FR3037070B1 - Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose - Google Patents

Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose Download PDF

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Publication number
FR3037070B1
FR3037070B1 FR1554982A FR1554982A FR3037070B1 FR 3037070 B1 FR3037070 B1 FR 3037070B1 FR 1554982 A FR1554982 A FR 1554982A FR 1554982 A FR1554982 A FR 1554982A FR 3037070 B1 FR3037070 B1 FR 3037070B1
Authority
FR
France
Prior art keywords
block copolymer
interface
surface energy
another compound
controlling surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR1554982A
Other languages
English (en)
Other versions
FR3037070A1 (fr
Inventor
Xavier Chevalier
Celia Nicolet
Christophe Navarro
Georges Hadziioannou
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Centre National de la Recherche Scientifique CNRS
Arkema France SA
Universite des Sciences et Tech (Bordeaux 1)
Universite de Bordeaux
Institut Polytechnique de Bordeaux
Original Assignee
Centre National de la Recherche Scientifique CNRS
Arkema France SA
Universite des Sciences et Tech (Bordeaux 1)
Universite de Bordeaux
Institut Polytechnique de Bordeaux
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to FR1554982A priority Critical patent/FR3037070B1/fr
Application filed by Centre National de la Recherche Scientifique CNRS, Arkema France SA, Universite des Sciences et Tech (Bordeaux 1), Universite de Bordeaux, Institut Polytechnique de Bordeaux filed Critical Centre National de la Recherche Scientifique CNRS
Priority to CN201680039637.9A priority patent/CN107735727A/zh
Priority to US15/579,063 priority patent/US20180173094A1/en
Priority to SG11201709937SA priority patent/SG11201709937SA/en
Priority to KR1020177035413A priority patent/KR20180005223A/ko
Priority to JP2017562680A priority patent/JP2018524154A/ja
Priority to EP16730881.6A priority patent/EP3304198A1/fr
Priority to PCT/FR2016/051252 priority patent/WO2016193582A1/fr
Priority to TW105116664A priority patent/TW201715296A/zh
Publication of FR3037070A1 publication Critical patent/FR3037070A1/fr
Application granted granted Critical
Publication of FR3037070B1 publication Critical patent/FR3037070B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Graft Or Block Polymers (AREA)

Abstract

L'invention concerne un procédé de contrôle de l'énergie de surface à l'interface supérieure d'un copolymère à blocs (BPC1), dont l'interface inférieure est en contact avec une surface préalablement neutralisée d'un substrat, pour permettre l'obtention d'une orientation des nano-domaines dudit copolymère à blocs (BPC1) perpendiculairement aux deux interfaces inférieure et supérieure, ledit procédé consistant couvrir la surface supérieure dudit copolymère à blocs (BPC1) par une couche supérieure (TC) de neutralisation de surface, et étant caractérisé en ce que ladite couche supérieure (TC) de neutralisation de surface est constituée par un deuxième copolymère à blocs (BPC2).
FR1554982A 2015-06-02 2015-06-02 Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose Expired - Fee Related FR3037070B1 (fr)

Priority Applications (9)

Application Number Priority Date Filing Date Title
FR1554982A FR3037070B1 (fr) 2015-06-02 2015-06-02 Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose
US15/579,063 US20180173094A1 (en) 2015-06-02 2016-05-26 Process for controlling the surface energy at the interface between a block copolymer and another compound
SG11201709937SA SG11201709937SA (en) 2015-06-02 2016-05-26 Method for controlling the surface energy at the interface between a block copolymer and another compound
KR1020177035413A KR20180005223A (ko) 2015-06-02 2016-05-26 블록 공중합체 및 또 다른 화합물 사이의 계면에서의 표면 에너지 제어 방법
CN201680039637.9A CN107735727A (zh) 2015-06-02 2016-05-26 用于控制嵌段共聚物和另外化合物之间的界面处的表面能的方法
JP2017562680A JP2018524154A (ja) 2015-06-02 2016-05-26 ブロックコポリマーと別の化合物との間の界面の表面エネルギーを制御するための方法
EP16730881.6A EP3304198A1 (fr) 2015-06-02 2016-05-26 Procédé de contrôle de l'énergie de surface a l'interface entre un copolymere a blocs et un autre composé
PCT/FR2016/051252 WO2016193582A1 (fr) 2015-06-02 2016-05-26 Procédé de contrôle de l'énergie de surface a l'interface entre un copolymere a blocs et un autre composé
TW105116664A TW201715296A (zh) 2015-06-02 2016-05-27 控制嵌段共聚物與另一化合物之間的界面之表面能的方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1554982 2015-06-02
FR1554982A FR3037070B1 (fr) 2015-06-02 2015-06-02 Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose

Publications (2)

Publication Number Publication Date
FR3037070A1 FR3037070A1 (fr) 2016-12-09
FR3037070B1 true FR3037070B1 (fr) 2019-05-31

Family

ID=53879659

Family Applications (1)

Application Number Title Priority Date Filing Date
FR1554982A Expired - Fee Related FR3037070B1 (fr) 2015-06-02 2015-06-02 Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose

Country Status (9)

Country Link
US (1) US20180173094A1 (fr)
EP (1) EP3304198A1 (fr)
JP (1) JP2018524154A (fr)
KR (1) KR20180005223A (fr)
CN (1) CN107735727A (fr)
FR (1) FR3037070B1 (fr)
SG (1) SG11201709937SA (fr)
TW (1) TW201715296A (fr)
WO (1) WO2016193582A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3069339B1 (fr) * 2017-07-21 2021-05-14 Arkema France Procede de controle de l'orientation des nano-domaines d'un copolymere a blocs
FR3074180B1 (fr) 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique
FR3074179B1 (fr) 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique
FR3096281A1 (fr) 2019-05-20 2020-11-27 Université De Bordeaux procédé de préparation d’un film de copolymère à blocs destiné à la création d’un masque de nanolithographie

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101114955B1 (ko) * 2009-10-28 2012-03-06 한국과학기술연구원 폴리(3-헥실티오펜) 기반 블록공중합체의 자기조립 구조 제어방법
US9157008B2 (en) * 2012-02-10 2015-10-13 Board Of Regents, The University Of Texas System Anhydride copolymer top coats for orientation control of thin film block copolymers
US20140065379A1 (en) * 2012-08-31 2014-03-06 Wisconsin Alumni Research Foundation Topcoat surfaces for directing the assembly of block copolymer films on chemically patterned surfaces
JP5758363B2 (ja) * 2012-09-07 2015-08-05 株式会社東芝 パターン形成方法
JP5752655B2 (ja) * 2012-09-10 2015-07-22 株式会社東芝 パターン形成方法
US8822619B1 (en) * 2013-02-08 2014-09-02 Rohm And Haas Electronic Materials Llc Directed self assembly copolymer composition and related methods
US9802400B2 (en) * 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers
US9382444B2 (en) * 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same

Also Published As

Publication number Publication date
JP2018524154A (ja) 2018-08-30
KR20180005223A (ko) 2018-01-15
FR3037070A1 (fr) 2016-12-09
US20180173094A1 (en) 2018-06-21
WO2016193582A1 (fr) 2016-12-08
SG11201709937SA (en) 2017-12-28
EP3304198A1 (fr) 2018-04-11
TW201715296A (zh) 2017-05-01
CN107735727A (zh) 2018-02-23

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