SG43324A1 - Positive-working radiation-sensitive mixture and radiation-sensitive copying material produced therefrom - Google Patents

Positive-working radiation-sensitive mixture and radiation-sensitive copying material produced therefrom

Info

Publication number
SG43324A1
SG43324A1 SG1996008359A SG1996008359A SG43324A1 SG 43324 A1 SG43324 A1 SG 43324A1 SG 1996008359 A SG1996008359 A SG 1996008359A SG 1996008359 A SG1996008359 A SG 1996008359A SG 43324 A1 SG43324 A1 SG 43324A1
Authority
SG
Singapore
Prior art keywords
radiation
sensitive
positive
material produced
produced therefrom
Prior art date
Application number
SG1996008359A
Other languages
English (en)
Inventor
Georg Pawlowski
Hans-Joachim Merrem
Juergen Lingnau
Ralph Dammel
Horst Roeschert
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of SG43324A1 publication Critical patent/SG43324A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SG1996008359A 1989-09-09 1990-08-30 Positive-working radiation-sensitive mixture and radiation-sensitive copying material produced therefrom SG43324A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE3930086A DE3930086A1 (de) 1989-09-09 1989-09-09 Positiv arbeitendes strahlungsempfindliches gemisch und daraus hergestelltes strahlungsempfindliches aufzeichnungsmaterial

Publications (1)

Publication Number Publication Date
SG43324A1 true SG43324A1 (en) 1997-10-17

Family

ID=6389038

Family Applications (1)

Application Number Title Priority Date Filing Date
SG1996008359A SG43324A1 (en) 1989-09-09 1990-08-30 Positive-working radiation-sensitive mixture and radiation-sensitive copying material produced therefrom

Country Status (7)

Country Link
US (1) US5338641A (ko)
EP (1) EP0417557B1 (ko)
JP (1) JP2854112B2 (ko)
KR (1) KR0163953B1 (ko)
DE (2) DE3930086A1 (ko)
HK (1) HK91097A (ko)
SG (1) SG43324A1 (ko)

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JP3991213B2 (ja) 2002-08-09 2007-10-17 信越化学工業株式会社 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法
JP3991222B2 (ja) 2003-02-13 2007-10-17 信越化学工業株式会社 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法
JP3991223B2 (ja) 2003-02-13 2007-10-17 信越化学工業株式会社 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法
JP4359467B2 (ja) 2003-08-28 2009-11-04 信越化学工業株式会社 新規スルホニルジアゾメタン化合物、光酸発生剤、並びにそれを用いたレジスト材料及びパターン形成方法。
US20050214674A1 (en) 2004-03-25 2005-09-29 Yu Sui Positive-working photoimageable bottom antireflective coating
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ATE410460T1 (de) 2005-08-23 2008-10-15 Fujifilm Corp Härtbare tinte enthaltend modifiziertes oxetan
JP4757574B2 (ja) 2005-09-07 2011-08-24 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び、平版印刷版
EP2103639A1 (en) 2005-11-04 2009-09-23 Fujifilm Corporation Curable polycyclic epoxy composition, ink composition and inkjet recording method therewith
EP1829684B1 (en) 2006-03-03 2011-01-26 FUJIFILM Corporation Curable composition, ink composition, inkjet-recording method, and planographic printing plate
JP2008189776A (ja) 2007-02-02 2008-08-21 Fujifilm Corp 活性放射線硬化型重合性組成物、インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法、及び平版印刷版
JP2008208266A (ja) 2007-02-27 2008-09-11 Fujifilm Corp インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、および平版印刷版
JP5159141B2 (ja) 2007-03-30 2013-03-06 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の作製方法及び平版印刷版
JP5111039B2 (ja) 2007-09-27 2012-12-26 富士フイルム株式会社 重合性化合物、重合開始剤、および染料を含有する光硬化性組成物
US8088548B2 (en) * 2007-10-23 2012-01-03 Az Electronic Materials Usa Corp. Bottom antireflective coating compositions
US8240838B2 (en) 2007-11-29 2012-08-14 Fujifilm Corporation Ink composition for inkjet recording, inkjet recording method, and printed material
JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
ATE541905T1 (de) 2008-09-26 2012-02-15 Fujifilm Corp Tintenzusammensetzung und tintenaufzeichnungsverfahren
JP5461809B2 (ja) 2008-09-29 2014-04-02 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
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US20110086312A1 (en) * 2009-10-09 2011-04-14 Dammel Ralph R Positive-Working Photoimageable Bottom Antireflective Coating
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Also Published As

Publication number Publication date
DE59010600D1 (de) 1997-01-23
DE3930086A1 (de) 1991-03-21
KR910006776A (ko) 1991-04-30
EP0417557A2 (de) 1991-03-20
EP0417557B1 (de) 1996-12-11
JP2854112B2 (ja) 1999-02-03
HK91097A (en) 1997-08-01
US5338641A (en) 1994-08-16
EP0417557A3 (en) 1991-10-16
JPH03103854A (ja) 1991-04-30
KR0163953B1 (ko) 1998-12-15

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