SG171843A1 - Controlling ion energy distribution in plasma processing systems - Google Patents

Controlling ion energy distribution in plasma processing systems Download PDF

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Publication number
SG171843A1
SG171843A1 SG2011038601A SG2011038601A SG171843A1 SG 171843 A1 SG171843 A1 SG 171843A1 SG 2011038601 A SG2011038601 A SG 2011038601A SG 2011038601 A SG2011038601 A SG 2011038601A SG 171843 A1 SG171843 A1 SG 171843A1
Authority
SG
Singapore
Prior art keywords
electrode
plasma processing
substrate
processing system
plasma
Prior art date
Application number
SG2011038601A
Other languages
English (en)
Inventor
Andreas Fischer
Eric Hudson
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG171843A1 publication Critical patent/SG171843A1/en

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H10P50/00—
    • H10P50/242—

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electromagnetism (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Recrystallisation Techniques (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
SG2011038601A 2008-12-19 2009-12-16 Controlling ion energy distribution in plasma processing systems SG171843A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US13948808P 2008-12-19 2008-12-19
US12/634,959 US9887069B2 (en) 2008-12-19 2009-12-10 Controlling ion energy distribution in plasma processing systems
PCT/US2009/068186 WO2010080421A2 (en) 2008-12-19 2009-12-16 Controlling ion energy distribution in plasma processing systems

Publications (1)

Publication Number Publication Date
SG171843A1 true SG171843A1 (en) 2011-07-28

Family

ID=42264351

Family Applications (1)

Application Number Title Priority Date Filing Date
SG2011038601A SG171843A1 (en) 2008-12-19 2009-12-16 Controlling ion energy distribution in plasma processing systems

Country Status (8)

Country Link
US (1) US9887069B2 (enExample)
EP (1) EP2380413A4 (enExample)
JP (2) JP5888981B2 (enExample)
KR (2) KR101650972B1 (enExample)
CN (1) CN102257886B (enExample)
SG (1) SG171843A1 (enExample)
TW (2) TWI516174B (enExample)
WO (1) WO2010080421A2 (enExample)

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Also Published As

Publication number Publication date
KR101679528B1 (ko) 2016-11-24
WO2010080421A3 (en) 2010-08-26
KR20110112804A (ko) 2011-10-13
WO2010080421A4 (en) 2010-10-07
EP2380413A2 (en) 2011-10-26
TWI516174B (zh) 2016-01-01
TW201603651A (zh) 2016-01-16
CN102257886B (zh) 2014-09-17
US9887069B2 (en) 2018-02-06
WO2010080421A2 (en) 2010-07-15
KR20150103304A (ko) 2015-09-09
JP5888981B2 (ja) 2016-03-22
JP2012513124A (ja) 2012-06-07
TWI639362B (zh) 2018-10-21
TW201031279A (en) 2010-08-16
JP5883481B2 (ja) 2016-03-15
EP2380413A4 (en) 2015-12-02
US20100154994A1 (en) 2010-06-24
KR101650972B1 (ko) 2016-08-24
JP2015029104A (ja) 2015-02-12
CN102257886A (zh) 2011-11-23

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