FR2782837B1 - Procede et dispositif de traitement de surface par plasma a pression atmospherique - Google Patents

Procede et dispositif de traitement de surface par plasma a pression atmospherique

Info

Publication number
FR2782837B1
FR2782837B1 FR9810814A FR9810814A FR2782837B1 FR 2782837 B1 FR2782837 B1 FR 2782837B1 FR 9810814 A FR9810814 A FR 9810814A FR 9810814 A FR9810814 A FR 9810814A FR 2782837 B1 FR2782837 B1 FR 2782837B1
Authority
FR
France
Prior art keywords
atmospheric pressure
surface treatment
pressure plasma
plasma
atmospheric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR9810814A
Other languages
English (en)
Other versions
FR2782837A1 (fr
Inventor
Nicolas Gherardi
Gamal Gouda
Francoise Massines
Alain Villermet
Eric Gat
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Priority to FR9810814A priority Critical patent/FR2782837B1/fr
Priority to US09/288,610 priority patent/US6299948B1/en
Priority to AU51696/99A priority patent/AU5169699A/en
Priority to JP2000568100A priority patent/JP2002524225A/ja
Priority to PCT/FR1999/001932 priority patent/WO2000013202A1/fr
Priority to EP99936688A priority patent/EP1108264A1/fr
Publication of FR2782837A1 publication Critical patent/FR2782837A1/fr
Application granted granted Critical
Publication of FR2782837B1 publication Critical patent/FR2782837B1/fr
Priority to US09/954,040 priority patent/US20020037374A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/02—Details
    • H01J2237/0203—Protection arrangements
    • H01J2237/0206—Extinguishing, preventing or controlling unwanted discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FR9810814A 1998-08-28 1998-08-28 Procede et dispositif de traitement de surface par plasma a pression atmospherique Expired - Fee Related FR2782837B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
FR9810814A FR2782837B1 (fr) 1998-08-28 1998-08-28 Procede et dispositif de traitement de surface par plasma a pression atmospherique
US09/288,610 US6299948B1 (en) 1998-08-28 1999-04-09 Method and device for surface treatment with a plasma at atmospheric pressure
JP2000568100A JP2002524225A (ja) 1998-08-28 1999-08-04 大気圧下におけるプラズマを用いた表面処理方法及び装置
PCT/FR1999/001932 WO2000013202A1 (fr) 1998-08-28 1999-08-04 Procede et dispositif de traitement de surface par plasma a pression atmospherique
AU51696/99A AU5169699A (en) 1998-08-28 1999-08-04 Method and device for surface processing with plasma at atmospheric pressure
EP99936688A EP1108264A1 (fr) 1998-08-28 1999-08-04 Procede et dispositif de traitement de surface par plasma a pression atmospherique
US09/954,040 US20020037374A1 (en) 1998-08-28 2001-09-18 Method and device for surface treatment with a plasma at atmospheric pressure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9810814A FR2782837B1 (fr) 1998-08-28 1998-08-28 Procede et dispositif de traitement de surface par plasma a pression atmospherique

Publications (2)

Publication Number Publication Date
FR2782837A1 FR2782837A1 (fr) 2000-03-03
FR2782837B1 true FR2782837B1 (fr) 2000-09-29

Family

ID=9529955

Family Applications (1)

Application Number Title Priority Date Filing Date
FR9810814A Expired - Fee Related FR2782837B1 (fr) 1998-08-28 1998-08-28 Procede et dispositif de traitement de surface par plasma a pression atmospherique

Country Status (6)

Country Link
US (2) US6299948B1 (fr)
EP (1) EP1108264A1 (fr)
JP (1) JP2002524225A (fr)
AU (1) AU5169699A (fr)
FR (1) FR2782837B1 (fr)
WO (1) WO2000013202A1 (fr)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW520453B (en) * 1999-12-27 2003-02-11 Seiko Epson Corp A method to fabricate thin insulating films
FR2806324B1 (fr) * 2000-03-15 2002-09-27 Air Liquide Procede et dispositif de mise en oeuvre d'une reaction chimique et procede de traitement de surface utilisant de tels procede et dispositif
EP1162646A3 (fr) * 2000-06-06 2004-10-13 Matsushita Electric Works, Ltd. Appareil et méthode de traitement par plasma
US7591957B2 (en) * 2001-01-30 2009-09-22 Rapt Industries, Inc. Method for atmospheric pressure reactive atom plasma processing for surface modification
CN1531465A (zh) * 2001-03-21 2004-09-22 普利司通股份有限公司 防污性涂膜的形成方法及具备防污性涂膜的防污材料
US6660177B2 (en) * 2001-11-07 2003-12-09 Rapt Industries Inc. Apparatus and method for reactive atom plasma processing for material deposition
US6774569B2 (en) * 2002-07-11 2004-08-10 Fuji Photo Film B.V. Apparatus for producing and sustaining a glow discharge plasma under atmospheric conditions
US7288204B2 (en) * 2002-07-19 2007-10-30 Fuji Photo Film B.V. Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG)
EP1403902A1 (fr) * 2002-09-30 2004-03-31 Fuji Photo Film B.V. Procédé et dispositif de production d'un plasma de décharge luminescente sous pression atmosphérique
JP3973587B2 (ja) * 2003-03-24 2007-09-12 俊夫 後藤 表面処理方法および表面処理装置
FR2855322B1 (fr) * 2003-05-21 2005-07-01 Air Liquide Dispositif de traitement de surface par zone d'un article
US7297892B2 (en) * 2003-08-14 2007-11-20 Rapt Industries, Inc. Systems and methods for laser-assisted plasma processing
JP4668208B2 (ja) * 2003-12-22 2011-04-13 フジフィルム マニュファクチャリング ユーロプ ビー．ブイ． 大気圧グロープラズマを用いて基板表面から汚物を除去する方法及び装置
EP1548795A1 (fr) * 2003-12-22 2005-06-29 Fuji Photo Film B.V. Verfahren und Vorrichtung zur Stabilisierung eines Glimmentladungsplasma unter atmosphärischen Bedingungen
WO2005105696A2 (fr) * 2004-04-28 2005-11-10 Saint-Gobain Vetrotex France Procede de traitement de surface de fibres de renforcement
US8227051B1 (en) * 2004-06-24 2012-07-24 UT-Battle, LLC Apparatus and method for carbon fiber surface treatment
US7313310B2 (en) * 2005-05-25 2007-12-25 Honeywell International Inc. Plasma directing baffle and method of use
FR2893037B1 (fr) * 2005-11-10 2012-11-09 Saint Gobain Vetrotex Procede de fonctionnalisation d'une portion de surface d'une fibre polymerique
JP4410771B2 (ja) * 2006-04-28 2010-02-03 パナソニック株式会社 ベベルエッチング装置およびベベルエッチング方法
US8575843B2 (en) 2008-05-30 2013-11-05 Colorado State University Research Foundation System, method and apparatus for generating plasma
EP2297377B1 (fr) 2008-05-30 2017-12-27 Colorado State University Research Foundation Dispositif de source chimique à base de plasma et procédé d'utilisation de celui-ci
US8994270B2 (en) 2008-05-30 2015-03-31 Colorado State University Research Foundation System and methods for plasma application
US9887069B2 (en) * 2008-12-19 2018-02-06 Lam Research Corporation Controlling ion energy distribution in plasma processing systems
GB2466664B (en) * 2009-01-06 2015-04-01 Perlemax Ltd Plasma microreactor apparatus, sterilisation unit and analyser
US8222822B2 (en) 2009-10-27 2012-07-17 Tyco Healthcare Group Lp Inductively-coupled plasma device
EP2326151A1 (fr) * 2009-11-24 2011-05-25 AGC Glass Europe Procédé et dispositif de polarisation d'une électrode DBD
AU2010349784B2 (en) 2010-03-31 2015-01-15 Colorado State University Research Foundation Liquid-gas interface plasma device
CA2794902A1 (fr) 2010-03-31 2011-10-06 Colorado State University Research Foundation Dispositif a plasma a interface liquide-gaz
US9532826B2 (en) 2013-03-06 2017-01-03 Covidien Lp System and method for sinus surgery
US9555145B2 (en) 2013-03-13 2017-01-31 Covidien Lp System and method for biofilm remediation
US9831070B1 (en) 2017-06-15 2017-11-28 Enercon Industries Corporation Surface treater with expansion electrode arrangement

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0346055B1 (fr) * 1988-06-06 1995-04-19 Research Development Corporation Of Japan Procédé pour provoquer une réaction dans le plasma sous pression atmosphérique
JP2990608B2 (ja) * 1989-12-13 1999-12-13 株式会社ブリヂストン 表面処理方法
JP3063769B2 (ja) * 1990-07-17 2000-07-12 イーシー化学株式会社 大気圧プラズマ表面処理法
JP2840699B2 (ja) * 1990-12-12 1998-12-24 株式会社 半導体エネルギー研究所 被膜形成装置及び被膜形成方法
JP3149272B2 (ja) * 1991-12-10 2001-03-26 幸子 岡崎 大気圧グロー放電プラズマのモニター方法
FR2692598B1 (fr) * 1992-06-17 1995-02-10 Air Liquide Procédé de dépôt d'un film contenant du silicium à la surface d'un substrat métallique et procédé de traitement anti-corrosion.
JP2572924B2 (ja) * 1992-09-04 1997-01-16 醇 西脇 大気圧プラズマによる金属の表面処理法
FR2704558B1 (fr) * 1993-04-29 1995-06-23 Air Liquide Procede et dispositif pour creer un depot d'oxyde de silicium sur un substrat solide en defilement.
KR960702844A (ko) * 1993-05-28 1996-05-23 앤 제이. 로버슨 중합체 물질을 대기압하에서 글로우 방전 플라즈마로 처리하는 방법 및 장치(nethod and apparatus for glow discharge plasma treatment of polymer materials at atmospheric pressure)

Also Published As

Publication number Publication date
US6299948B1 (en) 2001-10-09
JP2002524225A (ja) 2002-08-06
US20020037374A1 (en) 2002-03-28
WO2000013202A1 (fr) 2000-03-09
AU5169699A (en) 2000-03-21
FR2782837A1 (fr) 2000-03-03
EP1108264A1 (fr) 2001-06-20

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Effective date: 20100430