JPS5992770A
(ja)
*
|
1982-11-17 |
1984-05-29 |
Mitsubishi Electric Corp |
電力変換装置
|
BRPI0608161A2
(pt)
*
|
2005-02-16 |
2010-11-09 |
Basf Ag |
compostos, processo para preparar os mesmos, agente, semente, e, processo para combater fungos nocivos fitopatogênicos
|
KR101634894B1
(ko)
*
|
2006-01-19 |
2016-06-29 |
가부시키가이샤 니콘 |
이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 패턴 형성 장치, 노광 방법 및 노광 장치, 그리고 디바이스 제조 방법
|
SG178791A1
(en)
|
2006-02-21 |
2012-03-29 |
Nikon Corp |
Pattern forming apparatus, mark detecting apparatus, exposure apparatus, pattern forming method, exposure method and device manufacturing method
|
EP3279739A1
(en)
|
2006-02-21 |
2018-02-07 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
EP3327507B1
(en)
|
2006-02-21 |
2019-04-03 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
EP2071611B1
(en)
|
2006-08-31 |
2019-05-01 |
Nikon Corporation |
Mobile body drive system and mobile body drive method, pattern formation apparatus and method, exposure apparatus and method, device manufacturing method, and decision method
|
KR101698291B1
(ko)
*
|
2006-08-31 |
2017-02-01 |
가부시키가이샤 니콘 |
이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
|
SG10201507256WA
(en)
|
2006-08-31 |
2015-10-29 |
Nikon Corp |
Movable Body Drive Method And Movable Body Drive System, Pattern Formation Method And Apparatus, Exposure Method And Apparatus, And Device Manufacturing Method
|
TWI623825B
(zh)
|
2006-09-01 |
2018-05-11 |
Nikon Corp |
曝光裝置及方法、以及元件製造方法
|
CN101405838B
(zh)
|
2006-09-01 |
2011-12-14 |
株式会社尼康 |
移动体驱动方法及移动体驱动系统、图案形成方法及装置、曝光方法及装置、组件制造方法、以及校正方法
|
EP2068112A4
(en)
*
|
2006-09-29 |
2017-11-15 |
Nikon Corporation |
Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method
|
US7619207B2
(en)
*
|
2006-11-08 |
2009-11-17 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7903866B2
(en)
*
|
2007-03-29 |
2011-03-08 |
Asml Netherlands B.V. |
Measurement system, lithographic apparatus and method for measuring a position dependent signal of a movable object
|
US8687166B2
(en)
|
2007-05-24 |
2014-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus having an encoder position sensor system
|
US8760615B2
(en)
|
2007-05-24 |
2014-06-24 |
Asml Netherlands B.V. |
Lithographic apparatus having encoder type position sensor system
|
US8098362B2
(en)
*
|
2007-05-30 |
2012-01-17 |
Nikon Corporation |
Detection device, movable body apparatus, pattern formation apparatus and pattern formation method, exposure apparatus and exposure method, and device manufacturing method
|
US8174671B2
(en)
*
|
2007-06-21 |
2012-05-08 |
Asml Netherlands B.V. |
Lithographic projection apparatus and method for controlling a support structure
|
US7804579B2
(en)
*
|
2007-06-21 |
2010-09-28 |
Asml Netherlands B.V. |
Control system, lithographic projection apparatus, method of controlling a support structure, and a computer program product
|
WO2009011356A1
(ja)
*
|
2007-07-18 |
2009-01-22 |
Nikon Corporation |
計測方法、ステージ装置、及び露光装置
|
KR101409149B1
(ko)
|
2007-07-24 |
2014-06-17 |
가부시키가이샤 니콘 |
이동체 구동 방법 및 이동체 구동 시스템, 패턴 형성 방법 및 장치, 노광 방법 및 장치, 그리고 디바이스 제조 방법
|
EP2187430B1
(en)
*
|
2007-07-24 |
2018-10-03 |
Nikon Corporation |
Position measuring system, exposure apparatus, position measuring method, exposure method, and device manufacturing method
|
US8547527B2
(en)
*
|
2007-07-24 |
2013-10-01 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method
|
US8194232B2
(en)
*
|
2007-07-24 |
2012-06-05 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, position control method and position control system, and device manufacturing method
|
US8218129B2
(en)
|
2007-08-24 |
2012-07-10 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system
|
US8237919B2
(en)
*
|
2007-08-24 |
2012-08-07 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads
|
US8023106B2
(en)
|
2007-08-24 |
2011-09-20 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
|
WO2009028157A1
(ja)
|
2007-08-24 |
2009-03-05 |
Nikon Corporation |
移動体駆動方法及び移動体駆動システム、並びにパターン形成方法及びパターン形成装置
|
US9304412B2
(en)
*
|
2007-08-24 |
2016-04-05 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
|
US8867022B2
(en)
*
|
2007-08-24 |
2014-10-21 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, and device manufacturing method
|
US20090051895A1
(en)
*
|
2007-08-24 |
2009-02-26 |
Nikon Corporation |
Movable body drive method and movable body drive system, pattern formation method and apparatus, device manufacturing method, and processing system
|
US9013681B2
(en)
*
|
2007-11-06 |
2015-04-21 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
|
US9256140B2
(en)
*
|
2007-11-07 |
2016-02-09 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction
|
US8665455B2
(en)
*
|
2007-11-08 |
2014-03-04 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
|
US8422015B2
(en)
*
|
2007-11-09 |
2013-04-16 |
Nikon Corporation |
Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method
|
US8711327B2
(en)
*
|
2007-12-14 |
2014-04-29 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8792079B2
(en)
*
|
2007-12-28 |
2014-07-29 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method having encoders to measure displacement between optical member and measurement mount and between measurement mount and movable body
|
US8237916B2
(en)
*
|
2007-12-28 |
2012-08-07 |
Nikon Corporation |
Movable body drive system, pattern formation apparatus, exposure apparatus and exposure method, and device manufacturing method
|
US8269945B2
(en)
*
|
2007-12-28 |
2012-09-18 |
Nikon Corporation |
Movable body drive method and apparatus, exposure method and apparatus, pattern formation method and apparatus, and device manufacturing method
|
NL1036474A1
(nl)
|
2008-02-08 |
2009-08-11 |
Asml Netherlands Bv |
Lithographic apparatus and calibration method.
|
JP5057235B2
(ja)
*
|
2008-04-04 |
2012-10-24 |
株式会社ニコン |
較正方法、露光方法及びデバイス製造方法、並びに露光装置
|
JP5126594B2
(ja)
*
|
2008-04-04 |
2013-01-23 |
株式会社ニコン |
較正方法、露光方法及びデバイス製造方法、並びに露光装置
|
NL1036662A1
(nl)
*
|
2008-04-08 |
2009-10-09 |
Asml Netherlands Bv |
Stage system and lithographic apparatus comprising such stage system.
|
NL1036742A1
(nl)
*
|
2008-04-18 |
2009-10-20 |
Asml Netherlands Bv |
Stage system calibration method, stage system and lithographic apparatus comprising such stage system.
|
JP4922338B2
(ja)
*
|
2008-04-25 |
2012-04-25 |
エーエスエムエル ネザーランズ ビー.ブイ. |
位置制御システム、リソグラフィ装置、および可動オブジェクトの位置を制御する方法
|
US8228482B2
(en)
*
|
2008-05-13 |
2012-07-24 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8786829B2
(en)
*
|
2008-05-13 |
2014-07-22 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8817236B2
(en)
|
2008-05-13 |
2014-08-26 |
Nikon Corporation |
Movable body system, movable body drive method, pattern formation apparatus, pattern formation method, exposure apparatus, exposure method, and device manufacturing method
|
US8508735B2
(en)
*
|
2008-09-22 |
2013-08-13 |
Nikon Corporation |
Movable body apparatus, movable body drive method, exposure apparatus, exposure method, and device manufacturing method
|
US8902402B2
(en)
|
2008-12-19 |
2014-12-02 |
Nikon Corporation |
Movable body apparatus, exposure apparatus, exposure method, and device manufacturing method
|
US8599359B2
(en)
|
2008-12-19 |
2013-12-03 |
Nikon Corporation |
Exposure apparatus, exposure method, device manufacturing method, and carrier method
|
US8760629B2
(en)
|
2008-12-19 |
2014-06-24 |
Nikon Corporation |
Exposure apparatus including positional measurement system of movable body, exposure method of exposing object including measuring positional information of movable body, and device manufacturing method that includes exposure method of exposing object, including measuring positional information of movable body
|
US8773635B2
(en)
*
|
2008-12-19 |
2014-07-08 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
EP2264409B1
(en)
*
|
2009-06-19 |
2015-10-07 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
NL2005013A
(en)
*
|
2009-07-31 |
2011-02-02 |
Asml Netherlands Bv |
Positioning system, lithographic apparatus and method.
|
US8514395B2
(en)
|
2009-08-25 |
2013-08-20 |
Nikon Corporation |
Exposure method, exposure apparatus, and device manufacturing method
|
US8493547B2
(en)
|
2009-08-25 |
2013-07-23 |
Nikon Corporation |
Exposure apparatus, exposure method, and device manufacturing method
|
US8488109B2
(en)
|
2009-08-25 |
2013-07-16 |
Nikon Corporation |
Exposure method, exposure apparatus, and device manufacturing method
|
US20110096306A1
(en)
*
|
2009-09-28 |
2011-04-28 |
Nikon Corporation |
Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
|
US20110096318A1
(en)
*
|
2009-09-28 |
2011-04-28 |
Nikon Corporation |
Exposure apparatus and device fabricating method
|
US20110096312A1
(en)
*
|
2009-09-28 |
2011-04-28 |
Nikon Corporation |
Exposure apparatus and device fabricating method
|
US20110102761A1
(en)
*
|
2009-09-28 |
2011-05-05 |
Nikon Corporation |
Stage apparatus, exposure apparatus, and device fabricating method
|
US20110123913A1
(en)
*
|
2009-11-19 |
2011-05-26 |
Nikon Corporation |
Exposure apparatus, exposing method, and device fabricating method
|
US20110128523A1
(en)
*
|
2009-11-19 |
2011-06-02 |
Nikon Corporation |
Stage apparatus, exposure apparatus, driving method, exposing method, and device fabricating method
|
US8488106B2
(en)
*
|
2009-12-28 |
2013-07-16 |
Nikon Corporation |
Movable body drive method, movable body apparatus, exposure method, exposure apparatus, and device manufacturing method
|
NL2009196A
(en)
*
|
2011-08-25 |
2013-02-27 |
Asml Netherlands Bv |
Position measurement system, lithographic apparatus and device manufacturing method.
|
US9207549B2
(en)
|
2011-12-29 |
2015-12-08 |
Nikon Corporation |
Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
|
US20150212425A1
(en)
*
|
2012-09-28 |
2015-07-30 |
Asml Holding N.V. |
Quantitative Reticle Distortion Measurement System
|
SG11201503261TA
(en)
*
|
2012-11-19 |
2015-05-28 |
Asml Netherlands Bv |
Position measurement system, grating for a position measurement system and method
|
US9529280B2
(en)
*
|
2013-12-06 |
2016-12-27 |
Kla-Tencor Corporation |
Stage apparatus for semiconductor inspection and lithography systems
|
CN104061864A
(zh)
*
|
2014-06-30 |
2014-09-24 |
清华大学 |
一种基于平面光栅的硅片台大行程运动测量系统
|
NL2015211A
(en)
*
|
2014-08-29 |
2016-07-12 |
Asml Netherlands Bv |
Encoder system calibration method, object positioning system, lithographic apparatus and device device manufacturing method.
|
CN112068406A
(zh)
|
2015-02-23 |
2020-12-11 |
株式会社尼康 |
测量装置、光刻系统、以及组件制造方法
|
KR20240010551A
(ko)
|
2015-02-23 |
2024-01-23 |
가부시키가이샤 니콘 |
기판 처리 시스템 및 기판 처리 방법, 그리고 디바이스 제조 방법
|
WO2016136690A1
(ja)
*
|
2015-02-23 |
2016-09-01 |
株式会社ニコン |
計測装置、リソグラフィシステム及び露光装置、並びに管理方法、重ね合わせ計測方法及びデバイス製造方法
|
KR102633248B1
(ko)
*
|
2015-09-30 |
2024-02-02 |
가부시키가이샤 니콘 |
노광 장치 및 노광 방법, 그리고 플랫 패널 디스플레이 제조 방법
|
CN107607045B
(zh)
*
|
2017-08-24 |
2019-12-13 |
中国科学院长春光学精密机械与物理研究所 |
基于衍射光栅的长行程、高精度位移测量系统
|
CN107462166B
(zh)
*
|
2017-08-24 |
2019-10-15 |
中国科学院长春光学精密机械与物理研究所 |
基于衍射光栅的长行程、高精度位移测量方法
|