SG87892A1 - Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles - Google Patents
Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particlesInfo
- Publication number
- SG87892A1 SG87892A1 SG200002133A SG200002133A SG87892A1 SG 87892 A1 SG87892 A1 SG 87892A1 SG 200002133 A SG200002133 A SG 200002133A SG 200002133 A SG200002133 A SG 200002133A SG 87892 A1 SG87892 A1 SG 87892A1
- Authority
- SG
- Singapore
- Prior art keywords
- polishing
- layer
- abrasive particles
- backing
- substrates
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/22—Lapping pads for working plane surfaces characterised by a multi-layered structure
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12904899P | 1999-04-13 | 1999-04-13 | |
US09/545,982 US6656018B1 (en) | 1999-04-13 | 2000-04-10 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
Publications (1)
Publication Number | Publication Date |
---|---|
SG87892A1 true SG87892A1 (en) | 2002-04-16 |
Family
ID=26827184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200002133A SG87892A1 (en) | 1999-04-13 | 2000-04-13 | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles |
Country Status (8)
Country | Link |
---|---|
US (2) | US6656018B1 (de) |
EP (2) | EP2266757B1 (de) |
JP (1) | JP2001047357A (de) |
AT (1) | ATE459453T1 (de) |
CA (1) | CA2305106C (de) |
DE (1) | DE60043913D1 (de) |
SG (1) | SG87892A1 (de) |
TW (1) | TW440495B (de) |
Families Citing this family (52)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6964604B2 (en) * | 2000-06-23 | 2005-11-15 | International Business Machines Corporation | Fiber embedded polishing pad |
US6652764B1 (en) * | 2000-08-31 | 2003-11-25 | Micron Technology, Inc. | Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates |
JP2002190460A (ja) * | 2000-10-12 | 2002-07-05 | Toshiba Corp | 研磨布、研磨装置および半導体装置の製造方法 |
EP1211024A3 (de) | 2000-11-30 | 2004-01-02 | JSR Corporation | Polierverfahren |
US6863774B2 (en) * | 2001-03-08 | 2005-03-08 | Raytech Innovative Solutions, Inc. | Polishing pad for use in chemical-mechanical planarization of semiconductor wafers and method of making same |
KR100421704B1 (ko) * | 2001-04-20 | 2004-03-10 | 고려연마공업 주식회사 | 유연성 기능을 갖는 연마포용 직물기재 |
KR100858392B1 (ko) * | 2001-04-25 | 2008-09-11 | 제이에스알 가부시끼가이샤 | 반도체 웨이퍼용 연마 패드와, 이를 구비한 반도체웨이퍼용 연마 적층체와, 반도체 웨이퍼의 연마 방법 |
US6488767B1 (en) | 2001-06-08 | 2002-12-03 | Advanced Technology Materials, Inc. | High surface quality GaN wafer and method of fabricating same |
JP2003100682A (ja) * | 2001-09-25 | 2003-04-04 | Jsr Corp | 半導体ウエハ用研磨パッド |
CN1312740C (zh) * | 2001-09-28 | 2007-04-25 | 信越半导体株式会社 | 用于研磨的工件保持盘及工件研磨装置及研磨方法 |
US6913517B2 (en) | 2002-05-23 | 2005-07-05 | Cabot Microelectronics Corporation | Microporous polishing pads |
JP4266579B2 (ja) * | 2002-06-28 | 2009-05-20 | 株式会社ノリタケカンパニーリミテド | 研磨体およびその製造方法 |
EP1542831A1 (de) * | 2002-09-25 | 2005-06-22 | PPG Industries Ohio, Inc. | Polierkissen zur planarisierung |
US7267607B2 (en) | 2002-10-28 | 2007-09-11 | Cabot Microelectronics Corporation | Transparent microporous materials for CMP |
US7435165B2 (en) | 2002-10-28 | 2008-10-14 | Cabot Microelectronics Corporation | Transparent microporous materials for CMP |
US7311862B2 (en) * | 2002-10-28 | 2007-12-25 | Cabot Microelectronics Corporation | Method for manufacturing microporous CMP materials having controlled pore size |
US6641632B1 (en) * | 2002-11-18 | 2003-11-04 | International Business Machines Corporation | Polishing compositions and use thereof |
JP4659338B2 (ja) * | 2003-02-12 | 2011-03-30 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法並びにそれに使用する研磨パッド |
US7086932B2 (en) * | 2004-05-11 | 2006-08-08 | Freudenberg Nonwovens | Polishing pad |
US20050042976A1 (en) * | 2003-08-22 | 2005-02-24 | International Business Machines Corporation | Low friction planarizing/polishing pads and use thereof |
US7101275B2 (en) | 2003-09-26 | 2006-09-05 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Resilient polishing pad for chemical mechanical polishing |
US8075372B2 (en) | 2004-09-01 | 2011-12-13 | Cabot Microelectronics Corporation | Polishing pad with microporous regions |
US7232364B2 (en) * | 2005-02-04 | 2007-06-19 | 3M Innovative Properties Company | Abrasive cleaning article and method of making |
WO2007016498A2 (en) * | 2005-08-02 | 2007-02-08 | Raytech Composites, Inc. | Nonwoven polishing pads for chemical mechanical polishing |
US8192257B2 (en) * | 2006-04-06 | 2012-06-05 | Micron Technology, Inc. | Method of manufacture of constant groove depth pads |
JP2008000831A (ja) * | 2006-06-20 | 2008-01-10 | Saitama Univ | 研磨パッドの製造方法 |
TWI409136B (zh) | 2006-07-19 | 2013-09-21 | Innopad Inc | 表面具微溝槽之化學機械平坦化墊 |
US20080274674A1 (en) * | 2007-05-03 | 2008-11-06 | Cabot Microelectronics Corporation | Stacked polishing pad for high temperature applications |
US7635290B2 (en) * | 2007-08-15 | 2009-12-22 | Rohm And Haas Electronic Materials Cmp Holdings, Inc. | Interpenetrating network for chemical mechanical polishing |
US8491360B2 (en) * | 2007-10-26 | 2013-07-23 | Innopad, Inc. | Three-dimensional network in CMP pad |
EP2227350A4 (de) | 2007-11-30 | 2011-01-12 | Innopad Inc | Kissen mit endpunkterfassungsfenster für chemisch-mechanisches polieren |
EP2242615A4 (de) * | 2007-12-31 | 2013-10-30 | Innopad Inc | Chemisch-mechanisches planarisierungskissen |
EP2271463A4 (de) * | 2008-04-01 | 2013-11-27 | Innopad Inc | Polierkissen mit gesteuerter hohlraumbildung |
JP2011517111A (ja) * | 2008-04-11 | 2011-05-26 | イノパッド,インコーポレイテッド | ボイドネットワークを有する化学機械的平坦化パッド |
US8177603B2 (en) * | 2008-04-29 | 2012-05-15 | Semiquest, Inc. | Polishing pad composition |
US8546260B2 (en) * | 2008-09-04 | 2013-10-01 | Innopad, Inc. | Fabric containing non-crimped fibers and methods of manufacture |
TW201016391A (en) * | 2008-10-20 | 2010-05-01 | Bestac Advanced Material Co Ltd | Polishing pad having abrasive grains and method for making the same |
JP2012517715A (ja) * | 2009-02-12 | 2012-08-02 | イノパッド,インコーポレイテッド | Cmpパッドにおける3次元ネットワーク |
TWI510328B (zh) * | 2010-05-03 | 2015-12-01 | Iv Technologies Co Ltd | 基底層、包括此基底層的研磨墊及研磨方法 |
US8758659B2 (en) | 2010-09-29 | 2014-06-24 | Fns Tech Co., Ltd. | Method of grooving a chemical-mechanical planarization pad |
WO2012082395A2 (en) | 2010-12-14 | 2012-06-21 | 3M Innovative Properties Company | Self-contained fibrous buffing article |
US9108299B2 (en) | 2011-06-14 | 2015-08-18 | 3M Innovative Properties Company | Self-contained fibrous buffing article |
DE102012206708A1 (de) | 2012-04-24 | 2013-10-24 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
DE102013201663B4 (de) | 2012-12-04 | 2020-04-23 | Siltronic Ag | Verfahren zum Polieren einer Halbleiterscheibe |
DE102013205448A1 (de) | 2013-03-27 | 2014-10-16 | Siltronic Ag | Verfahren zum Polieren eines Substrates aus Halbleitermaterial |
TWI590918B (zh) * | 2013-08-16 | 2017-07-11 | 三芳化學工業股份有限公司 | 硏磨墊、硏磨裝置及製造硏磨墊之方法 |
US9238294B2 (en) * | 2014-06-18 | 2016-01-19 | Nexplanar Corporation | Polishing pad having porogens with liquid filler |
CN105729297B (zh) * | 2016-04-19 | 2017-08-25 | 南京航空航天大学 | 研抛一体化冰粒型固结磨料抛光垫及其制备方法 |
CN106002663B (zh) * | 2016-05-26 | 2018-03-27 | 南京航空航天大学 | 一种分层冷冻固结磨料抛光垫及制备方法 |
EP3441185A4 (de) * | 2016-06-01 | 2020-04-01 | Fujibo Holdings, Inc. | Polierkissen und verfahren zur herstellung davon sowie verfahren zur herstellung eines schleifmittels |
JP6829037B2 (ja) * | 2016-09-30 | 2021-02-10 | 富士紡ホールディングス株式会社 | 研磨パッド及びその製造方法 |
CN114310652A (zh) * | 2021-12-30 | 2022-04-12 | 金陵科技学院 | 一种软脆材料柔性研磨装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0288165A (ja) * | 1988-09-21 | 1990-03-28 | Speedfam Co Ltd | ポリッシングパッド及びその製造方法 |
EP0845328A2 (de) * | 1996-11-29 | 1998-06-03 | Sumitomo Metal Industries, Ltd. | Polierkissen und Vorrichtung zum Polieren einer Halbleiterscheibe |
JPH10225864A (ja) * | 1997-02-17 | 1998-08-25 | Sony Corp | 研磨パッドとその製造方法並びにその研磨パッドを用いたウエハの研磨方法 |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3607159A (en) * | 1967-05-12 | 1971-09-21 | Norton Co | Saturated, resilient, flexible and porous abrasive laminate |
US4255164A (en) * | 1979-04-30 | 1981-03-10 | Minnesota Mining And Manufacturing Company | Fining sheet and method of making and using the same |
US4927432A (en) * | 1986-03-25 | 1990-05-22 | Rodel, Inc. | Pad material for grinding, lapping and polishing |
US5578098A (en) * | 1990-10-09 | 1996-11-26 | Minnesota Mining And Manufacturing Company | Coated abrasive containing erodible agglomerates |
US5310455A (en) * | 1992-07-10 | 1994-05-10 | Lsi Logic Corporation | Techniques for assembling polishing pads for chemi-mechanical polishing of silicon wafers |
MY114512A (en) * | 1992-08-19 | 2002-11-30 | Rodel Inc | Polymeric substrate with polymeric microelements |
US5346516A (en) * | 1993-09-16 | 1994-09-13 | Tepco, Ltd. | Non-woven abrasive material containing hydrogenated vegetable oils |
US5632668A (en) * | 1993-10-29 | 1997-05-27 | Minnesota Mining And Manufacturing Company | Method for the polishing and finishing of optical lenses |
JP3149340B2 (ja) | 1995-08-22 | 2001-03-26 | ロデール・ニッタ株式会社 | 研磨用パッド |
US5646736A (en) * | 1995-12-19 | 1997-07-08 | Chemetrics, Inc. | Analytical apparatus with coded elements |
US5645736A (en) | 1995-12-29 | 1997-07-08 | Symbios Logic Inc. | Method for polishing a wafer |
US5879226A (en) | 1996-05-21 | 1999-03-09 | Micron Technology, Inc. | Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers |
US5976000A (en) | 1996-05-28 | 1999-11-02 | Micron Technology, Inc. | Polishing pad with incompressible, highly soluble particles for chemical-mechanical planarization of semiconductor wafers |
US5702292A (en) * | 1996-10-31 | 1997-12-30 | Micron Technology, Inc. | Apparatus and method for loading and unloading substrates to a chemical-mechanical planarization machine |
US5725417A (en) | 1996-11-05 | 1998-03-10 | Micron Technology, Inc. | Method and apparatus for conditioning polishing pads used in mechanical and chemical-mechanical planarization of substrates |
US5916011A (en) * | 1996-12-26 | 1999-06-29 | Motorola, Inc. | Process for polishing a semiconductor device substrate |
US5910471A (en) * | 1997-03-07 | 1999-06-08 | Minnesota Mining And Manufacturing Company | Abrasive article for providing a clear surface finish on glass |
US5919082A (en) * | 1997-08-22 | 1999-07-06 | Micron Technology, Inc. | Fixed abrasive polishing pad |
US6602111B1 (en) * | 1999-07-16 | 2003-08-05 | Seimi Chemical Co., Ltd. | Abrasive |
-
2000
- 2000-04-10 US US09/545,982 patent/US6656018B1/en not_active Expired - Lifetime
- 2000-04-12 AT AT00850065T patent/ATE459453T1/de not_active IP Right Cessation
- 2000-04-12 EP EP10155252.9A patent/EP2266757B1/de not_active Expired - Lifetime
- 2000-04-12 EP EP00850065A patent/EP1046466B1/de not_active Expired - Lifetime
- 2000-04-12 DE DE60043913T patent/DE60043913D1/de not_active Expired - Lifetime
- 2000-04-13 CA CA002305106A patent/CA2305106C/en not_active Expired - Fee Related
- 2000-04-13 SG SG200002133A patent/SG87892A1/en unknown
- 2000-04-13 JP JP2000112640A patent/JP2001047357A/ja active Pending
- 2000-05-26 TW TW089106810A patent/TW440495B/zh not_active IP Right Cessation
-
2003
- 2003-09-18 US US10/664,735 patent/US6890244B2/en not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0288165A (ja) * | 1988-09-21 | 1990-03-28 | Speedfam Co Ltd | ポリッシングパッド及びその製造方法 |
EP0845328A2 (de) * | 1996-11-29 | 1998-06-03 | Sumitomo Metal Industries, Ltd. | Polierkissen und Vorrichtung zum Polieren einer Halbleiterscheibe |
JPH10225864A (ja) * | 1997-02-17 | 1998-08-25 | Sony Corp | 研磨パッドとその製造方法並びにその研磨パッドを用いたウエハの研磨方法 |
Also Published As
Publication number | Publication date |
---|---|
US6656018B1 (en) | 2003-12-02 |
EP2266757B1 (de) | 2013-10-02 |
US6890244B2 (en) | 2005-05-10 |
TW440495B (en) | 2001-06-16 |
DE60043913D1 (de) | 2010-04-15 |
US20040072507A1 (en) | 2004-04-15 |
CA2305106A1 (en) | 2000-10-13 |
ATE459453T1 (de) | 2010-03-15 |
CA2305106C (en) | 2008-07-08 |
EP2266757A1 (de) | 2010-12-29 |
JP2001047357A (ja) | 2001-02-20 |
EP1046466A3 (de) | 2003-10-08 |
EP1046466B1 (de) | 2010-03-03 |
EP1046466A2 (de) | 2000-10-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG87892A1 (en) | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles | |
TW353205B (en) | Polishing pad and apparatus for polishing a semiconductor wafer | |
CA2295686A1 (en) | Structured abrasives with adhered functional powders | |
TW379389B (en) | A method to polish semiconductor wafers | |
MY119522A (en) | Polishing apparatus | |
AU4497600A (en) | Abrasive tools for grinding electronic components | |
MXPA02006319A (es) | Abrasivos disenados mejorados. | |
TW376350B (en) | Process for polishing a semiconductor device substrate | |
MX2008001827A (es) | Articulo abrasivo flexible y metodo de elaboracion. | |
TW200724306A (en) | CMP diamond conditioning disk | |
SG153668A1 (en) | Customized polish pads for chemical mechanical planarization | |
TW372901B (en) | Chemical and mechanical polishing apparatus | |
TW200720016A (en) | Chemically modified chemical mechanical polishing pad, process of making a modified chemical mechanical polishing pad and method of chemical mechanical polishing | |
ATE336333T1 (de) | Schleifschwamm mit träger mit hoher reissfestigkeit | |
GB2329601A (en) | Methods and apparatus for the chemical mechanical planarization of electronic devices | |
SG97841A1 (en) | Process for mechanical chemical polishing of a layer of aluminium or aluminium alloy conducting material | |
KR100701340B1 (ko) | 광택용 작업물 홀더, 작업물 광택용 장치, 그리고 작업물광택방법 | |
WO2001081496A1 (fr) | Compose de polissage et procede de preparation correspondant, et procede de polissage | |
TWI256415B (en) | Slurry for chemical mechanical polishing | |
WO2001069676A3 (en) | Method and apparatus for bonding substrates | |
EP0845329A3 (de) | Verfahren und Vorrichtung zum Polieren einer dünnen Platte | |
MY132791A (en) | Polishing pads useful in chemical mechanical polishing of substrates in the presence of a slurry containing abrasive particles | |
TW430583B (en) | Method for polishing thin plate and plate for holding thin plate | |
KR970023800A (ko) | 폴리싱포의 드레싱방법 및 장치 | |
DE69700374T2 (de) | Polierscheibe-Träger und Polierverfahren |