SG11202011069RA - Radical output monitor for a remote plasma source and method of use - Google Patents

Radical output monitor for a remote plasma source and method of use

Info

Publication number
SG11202011069RA
SG11202011069RA SG11202011069RA SG11202011069RA SG11202011069RA SG 11202011069R A SG11202011069R A SG 11202011069RA SG 11202011069R A SG11202011069R A SG 11202011069RA SG 11202011069R A SG11202011069R A SG 11202011069RA SG 11202011069R A SG11202011069R A SG 11202011069RA
Authority
SG
Singapore
Prior art keywords
plasma source
remote plasma
output monitor
radical output
radical
Prior art date
Application number
SG11202011069RA
Other languages
English (en)
Inventor
Michael Harris
Chiu-Yang Tai
Atul Gupta
Original Assignee
Mks Instr Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mks Instr Inc filed Critical Mks Instr Inc
Publication of SG11202011069RA publication Critical patent/SG11202011069RA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • H01J37/32449—Gas control, e.g. control of the gas flow
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32522—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • H01J37/32954—Electron temperature measurement
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/0006—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature
    • H05H1/0068—Investigating plasma, e.g. measuring the degree of ionisation or the electron temperature by thermal means

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Vapour Deposition (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
SG11202011069RA 2018-06-14 2019-06-12 Radical output monitor for a remote plasma source and method of use SG11202011069RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201862684820P 2018-06-14 2018-06-14
PCT/US2019/036796 WO2019241405A1 (en) 2018-06-14 2019-06-12 Radical output monitor for a remote plasma source and method of use

Publications (1)

Publication Number Publication Date
SG11202011069RA true SG11202011069RA (en) 2020-12-30

Family

ID=68840258

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202011069RA SG11202011069RA (en) 2018-06-14 2019-06-12 Radical output monitor for a remote plasma source and method of use

Country Status (8)

Country Link
US (1) US11114287B2 (zh)
EP (1) EP3785494A4 (zh)
JP (1) JP7301075B2 (zh)
KR (1) KR20210009428A (zh)
CN (1) CN112335342B (zh)
SG (1) SG11202011069RA (zh)
TW (1) TWI809122B (zh)
WO (1) WO2019241405A1 (zh)

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CN110800377B (zh) 2017-06-27 2022-04-29 佳能安内华股份有限公司 等离子体处理装置
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JP6595002B2 (ja) 2017-06-27 2019-10-23 キヤノンアネルバ株式会社 スパッタリング装置
SG11202009122YA (en) * 2018-06-26 2020-10-29 Canon Anelva Corp Plasma processing apparatus, plasma processing method, program, and memory medium

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Also Published As

Publication number Publication date
KR20210009428A (ko) 2021-01-26
TW202017074A (zh) 2020-05-01
EP3785494A1 (en) 2021-03-03
EP3785494A4 (en) 2022-01-26
TWI809122B (zh) 2023-07-21
US20190385829A1 (en) 2019-12-19
CN112335342A (zh) 2021-02-05
WO2019241405A1 (en) 2019-12-19
US11114287B2 (en) 2021-09-07
JP2021530076A (ja) 2021-11-04
JP7301075B2 (ja) 2023-06-30
CN112335342B (zh) 2023-07-14

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