SG11202000393VA - Method for controlling the orientation of nanodomains of a block copolymer - Google Patents

Method for controlling the orientation of nanodomains of a block copolymer

Info

Publication number
SG11202000393VA
SG11202000393VA SG11202000393VA SG11202000393VA SG11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA
Authority
SG
Singapore
Prior art keywords
nanodomains
orientation
controlling
block copolymer
copolymer
Prior art date
Application number
SG11202000393VA
Other languages
English (en)
Inventor
Xavier Chevalier
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11202000393VA publication Critical patent/SG11202000393VA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/34—Applying different liquids or other fluent materials simultaneously
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Materials For Photolithography (AREA)
SG11202000393VA 2017-07-21 2018-07-20 Method for controlling the orientation of nanodomains of a block copolymer SG11202000393VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1756928A FR3069339B1 (fr) 2017-07-21 2017-07-21 Procede de controle de l'orientation des nano-domaines d'un copolymere a blocs
PCT/FR2018/051857 WO2019016488A1 (fr) 2017-07-21 2018-07-20 Procede de controle de l'orientation des nano-domaines d'un copolymere a blocs

Publications (1)

Publication Number Publication Date
SG11202000393VA true SG11202000393VA (en) 2020-02-27

Family

ID=60382317

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202000393VA SG11202000393VA (en) 2017-07-21 2018-07-20 Method for controlling the orientation of nanodomains of a block copolymer

Country Status (9)

Country Link
US (1) US20200150535A1 (fr)
EP (1) EP3655820A1 (fr)
JP (1) JP2020527860A (fr)
KR (1) KR20200020846A (fr)
CN (1) CN110945426A (fr)
FR (1) FR3069339B1 (fr)
SG (1) SG11202000393VA (fr)
TW (1) TWI686416B (fr)
WO (1) WO2019016488A1 (fr)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104303103B (zh) * 2012-02-10 2019-04-26 得克萨斯大学体系董事会 用于薄膜嵌段共聚物的取向控制的酸酐共聚物的面涂层
FR2990885B1 (fr) * 2012-05-23 2014-09-19 Arkema France Procede de preparation de surfaces
US20140065379A1 (en) * 2012-08-31 2014-03-06 Wisconsin Alumni Research Foundation Topcoat surfaces for directing the assembly of block copolymer films on chemically patterned surfaces
JP6027912B2 (ja) * 2013-02-22 2016-11-16 東京応化工業株式会社 相分離構造を含む構造体の製造方法、及びパターン形成方法、並びにトップコート材料
JP2014164043A (ja) * 2013-02-22 2014-09-08 Tokyo Ohka Kogyo Co Ltd パターン形成方法、及び、相分離構造を含む構造体の製造方法
US9802400B2 (en) * 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9054043B2 (en) * 2013-10-30 2015-06-09 HGST Netherlands B.V. Method for directed self-assembly (DSA) of block copolymers
FR3025937B1 (fr) * 2014-09-16 2017-11-24 Commissariat Energie Atomique Procede de grapho-epitaxie pour realiser des motifs a la surface d'un substrat
KR101932799B1 (ko) * 2015-02-17 2018-12-26 주식회사 엘지화학 블록 공중합체 자기 조립 패턴의 습식 식각 방법
FR3037070B1 (fr) * 2015-06-02 2019-05-31 Arkema France Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose
FR3037071B1 (fr) * 2015-06-02 2019-06-21 Arkema France Procede de reduction de la defectivite d'un film de copolymere a blocs
JP6039028B1 (ja) * 2015-09-11 2016-12-07 株式会社東芝 自己組織化材料及びパターン形成方法
FR3045645B1 (fr) * 2015-12-18 2019-07-05 Arkema France Procede de reduction des defauts dans un film ordonne de copolymeres a blocs

Also Published As

Publication number Publication date
US20200150535A1 (en) 2020-05-14
JP2020527860A (ja) 2020-09-10
FR3069339B1 (fr) 2021-05-14
EP3655820A1 (fr) 2020-05-27
WO2019016488A1 (fr) 2019-01-24
KR20200020846A (ko) 2020-02-26
CN110945426A (zh) 2020-03-31
FR3069339A1 (fr) 2019-01-25
TWI686416B (zh) 2020-03-01
TW201920321A (zh) 2019-06-01

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