SG114513A1 - Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus - Google Patents

Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus

Info

Publication number
SG114513A1
SG114513A1 SG200107340A SG200107340A SG114513A1 SG 114513 A1 SG114513 A1 SG 114513A1 SG 200107340 A SG200107340 A SG 200107340A SG 200107340 A SG200107340 A SG 200107340A SG 114513 A1 SG114513 A1 SG 114513A1
Authority
SG
Singapore
Prior art keywords
illumination optical
optical apparatus
exposure
exposure apparatus
apparatus provided
Prior art date
Application number
SG200107340A
Other languages
English (en)
Inventor
Tanitsu Osamu
Shibuya Masato
Toyoda Mitsunori
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of SG114513A1 publication Critical patent/SG114513A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70108—Off-axis setting using a light-guiding element, e.g. diffractive optical elements [DOEs] or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70183—Zoom systems for adjusting beam diameter

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Optical Elements Other Than Lenses (AREA)
SG200107340A 2000-11-29 2001-11-28 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus SG114513A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000363225 2000-11-29
JP2001074240A JP2002231619A (ja) 2000-11-29 2001-03-15 照明光学装置および該照明光学装置を備えた露光装置

Publications (1)

Publication Number Publication Date
SG114513A1 true SG114513A1 (en) 2005-09-28

Family

ID=26604841

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200107340A SG114513A1 (en) 2000-11-29 2001-11-28 Illumination optical apparatus and exposure apparatus provided with illumination optical apparatus

Country Status (6)

Country Link
US (2) US20020085276A1 (fr)
EP (1) EP1211561A3 (fr)
JP (1) JP2002231619A (fr)
KR (1) KR20020042462A (fr)
SG (1) SG114513A1 (fr)
TW (1) TW516097B (fr)

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TW567406B (en) 2001-12-12 2003-12-21 Nikon Corp Diffraction optical device, refraction optical device, illuminating optical device, exposure system and exposure method
JP4207478B2 (ja) * 2002-07-12 2009-01-14 株式会社ニコン オプティカルインテグレータ、照明光学装置、露光装置および露光方法
JP4332331B2 (ja) * 2002-08-05 2009-09-16 キヤノン株式会社 露光方法
JP4735258B2 (ja) * 2003-04-09 2011-07-27 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
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JP2005032847A (ja) * 2003-07-09 2005-02-03 Advanced Lcd Technologies Development Center Co Ltd 結晶化装置、結晶化方法およびデバイス
WO2005026843A2 (fr) * 2003-09-12 2005-03-24 Carl Zeiss Smt Ag Systeme d'eclairage pour une installation d'exposition de projection de microlithographie
TW201834020A (zh) * 2003-10-28 2018-09-16 日商尼康股份有限公司 照明光學裝置、曝光裝置、曝光方法以及元件製造方法
TW201809801A (zh) 2003-11-20 2018-03-16 日商尼康股份有限公司 光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
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US8451427B2 (en) 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
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JP5761329B2 (ja) * 2013-12-27 2015-08-12 株式会社ニコン 照明光学装置、露光装置および露光方法
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Also Published As

Publication number Publication date
EP1211561A3 (fr) 2005-01-26
US20040263817A1 (en) 2004-12-30
KR20020042462A (ko) 2002-06-05
US20020085276A1 (en) 2002-07-04
JP2002231619A (ja) 2002-08-16
EP1211561A2 (fr) 2002-06-05
TW516097B (en) 2003-01-01

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