SG148976A1 - Method and apparatus for inspection and fault analysis - Google Patents

Method and apparatus for inspection and fault analysis

Info

Publication number
SG148976A1
SG148976A1 SG200804893-6A SG2008048936A SG148976A1 SG 148976 A1 SG148976 A1 SG 148976A1 SG 2008048936 A SG2008048936 A SG 2008048936A SG 148976 A1 SG148976 A1 SG 148976A1
Authority
SG
Singapore
Prior art keywords
signal
lsi chip
inspection
fault analysis
amplifier
Prior art date
Application number
SG200804893-6A
Other languages
English (en)
Inventor
Kiyoshi Nikawa
Original Assignee
Nec Electronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nec Electronics Corp filed Critical Nec Electronics Corp
Publication of SG148976A1 publication Critical patent/SG148976A1/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/317Testing of digital circuits
    • G01R31/3181Functional testing
    • G01R31/3183Generation of test inputs, e.g. test vectors, patterns or sequences
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/30Marginal testing, e.g. by varying supply voltage
    • G01R31/3004Current or voltage test
    • G01R31/3008Quiescent current [IDDQ] test or leakage current test
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R27/00Arrangements for measuring resistance, reactance, impedance, or electric characteristics derived therefrom
    • G01R27/02Measuring real or complex resistance, reactance, impedance, or other two-pole characteristics derived therefrom, e.g. time constant
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/302Contactless testing
    • G01R31/308Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
    • G01R31/311Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation of integrated circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Electromagnetism (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG200804893-6A 2007-06-29 2008-06-27 Method and apparatus for inspection and fault analysis SG148976A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007172555A JP4917975B2 (ja) 2007-06-29 2007-06-29 検査故障解析方法及び検査故障解析装置

Publications (1)

Publication Number Publication Date
SG148976A1 true SG148976A1 (en) 2009-01-29

Family

ID=40020150

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200804893-6A SG148976A1 (en) 2007-06-29 2008-06-27 Method and apparatus for inspection and fault analysis

Country Status (7)

Country Link
US (1) US8090191B2 (ja)
EP (1) EP2012353A3 (ja)
JP (1) JP4917975B2 (ja)
KR (1) KR20090004481A (ja)
CN (1) CN101349664A (ja)
SG (1) SG148976A1 (ja)
TW (1) TW200921126A (ja)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5272804B2 (ja) * 2009-03-02 2013-08-28 富士ゼロックス株式会社 情報処理装置及びプログラム
FR2978559B1 (fr) * 2011-07-29 2014-03-21 Centre Nat Etd Spatiales Procede et dispositif d'analyse d'un assemblage a remplissage aleatoire des points de test par les parametres mesures
CN102338857A (zh) * 2011-08-03 2012-02-01 上海华碧检测技术有限公司 一种卡类产品芯片碎裂的无损检测方法
WO2013128234A1 (en) * 2012-02-27 2013-09-06 Freescale Semiconductor, Inc. Method of detecting irregular current flow in an integrated circuit device and apparatus therefor
CN103929128B (zh) * 2014-04-22 2015-12-02 哈尔滨工业大学 一种硅片与硅基太阳能电池的少数载流子传输特性检测方法
CN105092995B (zh) * 2014-04-30 2017-11-14 中芯国际集成电路制造(北京)有限公司 芯片中静态电流失效器件的检测方法和装置
CN105717170A (zh) * 2016-02-18 2016-06-29 工业和信息化部电子第五研究所 激光诱导阻抗变化测试方法和系统
US10755404B2 (en) 2017-12-07 2020-08-25 International Business Machines Corporation Integrated circuit defect detection using pattern images
JP7158224B2 (ja) 2018-09-26 2022-10-21 浜松ホトニクス株式会社 半導体デバイス検査方法及び半導体デバイス検査装置
WO2021241007A1 (ja) * 2020-05-26 2021-12-02 浜松ホトニクス株式会社 半導体デバイス検査方法及び半導体デバイス検査装置
WO2021241008A1 (ja) * 2020-05-26 2021-12-02 浜松ホトニクス株式会社 半導体デバイス検査方法及び半導体デバイス検査装置
JP2022093970A (ja) * 2020-12-14 2022-06-24 トヨタ自動車株式会社 異常診断システム、異常診断方法及びプログラム
CN113009319B (zh) * 2021-02-25 2022-06-07 湖北工业大学 一种图像压缩光学芯片的实时在线制作检测系统及方法
CN116594700B (zh) * 2023-07-17 2023-12-12 合肥康芯威存储技术有限公司 一种克隆eMMC芯片的方法、装置、电子设备及存储介质

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3531129A1 (de) * 1985-08-30 1987-03-12 Siemens Ag Verfahren und anordnung zum betrieb eines rastermikroskopes
JP2900858B2 (ja) * 1995-09-28 1999-06-02 日本電気株式会社 Cmos論理回路の故障箇所特定方法
JP2970505B2 (ja) 1995-11-21 1999-11-02 日本電気株式会社 半導体デバイスの配線電流観測方法、検査方法および装置
JP2900877B2 (ja) * 1996-03-22 1999-06-02 日本電気株式会社 半導体デバイスの配線電流観測方法、配線系欠陥検査方法およびその装置
US6078183A (en) * 1998-03-03 2000-06-20 Sandia Corporation Thermally-induced voltage alteration for integrated circuit analysis
JPH11310266A (ja) 1998-04-30 1999-11-09 Canon Inc インクカートリッジの包装形態
JP2000031228A (ja) * 1998-07-10 2000-01-28 Ricoh Co Ltd 半導体装置の製造方法及び検査方法
US6549022B1 (en) * 2000-06-02 2003-04-15 Sandia Corporation Apparatus and method for analyzing functional failures in integrated circuits
JP2002313859A (ja) * 2001-02-09 2002-10-25 Nec Corp 非破壊検査方法および装置ならびに半導体チップ
US6617862B1 (en) * 2002-02-27 2003-09-09 Advanced Micro Devices, Inc. Laser intrusive technique for locating specific integrated circuit current paths
US6967491B2 (en) * 2003-07-11 2005-11-22 Credence Systems Corporation Spatial and temporal selective laser assisted fault localization
JP4557526B2 (ja) * 2003-11-10 2010-10-06 パナソニック株式会社 半導体集積回路及び半導体集積回路の故障検出方法
JP2007017255A (ja) 2005-07-07 2007-01-25 Ngk Spark Plug Co Ltd 静電式液体状態検知センサ
JP2007127590A (ja) * 2005-11-07 2007-05-24 Nec Electronics Corp 半導体装置の検査方法および装置

Also Published As

Publication number Publication date
JP4917975B2 (ja) 2012-04-18
KR20090004481A (ko) 2009-01-12
CN101349664A (zh) 2009-01-21
US8090191B2 (en) 2012-01-03
JP2009008627A (ja) 2009-01-15
EP2012353A3 (en) 2013-02-20
EP2012353A2 (en) 2009-01-07
US20090003685A1 (en) 2009-01-01
TW200921126A (en) 2009-05-16

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