SG151198A1 - Methods relating to immersion lithography and an immersion lithographic apparatus - Google Patents

Methods relating to immersion lithography and an immersion lithographic apparatus

Info

Publication number
SG151198A1
SG151198A1 SG200806669-8A SG2008066698A SG151198A1 SG 151198 A1 SG151198 A1 SG 151198A1 SG 2008066698 A SG2008066698 A SG 2008066698A SG 151198 A1 SG151198 A1 SG 151198A1
Authority
SG
Singapore
Prior art keywords
immersion
lithographic apparatus
methods relating
lithography
immersion lithographic
Prior art date
Application number
SG200806669-8A
Other languages
English (en)
Inventor
Streefkerk Bob
Graaf Roelof Frederik De
Johannes Catharinus Hubertus Mulkens
Beckers Marcel
Paul Petrus Joannes Berkvens
David Lucien Anstotz
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG151198A1 publication Critical patent/SG151198A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200806669-8A 2007-09-27 2008-09-10 Methods relating to immersion lithography and an immersion lithographic apparatus SG151198A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US96038607P 2007-09-27 2007-09-27
US7133508P 2008-04-22 2008-04-22

Publications (1)

Publication Number Publication Date
SG151198A1 true SG151198A1 (en) 2009-04-30

Family

ID=40219384

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200806669-8A SG151198A1 (en) 2007-09-27 2008-09-10 Methods relating to immersion lithography and an immersion lithographic apparatus

Country Status (7)

Country Link
US (1) US8587762B2 (zh)
EP (1) EP2042930B1 (zh)
JP (1) JP5064340B2 (zh)
KR (2) KR101010297B1 (zh)
CN (2) CN101408733B (zh)
SG (1) SG151198A1 (zh)
TW (1) TWI392974B (zh)

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KR20230121035A (ko) * 2020-12-23 2023-08-17 에이에스엠엘 네델란즈 비.브이. 유체 취급 시스템, 방법 및 리소그래피 장치
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US7916269B2 (en) 2007-07-24 2011-03-29 Asml Netherlands B.V. Lithographic apparatus and contamination removal or prevention method

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CN102156390A (zh) 2011-08-17
TWI392974B (zh) 2013-04-11
CN101408733B (zh) 2013-02-27
JP2009088508A (ja) 2009-04-23
TW200921294A (en) 2009-05-16
CN102156390B (zh) 2017-03-01
KR20090033128A (ko) 2009-04-01
EP2042930B1 (en) 2014-02-12
EP2042930A2 (en) 2009-04-01
CN101408733A (zh) 2009-04-15
US20090086175A1 (en) 2009-04-02
EP2042930A3 (en) 2009-06-24
JP5064340B2 (ja) 2012-10-31
KR101010297B1 (ko) 2011-01-24
US8587762B2 (en) 2013-11-19
KR20110004809A (ko) 2011-01-14

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