above-mentioned treatment fluid ejection mechanism, flow, flow down from edge in the end to the direction vertical with the direction of transfer of substrate on the substrate is collected in described discharge opeing path.
2. substrate board treatment according to claim 1 is characterized in that, above-mentioned treatment trough is removed the adjacent ground connection of inlet side with the substrate of this washing treatment trough the soup treatment trough of substrate being handled with soup is set for the washing treatment trough with the pure water cleaning base plate.
3. a substrate board treatment in treatment trough, transmits substrate by connecting gear to horizontal direction, and sprays treatment fluid from treatment fluid ejection mechanism to substrate, and substrate is handled, it is characterized in that,
By above-mentioned connecting gear, transmit substrate with the posture that on the direction vertical, is inclined relative to horizontal with the substrate direction of transfer, simultaneously, near position under the low lateral edges place of substrate on the inner bottom surface of above-mentioned treatment trough, that tilt to transmit, along the upright demarcation strip of establishing of the direction of transfer of substrate; The inner bottom part of separating treatment trough by this demarcation strip, it is distinguished into recovery slot part and discharge opeing slot part, wherein, described recovery slot part reclaims treatment fluid ejection, that intactly do not flow down via real estate from above-mentioned treatment fluid ejection mechanism, described discharge opeing slot part receive spray to substrate from treatment fluid ejection mechanism, at the treatment fluid after low side flow, the use that flows down from edge on the substrate; Possess the treatment fluid that will be recovered in the above-mentioned recovery slot part and turn back to fluid circulation system in the above-mentioned treatment fluid ejection mechanism, and possess the discharge opeing stream of discharging the treatment fluid after the use that flows in the above-mentioned discharge opeing slot part.
4. substrate board treatment according to claim 3 is characterized in that, the upper end of above-mentioned demarcation strip is configured to the edge near low side of the substrate that tilts to transmit.
5. a substrate board treatment in treatment trough, transmits substrate with flat-hand position by connecting gear to horizontal direction, and sprays treatment fluid from treatment fluid ejection mechanism to substrate, and substrate is handled, it is characterized in that,
On the inner bottom surface of above-mentioned treatment trough, under the edge of the substrate both sides that are transmitted near the position, direction of transfer along substrate is provided with demarcation strip respectively, the inner bottom part of separating treatment trough by each demarcation strip respectively, it is distinguished into recovery slot part and discharge opeing slot part, wherein, described recovery slot part reclaims from the ejection of above-mentioned treatment fluid ejection mechanism, the treatment fluid that does not intactly flow down via real estate, described discharge opeing slot part reception sprays to substrate from treatment fluid ejection mechanism, on substrate to two side flow, treatment fluid after the use that flows down respectively from two edges; Possess the treatment fluid that will be recovered in the above-mentioned recovery slot part and return fluid circulation system in the above-mentioned treatment fluid ejection mechanism, and possess the discharge opeing stream that discharge flows to the treatment fluid after the use in above-mentioned each discharge opeing slot part respectively.
6. substrate board treatment according to claim 5 is characterized in that, the upper end of above-mentioned each demarcation strip is configured to the edge of approaching substrate both sides of transmitting respectively.
7. according to each described substrate board treatment in the claim 3 to 6, it is characterized in that, on the inner bottom surface of above-mentioned treatment trough, the removing on the inlet side of substrate, found the demarcation strip of establishing Width along the direction that the direction of transfer with substrate intersects, the inner bottom part of separating treatment trough by the demarcation strip of this Width, what form to receive the liquid that flows down from the front edge of moving into the substrate in the treatment trough moves into oral-lateral discharge opeing slot part, and will flow to this treatment fluid of moving in the oral-lateral discharge opeing slot part and discharge.
8. substrate board treatment according to claim 7 is characterized in that, the above-mentioned oral-lateral discharge opeing slot part of moving into is connected with above-mentioned discharge opeing slot part.
9. a substrate board treatment in treatment trough, transmits substrate by connecting gear to horizontal direction, and sprays treatment fluid from treatment fluid ejection mechanism to substrate, and substrate is handled, it is characterized in that,
By above-mentioned connecting gear, transmit substrate with the posture that on the direction vertical, is inclined relative to horizontal with the direction of transfer of substrate, simultaneously near position under the edge of the low side of substrate inside, that tilt to transmit of above-mentioned treatment trough, along the direction of transfer horizontally set discharge opeing chute of substrate, described discharge opeing chute receive spray to substrate from above-mentioned treatment fluid ejection mechanism, at the treatment fluid after low side flow, the use that flows down from edge on the substrate; Possess will from the ejection of above-mentioned treatment fluid ejection mechanism, intactly do not flow down the treatment fluid that is recycled on the above-mentioned treatment trough inner bottom part and return fluid circulation system the above-mentioned treatment fluid ejection mechanism via real estate, and possess the discharge opeing stream of discharging the treatment fluid after the use that flows in the above-mentioned discharge opeing chute.
10. a substrate board treatment in treatment trough, transmits substrate with flat-hand position by connecting gear to horizontal direction, and sprays treatment fluid from treatment fluid ejection mechanism to substrate, and substrate is handled, it is characterized in that,
Near position under the edge of the substrate both sides inside of above-mentioned treatment trough, that transmit, along a pair of discharge opeing chute of the direction of transfer horizontally set of substrate, described discharge opeing chute receive spray to substrate from above-mentioned treatment fluid ejection mechanism, at the treatment fluid after two side flow, the use that flows down respectively from two edges on the substrate; Possess will from the ejection of above-mentioned treatment fluid ejection mechanism, intactly do not flow down the treatment fluid that is recycled on the above-mentioned treatment trough inner bottom part and return fluid circulation system the above-mentioned treatment fluid ejection mechanism via real estate, and possess the discharge opeing stream that discharge flows to the treatment fluid after the use in above-mentioned each discharge opeing chute respectively.
11., it is characterized in that on above-mentioned connecting gear direction that the direction of transfer of substrate supporting Cheng Zaiyu substrate is vertical, the central portion of substrate is higher than the both ends of substrate according to claim 5,6 or 10 described substrate board treatments.
12. according to claim 5,6 or 10 described substrate board treatments, it is characterized in that, with respect to substrate surface respectively the mode that tilts of the substrate both ends on the direction vertical with the direction of transfer of substrate spray treatment fluid from above-mentioned treatment fluid ejection mechanism to substrate.
13. according to claim 5,6 or 10 described substrate board treatments, it is characterized in that, near position under the lateral edges place, rear and front end of the substrate that transmits by above-mentioned connecting gear, along the direction vertical with the direction of transfer of substrate, set the auxiliary discharge opeing chute of the treatment fluid after the use that a pair of reception flows down respectively from the rear and front end lateral edges of substrate, this a pair of auxiliary discharge opeing chute is supported to moving of substrate synchronously moves, possess the auxiliary discharge opeing stream that discharge flows to the treatment fluid after the use in above-mentioned each auxiliary discharge opeing chute respectively to horizontal direction.
14. a substrate board treatment in treatment trough, is discharged treatment fluid from treatment fluid ejection mechanism to substrate while transmit substrate, and substrate is handled, it is characterized in that,
Below above-mentioned treatment fluid ejection structure, form to reclaim from the ejection of above-mentioned treatment fluid ejection mechanism, the recovery slot part of the treatment fluid that does not intactly flow down via real estate, and, below above-mentioned treatment fluid ejection mechanism, set recovery from the ejection of treatment fluid ejection mechanism, the returnable of the treatment fluid that does not intactly flow down via real estate, the treatment fluid that will be recovered in above-mentioned recovery slot part or the returnable is set returns above-mentioned treatment fluid ejection mechanism, make the treatment fluid cycling mechanism of treatment fluid circulation, and be provided with that discharge sprays to substrate from above-mentioned treatment fluid ejection mechanism, flow to the discharge opeing stream of the treatment fluid after the use on the above-mentioned treatment trough inner bottom part from substrate.
15. substrate board treatment according to claim 14 is characterized in that, possesses wiper mechanism, this wiper mechanism with cleaning fluid clean with the use that flows down from substrate after the internal face of the contacted above-mentioned treatment trough of treatment fluid or the parts of treatment trough inside.
16. substrate board treatment according to claim 15 is characterized in that, adjacent ground connection with above-mentioned treatment trough is provided with the washing treatment trough with the pure water cleaning base plate, and the pure water after this washing treatment trough uses uses as cleaning fluid in above-mentioned wiper mechanism.
17., it is characterized in that according to each described substrate board treatment in the claim 14 to 16, make above-mentioned discharge opeing stream branch, will divide branch road to be connected on the above-mentioned treatment fluid cycling mechanism, on branch location, install the stream switching mechanism additional.
18. substrate board treatment according to claim 15, it is characterized in that, make above-mentioned discharge opeing stream branch, to divide branch road to be connected on the above-mentioned treatment fluid cycling mechanism, on branch location, install the stream switching mechanism additional, allow treatment fluid circulation time after using being sent to above-mentioned treatment fluid cycling mechanism by above-mentioned discharge opeing stream, via above-mentioned minute branch road by the treatment fluid after the use that will flow down from substrate, treatment fluid uses as cleaning fluid in above-mentioned wiper mechanism.
19. substrate board treatment according to claim 14 is characterized in that, is provided with to store the jar that is recovered to the treatment fluid in above-mentioned recovery slot part or the returnable, sets up the management devices that the treatment fluid composition in this jar is managed on this jar.
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP87609/2002 | 2002-03-27 | ||
| JP87609/02 | 2002-03-27 | ||
| JP2002087609 | 2002-03-27 | ||
| JP92463/2002 | 2002-03-28 | ||
| JP92463/02 | 2002-03-28 | ||
| JP2002092463A JP4050538B2 (en) | 2002-03-28 | 2002-03-28 | Substrate processing equipment |
| JP5897/03 | 2003-01-14 | ||
| JP2003005897A JP4138504B2 (en) | 2002-03-27 | 2003-01-14 | Substrate processing equipment |
| JP5897/2003 | 2003-01-14 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1447395A CN1447395A (en) | 2003-10-08 |
| CN1280876C true CN1280876C (en) | 2006-10-18 |
Family
ID=28457588
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB03107541XA Expired - Lifetime CN1280876C (en) | 2002-03-27 | 2003-03-27 | Substrate processing apparatus |
Country Status (3)
| Country | Link |
|---|---|
| KR (1) | KR100593709B1 (en) |
| CN (1) | CN1280876C (en) |
| TW (1) | TWI224369B (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101118394B1 (en) * | 2004-02-18 | 2012-03-09 | 코닝 제팬 가부시끼 가이샤 | Washing apparatus for plate material |
| CN100397155C (en) * | 2004-06-11 | 2008-06-25 | 鸿富锦精密工业（深圳）有限公司 | Substrate processing apparatus and processing method |
| KR100613658B1 (en) * | 2005-04-28 | 2006-08-22 | (주)피스코엔지니어링 | Supporting device for a polyethylene terephthalate bottle |
| TWI319213B (en) * | 2005-11-28 | 2010-01-01 | Hitachi High Tech Corp | A substrate processing device, a substrate processing method and a production method for a substrate |
| KR100923686B1 (en) * | 2007-10-08 | 2009-10-28 | 세메스 주식회사 | Apparatus of cleaning a substrate |
| KR100854981B1 (en) * | 2007-10-10 | 2008-08-28 | 홍경표 | Wet processing treatment apparatus for manufacturing printed circuit board |
| CN102184841A (en) * | 2010-12-17 | 2011-09-14 | 无锡华润上华半导体有限公司 | Method and system for recycling ultrapure water of wafer foundry machine platform |
| KR101405668B1 (en) * | 2011-12-22 | 2014-06-10 | 다이니폰 스크린 세이조우 가부시키가이샤 | Application apparatus |
| JP2013191779A (en) * | 2012-03-14 | 2013-09-26 | Toshiba Corp | Processor and processing method |
| CN104282598A (en) * | 2014-09-23 | 2015-01-14 | 安徽省大富光电科技有限公司 | Etching, developing, cleaning and film removing equipment, spraying processing equipment and method |
| CN104399701A (en) * | 2014-10-31 | 2015-03-11 | 镇江华印电路板有限公司 | Anti-etching printing-ink separating system for circuit-board printing |
| CN109037111B (en) * | 2015-02-25 | 2022-03-22 | 株式会社思可林集团 | Substrate processing apparatus |
| CN105093259B (en) * | 2015-08-14 | 2018-12-18 | 京东方科技集团股份有限公司 | Ray detector |
| CN107179654B (en) * | 2016-03-11 | 2020-12-01 | 上海和辉光电股份有限公司 | Developing method of OLED panel, OLED panel and manufacturing equipment |
| KR102609763B1 (en) | 2017-12-22 | 2023-12-05 | 니폰 덴키 가라스 가부시키가이샤 | Manufacturing method of glass plate |
| JP7060415B2 (en) * | 2018-03-12 | 2022-04-26 | 株式会社Ｓｃｒｅｅｎホールディングス | Board processing equipment and board processing method |
| CN108526097A (en) * | 2018-04-28 | 2018-09-14 | 武汉华星光电技术有限公司 | Substrate cleaning apparatus |
-
2003
- 2003-03-18 KR KR1020030016824A patent/KR100593709B1/en active IP Right Grant
- 2003-03-25 TW TW092106633A patent/TWI224369B/en not_active IP Right Cessation
- 2003-03-27 CN CNB03107541XA patent/CN1280876C/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| KR100593709B1 (en) | 2006-06-28 |
| TW200404337A (en) | 2004-03-16 |
| KR20030077980A (en) | 2003-10-04 |
| TWI224369B (en) | 2004-11-21 |
| CN1447395A (en) | 2003-10-08 |
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