SK106495A3 - Manufacturing process of stericly restrained n-oxy-laminoesters - Google Patents
Manufacturing process of stericly restrained n-oxy-laminoesters Download PDFInfo
- Publication number
- SK106495A3 SK106495A3 SK1064-95A SK106495A SK106495A3 SK 106495 A3 SK106495 A3 SK 106495A3 SK 106495 A SK106495 A SK 106495A SK 106495 A3 SK106495 A3 SK 106495A3
- Authority
- SK
- Slovakia
- Prior art keywords
- oxyl
- tetramethylpiperidin
- formula
- process according
- group
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/04—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D211/06—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members
- C07D211/36—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having no double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D211/40—Oxygen atoms
- C07D211/44—Oxygen atoms attached in position 4
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07B—GENERAL METHODS OF ORGANIC CHEMISTRY; APPARATUS THEREFOR
- C07B61/00—Other general methods
- C07B61/02—Generation of organic free radicals; Organic free radicals per se
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D211/00—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings
- C07D211/92—Heterocyclic compounds containing hydrogenated pyridine rings, not condensed with other rings with a hetero atom directly attached to the ring nitrogen atom
- C07D211/94—Oxygen atom, e.g. piperidine N-oxide
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Hydrogenated Pyridines (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/298,898 US5574163A (en) | 1994-08-31 | 1994-08-31 | Process for the preparation of N-oxyl hindered amine esters |
Publications (1)
Publication Number | Publication Date |
---|---|
SK106495A3 true SK106495A3 (en) | 1996-06-05 |
Family
ID=23152452
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SK1064-95A SK106495A3 (en) | 1994-08-31 | 1995-08-28 | Manufacturing process of stericly restrained n-oxy-laminoesters |
Country Status (12)
Country | Link |
---|---|
US (1) | US5574163A (fr) |
EP (1) | EP0703220B1 (fr) |
JP (1) | JP3849078B2 (fr) |
KR (1) | KR100349629B1 (fr) |
AT (1) | ATE198473T1 (fr) |
BR (1) | BR9503848A (fr) |
CA (1) | CA2157147C (fr) |
CZ (1) | CZ220895A3 (fr) |
DE (1) | DE69519779T2 (fr) |
ES (1) | ES2153464T3 (fr) |
SK (1) | SK106495A3 (fr) |
TW (1) | TW297812B (fr) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000072718A (ja) * | 1998-09-01 | 2000-03-07 | Mitsubishi Rayon Co Ltd | (メタ)アクリル酸ピペリジン−1−オキシルエステル誘導体からなる(メタ)アクリル酸エステル用重合防止剤およびその製造方法 |
DE10004495A1 (de) * | 2000-02-02 | 2001-08-09 | Basf Ag | Verfahren zur Herstellung von Beschichtungen, Klebschichten oder Dichtungen für grundierte oder ungrundierte Substrate |
DE10004488A1 (de) * | 2000-02-02 | 2001-08-09 | Basf Ag | Verfahren zur Herstellung von Beschichtungen, Klebschichten oder Dichtungen für grundierte oder ungrundierte Substrate |
DE10009822C1 (de) * | 2000-03-01 | 2001-12-06 | Basf Coatings Ag | Verfahren zur Herstellung von Beschichtungen, Klebschichten oder Dichtungen für grundierte oder ungrundierte Substrate und Substrate |
JP4594727B2 (ja) * | 2002-05-02 | 2010-12-08 | チバ ホールディング インコーポレーテッド | 安定化ボディケア製品、家庭用品、織物材料及び織物 |
EP2137242B1 (fr) | 2007-04-13 | 2012-10-31 | LG Chem, Ltd. | Films optiques, films de retardement et affichage à cristaux liquides comprenant ceux-ci |
EP2655451B1 (fr) | 2010-12-21 | 2015-03-11 | 3M Innovative Properties Company | Polymères dérivés de (méth)acrylates d'alkyle secondaire |
EP2514800B2 (fr) * | 2011-04-21 | 2018-03-07 | Merck Patent GmbH | Composés et milieu liquide cristallin |
BR112014014477A2 (pt) | 2011-12-19 | 2017-06-13 | Rohm & Haas | método para preparar um inibidor de amina impedida e composição |
CN103274994A (zh) * | 2013-06-17 | 2013-09-04 | 南通市振兴精细化工有限公司 | 2,2,6,6-四甲基哌啶氧自由基硬脂酸酯的制作方法 |
KR20210008363A (ko) | 2018-05-15 | 2021-01-21 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 경화성 고굴절률 조성물 및 이로부터 제조된 물품 |
CN109705023A (zh) * | 2018-10-23 | 2019-05-03 | 山东兄弟科技股份有限公司 | 一种双(1-烷氧基-2,2,6,6-四甲基哌啶-4-基)癸二酸酯的制备方法 |
JP6724269B1 (ja) * | 2018-11-12 | 2020-07-15 | 日東電工株式会社 | 画像表示装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4665185A (en) * | 1984-03-22 | 1987-05-12 | Ciba-Geigy Corporation | Process for preparing nitroxyls of sterically hindered amines |
SU1168556A1 (ru) * | 1984-05-03 | 1985-07-23 | Предприятие П/Я А-7253 | Способ получени 2,2,6,6-тетраметилпиперидин-1-оксиловых эфиров карбоновых кислот |
JPH01258642A (ja) * | 1988-04-06 | 1989-10-16 | Mitsubishi Gas Chem Co Inc | (メタ)アクリル酸エステルの製造法 |
JPH0466555A (ja) * | 1990-07-03 | 1992-03-02 | Mitsubishi Gas Chem Co Inc | (メタ)アクリル酸エステルの製造法 |
IT1243402B (it) * | 1990-11-30 | 1994-06-10 | Enichem Sintesi | Procedimento per la preparazione dei radicali nitrosilici delle amminestericamente impedite. |
-
1994
- 1994-08-31 US US08/298,898 patent/US5574163A/en not_active Expired - Lifetime
-
1995
- 1995-08-09 TW TW084108284A patent/TW297812B/zh active
- 1995-08-22 AT AT95810525T patent/ATE198473T1/de not_active IP Right Cessation
- 1995-08-22 DE DE69519779T patent/DE69519779T2/de not_active Expired - Lifetime
- 1995-08-22 EP EP95810525A patent/EP0703220B1/fr not_active Expired - Lifetime
- 1995-08-22 ES ES95810525T patent/ES2153464T3/es not_active Expired - Lifetime
- 1995-08-28 SK SK1064-95A patent/SK106495A3/sk unknown
- 1995-08-29 CA CA002157147A patent/CA2157147C/fr not_active Expired - Fee Related
- 1995-08-29 CZ CZ952208A patent/CZ220895A3/cs unknown
- 1995-08-29 KR KR1019950028656A patent/KR100349629B1/ko not_active IP Right Cessation
- 1995-08-29 JP JP24356595A patent/JP3849078B2/ja not_active Expired - Fee Related
- 1995-08-30 BR BR9503848A patent/BR9503848A/pt not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH0873430A (ja) | 1996-03-19 |
CA2157147A1 (fr) | 1996-03-01 |
CA2157147C (fr) | 2007-03-20 |
DE69519779D1 (de) | 2001-02-08 |
ATE198473T1 (de) | 2001-01-15 |
EP0703220B1 (fr) | 2001-01-03 |
EP0703220A1 (fr) | 1996-03-27 |
ES2153464T3 (es) | 2001-03-01 |
TW297812B (fr) | 1997-02-11 |
BR9503848A (pt) | 1996-09-17 |
DE69519779T2 (de) | 2001-05-03 |
KR100349629B1 (ko) | 2002-12-28 |
KR960007561A (ko) | 1996-03-22 |
CZ220895A3 (en) | 1996-03-13 |
JP3849078B2 (ja) | 2006-11-22 |
US5574163A (en) | 1996-11-12 |
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