SG76507A1 - Continuous vacuum processing apparatus - Google Patents

Continuous vacuum processing apparatus

Info

Publication number
SG76507A1
SG76507A1 SG1997000701A SG1997000701A SG76507A1 SG 76507 A1 SG76507 A1 SG 76507A1 SG 1997000701 A SG1997000701 A SG 1997000701A SG 1997000701 A SG1997000701 A SG 1997000701A SG 76507 A1 SG76507 A1 SG 76507A1
Authority
SG
Singapore
Prior art keywords
processing apparatus
vacuum processing
continuous vacuum
continuous
vacuum
Prior art date
Application number
SG1997000701A
Other languages
English (en)
Inventor
Namiki Shigeru
Shibasaki Hatsuhiko
Amano Tadaomi
Kita Katsuyuki
Okuda Akira
Original Assignee
Matsushita Electric Ind Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Ind Co Ltd filed Critical Matsushita Electric Ind Co Ltd
Publication of SG76507A1 publication Critical patent/SG76507A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18—Vacuum control means
    • H01J2237/184—Vacuum locks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
SG1997000701A 1996-03-18 1997-03-12 Continuous vacuum processing apparatus SG76507A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP06102196A JP3199162B2 (ja) 1996-03-18 1996-03-18 連続真空処理装置

Publications (1)

Publication Number Publication Date
SG76507A1 true SG76507A1 (en) 2000-11-21

Family

ID=13159251

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1997000701A SG76507A1 (en) 1996-03-18 1997-03-12 Continuous vacuum processing apparatus

Country Status (5)

Country Link
US (1) US5951835A (ko)
JP (1) JP3199162B2 (ko)
KR (1) KR100487010B1 (ko)
MY (1) MY116869A (ko)
SG (1) SG76507A1 (ko)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2942239B2 (ja) * 1997-05-23 1999-08-30 キヤノン株式会社 排気方法及び排気装置、それを用いたプラズマ処理方法及びプラズマ処理装置
JP3352418B2 (ja) 1999-01-28 2002-12-03 キヤノン株式会社 減圧処理方法及び減圧処理装置
JP4268303B2 (ja) * 2000-02-01 2009-05-27 キヤノンアネルバ株式会社 インライン型基板処理装置
KR20040046571A (ko) * 2002-11-27 2004-06-05 주식회사 피앤아이 이온빔을 이용한 재료의 표면 처리 장치
RU2332523C2 (ru) * 2002-12-26 2008-08-27 Топпан Принтинг Ко., Лтд. Устройство вакуумного осаждения и способ получения пленки вакуумным осаждением
US7736438B2 (en) * 2005-06-01 2010-06-15 Los Alamos National Security, Llc Method and apparatus for depositing a coating on a tape carrier
ATE445720T1 (de) * 2007-02-28 2009-10-15 Applied Materials Inc Zugangsversperrsystem, netzverarbeitungsanlage und anwendungsverfahren dafür
TW201005121A (en) * 2007-07-31 2010-02-01 United Solar Ovonic Llc System and method for manufacturing thin film electrical devices
JP2011529532A (ja) * 2008-07-30 2011-12-08 ユナイテッド ソーラー オヴォニック エルエルシー 薄膜電気デバイスを製造するシステム及び方法
US20100252602A1 (en) * 2009-04-03 2010-10-07 United Solar Ovonic Llc Continuous processing system with pinch valve
US8061686B2 (en) * 2009-04-03 2011-11-22 Uniter Solar Ovonic LLC Pinch valve
JP2011144922A (ja) * 2009-12-18 2011-07-28 Canon Anelva Corp ゲートバルブ、フィルム製造装置、及び、フィルム製造方法
US9303316B1 (en) 2010-01-15 2016-04-05 Apollo Precision Kunming Yuanhong Limited Continuous web apparatus and method using an air to vacuum seal and accumulator
EP2374914B1 (en) * 2010-04-07 2015-07-22 Applied Materials, Inc. A device for sealing a chamber inlet or a chamber outlet for a flexible substrate; substrate processing apparatus, and method for assembling such a device
KR101876454B1 (ko) * 2011-09-14 2018-07-11 삼성디스플레이 주식회사 진공 롤투롤 장치 및 롤 타입 기판 제조 방법
JP5894820B2 (ja) * 2012-03-13 2016-03-30 日東電工株式会社 導電性フィルムロールの製造方法
JP6018519B2 (ja) * 2013-02-25 2016-11-02 長州産業株式会社 ゲートバルブ及びこれを有する真空処理装置
JP6637224B1 (ja) * 2018-06-12 2020-01-29 株式会社アルバック 仕切弁装置
USD878697S1 (en) 2019-02-19 2020-03-17 Hamilton Beach Brands, Inc. Iron
CN110042360A (zh) * 2019-05-21 2019-07-23 应净球 智能连续镀膜设备

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3294670A (en) * 1963-10-07 1966-12-27 Western Electric Co Apparatus for processing materials in a controlled atmosphere
GB8408023D0 (en) * 1984-03-28 1984-05-10 Gen Eng Radcliffe Ltd Vacuum coating apparatus
JP2691007B2 (ja) * 1989-03-20 1997-12-17 株式会社日立製作所 真空連続処理装置
JP3059000B2 (ja) * 1992-09-07 2000-07-04 三菱重工業株式会社 連続真空シール装置

Also Published As

Publication number Publication date
KR100487010B1 (ko) 2005-09-02
JP3199162B2 (ja) 2001-08-13
KR970065761A (ko) 1997-10-13
US5951835A (en) 1999-09-14
JPH09256158A (ja) 1997-09-30
MY116869A (en) 2004-04-30

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