SG194732A1 - Wafer container with particle shield - Google Patents

Wafer container with particle shield Download PDF

Info

Publication number
SG194732A1
SG194732A1 SG2013080965A SG2013080965A SG194732A1 SG 194732 A1 SG194732 A1 SG 194732A1 SG 2013080965 A SG2013080965 A SG 2013080965A SG 2013080965 A SG2013080965 A SG 2013080965A SG 194732 A1 SG194732 A1 SG 194732A1
Authority
SG
Singapore
Prior art keywords
barrier
particulates
wafer
containers
materials
Prior art date
Application number
SG2013080965A
Other languages
English (en)
Inventor
Martin L Forbes
John Burns
Matthew A Fuller
Original Assignee
Entegris Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Entegris Inc filed Critical Entegris Inc
Publication of SG194732A1 publication Critical patent/SG194732A1/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
    • B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
    • B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
    • B65D85/38—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for delicate optical, measuring, calculating or control apparatus
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1922—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by the construction of the closed carrier
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • H10P72/1926—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/10—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP]
    • H10P72/19—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers
    • H10P72/1924—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control
    • H10P72/1926—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier
    • H10P72/1928—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof using carriers specially adapted therefor, e.g. front opening unified pods [FOUP] closed carriers characterised by atmosphere control characterised by the presence of atmosphere modifying elements inside or attached to the closed carrier characterised by the presence of antistatic elements

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Frangible Articles (AREA)
SG2013080965A 2011-05-03 2012-05-03 Wafer container with particle shield SG194732A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201161482151P 2011-05-03 2011-05-03
PCT/US2012/036373 WO2012151431A2 (en) 2011-05-03 2012-05-03 Wafer container with particle shield

Publications (1)

Publication Number Publication Date
SG194732A1 true SG194732A1 (en) 2013-12-30

Family

ID=47108234

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2013080965A SG194732A1 (en) 2011-05-03 2012-05-03 Wafer container with particle shield

Country Status (8)

Country Link
US (1) US20150294887A1 (enExample)
EP (1) EP2705528A4 (enExample)
JP (1) JP2014513442A (enExample)
KR (1) KR20140035377A (enExample)
CN (1) CN103765569A (enExample)
SG (1) SG194732A1 (enExample)
TW (1) TW201302573A (enExample)
WO (1) WO2012151431A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2016046985A1 (ja) * 2014-09-26 2016-03-31 ミライアル株式会社 基板収納容器
US10559484B2 (en) * 2015-04-10 2020-02-11 Shin-Etsu Polymer Co., Ltd. Substrate storage container
TWI646032B (zh) * 2017-03-24 2019-01-01 奇景光電股份有限公司 傳送及保護晶圓的裝置
CN109326546A (zh) * 2017-07-31 2019-02-12 富士迈半导体精密工业（上海）有限公司 用于晶圆盒的气体填充装置及气体填充系统
US10504762B2 (en) * 2018-02-06 2019-12-10 Applied Materials, Inc. Bridging front opening unified pod (FOUP)
JP7336923B2 (ja) * 2019-09-05 2023-09-01 信越ポリマー株式会社 基板収納容器
TWI735115B (zh) * 2019-12-24 2021-08-01 力成科技股份有限公司 晶圓儲存裝置及晶圓承載盤
JP7423429B2 (ja) * 2020-06-05 2024-01-29 信越ポリマー株式会社 基板収納容器
EP4015164A1 (en) * 2020-12-18 2022-06-22 System 3R International AB Gripper for a manupulator
JP7669853B2 (ja) * 2021-07-27 2025-04-30 信越半導体株式会社 密閉収納容器
TWI796984B (zh) * 2022-03-31 2023-03-21 大立鈺科技有限公司 具抵持元件之可伸縮基板承載裝置

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5346518A (en) * 1993-03-23 1994-09-13 International Business Machines Corporation Vapor drain system
US5570987A (en) * 1993-12-14 1996-11-05 W. L. Gore & Associates, Inc. Semiconductor wafer transport container
US5472086A (en) 1994-03-11 1995-12-05 Holliday; James E. Enclosed sealable purgible semiconductor wafer holder
US5785186A (en) 1994-10-11 1998-07-28 Progressive System Technologies, Inc. Substrate housing and docking system
JP3483573B2 (ja) 1995-10-13 2004-01-06 エムパック インコーポレイテッド パッケージ
US5833067A (en) * 1997-03-10 1998-11-10 Seagate Technologies, Inc. Disk caddy and lid with barrier means
US6010008A (en) * 1997-07-11 2000-01-04 Fluoroware, Inc. Transport module
US6736268B2 (en) 1997-07-11 2004-05-18 Entegris, Inc. Transport module
JPH11204448A (ja) * 1998-01-16 1999-07-30 Kokusai Electric Co Ltd 半導体製造装置
US6267245B1 (en) 1998-07-10 2001-07-31 Fluoroware, Inc. Cushioned wafer container
JP3916380B2 (ja) * 1999-07-06 2007-05-16 株式会社荏原製作所 基板搬送容器待機ステーション
KR20040017481A (ko) * 2002-08-21 2004-02-27 삼성전자주식회사 전면 파티클 오염을 억제할 수 있는 웨이퍼 캐리어
JP2004260087A (ja) * 2003-02-27 2004-09-16 Shin Etsu Polymer Co Ltd 収納容器
US7328727B2 (en) 2004-04-18 2008-02-12 Entegris, Inc. Substrate container with fluid-sealing flow passageway
WO2008008270A2 (en) 2006-07-07 2008-01-17 Entegris, Inc. Wafer cassette
JP2008024429A (ja) * 2006-07-20 2008-02-07 Toshiba Corp 電子装置の製造方法
US20080041758A1 (en) * 2006-08-16 2008-02-21 Taiwan Semiconductor Manufacturing Co., Ltd. Wafer carrier
US7784178B2 (en) * 2007-06-29 2010-08-31 Intel Corporation Higher performance barrier materials for containers of environmentally sensitive semiconductor fabrication devices
JP2011510491A (ja) 2008-01-13 2011-03-31 インテグリス・インコーポレーテッド 大口径のウエハ容器とウエハ取扱方法
JP2011018771A (ja) * 2009-07-09 2011-01-27 Shin Etsu Polymer Co Ltd 基板収納容器

Also Published As

Publication number Publication date
EP2705528A2 (en) 2014-03-12
EP2705528A4 (en) 2014-11-26
TW201302573A (zh) 2013-01-16
KR20140035377A (ko) 2014-03-21
CN103765569A (zh) 2014-04-30
WO2012151431A2 (en) 2012-11-08
US20150294887A1 (en) 2015-10-15
WO2012151431A3 (en) 2013-03-14
JP2014513442A (ja) 2014-05-29

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