SG11201503261TA - Position measurement system, grating for a position measurement system and method - Google Patents

Position measurement system, grating for a position measurement system and method

Info

Publication number
SG11201503261TA
SG11201503261TA SG11201503261TA SG11201503261TA SG11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA SG 11201503261T A SG11201503261T A SG 11201503261TA
Authority
SG
Singapore
Prior art keywords
measurement system
position measurement
grating
measurement
Prior art date
Application number
SG11201503261TA
Inventor
Willem Herman Gertruda Anna Koenen
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG11201503261TA publication Critical patent/SG11201503261TA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
    • G01D5/34776—Absolute encoders with analogue or digital scales
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/347—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells using displacement encoding scales
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1861—Reflection gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70133—Measurement of illumination distribution, in pupil plane or field plane
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D2205/00—Indexing scheme relating to details of means for transferring or converting the output of a sensing member
    • G01D2205/90—Two-dimensional encoders, i.e. having one or two codes extending in two directions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Toxicology (AREA)
  • Health & Medical Sciences (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Optical Transform (AREA)
SG11201503261TA 2012-11-19 2013-11-08 Position measurement system, grating for a position measurement system and method SG11201503261TA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201261728071P 2012-11-19 2012-11-19
PCT/EP2013/073392 WO2014076009A2 (en) 2012-11-19 2013-11-08 Position measurement system, grating for a position measurement system and method

Publications (1)

Publication Number Publication Date
SG11201503261TA true SG11201503261TA (en) 2015-05-28

Family

ID=49554262

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201503261TA SG11201503261TA (en) 2012-11-19 2013-11-08 Position measurement system, grating for a position measurement system and method

Country Status (9)

Country Link
US (1) US9651877B2 (en)
EP (1) EP2920649B1 (en)
JP (1) JP6080970B2 (en)
KR (1) KR20150087360A (en)
CN (1) CN104797983B (en)
NL (1) NL2011766A (en)
SG (1) SG11201503261TA (en)
TW (1) TWI519906B (en)
WO (1) WO2014076009A2 (en)

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TWI696042B (en) 2015-02-23 2020-06-11 日商尼康股份有限公司 Measurement device, lithography system and exposure apparatus, and control method, superposition measurement method and device manufacturing method
JP6649636B2 (en) 2015-02-23 2020-02-19 株式会社ニコン Measurement apparatus, lithography system, exposure apparatus, and device manufacturing method
CN111610696A (en) 2015-02-23 2020-09-01 株式会社尼康 Substrate processing system, substrate processing method, and device manufacturing method
CN105371881B (en) * 2015-11-22 2017-07-28 长春禹衡光学有限公司 A kind of Split encoder of integrative installation technology
US10243668B2 (en) 2016-04-27 2019-03-26 Industrial Technology Research Institute Positioning measurement device and the method thereof
US11982521B2 (en) * 2017-02-23 2024-05-14 Nikon Corporation Measurement of a change in a geometrical characteristic and/or position of a workpiece
CN107993722B (en) * 2017-12-05 2021-12-07 天津大学 Rapid extraction method for photon distribution in medium under lattice light source
US10768361B1 (en) * 2018-08-03 2020-09-08 Facebook Technologies, Llc System for monitoring grating formation

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US5204524A (en) * 1991-03-22 1993-04-20 Mitutoyo Corporation Two-dimensional optical encoder with three gratings in each dimension
EP0669519B1 (en) 1994-02-23 2000-05-03 Dr. Johannes Heidenhain GmbH Position measuring device
JPH08191043A (en) 1995-01-11 1996-07-23 Nikon Corp Alignment method and exposure system used for this method
US6031951A (en) * 1998-04-24 2000-02-29 Rose Research, L.L.C. Transmission-mode optical coupling mechanism and method of manufacturing the same
US6922287B2 (en) * 2001-10-12 2005-07-26 Unaxis Balzers Aktiengesellschaft Light coupling element
US6781694B2 (en) * 2002-07-16 2004-08-24 Mitutoyo Corporation Two-dimensional scale structures and method usable in an absolute position transducer
US7348574B2 (en) * 2005-09-02 2008-03-25 Asml Netherlands, B.V. Position measurement system and lithographic apparatus
US7483120B2 (en) * 2006-05-09 2009-01-27 Asml Netherlands B.V. Displacement measurement system, lithographic apparatus, displacement measurement method and device manufacturing method
WO2008072502A1 (en) 2006-12-08 2008-06-19 Nikon Corporation Exposure method and apparatus, and device manufacturing method
DE102007023300A1 (en) 2007-05-16 2008-11-20 Dr. Johannes Heidenhain Gmbh Position measuring device and arrangement thereof
CN100587608C (en) * 2007-07-24 2010-02-03 上海微电子装备有限公司 Aligning system used for photolithography equipment
CN101149564B (en) * 2007-09-04 2010-05-19 上海微电子装备有限公司 Alignment mark and its imaging optical system and imaging method
NL1036080A1 (en) 2007-11-01 2009-05-07 Asml Netherlands Bv Position measurement system and Lithographic Apparatus.
CN101251724B (en) * 2008-03-31 2010-09-15 上海微电子装备有限公司 Aligning system, method and lithographic device thereof
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Also Published As

Publication number Publication date
WO2014076009A3 (en) 2014-07-17
US9651877B2 (en) 2017-05-16
KR20150087360A (en) 2015-07-29
NL2011766A (en) 2014-05-21
TW201428430A (en) 2014-07-16
WO2014076009A2 (en) 2014-05-22
TWI519906B (en) 2016-02-01
CN104797983A (en) 2015-07-22
CN104797983B (en) 2017-03-08
EP2920649B1 (en) 2023-03-29
JP2016505812A (en) 2016-02-25
EP2920649A2 (en) 2015-09-23
US20150316856A1 (en) 2015-11-05
JP6080970B2 (en) 2017-02-15

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