SG11202000393VA - Method for controlling the orientation of nanodomains of a block copolymer - Google Patents

Method for controlling the orientation of nanodomains of a block copolymer

Info

Publication number
SG11202000393VA
SG11202000393VA SG11202000393VA SG11202000393VA SG11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA SG 11202000393V A SG11202000393V A SG 11202000393VA
Authority
SG
Singapore
Prior art keywords
nanodomains
orientation
controlling
block copolymer
copolymer
Prior art date
Application number
SG11202000393VA
Inventor
Xavier Chevalier
Original Assignee
Arkema France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France filed Critical Arkema France
Publication of SG11202000393VA publication Critical patent/SG11202000393VA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/34—Applying different liquids or other fluent materials simultaneously
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
SG11202000393VA 2017-07-21 2018-07-20 Method for controlling the orientation of nanodomains of a block copolymer SG11202000393VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1756928A FR3069339B1 (en) 2017-07-21 2017-07-21 METHOD OF CHECKING THE ORIENTATION OF THE NANO-DOMAINS OF A BLOCK COPOLYMER
PCT/FR2018/051857 WO2019016488A1 (en) 2017-07-21 2018-07-20 Method for controlling the orientation of nanodomains of a block copolymer

Publications (1)

Publication Number Publication Date
SG11202000393VA true SG11202000393VA (en) 2020-02-27

Family

ID=60382317

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11202000393VA SG11202000393VA (en) 2017-07-21 2018-07-20 Method for controlling the orientation of nanodomains of a block copolymer

Country Status (9)

Country Link
US (1) US20200150535A1 (en)
EP (1) EP3655820A1 (en)
JP (1) JP2020527860A (en)
KR (1) KR20200020846A (en)
CN (1) CN110945426A (en)
FR (1) FR3069339B1 (en)
SG (1) SG11202000393VA (en)
TW (1) TWI686416B (en)
WO (1) WO2019016488A1 (en)

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201404414SA (en) * 2012-02-10 2014-08-28 Univ Texas Anhydride copolymer top coats for orientation control of thin film block copolymers
FR2990885B1 (en) * 2012-05-23 2014-09-19 Arkema France PROCESS FOR PREPARING SURFACES
US20140065379A1 (en) * 2012-08-31 2014-03-06 Wisconsin Alumni Research Foundation Topcoat surfaces for directing the assembly of block copolymer films on chemically patterned surfaces
JP6027912B2 (en) * 2013-02-22 2016-11-16 東京応化工業株式会社 Method of manufacturing structure including phase separation structure, pattern forming method, and topcoat material
JP2014164043A (en) * 2013-02-22 2014-09-08 Tokyo Ohka Kogyo Co Ltd Pattern forming method and production method of structure including phase separation structure
US9802400B2 (en) * 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9054043B2 (en) * 2013-10-30 2015-06-09 HGST Netherlands B.V. Method for directed self-assembly (DSA) of block copolymers
FR3025937B1 (en) * 2014-09-16 2017-11-24 Commissariat Energie Atomique GRAPHO-EPITAXY METHOD FOR REALIZING PATTERNS ON THE SURFACE OF A SUBSTRATE
KR101932799B1 (en) * 2015-02-17 2018-12-26 주식회사 엘지화학 Wet etching process for self-assembled pattern of block copolymer
FR3037071B1 (en) * 2015-06-02 2019-06-21 Arkema France METHOD FOR REDUCING THE DEFECTIVITY OF A BLOCK COPOLYMER FILM
FR3037070B1 (en) * 2015-06-02 2019-05-31 Arkema France METHOD FOR CONTROLLING SURFACE ENERGY AT THE INTERFACE BETWEEN A BLOCK COPOLYMER AND ANOTHER COMPOUND
JP6039028B1 (en) * 2015-09-11 2016-12-07 株式会社東芝 Self-organizing material and pattern forming method
FR3045645B1 (en) * 2015-12-18 2019-07-05 Arkema France METHOD OF REDUCING DEFECTS IN ORDINATED BLOCK COPOLYMER FILM

Also Published As

Publication number Publication date
JP2020527860A (en) 2020-09-10
CN110945426A (en) 2020-03-31
TW201920321A (en) 2019-06-01
TWI686416B (en) 2020-03-01
WO2019016488A1 (en) 2019-01-24
FR3069339A1 (en) 2019-01-25
EP3655820A1 (en) 2020-05-27
KR20200020846A (en) 2020-02-26
FR3069339B1 (en) 2021-05-14
US20200150535A1 (en) 2020-05-14

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