SG130180A1 - Scrubber for processing semiconductor waste gas - Google Patents

Scrubber for processing semiconductor waste gas

Info

Publication number
SG130180A1
SG130180A1 SG200605933-1A SG2006059331A SG130180A1 SG 130180 A1 SG130180 A1 SG 130180A1 SG 2006059331 A SG2006059331 A SG 2006059331A SG 130180 A1 SG130180 A1 SG 130180A1
Authority
SG
Singapore
Prior art keywords
waste gas
particles
scrubber
burning chamber
semiconductor
Prior art date
Application number
SG200605933-1A
Other languages
English (en)
Inventor
Young Chan Lee
Hyung Geuk Kim
Sang Keun Lee
Original Assignee
Clean Systems Korea Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020050081838A external-priority patent/KR100623368B1/ko
Priority claimed from KR1020050082274A external-priority patent/KR100623369B1/ko
Priority claimed from KR1020060011011A external-priority patent/KR100750406B1/ko
Priority claimed from KR1020060011012A external-priority patent/KR100683805B1/ko
Priority claimed from KR1020060011013A external-priority patent/KR100669501B1/ko
Application filed by Clean Systems Korea Inc filed Critical Clean Systems Korea Inc
Publication of SG130180A1 publication Critical patent/SG130180A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/14—Packed scrubbers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G7/00—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals
    • F23G7/06—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases
    • F23G7/061—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating
    • F23G7/065—Incinerators or other apparatus for consuming industrial waste, e.g. chemicals of waste gases or noxious gases, e.g. exhaust gases with supplementary heating using gaseous or liquid fuel
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23G—CREMATION FURNACES; CONSUMING WASTE PRODUCTS BY COMBUSTION
    • F23G2209/00—Specific waste
    • F23G2209/14—Gaseous waste or fumes
    • F23G2209/142—Halogen gases, e.g. silane
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23J—REMOVAL OR TREATMENT OF COMBUSTION PRODUCTS OR COMBUSTION RESIDUES; FLUES 
    • F23J2217/00—Intercepting solids
    • F23J2217/50—Intercepting solids by cleaning fluids (washers or scrubbers)
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Incineration Of Waste (AREA)
  • Treating Waste Gases (AREA)
  • Separation Of Particles Using Liquids (AREA)
SG200605933-1A 2005-09-02 2006-08-30 Scrubber for processing semiconductor waste gas SG130180A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
KR1020050081838A KR100623368B1 (ko) 2005-09-02 2005-09-02 반도체 제조 장비용 직접 연소식 스크러버
KR1020050082274A KR100623369B1 (ko) 2005-09-05 2005-09-05 반도체 제조장비용 배기가스 처리장치의 버너
KR1020060011011A KR100750406B1 (ko) 2006-02-06 2006-02-06 반도체 폐가스 처리용 스크러버의 파우더 제거 장치
KR1020060011012A KR100683805B1 (ko) 2006-02-06 2006-02-06 반도체 폐가스 처리용 스크러버의 파우더 배출 장치
KR1020060011013A KR100669501B1 (ko) 2006-02-06 2006-02-06 반도체 폐가스 처리용 스크러버의 습식 타워

Publications (1)

Publication Number Publication Date
SG130180A1 true SG130180A1 (en) 2007-03-20

Family

ID=37735674

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200605933-1A SG130180A1 (en) 2005-09-02 2006-08-30 Scrubber for processing semiconductor waste gas

Country Status (5)

Country Link
US (1) US7758818B2 (de)
JP (1) JP4468920B2 (de)
DE (1) DE102006027882B4 (de)
SG (1) SG130180A1 (de)
TW (1) TWI311071B (de)

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KR101576212B1 (ko) * 2014-03-14 2015-12-11 주식회사 글로벌스탠다드테크놀로지 사전 수처리 기능을 가지는 스크러버
JP6441660B2 (ja) * 2014-03-17 2018-12-19 株式会社荏原製作所 除害機能付真空ポンプ
KR101519507B1 (ko) * 2014-11-06 2015-05-13 씨에스케이(주) 스크러버용 습식 탱크
CN105864801A (zh) * 2015-02-09 2016-08-17 日本派欧尼株式会社 废气的燃烧式净化装置
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TWI633924B (zh) * 2016-05-13 2018-09-01 青淨光能科技有限公司 一種氣體之處理方法與氣體處理裝置
CN105833654A (zh) * 2016-06-05 2016-08-10 青岛海奥瑞自动化科技有限公司 一种空气过滤系统
TWI646279B (zh) * 2017-06-01 2019-01-01 華邦電子股份有限公司 管路系統
CN108980617B (zh) 2017-06-01 2020-04-10 华邦电子股份有限公司 管路系统
KR102318517B1 (ko) * 2017-07-07 2021-10-27 에스아이더블유 엔지니어링 피티이. 엘티디. 가스 오염물의 분해 및 산화를 위한 장치 및 시스템
KR102064662B1 (ko) * 2018-03-17 2020-01-09 이상준 환경 유해 폐가스 처리 시스템 및 이에 사용되는 버너 구조체
JP7128078B2 (ja) * 2018-10-12 2022-08-30 株式会社荏原製作所 除害装置、除害装置の配管部の交換方法及び除害装置の配管の洗浄方法
KR101997185B1 (ko) * 2019-01-28 2019-07-08 주식회사 대승엔지니어링 촉매산화수 발생장치를 이용한 약액 세정 탈취장치
KR101997186B1 (ko) * 2019-02-01 2019-07-08 주식회사 대승엔지니어링 촉매수 발생장치를 이용한 약액세정장치
KR101963765B1 (ko) * 2019-02-01 2019-06-18 주식회사 대승엔지니어링 촉매수 발생장치를 이용한 세정장치를 구비한 약액세정탈취장치
KR101999165B1 (ko) * 2019-03-25 2019-07-12 주식회사 대승엔지니어링 고도산화공정을 이용한 탈취장치
KR102471366B1 (ko) * 2020-10-16 2022-11-29 영진아이엔디(주) 용수 절감을 위한 반도체 폐가스 처리용 플라즈마 스크러버 시스템 및 그 작동 방법
CN112388791B (zh) * 2020-11-13 2022-07-01 众智机械(临沂)有限公司 一种模压门面板热压造型装置及热压工艺
CN112388783B (zh) * 2020-11-13 2022-06-24 山东唐唐家居有限公司 一种模压门面板热压装置及其工艺
CN112495115A (zh) * 2020-12-21 2021-03-16 重庆第二师范学院 一种装修切割粉尘环保移动收集箱
KR102365718B1 (ko) * 2021-05-25 2022-02-25 주식회사 원익홀딩스 습식 타워
KR102330326B1 (ko) * 2021-05-25 2021-11-24 주식회사 원익홀딩스 습식 타워용 냉각 어셈블리
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Also Published As

Publication number Publication date
TW200709844A (en) 2007-03-16
US20070053803A1 (en) 2007-03-08
DE102006027882B4 (de) 2009-04-30
JP2007069201A (ja) 2007-03-22
US7758818B2 (en) 2010-07-20
TWI311071B (en) 2009-06-21
JP4468920B2 (ja) 2010-05-26
DE102006027882A1 (de) 2007-03-08

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