SG116418A1 - Semiconductor wafer grinding method. - Google Patents

Semiconductor wafer grinding method.

Info

Publication number
SG116418A1
SG116418A1 SG200103861A SG200103861A SG116418A1 SG 116418 A1 SG116418 A1 SG 116418A1 SG 200103861 A SG200103861 A SG 200103861A SG 200103861 A SG200103861 A SG 200103861A SG 116418 A1 SG116418 A1 SG 116418A1
Authority
SG
Singapore
Prior art keywords
semiconductor wafer
grinding method
wafer grinding
semiconductor
wafer
Prior art date
Application number
SG200103861A
Other languages
English (en)
Inventor
Arai Kazuhisa
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Publication of SG116418A1 publication Critical patent/SG116418A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
    • B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
    • B24B7/228—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding thin, brittle parts, e.g. semiconductors, wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B41/00—Component parts such as frames, beds, carriages, headstocks
    • B24B41/06—Work supports, e.g. adjustable steadies
    • B24B41/068—Table-like supports for panels, sheets or the like
SG200103861A 2000-07-04 2001-06-25 Semiconductor wafer grinding method. SG116418A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000202661A JP2002025961A (ja) 2000-07-04 2000-07-04 半導体ウエーハの研削方法

Publications (1)

Publication Number Publication Date
SG116418A1 true SG116418A1 (en) 2005-11-28

Family

ID=18700155

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200103861A SG116418A1 (en) 2000-07-04 2001-06-25 Semiconductor wafer grinding method.

Country Status (7)

Country Link
US (1) US6527627B2 (de)
EP (1) EP1170088B1 (de)
JP (1) JP2002025961A (de)
KR (1) KR100709457B1 (de)
DE (1) DE60103701T2 (de)
SG (1) SG116418A1 (de)
TW (1) TW490359B (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010035163A (ko) * 2001-01-09 2001-05-07 이민기 세계 헤드헌터 네트워크를 이용한 국제 고급인력 수급인터넷망
US6826986B2 (en) * 2001-05-05 2004-12-07 Ah Beng Lim Bi-directional singulation system and method
JP2002359211A (ja) * 2001-05-30 2002-12-13 Disco Abrasive Syst Ltd 切削機
KR20040031071A (ko) * 2001-09-28 2004-04-09 신에쯔 한도타이 가부시키가이샤 연마용 워크지지반, 워크의 연마장치 및 연마방법
US7018268B2 (en) 2002-04-09 2006-03-28 Strasbaugh Protection of work piece during surface processing
JP2004319697A (ja) * 2003-04-15 2004-11-11 Disco Abrasive Syst Ltd 板状物に形成された電極の加工装置
JP4464113B2 (ja) * 2003-11-27 2010-05-19 株式会社ディスコ ウエーハの加工装置
US6910956B1 (en) 2003-12-22 2005-06-28 Powerchip Semiconductor Corp. Wafer grinding apparatus
US7011567B2 (en) * 2004-02-05 2006-03-14 Robert Gerber Semiconductor wafer grinder
US7163441B2 (en) * 2004-02-05 2007-01-16 Robert Gerber Semiconductor wafer grinder
JP4427396B2 (ja) * 2004-06-30 2010-03-03 株式会社ディスコ 加工装置
TWI251924B (en) * 2004-12-29 2006-03-21 Siliconware Precision Industries Co Ltd A process applied to semiconductor
US7713846B2 (en) * 2004-12-29 2010-05-11 Siliconware Precision Industries Co., Ltd. Process applied to semiconductor
JP2007243112A (ja) * 2006-03-13 2007-09-20 Disco Abrasive Syst Ltd ウェーハの凹状加工方法及び凹凸吸収パッド
JP4806282B2 (ja) * 2006-03-29 2011-11-02 株式会社ディスコ ウエーハの処理装置
JP4937674B2 (ja) * 2006-08-16 2012-05-23 株式会社ディスコ ウエーハのエッチング方法
KR101109078B1 (ko) * 2009-11-17 2012-03-13 (주)엘이티 기판 지지 유닛 및 이를 포함하는 기판 검사 장치, 그리고 이를 이용한 기판 검사 방법
US9508570B2 (en) * 2013-10-21 2016-11-29 Asm Technology Singapore Pte Ltd Singulation apparatus and method
WO2016151121A2 (de) * 2015-03-26 2016-09-29 Mauser-Werke Oberndorf Maschinenbau Gmbh Bearbeitungseinheit
KR20160125585A (ko) * 2015-04-21 2016-11-01 삼성전자주식회사 기판 처리 장치 및 기판 처리 방법
JP2018114573A (ja) * 2017-01-17 2018-07-26 株式会社ディスコ 研削装置
CN108000267A (zh) * 2017-12-26 2018-05-08 北京中电科电子装备有限公司 减薄机
JP7171140B2 (ja) * 2018-12-11 2022-11-15 株式会社ディスコ 被加工物の加工方法および樹脂シートユニット

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19641534A1 (de) * 1996-10-09 1998-04-23 Genauigkeits & Maschinenbau Nu Schleifautomat
EP0897778A1 (de) * 1997-08-15 1999-02-24 Disco Corporation Verfahren und Vorrichtung zum Bearbeiten von Werkstücken, wobei eine Bearbeitungsflüssigkeit zwischen Werkstück und Werkzeug gespült wird
WO2000041854A1 (en) * 1999-01-11 2000-07-20 Strasbaugh, Inc. Improved handling of wet thin wafers

Family Cites Families (15)

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US3377096A (en) 1967-06-02 1968-04-09 Wood S Powr Grip Co Inc Vacuum gripping pad
EP0272531B1 (de) * 1986-12-08 1991-07-31 Sumitomo Electric Industries Limited Flächenschleifmaschine
JP3050910B2 (ja) * 1990-11-30 2000-06-12 東芝セラミックス株式会社 薄板状部材の保持装置
JPH06302572A (ja) * 1993-04-12 1994-10-28 Hitachi Ltd 半導体装置の製造方法及びテープ貼付剥離装置
DE4335980C2 (de) * 1993-10-21 1998-09-10 Wacker Siltronic Halbleitermat Verfahren zum Positionieren einer Werkstückhalterung
US5632667A (en) * 1995-06-29 1997-05-27 Delco Electronics Corporation No coat backside wafer grinding process
US5738574A (en) * 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
US5816895A (en) * 1997-01-17 1998-10-06 Tokyo Seimitsu Co., Ltd. Surface grinding method and apparatus
JPH1123450A (ja) * 1997-07-09 1999-01-29 Mitsubishi Heavy Ind Ltd ガス濃度検知方法及び装置
US5827111A (en) * 1997-12-15 1998-10-27 Micron Technology, Inc. Method and apparatus for grinding wafers
US6383890B2 (en) 1997-12-26 2002-05-07 Canon Kabushiki Kaisha Wafer bonding method, apparatus and vacuum chuck
JP2000015570A (ja) * 1998-07-02 2000-01-18 Disco Abrasive Syst Ltd 研削装置
JP4009367B2 (ja) * 1998-08-04 2007-11-14 株式会社ディスコ スピン洗浄・乾燥方法
JP2000158334A (ja) * 1998-11-30 2000-06-13 Disco Abrasive Syst Ltd 作業用トレー及び研削方法
US6227950B1 (en) * 1999-03-08 2001-05-08 Speedfam-Ipec Corporation Dual purpose handoff station for workpiece polishing machine

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19641534A1 (de) * 1996-10-09 1998-04-23 Genauigkeits & Maschinenbau Nu Schleifautomat
EP0897778A1 (de) * 1997-08-15 1999-02-24 Disco Corporation Verfahren und Vorrichtung zum Bearbeiten von Werkstücken, wobei eine Bearbeitungsflüssigkeit zwischen Werkstück und Werkzeug gespült wird
WO2000041854A1 (en) * 1999-01-11 2000-07-20 Strasbaugh, Inc. Improved handling of wet thin wafers

Also Published As

Publication number Publication date
EP1170088A3 (de) 2002-01-30
EP1170088A2 (de) 2002-01-09
US6527627B2 (en) 2003-03-04
US20020004359A1 (en) 2002-01-10
KR20020017943A (ko) 2002-03-07
DE60103701T2 (de) 2005-06-16
DE60103701D1 (de) 2004-07-15
EP1170088B1 (de) 2004-06-09
TW490359B (en) 2002-06-11
JP2002025961A (ja) 2002-01-25
KR100709457B1 (ko) 2007-04-18

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