KR100593709B1 - Substrate Processing Equipment - Google Patents

Abstract

The present invention provides a device capable of reducing the amount of treatment liquid used, reducing the amount of waste liquid, maintaining a high treatment efficiency, and minimizing contamination of members in the circulation path of the liquid.

The board | substrate 1 is conveyed in the form inclined with respect to the horizontal plane in the direction orthogonal to a conveyance direction, and a board | substrate conveyance is near the position just below the edge of the lowered side of the board | substrate on the bottom surface in the water washing tank 10. The recovery tank part which installs the boundary plate 20 according to the direction, distinguishes the bottom part in a washing-processing tank with the boundary plate, discharges from the pure water discharge nozzle 14, and collects the pure water which flows down without passing through the board surface. And a drain tank 26 receiving the used pure water discharged from the pure water discharge nozzle and flowing down the substrate onto the lowered side, and flowing from the edge of the water. The used pure water discharged to the inside is discharged.

Water treatment tank, discharge nozzle, liquid recovery port, drainage tank, liquid discharge port, recovery tank, flow path switching valve

Description

Substrate Processing Equipment {SUBSTRATE PROCESSING APPARATUS}

1 is a schematic plan view showing an example of a first embodiment of the present invention and showing a schematic configuration of a substrate processing apparatus;

FIG. 2 is a cross sectional view taken along arrow II-II of FIG. 1;

3 is a cross-sectional view taken along the line III-III of FIG. 1;

4 is a schematic plan view showing another example of the first embodiment of the present invention and showing a schematic configuration of a substrate processing apparatus;

Fig. 5 shows another example of the first embodiment of the present invention, and shows a schematic plan view of a schematic structure of a substrate processing apparatus.

6 is a cross-sectional view taken along the VI-VI arrow of FIG. 5;

7 shows still another example of the first embodiment of the present invention, and schematically shows a schematic structure of a substrate processing apparatus;

8 is a cross-sectional view taken along the line VIII-VIII in FIG. 7;

Fig. 9 shows still another example of the first embodiment of the present invention, and schematically shows a schematic structure of a substrate processing apparatus.

10 is a cross sectional view taken along the line VIII-VIII in FIG. 9;

Fig. 11 shows a configuration example for facilitating flow of pure water discharged onto a substrate when the substrate is conveyed in a horizontal direction in a horizontal form, and shows a part of the substrate processing apparatus.

Fig. 12 similarly shows another configuration example for facilitating the flow of pure water discharged onto the substrate on the substrate, and a schematic side view showing a part of the substrate processing apparatus;

13 is a schematic plan view showing a modification of the substrate processing apparatus shown in FIG. 9;

Fig. 14 shows an example of a second embodiment of the present invention, and is a schematic side view showing a schematic configuration of a developing apparatus which is one of substrate processing apparatuses;

Fig. 15 shows an example different from that shown in Fig. 14 of the cleaning mechanism of the developing tank, and a schematic side view showing the schematic structure of the developing processing apparatus;

Fig. 16 shows another example of the second embodiment of the present invention and is a schematic side view showing a schematic configuration of a developing apparatus;

Fig. 17 shows an example in which a developer discharge nozzle is provided for each type of developer used in the second embodiment, and a schematic side view showing a schematic configuration of a developer;

Fig. 18 shows another example in which the processing operation can be performed for each type of developing solution used in the second embodiment, and a schematic side view showing a schematic structure of the developing processing apparatus;

19 is a side view schematically showing an example of a schematic configuration of a conventional substrate processing apparatus;

20 is a side view schematically showing an example of a schematic configuration of a conventional developing treatment apparatus.

(Explanation of the sign)

1 board

2 chemicals

3 developer

10 water treatment tank

12 Entrance to flushing tank

14 Pure Discharge Nozzle

16 Chemical processing tank

18 Chemical Spray Nozzle

20,46,76a, 76b border

22,78 width border

24,48,80 Recovery Grandfather

26,50,82a, 82b drainage

28,72,86,100 liquid recovery port

30,74,88,102 Liquid Recovery Piping

32 Recovered amount

34 Recovery Tank

36 Piping Pipe

40 pumps

42,68,90,96a, 96b liquid outlet

44,70,92,98a, 98b drain tube

66,94a, 94b drain box

84 Drainage grandfather at the entrance side

104,106 Conveyor Roller

108a, 108b auxiliary drain box

110,154 Developing tank

114,158 water treatment tank

116,116a, 116b developer discharge nozzle

118 Liquid Removal Roller

120 water jet nozzle

122,122a, 122b recovery tank

124,124a, 124b liquid recovery port

126,126a, 126b liquid recovery piping

128,128a, 128b recovered developer

130,130a, 130b recovery tank

132,132a, 132b Fluid Pipe

134,152,134a, 134b pump

136,162,136a, 136b Liquid outlet

138,164,178,178a, 178b Drainage Pipe

140,160 Cleaning Nozzle

142 Drain

144 Water recovery pipe

146 Water Recovery Tank

148 Recovered Pure Water

150 Water piping

156 Bottom of developing tank

166 Water Recovery Pad

168 Water piping

180,180a, 180b liquid return piping

182,182a, 182b flow path switching valve

184,184a, 184b Cleaning Pipe

186,188,186a, 186b, 190a, 190b, 192a, 192b, 196a, 196b On / Off Control Valve

194 bypass tube

98 liquid outlet

900 Liquid drain pipe

902 valve

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus which performs cleaning, developing, etching, peeling, and the like on a substrate while conveying a substrate such as a glass substrate for a flat panel display (FPD), a semiconductor wafer, or a printed circuit board.

In manufacturing processes such as FPDs, semiconductor devices, printed wiring boards, and the like, after treating the substrate with a chemical liquid, the substrate is washed with pure water, and the substrate is replaced by a conveying roller when the chemical liquid attached to the substrate is replaced with pure water. A horizontal transfer processing apparatus is used for discharging pure water onto a substrate while conveying the sheets one by one in the horizontal direction. An example of the schematic configuration of this processing apparatus is schematically shown in FIG.

The processing apparatus shown in FIG. 19 includes a water washing treatment tank 10 having an inlet 12 and a carrying out outlet (not shown), and a plurality of conveying rollers are not shown inside the washing treatment tank 10. Are excreted in parallel. Moreover, in the inside of the water washing tank 10, pure water is sprayed on both the upper and lower sides of the board | substrate 1 by the conveyance path L of the board | substrate 1 shown by the dashed-two dotted line between it. A plurality of pure discharge nozzles 14 are provided side by side, respectively. The chemical liquid processing tank 16 is provided in the inlet 12 side of the water washing tank 10 adjacent to the water washing tank 10, and the board | substrate 1 is conveyed inside the chemical liquid processing tank 16. As shown in FIG. On both sides of the upper and lower sides of the furnace L, a plurality of chemical liquid ejecting nozzles 18 for ejecting the chemical liquid are provided on both sides of the substrate 1 side by side. And the board | substrate 1 is carried in the washing | cleaning process tank 10 through the delivery opening 12 in the chemical liquid processing tank 16, is supported by the conveyance roller, and is conveyed in a horizontal direction, and the washing process tank 10 is carried out. It is carried out through an outlet at the inside, and is conveyed to the next drying process part (not shown).

In addition, a liquid recovery port 52 is formed at the bottom of the water treatment tank 10 in which the liquid that flows from the substrate 1 to the bottom of the water treatment tank 10 flows out. The pipe 54 for liquid recovery is connected to the water port 52. The liquid recovery pipe 54 is connected to a recovery tank 58 for storing the recovery liquid 56. In addition, one end of the liquid feeding pipe 60 is connected to the recovery tank 58, and the tip of the liquid feeding pipe 60 is connected to the pure water discharge nozzle 14 although not shown. A filter 62 and a pump 64 are respectively provided in this liquid supply pipe 60. Although not shown, the recovery tank 58 is connected to a pure water supply pipe for replenishing pure water.

In the processing apparatus of the above-mentioned structure, when the board | substrate 1 with the chemical liquid 2 adhered to the upper surface in the chemical | medical solution processing tank 16 is carried into the washing | cleaning process tank 10, it conveys in the washing | cleaning process tank 10. As the substrate 1 is conveyed by the roller, pure water is injected from the pure water discharge nozzle 14 to both the upper and lower surfaces of the substrate 1, and the chemical liquid 2 attached to the upper surface of the substrate 1 is replaced with pure water. . At this time, the pure water sprayed on the surface of the substrate 1 flows down to the bottom portion of the water treatment tank 10 together with the chemical liquid 2 attached to the upper surface of the substrate 1. The mixed liquid of the pure water and the chemical liquid flowing down to the bottom of the water treatment tank 10 flows over the bottom of the water treatment tank 10 toward the liquid recovery port 52, and the liquid recovery piping 52 is connected to the liquid recovery port 52. It enters into the recovery tank 58 through 54. The recovery liquid 56 stored in the recovery tank 58 is returned to the pure discharge nozzle 14 through the liquid supply pipe 60 for reuse. In this way, pure water is used while circulating.

In the apparatus for treating the substrate while circulating the mixed liquid of pure water and chemical liquid as described above, the mixed liquid of pure water and chemical liquid is reused and replaced with the chemical liquid attached to the substrate 1, so that the concentration of the chemical liquid is gradually increased. As a result, the substitution efficiency gradually decreases. In addition, since the liquid containing the chemical liquid is circulated through the liquid recovery pipe 54, the recovery tank 58, and the liquid supply pipe 60, the inner surface of the recovery tank 58, the liquid recovery pipe 54 and There is a problem that the inner surface of the liquid supply pipe 60, the inside of the pump 64, and the like are contaminated.

On the other hand, when the mixed liquid of pure water and the chemical liquid which flows down to the bottom part of the washing treatment tank 10 on the board | substrate 1 is discharged as waste liquid in the washing treatment tank 10, waste liquid volume will increase, and waste liquid processing will cost, In addition, the use of pure water also increases the running cost is a problem.

In the process of forming a wiring pattern on the substrate, for example, when developing the photoresist film formed on the surface of the substrate, the developer is sprinkled onto the substrate while the substrate is placed side by side and conveyed by a conveying roller, and then the liquid is sprinkled. A roller conveyance developing apparatus for stopping the developing reaction after a predetermined time has elapsed is used. An example of the schematic structure of this developing apparatus is shown typically in FIG.

The developing apparatus shown in FIG. 20 includes a developing tank 110 having an inlet side opening 112a and an outlet side opening 112b, and a plurality of conveying rollers are not shown inside the developing chamber 110. Exposed in parallel. The board | substrate 1 is carried in into the developing tank 110 through the inlet opening 112a, is supported by the conveyance roller, and is conveyed in a horizontal direction, and the exit side opening 112b is opened in the developing tank 110. As shown in FIG. It is carried out through and is sent to the next washing tank 114. The developer discharge nozzle 116 is disposed near the inlet opening 112a in the developing chamber 110. In addition, in the vicinity of the outlet side opening 112b inside the developing chamber 110, a liquid removal roller which is in contact with the upper surface side of the substrate 1 supported by the conveying roller so as to face the conveying roller directly on one conveying roller. 118 is excreted. Instead of providing the liquid removing roller 118, the conveying roller disposed in the vicinity of the outlet side opening 112b of the developing tank 110 is inclined in a direction orthogonal to the conveying direction of the substrate 1, or by air. Sometimes a knife is installed. In the water treatment tank 114 provided adjacent to the developing tank 110, the upper and lower sides of the board | substrate 1 are provided on both sides of the upper and lower sides of the conveyance path L of the board | substrate 1 shown by the dashed-two dotted line. A plurality of water jet nozzles 120 for spraying pure water on both sides are disposed.

In addition, a liquid recovery port 906 is formed in the bottom portion of the developing tank 110 through which the developing solution that has flowed from the substrate 1 to the bottom portion of the developing tank 110 flows out. Is connected to the liquid recovery pipe 908. The liquid recovery pipe 908 is connected to a recovery tank 912 for storing the recovered developer 910. One end of the liquid feeding pipe 914 is connected to the recovery tank 912, and the tip of the liquid feeding pipe 914 is connected to the developing solution discharge nozzle 116. A filter 916 and a pump 918 are respectively provided in this liquid supply pipe 914. The liquid circulation system is constituted by the liquid recovery pipe 908, the recovery tank 912, the liquid supply pipe 914, the filter 916, and the pump 918.

In the developing apparatus of such a configuration, the substrate 1 having the photoresist film exposed on the surface thereof is positioned directly below the developer discharge nozzle 116 disposed near the inlet opening 112a of the developing tank 110. When passing through, the developer 3 discharged in the form of a katenite over the entire width of the substrate 1 is sprinkled onto the surface from the slit-shaped outlet of the bottom surface of the developer discharge nozzle 116. The developing reaction of the photoresist film proceeds while the substrate 1 on which the liquid is sprayed is conveyed by the conveying roller. When the board | substrate 1 is conveyed to the vicinity of the exit side opening 112b of the developing tank 110, the developing solution 3 is removed on the board | substrate 1 by the liquid removal roller 118, and thereafter, a developing tank It is taken out within 110. Subsequently, the substrate 1 is sent to the next water treatment tank 114 and washed with pure water to completely stop the development reaction of the photoresist film.

In this development process, the used developer that flows down from the substrate 1 to the bottom of the developing tank 110 and the developer discharge nozzle when the substrate 1 does not pass directly under the developer discharge nozzle 116. The developing solution discharged from the 116 and flowed down to the bottom of the developing tank 110 without passing through the surface of the substrate 1 flows toward the liquid recovery port 906 on the bottom of the developing tank 110. The liquid recovery port 906 flows into the recovery tank 912 through the liquid recovery pipe 908. Then, the developer 910 flowing into the recovery tank 912 and stored is sent to the developer discharge nozzle 116 through the liquid supply pipe 914 for reuse. In this way, the developer is used while being circulated.

In the apparatus which performs substrate processing while circulating the above-mentioned processing solution (development solution in the above example), when the substrate or the reaction product of the substrate adherend and the developing solution dissolves in the developing solution, even if the used developing solution is reused, it is not much problem. Does not. However, when a substance which does not dissolve in the developer is produced by the reaction with the developer, the inner surface of the recovery tank 912, the liquid recovery pipe 908 and the liquid supply pipe 914, when used while circulating the developer, are used. Inside, there arises a problem that the inside of the pump 918 is contaminated by uncontaminated material. Moreover, the filter 916 provided in the liquid feed pipe 914 becomes clogged quickly, and in the worst case, there is a problem that the substrate cannot be processed while circulating the developer.

On the other hand, if the developer is discharged from the bottom of the developing tank 110 without being circulated and disposed of, the above problem does not occur, but when the substrate 1 does not pass directly under the developer discharge nozzle 116. Since the developer is discharged from the developer discharge nozzle 116 and is disposed as it is, the developer lowered to the bottom of the developing tank 110 together, there is a problem that the utilization efficiency of the developer is lowered. The above problems are not limited to the developing apparatus, but may also occur in processing apparatuses such as washing, etching, and peeling treatment.

SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is possible to keep the utilization efficiency of treatment liquids such as pure water to be high, to reduce the amount of treatment liquid used, to reduce the amount of waste liquid, and to maintain the treatment efficiency high. It is a first object of the present invention to provide a substrate processing apparatus capable of minimizing contamination of each member in a circulation path of liquid.

It is a second object of the present invention to provide a substrate processing apparatus which can perform substrate processing while circulating the processing liquid, and maintains the utilization efficiency of the processing liquid without causing problems in the liquid circulation system.

The invention according to claim 1 is a substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means to the substrate while conveying the substrate in a horizontal direction by the transfer means in the processing tank, wherein the substrate is discharged from the processing liquid discharge means. A recovery path for discharging the processing liquid discharged without falling through the substrate surface; and discharged from the processing liquid discharge means onto the substrate, and flows over the substrate toward the end portion in a direction orthogonal to the conveying direction of the substrate and flows from the edge. A drainage path for collecting the used waste liquid to be separated is provided separately, and a liquid circulation system for returning the treated liquid recovered in the recovery path to the treatment liquid discharge means is provided in the drainage path. Characterized in that the drain passage for discharging the used treatment liquid collected.

The invention according to claim 2 is a substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in a horizontal direction by the transfer means in the processing tank, wherein the substrate is carried by the transfer means. Conveying the substrate in a form inclined with respect to the horizontal plane in a direction orthogonal to the conveying direction of the substrate and conveying the substrate near the position immediately below the edge of the lowered side of the substrate to be conveyed at an angle on the bottom surface of the processing tank. The recovery tank unit and the processing liquid discharge means which arrange | position a boundary plate along a direction, and collect | recover the processing liquid discharged from the said process liquid discharge means, and flow down as it is, without passing through the board surface by separating the bottom part in a process tank with the boundary plate. The drainage tank receives the used treatment liquid that is discharged from the substrate to the lower side of the substrate, and flows from the edge. And, to the treatment liquid collected in the recovery demodulator and at the same time provided with a liquid circulation system to return to the processing liquid discharge means, characterized in further comprising an a drainage for discharging the treatment liquid using a flow down into the drainage grandfather.

The invention according to claim 3 is characterized in that, in the substrate processing apparatus of claim 2, the upper end of the boundary plate is disposed so as to be close to the edge of the lowered side of the substrate to be conveyed at an angle.

The invention according to claim 4 is a substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharging means onto the substrate while conveying the substrate in a horizontal direction in a horizontal form by the conveying means in the processing tank. In the vicinity of the position just below the edge of both sides of the board | substrate to be conveyed on the inner bottom surface, a boundary board is provided according to the conveyance direction of a board | substrate, respectively, and each process board divides the bottom part in a process tank, respectively, A pair of recovery tanks for discharging the processing liquid discharged from the discharging means and flowing down without passing through the substrate surface, and a pair receiving the used processing liquid discharged from the processing liquid discharging means onto the substrate and flowing on both sides of the substrate, respectively flowing from both edges. And a liquid circulation system for dividing the liquid into the drainage tank and returning the processing liquid recovered in the recovery tank to the processing liquid discharge means. At the same time as biham, it characterized in that it includes a by drainage for discharging the treatment liquid, respectively, and use it flows down into the drain each demodulator.

According to a fifth aspect of the present invention, in the substrate processing apparatus of claim 4, the upper end of each of the boundary plates is disposed so as to be close to edges on both sides of the substrate to be conveyed, respectively.

According to a sixth aspect of the present invention, in the substrate processing apparatus of any one of claims 2 to 5, the substrate processing apparatus according to a direction intersecting with the conveying direction of the substrate on the inlet side of the substrate on the bottom surface of the processing tank. A widthwise boundary plate is provided, and the widthwise boundary plate divides the bottom part in the treatment tank, and forms an inlet-side drainage tank receiving the liquid overflowing from the front edge side of the substrate brought into the treatment tank. It is characterized by discharging the falling treatment liquid into the inlet drainage tank.

According to a seventh aspect of the present invention, in the substrate processing apparatus of claim 6, the delivery port side drainage tank portion and the drainage tank portion are in communication with each other.

The invention according to claim 8 is a substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in a horizontal direction by the transfer means in the processing tank, wherein the substrate is carried by the transfer means. Is conveyed in the form inclined with respect to the horizontal plane in a direction orthogonal to the conveying direction of the substrate, and in the conveying direction of the substrate near the position just below the edge of the lowered side of the substrate to be conveyed inclined inside the processing tank. Accordingly, the drainage container receiving the used processing liquid discharged from the processing liquid discharging means onto the substrate and flowing down the substrate to the lower side is rolled up, and discharged from the processing liquid discharging means to remove the substrate surface. A liquid flow that flows downward without passing through and returns the processing liquid recovered to the bottom of the processing tank to the processing liquid discharge means. Also it includes a system and at the same time, characterized in that it includes a by drainage for discharging the treatment liquid using a flow down into the drainage tube.

The invention according to claim 9 is a substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means to the substrate while conveying the substrate in a horizontal form in a horizontal manner by the transfer means in the processing tank. Near the position immediately below the edge of both sides of the substrate to be conveyed, the used treatment liquid is discharged from the processing liquid discharge means to the substrate, flows on both sides of the substrate, and flows from both edges according to the conveying direction of the substrate. And a liquid circulation system which horizontally stacks a pair of drainage vessels received and discharges from the processing liquid discharging means and flows down without passing through the substrate surface to return the processing liquid recovered to the bottom of the processing tank to the processing liquid discharging means. At the same time, a drainage passage for discharging the used treatment liquid flows into the respective drainage vessels, respectively. do.

In the invention according to claim 10, in the substrate processing apparatus according to claim 4, 5 or 9, the substrate is supported by the conveying means so that the center portion of the substrate is higher than both ends of the substrate in a direction orthogonal to the conveying direction of the substrate. It is characterized by conveying.

In the substrate processing apparatus according to claim 4, 5 or 9, the substrate processing apparatus according to claim 4, 5 or 9, respectively, is disposed above the substrate from the processing liquid discharge means and on both sides of the substrate in a direction orthogonal to the substrate conveyance direction with respect to the substrate surface. It tilts and discharges a process liquid.

In the invention according to claim 12, the substrate processing apparatus according to claim 4, 5 or 9, wherein the substrate processing apparatus according to claim 4 is orthogonal to the conveying direction of the substrate near the position immediately below the front and rear end edges of the substrate conveyed by the conveying means. Depending on the direction, a pair of auxiliary drainage tanks receiving the used treatment liquids overflowing from the front and rear edges of the substrate, respectively, is disposed, and the pair of auxiliary drainage tanks is supported to move horizontally in synchronism with the movement of the substrate. And an auxiliary drainage passage for discharging the used processing liquid which is lower than each of the auxiliary draining vessels.

According to a thirteenth aspect of the present invention, in the substrate processing apparatus of claim 1, the treatment tank is a washing treatment tank that cleans the substrate with pure water, and is a chemical liquid that treats the substrate with a chemical liquid adjacent to the substrate inlet side of the washing treatment tank. Characterized in that the treatment tank is installed.

A substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in the processing tank, wherein the inside of the processing tank is divided so that the processing liquid discharge means Forming a recovery tank for recovering the processing liquid discharged from the substrate without falling through the substrate surface, or is discharged from the processing liquid discharge means below the processing liquid discharge means to flow down without passing through the substrate surface. A recovery container for recovering the processing liquid is disposed, and a processing liquid circulation means for circulating the processing liquid by returning the processing liquid recovered in the recovery tank unit or the recovery container to the processing liquid discharge means and at the same time discharges the processing liquid. It is discharged from the means onto the substrate to discharge the used processing liquid which flows down from the means to the bottom of the processing tank. Is characterized in that the drainage passage is installed.

According to a fifteenth aspect of the present invention, there is provided the substrate processing apparatus of claim 14, further comprising: a cleaning means for cleaning the inner wall surface of the processing tank or a member inside the processing tank with a cleaning liquid in contact with the used processing liquid flowing on the substrate. It features.

According to a sixteenth aspect of the present invention, in the substrate processing apparatus of claim 15, a water treatment tank for cleaning the substrate with pure water is provided adjacent to the treatment tank, and the pure water used in the water treatment tank is washed with the washing means. It is characterized in that it is to be used as.

According to a seventeenth aspect of the present invention, in the substrate processing apparatus of any one of claims 14 to 16, the draining passage is branched, and a branching passage is connected to the processing liquid circulation means in a flow path. , The flow path switching means is provided at the branch position.

In the substrate processing apparatus according to claim 15, in the substrate processing apparatus of claim 15, the drain passage is branched, the branch passage is connected to the processing liquid circulation means in a flow path, and a flow path switching means is provided at a branch position. When the used treatment liquid is passed through the drainage passage through the branch passage to the treatment liquid circulation means, and the used treatment liquid is circulated, the treatment liquid is used as the washing liquid in the washing means.

According to a nineteenth aspect of the present invention, in the substrate processing apparatus of claim 14, a tank for storing the processing liquid recovered in the recovery tank unit or the recovery container is provided, and the components of the processing liquid in the tank are placed in the tank. Characterized in that a management device for managing.

In the substrate processing apparatus of the invention according to claim 1, while the substrate is conveyed horizontally by the conveying means in the processing tank, the processing liquid is discharged from the processing liquid ejecting means onto the substrate to process the substrate. And the process liquid used for the substrate process flows toward the edge part in the direction orthogonal to the conveyance direction of a board | substrate, and flows in the edge of a board | substrate. The used treatment liquid flowing off the edge of the substrate is collected in the drainage path and discharged through the drainage path. On the other hand, the processing liquid discharged from the processing liquid discharging means and flowing down without passing through the substrate surface is recovered in the recovery path and returned to the processing liquid discharging means by the liquid circulation system for reuse. Therefore, since the used processing liquid is discarded without being reused, the processing efficiency of the substrate does not decrease, and since the used processing liquid does not flow through the liquid circulation system, contamination of each member in the liquid circulation system is also minimized. On the other hand, since the treatment liquid recovered by the recovery path is reused, the utilization efficiency of the treatment liquid is maintained to be high, so that the amount of treatment liquid used is reduced, and the amount of waste liquid is also reduced.

In the substrate processing apparatus of the invention according to claim 2, since the substrate is conveyed in a form inclined with respect to the horizontal plane in a direction orthogonal to the conveying direction, the processing liquid discharged from the processing liquid discharge means onto the substrate and used for the substrate processing is a substrate. The stomach flows to the lower side and flows off the edge of the substrate. At this time, a boundary plate is provided near the position of the lower edge of the lower side of the substrate, and the bottom portion of the treatment tank is divided by the boundary plate and divided into a recovery tank portion and a drainage tank portion. The liquid flows down into the drainage tank and is discharged through the drainage passage. On the other hand, the processing liquid discharged from the processing liquid discharge means and flowing down without passing through the substrate surface is recovered into the recovery tank portion, and returned to the processing liquid discharge means by the liquid circulation system for reuse. Therefore, since the used processing liquid is discarded without being reused, the processing efficiency of the substrate does not decrease and the used processing liquid does not flow through the liquid circulation system, so that contamination of each member in the liquid circulation system is also minimized. On the other hand, since the treatment liquid recovered into the recovery tank is reused, the utilization efficiency of the treatment liquid is maintained to be high, so that the amount of treatment liquid used is reduced, and the amount of waste liquid is also reduced.

In the substrate processing apparatus of Claim 3, the used processing liquid which flowed on the lower side of the board | substrate, and flowed out from the edge of a board | substrate reliably flows into a drain tank part, and does not flow down into the collection tank part beyond the upper end of a boundary plate. Do not.

In the substrate processing apparatus of the present invention according to claim 4, while the substrate is conveyed in the processing tank in the horizontal direction by the conveying means in the horizontal direction, the processing liquid is discharged from the processing liquid ejecting means onto the substrate to process the substrate. The processing liquid used for the substrate processing flows on both sides of the substrate and flows down at both edges of the substrate, respectively. At this time, a boundary plate is provided near each position immediately below the edge of both sides of the substrate, and the bottom part of the treatment tank is divided by each boundary plate, and is divided into a recovery tank part and a pair of drainage tank parts. The used waste liquid flows down into each drainage tank and is discharged through the drainage passage. On the other hand, the processing liquid discharged from the processing liquid discharge means and flowing down without passing through the substrate surface is recovered into the recovery tank portion, and is returned to the processing liquid discharge means by the liquid circulation system for reuse. Therefore, since the used processing liquid is discarded without being reused, the processing efficiency of the substrate does not decrease, and since the used processing liquid does not flow through the liquid circulation system, contamination of each member in the liquid circulation system is also minimized. On the other hand, since the treatment liquid recovered into the recovery tank is reused, the utilization efficiency of the treatment liquid is maintained to be high, so that the amount of treatment liquid used is reduced, and the amount of waste liquid is also reduced.

In the substrate processing apparatus of claim 5, the used processing liquid that flows on both sides of the substrate and flows from both edges of the substrate reliably flows into each drain vessel part, and does not flow beyond the upper end of the boundary plate into the recovery tank portion. Do not.

In the substrate processing apparatus of the invention according to claim 6, in the vicinity of the inlet of the substrate, the processing liquid used in the processing of the front end and adhered to the substrate overflows from the front edge side of the substrate, or the substrate conveying direction from the processing liquid discharge means. When the processing liquid discharged over the substrate flows down from the front edge of the substrate, the widthwise boundary plate is provided on the inlet side of the substrate, and the bottom portion of the treatment tank is divided by the widthwise boundary plate. Since the inlet-side drainage tank part is formed, the liquid which overflowed from the front edge side edge of the board | substrate flows down into the inlet-side drainage tank part, and is discharged | emitted.

In the apparatus of the invention according to claim 7, the liquid dripping into the inlet side drainage tank is discharged through the drainage passage together with the used treatment liquid falling into the drainage tank.

In the substrate processing apparatus of the invention according to claim 8, since the substrate is conveyed in a form inclined with respect to the horizontal plane in a direction orthogonal to the conveying direction, the processing liquid discharged from the processing liquid discharge means onto the substrate and used for processing the substrate is placed on the substrate. Flows to the lower side and flows off the edge of the substrate. At this time, since the drainage container is rolled out along the conveyance direction of the substrate near the position immediately below the edge of the lower side of the substrate, the used processing liquid flowing out of the edge of the substrate flows into the drainage container and is discharged through the drainage passage. do. On the other hand, the processing liquid discharged from the processing liquid discharge means and flowing down without passing through the substrate surface is recovered to the bottom of the processing tank, and returned to the processing liquid discharge means by the liquid circulation system for reuse. Therefore, since the used processing liquid is discarded without being reused, the processing efficiency of the substrate does not decrease, and since the used processing liquid does not flow through the liquid circulation system, contamination of each member in the liquid circulation system is also minimized. On the other hand, since the treatment liquid recovered to the bottom of the treatment tank is reused, the utilization efficiency of the treatment liquid is kept high, so that the amount of treatment liquid used is reduced, and the amount of waste liquid is also reduced.

In the substrate processing apparatus of the invention according to claim 9, while the substrate is conveyed horizontally in a horizontal form by the conveying means in the processing tank, the processing liquid is discharged from the processing liquid ejecting means onto the substrate to process the substrate. The processing liquid used for the substrate processing flows on both sides of the substrate and flows down at both edges of the substrate, respectively. At this time, since the drainage tanks are horizontally laid along the conveying direction of the substrate near the position immediately below the edges of both sides of the substrate, the used treatment liquid flowing down from both edges of the substrate flows into each drainage container, Is discharged through. On the other hand, the processing liquid discharged from the processing liquid discharging means and flowing down without passing through the substrate surface is recovered to the bottom of the processing tank and returned to the processing liquid discharging means by the liquid circulation system for reuse. Therefore, since the used processing liquid is discarded without being reused, the processing efficiency of the substrate does not decrease, and since the used processing liquid does not flow through the liquid circulation system, contamination of each member in the liquid circulation system is also minimized. On the other hand, since the treatment liquid recovered to the bottom of the treatment tank is reused, the utilization efficiency of the treatment liquid is kept high, so that the amount of treatment liquid used is reduced, and the amount of waste liquid is also reduced.

In the substrate processing apparatus of the invention according to claim 10, the substrate is conveyed while being supported so that the center portion is higher than both ends in the direction orthogonal to the conveying direction, so that the processing liquid discharged from the processing liquid ejecting means onto the substrate is used for substrate processing. It flows from the edges of the substrate to each end at the central portion of the substrate without dividing left and right at the center portion of the substrate and remaining on the substrate.

In the substrate processing apparatus of the invention according to claim 11, since the processing liquids are inclined to both end sides of the substrate in the direction orthogonal to the substrate conveyance direction with respect to the substrate surface, the processing liquids are discharged from the processing liquid discharge means onto the substrate, respectively. Flow toward both ends is formed so that the treatment liquid flows over the substrate to both ends and flows off the edge of the substrate.

In the substrate processing apparatus of the invention according to claim 12, when the substrate is conveyed by the conveying means, it is discharged from the processing liquid ejecting means onto the substrate, and the processing liquid used for the substrate processing overflows from the front and rear ends of the substrate, respectively. Even if there is a work, a pair of auxiliary drainage tanks is disposed near the position immediately below the front and rear edges of the substrate in a direction orthogonal to the conveying direction of the substrate, and the pair of auxiliary drainage tanks is synchronized with the movement of the substrate in the horizontal direction. Since it is supported so as to move to, the used processing liquid that has overflowed from the front and rear edges of the substrate, respectively, flows down into each auxiliary drain container and is discharged through the auxiliary drain channel.

In the substrate processing apparatus of the invention according to claim 13, the chemical liquid used for substrate processing in the chemical liquid treatment tank and adhered to the substrate is removed from the substrate by the pure water in the water treatment tank and replaced with pure water.

In the substrate processing apparatus of the invention according to claim 14, the processing liquid discharged from the processing liquid discharge means and flows down as it is without passing through the substrate surface is recovered to the recovery tank part or the recovery container of the processing tank, and the recovery tank part by the processing liquid circulation means. Or it is used to circulate back to the processing liquid discharge means from the recovery container. In addition, since this process liquid does not pass through a board | substrate surface, a non-toxic solution is not contained. Therefore, in the liquid circulation system, there is no fear of causing a problem that the inner surface of the tank, the inner surface of the pipe, the inside of the pump, and the like are contaminated by uncontaminated material. On the other hand, the used processing liquid discharged from the processing liquid discharge means onto the substrate and flows down to the bottom of the processing tank on the substrate is discharged through the drainage passage. Therefore, there is no problem even if non-toxic products are contained in the treatment liquid.

In the substrate processing apparatus of the present invention according to claim 15, since the cleaning means washes the wall inside the processing tank or the member inside the processing tank in contact with the used processing liquid flowing down on the substrate with the cleaning liquid, it is not harmful to the used processing liquid. Even if the non-lysates are attached to the wall in the treatment tank or to a member inside the treatment tank, the non-lysates are washed away. Therefore, contamination of the wall inside the treatment tank or the member inside the treatment tank is prevented.

In the substrate processing apparatus of the invention according to claim 16, since the pure water used in the water treatment tank adjacent to the treatment tank is used as the cleaning liquid in the cleaning means, the cleaning liquid is saved.

In the substrate processing apparatus of the present invention according to claim 17, when the non-porous material is contained in the used processing liquid flowing down the bottom of the processing tank on the substrate, the used processing liquid is discharged as it is through the drainage passage. On the other hand, when no waste matter is contained in the used processing liquid flowing down from the bottom of the processing tank onto the substrate, the flow path switching means switches the flow path so that the used processing liquid flows into the branch in the drainage passage. The treated liquid flows through the branch path to the processing liquid circulation means. In this way, when the cost-effective solution is not included in the used treatment liquid according to the difference in the type of substrate or the like, the amount of the treatment liquid is reduced by circulating and using the used treatment liquid.

In the substrate processing apparatus of the eighteenth aspect of the present invention, when the non-porous matter is contained in the used processing liquid flowing down the bottom of the processing tank on the substrate, the used processing liquid is discharged as it is through the drainage passage. On the other hand, when no detriment is contained in the used processing liquid flowing down the bottom of the processing tank on the substrate, the flow path is switched so that the processing liquid used by the flow path switching means flows into the branch in the drainage passage. The treatment liquid flows through the branch path to the treatment liquid circulation means. In this way, when the cost-effective solution is not contained in the used processing liquid according to the difference in the type of substrate or the like, the amount of the processing liquid used is reduced by circulating the used processing liquid. When the used treatment liquid flowing down on the substrate is circulated, the processing liquid is used as the cleaning liquid in the cleaning means. Thus, the processing liquid (cleaning liquid) used for cleaning the wall inside the processing tank or the member inside the processing tank is also circulated. It is possible to use for cleaning the substrate surface and the inner wall of the processing tank.

In the substrate processing apparatus of the present invention according to claim 19, since the components of the processing liquid in the tank are managed by the management apparatus, it is possible to eliminate the case of contaminating, deteriorating or circulating the processing liquid for use in substrate processing.

<1st embodiment>

EMBODIMENT OF THE INVENTION Hereinafter, 1st Embodiment of this invention is described, referring FIGS.

1 to 3 show an example of the first embodiment of the present invention, FIG. 1 is a schematic plan view showing a schematic configuration of a substrate processing apparatus, and FIGS. 2 and 3 are the II-II arrows in FIG. And cross-sectional views in the III-III arrow. In this substrate processing apparatus, the structure and operation of the main part for processing the substrate are the same as those of the conventional apparatus described with reference to FIG. 19, and therefore, the same reference numerals as in FIG. Omit.

Although not shown in this substrate processing apparatus, each conveyance roller arrange | positioned in parallel in the water washing tank 10 is supported so that it may incline in the direction orthogonal to the conveyance direction of the board | substrate 1, respectively. 3, the board | substrate 1 is conveyed in the horizontal direction in the form inclined in the direction orthogonal to the conveyance direction. In addition, in FIG. 2, the board | substrate 1 is not described in inclined form for convenience. In addition, the pure water discharged from the pure water discharge nozzle 14 flows into the chemical liquid processing tank 16 on the upstream side through the upper surface of the substrate 1 which has been carried into the water treatment tank 10 from the chemical liquid processing tank 16. In order to avoid lifting, the pure water discharge nozzle 14a provided at the position closest to the inlet 12 of the water washing tank 10 among the pure water discharge nozzles 14 is conveyed to the substrate 1 as shown in FIG. The discharge port is arranged to discharge pure water toward the front in the direction. Moreover, in this substrate processing apparatus, the bottom part in the water washing treatment tank 10 is divided by the boundary plate 20 and the width direction boundary plate 22, and the bottom part in the water washing treatment tank 10 is connected with the recovery tank part 24. The L-shaped drainage passage section 26 is partitioned.

The boundary plate 20 is provided along the conveyance direction of the board | substrate 1 near the position just below the edge of the lowered side of the board | substrate 1 conveyed inclinedly on the bottom surface in the water washing tank 10, along the conveyance direction. . As shown in Fig. 3A, the upper end of the boundary plate 20 is preferably disposed so as to be close to the edge of the side where the substrate 1 is lowered. Moreover, the width direction boundary plate 22 is provided in the inlet 12 side of the board | substrate 1 on the bottom surface in the water treatment tank 10 along the direction orthogonal to the conveyance direction of the board | substrate 1, have. Then, one end of the widthwise boundary plate 22 is connected to one end of the boundary plate 20 so as to form a sphere.

Moreover, the liquid recovery port 28 is formed in the bottom part of the collection tank 24 of the water washing tank 10, and the liquid collection pipe 30 is connected to the liquid recovery port 28 in communication. have. The liquid recovery pipe 30 is connected to a recovery tank 34 for storing the recovery liquid 32. In addition, one end of the liquid feeding pipe 36 provided with the filter 38 and the pump 40 is connected to the recovery tank 34, and the tip of the liquid feeding pipe 36 is not shown. It is connected to 14 and 14a. On the other hand, the liquid discharge port 42 is formed in the bottom part of the drainage tank part 26 of the water washing treatment tank 10, and the drainage pipe 44 is connected to the liquid discharge port 42 in communication.

In the substrate processing apparatus having the above-described configuration, as shown in Fig. 3A, when the substrate 1 passes through the installation position of the pure water discharge nozzle 14, the pure water discharge nozzle 14 The pure water discharged onto the substrate 1 flows to the lowered side on the substrate 1 together with the chemical liquid 2 attached to the upper surface of the substrate 1 and flows down the edge of the substrate 1. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower surface side of the substrate 1 flows toward the lower side of the substrate 1 along the lower surface of the substrate 1 and flows off the edge of the substrate 1. The mixed liquid of the pure water and the chemical liquid which flowed off the edge of the board | substrate 1 flows into the drain tank 26, flows out into the drain pipe 44 through the liquid discharge port 42 in the drain tank 26, and the drain pipe 44 Is discharged as waste liquid. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 toward the lower surface side of the substrate 1 flows away from the lower surface of the substrate 1 and flows into the recovery tank 24. Then, the relatively small amount of pure water recovered into the recovery tank 24 flows into the liquid recovery pipe 30 through the liquid recovery port 28 in the recovery tank 24 and through the liquid recovery pipe 30. It flows into the recovery tank 34. The recovery liquid 32 stored in the recovery tank 34 is returned to the pure discharge nozzles 14 and 14a through the liquid supply pipe 36 for reuse. In addition, at this time, the pure water discharged from the lower pure water discharge nozzle 14 is returned to the recovery tank 34 after contacting the substrate 1, but there is no substantial irrationality. That is, since gravity acts on the chemical liquid attached to the lower surface of the substrate 1, only a small amount of chemical liquid is originally attached to the chemical liquid attached to the lower surface. Therefore, since the pure water contacting the lower surface of the substrate 1 contains only a very small amount of chemical liquid, it is practically unreasonable to return it to the recovery tank 34 for reuse. In addition, the liquid removal roller which removes the chemical liquid adhering to the lower surface of the board | substrate 1 may be used for the chemical liquid treatment tank 16, In that case, the lower surface of the board | substrate 1 which enters the washing | cleaning process tank 10 is used. Since the chemical liquid attached to it becomes smaller, it is practically unreasonable.

On the other hand, as shown in Fig. 3B, when the substrate 1 does not pass through the installation position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 14 is the substrate 1 surface. It flows into the collection tank 24 as it is without passing through. The large amount of pure water dropped into the recovery tank 24 and flows out into the liquid recovery pipe 30 through the liquid recovery port 28 in the recovery tank 24 and is recovered through the liquid recovery pipe 30. It flows into the tank 34. The recovery liquid (pure water) 32 stored in the recovery tank 34 is returned to the pure discharge nozzles 14 and 14a through the liquid supply pipe 36 for reuse. In this case, pure water rarely flows into the drainage tank 26, and the amount of waste liquid discharged through the drainage pipe 44 in the drainage tank 26 is extremely small.

In addition, in the vicinity of the inlet 12 of the water treatment tank 10, the pure water discharge nozzle is applied to the substrate 1 to which the chemical liquid which is carried into the water treatment tank 10 in the chemical treatment tank 16 adheres. Since pure water is discharged toward the front of the conveyance direction of the board | substrate 1 from 14a, the pure water discharged over the board | substrate 1 is carried out on the board | substrate 1 with the chemical liquid 2 adhering to the upper surface of the board | substrate 1. It flows to the front side, and overflows at the front edge of the board | substrate 1, and falls. The mixed liquid of the pure water and the chemical liquid which overflowed from the front edge side of the board | substrate 1 flows into the drain tank 26 with which the partition was covered by the recovery tank part 24 by the width direction boundary plate 22, and the drain tank part 26 is carried out. It flows on the inner bottom toward the liquid outlet 42. Then, the liquid is discharged into the drainage pipe 44 through the liquid discharge port 42 in the drainage tank 26 and discharged as waste liquid through the drainage pipe 44.

As described above, in this substrate processing apparatus, the pure water used is almost never reused and is disposed of as waste liquid together with the chemical liquid. Since pure water is used for the cleaning treatment of the substrate 1, the processing efficiency of the substrate 1 is lowered. There is no case. Moreover, since the mixed liquid of pure water and a chemical liquid does not flow in the liquid collection piping 30, the recovery tank 34, the liquid supply piping 36, the inside of the pump 40, etc., those members are contaminated with chemical liquid. The case is minimized. On the other hand, since the pure water recovered into the recovery tank 24 is reused, the amount of pure water used can be reduced, and the amount of waste liquid is also reduced.

In the substrate processing apparatus described above, the pure water discharge nozzle 14a provided at the position closest to the inlet 12 of the flushing tank 10 among the pure water discharge nozzles 14 moves forward in the conveying direction of the substrate 1. The discharge port is arranged so as to discharge pure water. In addition, in order to prevent pure water from flowing into the chemical liquid treatment tank 16 on the upstream side through the upper surface of the substrate 1 carried into the washing treatment tank 10, the inlet 12 of the washing treatment tank 10 is provided. Although the air knife may be provided in the vicinity of the substrate 1, the apparatus 1 having such a configuration has the L-shaped drainage tank 26 as in the above-described embodiment, and the substrate 1 carried into the water treatment tank 10. It is necessary to flow the pure water and the chemical liquid which overflows from the front edge of the front side into the drain tank 26. On the other hand, when the quantity of the pure water and the chemical liquid which overflows from the front edge side edge of the board | substrate 1 carried in the water washing tank 10 does not become much, etc., as shown in a schematic plan view in FIG. The boundary plate 46 is provided along the conveyance direction of the board | substrate 1 over the full length of the water washing tank 10, without providing the width direction boundary plate 22, and by the boundary plate 46 The bottom part of the water washing tank 10 may be partitioned into a recovery tank 48 and a drainage tank 50.

In the first embodiment, the liquid discharged through the drainage pipe 44 is discarded as waste liquid, but in the present invention, drainage does not necessarily mean waste liquid. For example, in the case where two water washing treatment tanks are provided downstream of the chemical liquid treatment tank, the present invention may be applied to both water washing treatment tanks, and the following configuration may be considered. That is, the downstream water treatment tank uses new unused pure water for washing water. And the liquid discharged | emitted from the drain pipe 44 in the downstream washing tank is not discarded, but is sent to the upstream washing tank, and can be used for washing with fresh water in the upstream washing tank. This is because a large amount of chemical liquid adheres to the substrate loaded into the upstream washing tank, while the substrate loaded into the downstream washing tank is already washed once in the upstream washing tank, and the chemical liquid adhered to the substrate is extremely Because it is a small amount. Therefore, the liquid discharged to the drainage pipe 44 from the downstream water treatment tank contains only a small amount of the chemical liquid, and can be used as a fresh liquid in the upstream water treatment tank. Thus, the amount of pure water used can be further reduced by sending the liquid discharged | emitted from the downstream water washing tank to the drain pipe 44 to an upstream water washing tank for reuse.

Moreover, in the above example, although the drainage tank part 26 is made into the integral L shape which made the part formed by the boundary plate 20 and the part formed by the width direction boundary plate 22 communicate, The drainage pipes may be separately provided at the portions, and both drainage pipes may be connected to the recovery tank 34 to communicate with each other.

Next, FIGS. 5 and 6 show another example of the first embodiment of the present invention, FIG. 5 is a schematic plan view showing the schematic configuration of the substrate processing apparatus, and FIG. 6 shows the VI-VI arrow of FIG. It is a cross section of. Also in this substrate processing apparatus, the configuration and operation of the main portion for processing the substrate are the same as those in the conventional apparatus described with reference to FIG. In Figs. 5 and 6, members denoted by the same reference numerals as those used in Figs. 1 to 3 represent the same members having the same functions as those of the members described with reference to Figs. Omit.

Also in this substrate processing apparatus, although not shown, each of the conveying rollers disposed in parallel in the water treatment tank 10 is supported so as to be inclined in a direction orthogonal to the conveying direction of the substrate 1, FIG. As shown to, the board | substrate 1 is conveyed in the horizontal direction in the form inclined in the direction orthogonal to the conveyance direction. And in this substrate processing apparatus, the drain container 66 is arranged in the water washing tank 10 along the conveyance direction of the board | substrate 1. This drain container 66 is arrange | positioned near the position just under the edge of the lowered side of the board | substrate 1 which is inclined and conveyed. Moreover, the drain outlet 68 is formed in the bottom part of the drain container 66, and the drain pipe 70 is connected to the liquid discharge port 68.

On the other hand, the liquid recovery port 72 is formed in the bottom part of the water washing tank 10, and the liquid collection pipe 74 is connected to the liquid recovery port 72 in communication. Although not shown, similarly to the apparatus shown in Figs. 1 to 3, the liquid recovery pipe 74 is connected to a recovery tank for storing the recovery liquid, and the recovery tank has a filter and a pump, respectively. One end is connected, and the front end of the liquid supply pipe is connected to the pure water discharge nozzles 14 and 14a.

In the substrate processing apparatus having the above-described configuration, as shown in FIG. 6, when the substrate 1 passes through the installation position of the pure water discharge nozzle 14, the pure water discharge nozzle 14 is connected to the substrate 1. The pure water discharged upward flows on the lower side of the substrate 1 together with the chemical liquid 2 attached to the upper surface of the substrate 1 and flows down the edge of the substrate 1. In addition, a part of the pure water discharged from the procedure discharge nozzle 14 toward the lower surface side of the substrate 1 flows toward the lower side of the substrate 1 along the lower surface of the substrate 1 and flows down the edge of the substrate 1. The mixed liquid of the pure water and the chemical liquid which flowed from the edge of the board | substrate 1 flows into the drain container 66, and flows out into the drain pipe 70 through the liquid discharge port 68 in the drain container 66, and the drain pipe 70 Is discharged as waste liquid. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 toward the lower surface side of the substrate 1 flows away from the lower surface of the substrate 1 and flows down to the bottom portion of the water treatment tank 10. In addition, a relatively small amount of pure water recovered to the bottom of the water treatment tank 10 flows out from the bottom of the water treatment tank 10 into the liquid collection pipe 74 through the liquid recovery port 72 and is used for liquid recovery. It flows into the recovery tank through the pipe 74. The recovery liquid stored in the recovery tank is returned to the pure discharge nozzles 14 and 14a through the liquid feeding pipe and reused.

On the other hand, when the substrate 1 does not pass through the installation position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 14 is washed directly without washing the substrate 1 surface. Descend to my bottom. The large amount of pure water that has flowed down to the bottom of the water treatment tank 10 and flows out from the bottom of the water treatment tank 10 to the liquid recovery pipe 74 through the liquid recovery port 72, and the liquid recovery piping It is introduced into the recovery tank through 74. Then, the recovered liquid (pure water) stored in the recovery tank is returned to the pure discharge nozzles 14 and 14a after passing through the liquid feeding pipe and reused. In this case, pure water rarely flows into the drain container 66, and the amount of waste liquid discharged through the drain tube 70 in the drain container 66 is extremely small.

As mentioned above, also in this substrate processing apparatus, the used pure water is hardly reused and is discarded as a waste liquid together with the chemical liquid, and since the pure water is used for the cleaning process of the substrate 1, the processing efficiency of the substrate 1 is lowered. There is nothing to do. Moreover, since the mixed liquid of pure water and a chemical liquid does not flow in the liquid collection piping 74, the recovery tank, the liquid supply piping, the inside of a pump, etc., contamination of these members with a chemical liquid is suppressed to the minimum. On the other hand, since the pure water recovered to the bottom of the water washing tank 10 is reused, the amount of pure water used can be reduced, and the amount of waste liquid is also reduced.

Next, FIGS. 7 and 8 show still another example of the first embodiment of the present invention, FIG. 7 is a schematic plan view showing a schematic configuration of a substrate processing apparatus, and FIG. Cross section in arrow. Also in this substrate processing apparatus, since the structure and operation of the main portion for processing the substrate are the same as those of the conventional apparatus described with reference to FIG. 19, the description thereof is omitted. In Figs. 7 and 8, members denoted by the same reference numerals as those used in Figs. 1 to 3 denote the same members having the same functions as those of the members described with reference to Figs. Omit.

In this substrate processing apparatus, although not shown, each conveying roller arranged in parallel in the water washing tank 10 is horizontally supported, and as shown in FIG. 8, the substrate 1 is horizontal. It is made to be conveyed in the horizontal direction in the form. In this substrate processing apparatus, the bottom portion of the washing treatment tank 10 is divided by a pair of boundary plates 76a and 76b and the widthwise boundary plate 78, and the bottom portion of the washing treatment tank 10 has a recovery tank portion ( 80), and it is divided into a pair of drainage tank parts 82a and 82b, and the inlet side drainage tank part 84. As shown in FIG.

The pair of boundary plates 76a and 76b are positioned along the conveying direction of the substrate 1 near the position immediately below the edges on both sides of the substrate 1, which are conveyed in a horizontal form on the bottom of the water treatment tank 10, respectively. It is installed. As shown in Fig. 8, the upper ends of the boundary plates 76a and 76b are preferably disposed so as to be close to the edges of both sides of the substrate 1, respectively. Moreover, the width direction border plate 78 is provided in the inlet side of the board | substrate 1 on the bottom surface in the water treatment tank 10 along the direction orthogonal to the conveyance direction of the board | substrate 1. Both ends of the widthwise boundary plate 78 are connected to one end of each of the boundary plates 76a and 76b so as to form a spherical shape. The pair of drainage tanks 82a and 82b and the inlet side drainage The grandparents 84 communicate with each other in a flow path.

In addition, a liquid recovery port 86 is formed at the bottom of the recovery tank 80 of the water treatment tank 10, and a pipe 88 for liquid recovery is connected to the liquid recovery port 86. . Although not shown, the liquid collecting pipe 88 is connected to a collecting tank for storing the recovered liquid, similarly to the apparatus shown in FIGS. 1 to 3, and one end of the liquid feeding pipe provided with a filter and a pump is respectively provided in the collecting tank. This communication connection is made, and the front-end | tip of this liquid supply piping is connected to the pure water discharge nozzles 14 and 14a. On the other hand, the liquid discharge port 90 is formed in the bottom part of the drain tank 82a of the water washing tank 10, and the drain pipe 92 is connected to the liquid discharge port 90.

In the substrate processing apparatus having the above-described configuration, as shown in FIG. 8, when the substrate 1 passes through the installation position of the pure water discharge nozzle 14, the pure water discharge nozzle 14 is connected to the substrate 1. The pure water discharged upward flows on both sides of the substrate 1 together with the chemical liquid 2 attached to the upper surface of the substrate 1, respectively, and flows down at both edges of the substrate 1. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower surface side of the substrate 1 flows to both sides of the substrate 1 along the lower surface of the substrate 1 and flows from both edges of the substrate 1. The mixed liquid of the pure water and the chemical liquid which respectively flowed out at both edges of the board | substrate 1 flows into each drain tank part 82a, 82b, respectively, and the drain pipe 92 through the liquid discharge port 90 in the drain tank part 82a, 82b. ) And flows out through the drainage tube 92 to be discharged as waste liquid. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 toward the lower surface side of the substrate 1 flows away from the lower surface of the substrate 1 and flows into the recovery tank 80. Then, the relatively small amount of pure water recovered into the recovery tank 80 flows into the liquid recovery pipe 88 through the liquid recovery port 86 in the recovery tank 80, and the liquid recovery pipe 88 is discharged. Through the recovery tank. The recovery liquid stored in the recovery tank is returned to the pure discharge nozzles 14 and 14a through the liquid feeding pipe and reused.

On the other hand, when the substrate 1 does not pass through the installation position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 14 does not pass through the surface of the substrate 1, but directly into the recovery tank 80. You're down. The large amount of pure water dropped into the recovery tank unit 80 flows into the liquid recovery pipe 88 through the liquid recovery port 86 in the recovery tank 80 and is recovered through the liquid recovery pipe 88. Enter the tank. Then, the recovered liquid (pure water) stored in the recovery tank is returned to the pure discharge nozzles 14 and 14a through the liquid feeding pipe for reuse. In this case, pure water rarely flows into the drainage tanks 82a and 82b, and the amount of waste liquid discharged through the drainage tube 92 in the drainage tanks 82a and 82b is extremely small.

In addition, in the vicinity of the inlet of the water washing treatment tank 10, the pure water discharge nozzle 14a is applied to the substrate 1 to which the chemical liquid brought into the water washing treatment tank 10 is attached. Since the pure water is discharged toward the front of the substrate 1 in the conveying direction, the pure water discharged onto the substrate 1 flows over the substrate 1 toward the front side together with the chemical liquid 2 attached to the upper surface of the substrate 1. It overflows from the front edge side edge of the board | substrate 1, and falls. The mixed liquid of the pure water and the chemical liquid which overflowed from the front edge side edge of the board | substrate 1 flows into the inlet side drain tank part 84 where the membrane was partitioned by the collection tank part 80 by the width direction boundary plate 78, and is carried in On the bottom surface in the side drain tank 84 flows toward the liquid discharge port 90. Then, the liquid is discharged into the drainage tube 92 through the liquid discharge port 90 in the drainage tank portion 82a and passed through the drainage tube 92 to be discharged as waste liquid.

Also in this substrate processing apparatus, similarly to the apparatus shown in Figs. 1 to 3, the processing efficiency of the substrate 1 does not decrease, and further, the liquid recovery piping 88, the recovery tank, the liquid supply piping, Contamination of a member such as the inside of the pump with the chemical liquid is suppressed to a minimum, while the effect of reducing the amount of pure water used and reducing the amount of waste liquid is obtained.

9 and 10 show still another example of the first embodiment of the present invention, FIG. 9 is a schematic plan view showing a schematic configuration of a substrate processing apparatus, and FIG. 10 is a cross-sectional view of FIG. It is a cross section of. Also in this substrate processing apparatus, since the structure and operation of the main portion for processing the substrate are the same as those of the conventional apparatus described with reference to FIG. 19, the description thereof is omitted. In Figs. 9 and 10, members denoted by the same reference numerals as those used in Figs. 1 to 3 represent the same members having the same functions as those of the members described with reference to Figs. Omit.

In this substrate processing apparatus, although not shown, each conveying roller arranged in parallel in the water washing tank 10 is supported horizontally, and as shown in FIG. 10, the board | substrate 1 is horizontal. It is made to be conveyed in the horizontal direction in the form. In this substrate processing apparatus, a pair of drainage vessels 94a and 94b are rolled out inside the water treatment tank 10 along the conveyance direction of the substrate 1. These pairs of drainage container 94a, 94b are arrange | positioned near the position just under the edge of both sides of the board | substrate 1 conveyed in a horizontal form, respectively. Further, liquid outlets 96a and 96b are formed at the bottoms of the drainage vessels 94a and 94b, respectively, and drainage pipes 98a and 98b are connected to each of the liquid discharge ports 96a and 96b. .

On the other hand, the liquid recovery port 100 is formed in the bottom part of the water washing treatment tank 10, and the liquid collection piping 102 is connected to the liquid recovery port 100 in communication. Although not shown, similarly to the apparatus shown in Figs. 1 to 3, the liquid recovery pipe 102 is connected to a recovery tank for storing the recovery liquid, and the recovery tank has a filter and a pump, respectively. One end is connected, and the front end of the liquid supply pipe is connected to the pure water discharge nozzles 14 and 14a.

In the substrate processing apparatus having the above configuration, as shown in FIG. 10, when the substrate 1 passes through the installation position of the pure water discharge nozzle 14, the pure water discharge nozzle 14 is moved from the pure water discharge nozzle 14 to the substrate 1. The discharged pure water flows on both sides of the substrate 1 together with the chemical liquid 2 attached to the upper surface of the substrate 1, and flows down at both edges of the substrate 1, respectively. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 to the lower surface side of the substrate 1 flows to both sides of the substrate 1 along the lower surface of the substrate 1 and flows from both edges of the substrate 1, respectively. The mixed liquid of the pure water and the chemical liquid which respectively flowed out at both edges of the board | substrate 1 flows into each drain container 94a, 94b, and drains through the liquid discharge ports 96a, 96b in each drain container 94a, 94b. It flows out into 98a and 98b, and it discharges as waste liquid through the drainage pipes 98a and 98b, respectively. In addition, a part of the pure water discharged from the pure water discharge nozzle 14 toward the lower surface side of the substrate 1 flows away from the lower surface of the substrate 1 and flows down to the bottom portion of the water treatment tank 10. In addition, a relatively small amount of pure water recovered to the bottom of the water treatment tank 10 flows out from the bottom of the water treatment tank 10 into the liquid recovery pipe 102 through the liquid recovery port 100, and is used for liquid recovery. Flow into the recovery tank through the pipe (102). The recovery liquid stored in the recovery tank is returned to the pure discharge nozzles 14 and 14a through the liquid feeding pipe and reused.

On the other hand, when the substrate 1 does not pass through the installation position of the pure water discharge nozzle 14, the pure water discharged from the pure water discharge nozzle 14 is washed directly without washing the substrate 1 surface. Descend to my bottom. The large amount of pure water recovered by flowing to the bottom of the water treatment tank 10 flows out from the bottom of the water treatment tank 10 into the liquid recovery pipe 102 through the liquid recovery port 100, and the liquid recovery piping Through 102 is introduced into the recovery tank. Then, the recovered liquid (pure water) stored in the recovery tank is returned to the pure discharge nozzles 14 and 14a through the liquid feeding pipe for reuse. In this case, pure water hardly flows into the drainage vessels 94a and 94b, and the amount of waste liquid discharged through the drainage tubes 98a and 98b in the drainage vessels 94a and 94b is extremely small.

Also in this substrate processing apparatus, similarly to the apparatus shown in Figs. 5 and 6, the processing efficiency of the substrate 1 does not decrease, and in the liquid collecting pipe 102, the collecting tank, the liquid feeding pipe, Contamination of a member such as the inside of the pump with the chemical liquid is suppressed to a minimum, while the effect of reducing the amount of pure water used and reducing the amount of waste liquid is obtained.

As shown in the embodiments shown in Figs. 7 and 8 and the embodiments shown in Figs. 9 and 10, when the substrate 1 is transported in the horizontal direction in the horizontal form, the pure water discharge nozzle 14 is placed on the substrate 1. There is a possibility that the mixed liquid of the discharged pure water and the chemical liquid is difficult to flow on the substrate 1. In this case, as shown in a schematic side view in FIG. 11, the diameter of the conveyance roller 104 which contacts the center part of the lower surface of the board | substrate 1, and supports the board | substrate 1 is respectively provided in the lower end of the board | substrate 1, respectively. It is good to make it larger than the diameter of the conveyance rollers 106 and 106 which contact and support the board | substrate 1, and to support and convey the board | substrate 1 so that a center part may become higher than both ends in the direction orthogonal to the conveyance direction. . With such a configuration, the mixed liquid of pure water discharged from the pure water discharge nozzle 14 onto the substrate 1 and the chemical liquid on the surface of the substrate is divided left and right at the center of the substrate 1 without remaining on the substrate 1. The substrate 1 flows from the center to both ends, respectively, and flows down from both edges of the substrate 1.

12, the pure water discharge nozzles 14 may be arranged so that their discharge ports face both ends of the substrate 1, respectively. With such a configuration, pure water is discharged from each of the pure water discharge nozzles 14 onto the substrate 1 and inclined toward both end sides in a direction orthogonal to the surface of the substrate 1, so that pure water is discharged. In the pure water discharged from the nozzle 14 onto the substrate 1, flows are formed at both ends, respectively, and the pure water mixes with the chemical liquid and flows on both ends of the substrate 1 to flow from the edge of the substrate 1. .

As shown in Fig. 13, a schematic plan view of the substrate processing apparatus is arranged along the direction orthogonal to the conveying direction, near the positions immediately below the front and rear both side edges of the substrate 1, which are conveyed in the horizontal direction in a horizontal form. The pair of auxiliary waste containers 108a and 108b may be disposed, and the pair of auxiliary waste containers 108a and 108b may be supported to move in the horizontal direction in synchronism with the movement of the substrate 1. In the substrate processing apparatus having such a configuration, when the substrate 1 is being conveyed, pure water discharged from the pure water discharge nozzle 14 onto the substrate 1 and used for cleaning the substrate 1 is mixed with the chemical liquid. Even though the liquid may overflow from both front and rear end edges of the substrate 1, the mixed liquids of the pure water and the chemical liquids overflowing from the front and rear both side edges of the substrate 1 are respectively contained in the respective auxiliary drain vessels 108a and 108b. It flows down, and is discharged | emitted through the auxiliary drainage path (not shown) connected to each auxiliary drain container 108a, 108b.

In addition, in 1st Embodiment, although the substrate processing apparatus provided with the water washing tank 10 adjacent to the chemical liquid treatment tank 16 was demonstrated, this invention is another washing | cleaning, image development, etching, peeling, etc. It is also possible to apply to the basic processing apparatus which performs the processing of.

<2. Second Embodiment>

Next, a second embodiment of the present invention will be described with reference to Figs.

Fig. 14 shows an example of a second embodiment of the present invention, and is a schematic side view showing a schematic configuration of a developing apparatus which is one of substrate processing apparatuses. Since the structure and operation of the main part for developing in this developing apparatus are the same as those of the conventional apparatus described with reference to FIG. 20, the same reference numerals as in FIG. 20 denote the same members, and redundant description is omitted.

In this developing apparatus, a recovery tank 122 is formed below the developing solution discharge nozzle 116 by dividing the inside of the developing processing tank 110. Instead of forming the recovery tank 122, a recovery pad (recovery container) may be disposed below the developer discharge nozzle 116. In the recovery tank 122, when the substrate 1 does not pass through the position just below the developer discharge nozzle 116, it is discharged from the developer discharge nozzle 116 and flows down as it is without passing through the substrate 1 surface. The developer is recovered (see Fig. 15). At the bottom of the recovery tank 122, a liquid recovery port 124 is formed in which the developer liquid flowing down from the substrate 1 to the bottom of the recovery tank 122 flows out. The accommodation pipe 126 is connected in communication. The liquid recovery pipe 126 is connected to a recovery tank 130 for storing the recovered developer 128. In addition, one end of the liquid supply pipe 132 is connected to the recovery tank 130, and the tip of the liquid supply pipe 132 is connected to the developer discharge nozzle 116. The pump 134 is provided in this liquid supply pipe 132, and although not shown in figure, a filter is provided as needed. The liquid circulation system is constituted by the liquid recovery pipe 126, the recovery tank 130, the liquid supply pipe 132, and the pump 134.

In the bottom of the developing tank 110, which is separated from the recovery tank 122, as shown in FIG. 14, the developing solution 110 is removed from the substrate 1 by the liquid removal roller 118. A liquid discharge port 136 is formed in which the developing solution which has flowed to the bottom of the processing tank 110 flows out, and a drainage pipe 138 is connected to the liquid discharge port 136.

Further, inside the developing tank 110, a cleaning nozzle 140 is disposed for cleaning the bottom surface of the developing tank 110 by discharging the cleaning liquid toward the bottom surface of the developing tank 110. Although not shown, a cleaning nozzle for cleaning a member such as a conveying roller disposed in the developing tank 110 may be provided. The cleaning nozzle 140 is supplied with a cleaning liquid from a cleaning liquid supply source. In the example shown in FIG. 14, the pure water used to clean the substrate 1 at the bottom of the washing treatment tank 114 provided adjacent to the developing treatment tank 110 and flowed to the bottom portion of the washing treatment tank 114 is removed. The drain outlet 142 which flows out is formed, the water collection pipe 144 is connected to the drain port 142, and the water collection pipe 144 is connected to the water recovery tank 146 as a flow path, and the water washing tank The pure water 148 used at 114 is recovered and stored in the water recovery tank 146. Then, one end of the water supply pipe 150 is connected to the water recovery tank 146, and the front end of the water supply pipe 150 is connected to the cleaning nozzle 140, and the pump 152 provided in the liquid supply pipe 150 is connected. ), The pure water 148 in the water recovery tank 146 is supplied to the cleaning nozzle 140.

In the developing apparatus having the above structure, the developing solution 3 discharged from the developing solution discharge nozzle 116 and falling down without passing through the surface of the substrate 1 is the recovery tank 122 of the developing tank 110. Is recovered. The developer recovered in the recovery tank 122 flows into the recovery tank 130 through the liquid recovery pipe 126 and is stored therein. Then, the developer 128 in the recovery tank 130 is sent to the developer discharge nozzle 116 through the liquid supply pipe 132. Since the developer used in the circulating manner does not pass through the surface of the substrate 1, no undesired matter is contained in the developer. Therefore, the inner surface of the recovery tank 130, the liquid recovery piping 126 and the liquid supply piping The inner surface of the 132, the inside of the pump 134, and the like are not contaminated by uncontaminated materials.

On the other hand, the used developer discharged from the developer discharge nozzle 116 onto the substrate 1 and flowing down from the substrate 1 to the bottom of the developing tank 110 is discharged from the liquid discharge port 136 through the drainage pipe 138. Discharged. Therefore, a problem does not arise even if a non-lysate is contained in the developing solution. In addition, the bottom surface of the developing tank 110 and the drainage pipe 138 and the like which are in contact with the used developer are sent from the water recovery tank 146 to the cleaning nozzle 140 through the water supply pipe 150 to the cleaning nozzle 140. It is cleaned by the pure water 148 discharged from the 140 to prevent contamination. In addition, when pure water does not want to adhere to the member which contacts the board | substrate 1, for example, the liquid removal roller 118, such a member can also be wash | cleaned using a process liquid.

15 shows an example different from that shown in FIG. 14 of the cleaning mechanism of the developing tank, and is a schematic side view showing the schematic configuration of the developing apparatus. In FIG. 15, the same reference numerals as those used in FIG. 14 denote the same members having the same functions as those of the above-described members described with reference to FIG. 15, the developer 3 discharged from the developer discharge nozzle 116 is left as it is while the substrate 1 is not passing directly under the developer discharge nozzle 116 to be recovered into the recovery tank 13. It shows the state which becomes.

In the apparatus shown in Fig. 15, the bottom surface 156 in the developing tank 154 is inclined such that the side of the washing tank 158 adjacent to the developing tank 154 is high and the side of the recovery tank 122 is low. have. Then, the washing nozzle 160 is provided at a position higher on the flushing tank 158 side, and a liquid discharge port 162 is formed at the bottom of the developing tank 154 lowered on the recovery tank 122 side. The drainage pipe 164 is connected to the liquid discharge port 162. In addition, the inside of the water treatment tank 158 has the conveyance path L of the substrate 1 interposed therebetween, and the plurality of water jet nozzles 120 disposed on both the upper and lower sides thereof allow the top and the bottom of the substrate 1 to be moved. The recovery pat 166 which collects the pure water sprayed on both lower surfaces is arrange | positioned. The water recovery pad 166 is disposed at a position higher than that of the cleaning nozzle 160, and connects the bottom portion of the water recovery pad 166 and the cleaning nozzle 160 with a flow passage 168. The water supply pipe 168 branches in the middle to form a drain pipe 170, and an opening / closing valve 172 is provided in the drain pipe 170. Moreover, the drain port 174 is formed in the bottom part of the water washing process tank 158, and the drain pipe 176 is connected to the drain port 174.

In the apparatus shown in Fig. 15, the pure water recovered into the water recovery pad 166 is sent to the cleaning nozzle 160 through the water supply pipe 168, and the bottom of the developing tank 154 in the cleaning nozzle 160. Pure water is discharged onto the surface 156. Pure water discharged onto the bottom surface 156 in the developing tank 154 flows down on the bottom surface 156 according to the inclination of the bottom surface 156. Thereby, the whole bottom surface 156 in the developing tank 154 is wash | cleaned with pure water. The pure water flowing down to the vicinity of the recovery tank 122 is discharged from the liquid discharge port 162 at the bottom of the developing tank 154 through the drainage pipe 164.

Next, Fig. 16 shows another example of the second embodiment of the present invention and is a schematic side view showing the schematic configuration of a developing apparatus. In FIG. 16, the same code | symbol as the code | symbol used in FIG. 14 is the same member which has the same function as the said member demonstrated with respect to FIG. 14, and duplication description is abbreviate | omitted.

In the apparatus shown in Fig. 16, the drainage pipe 178 connected to the liquid discharge port 136 at the bottom of the developing tank 110 is branched in the middle, and the tip of the branched liquid returning pipe 180 is recovered. The flow path is connected to the tank 130, and the flow path switching valve 182 is provided in the branch position of the drain piping 178. As shown in FIG. In addition, the liquid supply pipe 132 connecting the recovery tank 130 and the developer discharge nozzle 116 is branched in the middle, and the tip of the branched liquid supply pipe 184 communicates with the cleaning nozzle 140. You are connected. In addition, an opening / closing control valve 186 is provided in the cleaning liquid supply pipe 184, and an opening and closing control valve 188 is connected to the water supply pipe 150 connecting the water recovery tank 146 and the cleaning nozzle 140 to the flow path. ) Is being installed.

In the apparatus having the configuration shown in Fig. 16, when the undeveloped solution is not contained in the used developer falling down from the bottom of the developing tank 110 on the substrate 1, for example, a coating film of a soluble resist is deposited. When developing the substrate or the like, the flow path switching valve 182 is switched so that the drainage pipe 178 and the liquid return pipe 180 are in communication with each other, and the used developer is a drainage pipe 178. ) Into the liquid return pipe 180. In this case, by closing the opening / closing control valve 188 provided in the water supply pipe 150, the used developer and pure water are not mixed. In this way, the used developer is recovered into the recovery tank 130 through the drainage pipe 178 and the liquid returning pipe 180. When the used developer is discharged from the developer discharge nozzle 116 when the substrate 1 does not pass under the developer discharge nozzle 116, it is left as it is, together with the developer recovered into the recovery tank 130. Circulate to use. At this time, when it is necessary to clean the bottom surface or the like in the developing tank 110, the opening / closing control valve 186 provided in the cleaning liquid supply pipe 184 is opened, and a part of the developing solution 128 in the recovery tank 130 is opened. Is sent to the cleaning nozzle 140 through the cleaning liquid supply pipe 184, and the developer is discharged from the cleaning nozzle 140 to clean the bottom surface of the developing tank 110 and the like.

On the other hand, when the type of the substrate to be developed is changed and the non-lysate is included in the used developer falling down from the substrate 1 to the bottom of the developing tank 10, for example, the substrate on which the coating film of the non-solution resist is deposited is developed. At the time of processing, the flow path switching valve 182 is switched to operate so that the drainage pipe 178 and the liquid returning pipe 180 do not communicate with each other, and the used developer is used for the drainage pipe 178. To be discharged through In this case, the opening / closing control valve 186 provided in the cleaning liquid supply pipe 184 is closed, and the opening / closing control valve 188 provided in the water supply pipe 150 is opened, similarly to the apparatus shown in FIG. The pure water used for washing the substrate 1 in the washing tank 114 is sent to the washing nozzle 140, and the pure water is used to wash the bottom surface of the developing tank 110 and the like. In addition, when the used developing solution is discharged, the bottom surface of the developing tank 110 and the like can be cleaned by using pure water and a treating solution together.

Next, Fig. 17 shows an example in which a developer discharge nozzle is provided for each type of developer to be used, and is a schematic side view showing a schematic configuration of a developer. In Fig. 17, the same reference numerals as those used in Figs. 14 and 16 denote the same members having the same functions as those of the above-described members described with reference to Figs.

In the apparatus shown in Fig. 17, two developer discharge nozzles 116a and 116b are provided according to the type of developer to be used, and two recovery tanks 122a and 122b are developed according to the type of developer. It is written in. Moreover, according to the kind of developing solution, the liquid circulation system and the developing solution cleaning system are each installed. Referring to FIG. 17, reference numerals 124a and 124b are liquid recovery ports, 126a and 126b are liquid collection pipes, and 130a and 130b are separately collected and stored, respectively, of different types of developer 128a and 128b. It is a recovery tank, 132a and 132b are the liquid supply piping provided with the pumps 134a and 134b, respectively, and 136a and 136b are liquid discharge ports. Also, 178a and 178b are drainage pipes, 180a and 180b are liquid return pipes, 182a and 182b are flow path switching valves, and 184a and 184b are washing and feeding pipes provided with on / off control valves 186a and 186b, respectively. . In addition, open / close control valves 190a, 190b, 192a, and 192b are respectively provided in the liquid collection pipes 126a and 126b and the drainage pipes 178a and 178b, respectively.

In the apparatus shown in Fig. 17, one of the opening / closing control valves 190a and 190b provided in each of the liquid collecting pipes 126a and 126b is opened and the other is closed, and the respective draining pipes 178a and 178b are respectively opened. By opening one of the open / close control valves 192a and 192b and closing the other, the above-described processing operation in the apparatus shown in Fig. 16 can be performed for each type of developer to be used.

18 is a schematic side view showing another embodiment in which a processing operation can be performed for each type of developing solution to be used, showing a schematic configuration of a developing processing apparatus. In Fig. 18, the same reference numerals as those used in Figs. 14, 16, and 17 denote the same members having the same functions as those of the above-described members described with reference to Figs. .

In the apparatus shown in Fig. 18, only one developer discharge nozzle 116 is provided so as to share the developer discharge nozzle 116 with a developer of a different kind, and the recovery tank unit 122 is also used for the development processing tank 110. ), And only one type of developer is recovered by the same recovery tank 122. Then, for each liquid supply connected to the liquid supply pipes 132 connected to the developer discharge nozzle 116, flow paths are respectively connected to the recovery tanks 130a and 130b for separately collecting and storing the different types of developer 128a and 128b. The pipes 132a and 132b are connected to each other by communicating. In addition, a bypass pipe 194 is branched near the distal end of the liquid feed pipe 132 and connected to the developer discharge nozzle 116, and is downstream from the branched position of the liquid feed pipe 132 and bypassed. Opening and closing control valves 196a and 196b are respectively provided in the pipe 194. In addition, a liquid discharge port 198 is formed at the bottom of the recovery tank 122. A liquid discharge pipe 900 is connected to the liquid discharge port 198, and an opening / closing valve is connected to the liquid discharge pipe 900. 902 is provided.

Also in the apparatus shown in Fig. 18, similarly to the apparatus shown in Fig. 17, one of the opening and closing control valves 190a and 190b provided in each of the liquid collecting pipes 126a and 126b is opened, the other is closed, and each drain By opening one of the opening / closing control valves 192a and 192b respectively provided in the pipes 178a and 178b and closing the other, the above-described processing operation in the apparatus shown in Fig. 16 can be performed for each type of developer to be used. . And in this apparatus, when changing the kind of developing solution, the opening / closing valve 902 provided in the liquid discharge piping 900 is opened, and the developing solution which remains in the collection tank part 122 is discharged. In addition, by opening / closing the control valve 196b provided in the bypass pipe 194 and increasing the flow rate of the developer supplied to the developer discharge nozzle 116, the time required for liquid replacement is shortened to improve the processing efficiency. do. When the liquid replacement is completed, the on / off valve 902 provided on the liquid discharge pipe 900 and the on / off control valve 196b provided on the bypass pipe 194 are respectively closed.

Further, in the second embodiment described above, a management apparatus for managing the components of the processing liquid in the recovery tanks 130, 130a, 130b with respect to the recovery tanks 130, 130a, 130b for storing the recovered processing liquid is provided. It is desirable to lay. In the case of the developing apparatus, for example, the management apparatus analyzes the processing liquid in the recovery tanks 130, 130a, and 130b, and compares the developing solution (for example, TMAH) component with the resist (resin) component dissolved therein. Each concentration is measured, and when these values deviate from a desired value, the fresh and the concentrated solution of the developing solution are added to the processing liquid in the recovery tanks 130, 130a, and 130b, or, if necessary, the recovery tanks 130, It is conceivable to dispose the processing liquids in 130a and 130b so as to perform an operation of keeping these values in a desired range. Alternatively, a certain amount of new liquid is replenished at a predetermined timing with respect to the processing liquid in the recovery tanks 130, 130a and 130b, or a predetermined amount of new liquid is discarded after a predetermined amount of the processing liquid in the recovery tanks 130, 130a and 130b is discarded. It may be such as to supplement.

In the case of the developing process, if the same processing solution (developing solution) is circulated and continued to be used, the developing solution gradually deteriorates due to the developer's contact with air due to the circulating action of the developing solution, or the resist melts in the developing solution. In order to deteriorate, it is preferable to provide the above-mentioned management apparatus. However, in the case where the developer is also used for cleaning the inside of the treatment tank with the recovered developer, the developer is particularly likely to deteriorate. Therefore, it is particularly preferable to provide a management device as described above to prevent contamination or deterioration of the treatment liquid as described above.

In addition, in 2nd Embodiment, the case where a non-toxic compound produces | generates is a case where the non-toxic compound which becomes an obstacle when it produces | generates and uses a process liquid produces | generates specifically, the coating liquid for forming an organic leveling film, for example. Or the case where the development process is carried out the board | substrate to which the color resist etc. for color filter manufacture were apply | coated. The coating liquid and color resist for forming an organic flattening film generally do not peel off the pattern of the formed film also in a later process. On the contrary, the case where no non-lysate is produced is a case where the non-lysate which is an obstacle in the case of circulating and using the processing liquid is not produced. Specifically, for example, a sufficient amount of developer or the like for general positive resist or negative resist is sufficient. This is the case of developing the substrate to which the coating liquid to be dissolved is applied. A general positive resist or negative resist exfoliates the formed film pattern in a later process.

In the second embodiment, the development processing apparatus has been described, but the present invention can also be applied to a substrate processing apparatus which performs etching, peeling or the like using ozone water or the like.

By using the substrate processing apparatus of each invention of Claim 1, Claim 2, Claim 4, Claim 8, and Claim 9, while maintaining the utilization efficiency of process liquids, such as pure water, it can reduce the usage-amount of process liquids, Waste volume can also be reduced. In addition, the processing efficiency of the substrate can be maintained high, and the contamination of each member in the liquid circulation path can also be minimized.

In the substrate processing apparatus of the invention according to claim 3, it is possible to reliably discharge the used processing liquid that flows on the lowered side of the substrate and flows off the edge of the substrate as waste liquid.

In the substrate processing apparatus of claim 5, the used processing liquid flowing on both sides of the substrate and flowing from both edges of the substrate can be reliably discharged as waste liquid.                     

In the substrate processing apparatus of the sixth aspect of the present invention, the liquid which overflows from the front edge side edge of the substrate near the delivery port of the substrate can be discharged as waste liquid.

In the substrate processing apparatus of the invention according to claim 7, the liquid which has overflowed from the leading edge side of the substrate near the inlet of the substrate can be discharged as a waste liquid together with the used processing liquid falling into the drain tank.

In the substrate processing apparatus of each invention of Claim 10 and Claim 11, the process liquid discharged from a process liquid discharge means to a board | substrate flows to the both ends of a board | substrate, respectively, without remaining on a board | substrate, and flows in the edge of a board | substrate, respectively. Can fall.

In the substrate processing apparatus according to the twelfth aspect, the used processing liquid that overflows from both front and rear edges of the substrate when the substrate is being conveyed can be discharged as waste liquid.

In the substrate processing apparatus of the invention according to claim 13, the amount of pure water used can be reduced in the process of removing the chemical liquid attached to the substrate on the substrate and replacing the chemical liquid on the substrate with pure water.

When the substrate processing apparatus of the invention according to claim 14 is used, the substrate can be processed while circulating the processing liquid, and only the liquid used for the processing can be separated and drained, thereby maintaining the utilization efficiency of the processing liquid. At the same time, there is no problem in the liquid circulation system. In the process, no complicated control is required.

In the substrate processing apparatus of the invention according to claim 15, contamination of the inner wall surface or the member inside the processing tank can be prevented.

In the substrate processing apparatus of the invention according to claim 16, it is possible to save the cleaning liquid used to prevent contamination of the inner wall surface of the processing tank or the member inside the processing tank.

In the substrate processing apparatus of the invention according to claim 17, it is possible to circulate and use the used processing liquid when the cost-effective matter is not contained in the processing liquid used according to the difference of the kind of the substrate. The usage amount can be reduced.

In the substrate processing apparatus of the present invention according to claim 18, when the non-lysate is contained in the processing liquid used according to the difference in the kind of the substrate, etc., the processing liquid used can be circulated and used. The usage amount of can be reduced. In addition, when circulating and using the used processing liquid which falls down on the board | substrate, the processing liquid used for the washing | cleaning of the inner wall surface of a processing tank or the member inside a processing tank is also circulated, and it is used for the process of a board | substrate, the cleaning of the wall surface, etc. in a processing tank. Since this can be done, the processing liquid (washing liquid) can also be saved.

In the substrate processing apparatus of the present invention according to claim 19, there is no fear of circulating a contaminated or deteriorated processing liquid and using it for substrate processing, so that the processing quality of the substrate can be maintained.

Claims (19)

A substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in a horizontal direction by the transfer means in the processing tank. A recovery path for discharging the processing liquid discharged from the processing liquid discharge means and flowing down without passing through the substrate surface; and a direction discharged from the processing liquid discharge means onto the substrate and perpendicular to the conveying direction of the substrate on the substrate. A drainage path for collecting the used treatment liquid flowing down the edge of the wastewater and flowing from the edge is installed, and the treatment liquid recovered by the recovery path is returned to the treatment liquid discharge means. A substrate processing apparatus comprising a liquid circulation system and a drain passage for discharging the used processing liquid collected in the drain passage. A substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in a horizontal direction by the transfer means in the processing tank. The conveying means conveys the substrate in a form inclined with respect to the horizontal plane in a direction orthogonal to the conveying direction of the substrate, and is immediately below the edge of the lower side of the substrate to be conveyed at an angle on the bottom surface of the processing tank. In the vicinity, a boundary plate is provided in accordance with the conveying direction of the substrate, and the bottom portion in the treatment tank is divided by the boundary plate, and the processing liquid discharged from the processing liquid discharging means is recovered without falling through the substrate surface. The processing liquid discharged from the recovery tank portion and the processing liquid discharge means is partitioned into a drainage tank portion which receives the used processing liquid that flows down to the lower side on the substrate and flows down the edge of the substrate. A liquid flow path for discharging the used processing liquid flowing down into the liquid drainage tank is provided, and a liquid circulation system is provided for returning to the processing liquid discharge means. Substrate processing apparatus, characterized in that. The method of claim 2, The substrate processing apparatus arranged so that the upper end of the said boundary plate may be inclined and approached the edge of the lowered side of the board | substrate conveyed. A substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in the horizontal direction in a horizontal form by the transfer means in the processing tank. On the bottom surface of the said process tank, near a position just below the edge of both sides of the board | substrate to be conveyed, a boundary board is provided according to the conveyance direction of a board | substrate, respectively, and each bottom board in each process board | substrate is divided, A recovery tank part which is discharged from the processing liquid discharge means and recovers the processing liquid which flows down as it is without passing through the substrate surface; And a liquid circulation system for returning the processing liquid recovered in the recovery tank to the processing liquid discharging means, and discharging the used used processing liquid into each of the draining tanks. A substrate processing apparatus comprising a drainage passage. The method of claim 4, wherein The substrate processing apparatus arrange | positioned so that the upper end of each said boundary plate may approach each edge of both sides of the board | substrate conveyed, respectively. The method according to any one of claims 2 to 5, On the bottom surface of the said processing tank, the width direction board | substrate is provided in the carrying-in side of a board | substrate according to the direction which cross | intersects the conveyance direction of a board | substrate, and it divides the bottom part in a processing tank by the width direction board | substrate, A substrate processing apparatus for forming an inlet-side drainage tank receiving a liquid overflowing from the front edge side edge of the substrate brought into the container, and discharging the lower processing liquid into the inlet-side drainage tank. The method of claim 6, The substrate processing apparatus which communicated the said delivery port side drainage tank part and the said drainage tank part. In the substrate processing apparatus for processing the substrate by discharging the processing liquid from the processing liquid discharge means to the substrate while conveying the substrate in the horizontal direction by the conveying means in the processing tank, The conveying means conveys the substrate in a form inclined with respect to the horizontal plane in a direction orthogonal to the conveying direction of the substrate, and near the position immediately below the edge of the lowered side of the substrate to be conveyed at an angle in the processing tank. And a drainage container receiving the used processing liquid discharged from the processing liquid discharging means onto the substrate and flowing on the lower side of the substrate according to the conveying direction of the substrate, and flowing from the edge of the substrate. The used processing liquid which is discharged from the substrate and flows down as it is without passing through the substrate surface and returns the processing liquid recovered to the bottom of the processing tank to the processing liquid discharging means, and flows down into the drain container. Substrate processing apparatus characterized in that it comprises a drainage passage for discharging. A substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in the horizontal direction in a horizontal form by the transfer means in the processing tank. In the vicinity of the position immediately below the edge of both sides of the substrate to be conveyed in the processing tank, the substrate is discharged from the processing liquid ejecting means onto the substrate and flows on both sides of the substrate, respectively, which flows from both edges. A liquid circulation system which rolls up a pair of drainage vessels receiving the processing liquid, and discharges the processing liquid recovered from the processing liquid discharge means and flows down to the bottom of the processing tank without flowing through the substrate surface to return to the processing liquid discharge means. And a drainage passage for discharging the used processing liquid, which flows down into each of the drainage barrels, respectively. The method according to any one of claims 4, 5 or 9, The substrate processing apparatus which conveys by supporting the board | substrate so that a board | substrate center part may become higher than both ends of a board | substrate by the said conveyance means in the direction orthogonal to the conveyance direction of a board | substrate. The method according to any one of claims 4, 5 or 9, And a substrate processing apparatus for discharging the processing liquid from the processing liquid discharge means onto the substrate and inclined toward both ends of the substrate in a direction orthogonal to the substrate conveyance direction with respect to the substrate surface. The method according to any one of claims 4, 5 or 9, A pair of receiving the used processing liquid which overflows from the front and back both ends side edge of a board | substrate according to the direction orthogonal to the conveyance direction of a board | substrate near the position immediately below the front and rear both edge side edges of the board | substrate conveyed by the said conveying means. Auxiliary drainage liquid is excreted and the auxiliary drainage container is supported so that a pair of auxiliary drainage fluids may be moved horizontally in synchronism with the movement of the substrate, and the auxiliary drainage liquid discharges the used used treatment liquid each into the auxiliary drainage fluid containers. Substrate processing apparatus provided with a furnace. The method of claim 1, A substrate treatment apparatus in which the treatment tank is a washing treatment tank for washing the substrate with pure water, and is provided with a chemical liquid treatment tank adjacent to the substrate inlet side of the washing treatment tank to treat the substrate with the chemical liquid. A substrate processing apparatus for processing a substrate by discharging the processing liquid from the processing liquid discharge means onto the substrate while transporting the substrate in the processing tank. Separate the inside of the processing tank, and form a recovery tank for recovering the processing liquid discharged from the processing liquid discharge means and flows down without passing through the substrate surface, or discharges the processing liquid under the processing liquid discharge means. A processing container for recovering the processing liquid discharged from the means and flowing down without passing through the substrate surface; and a processing for circulating the processing liquid by returning the processing liquid collected in the recovery tank unit or recovery container to the processing liquid discharge means. And a drainage passage for discharging the used processing liquid, which is discharged from the processing liquid discharge means to the substrate at the same time as the liquid circulation means and is discharged from the substrate to the bottom of the processing tank. The method of claim 14, A substrate processing apparatus having cleaning means for cleaning an inner wall surface of the processing tank or a member inside the processing tank with a cleaning liquid, which is in contact with the used processing liquid which has flowed down on the substrate. The method of claim 15, Adjacent to the treatment tank, a water treatment tank for washing the substrate with pure water is provided, wherein the pure water used in the water treatment tank is used as the cleaning liquid in the cleaning means. The method according to any one of claims 14 to 16, And a flow path switching means is provided at a branching position by branching the drainage path, connecting a branch path to the processing liquid circulation means in a flow path. The method of claim 15, The drainage passage is branched, the branch passage is connected to the processing liquid circulation means in a flow path, and a flow path switching means is provided at a branch position, and the used processing liquid flowing down from the substrate passes through the drainage passage through the branch passage. And a processing liquid is used as the cleaning liquid in the cleaning means when circulating the processing liquid used by sending to the processing liquid circulation means. The method of claim 14, A substrate processing apparatus comprising: providing a tank for storing the processing liquid recovered in the recovery tank unit or the recovery container, and managing a component of the processing liquid in the tank in the tank.

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