SG11201709937SA - Method for controlling the surface energy at the interface between a block copolymer and another compound - Google Patents

Method for controlling the surface energy at the interface between a block copolymer and another compound

Info

Publication number
SG11201709937SA
SG11201709937SA SG11201709937SA SG11201709937SA SG11201709937SA SG 11201709937S A SG11201709937S A SG 11201709937SA SG 11201709937S A SG11201709937S A SG 11201709937SA SG 11201709937S A SG11201709937S A SG 11201709937SA SG 11201709937S A SG11201709937S A SG 11201709937SA
Authority
SG
Singapore
Prior art keywords
interface
controlling
block copolymer
surface energy
another compound
Prior art date
Application number
SG11201709937SA
Other languages
English (en)
Inventor
Xavier Chevalier
Celia Nicolet
Christophe Navarro
Georges Hadziioannou
Original Assignee
Arkema France
Centre Nat Rech Scient
Inst Polytechnique Bordeaux
Univ Bordeaux
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Arkema France, Centre Nat Rech Scient, Inst Polytechnique Bordeaux, Univ Bordeaux filed Critical Arkema France
Publication of SG11201709937SA publication Critical patent/SG11201709937SA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/168—Finishing the coated layer, e.g. drying, baking, soaking
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Graft Or Block Polymers (AREA)
SG11201709937SA 2015-06-02 2016-05-26 Method for controlling the surface energy at the interface between a block copolymer and another compound SG11201709937SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR1554982A FR3037070B1 (fr) 2015-06-02 2015-06-02 Procede de controle de l'energie de surface a l'interface entre un copolymere a blocs et un autre compose
PCT/FR2016/051252 WO2016193582A1 (fr) 2015-06-02 2016-05-26 Procédé de contrôle de l'énergie de surface a l'interface entre un copolymere a blocs et un autre composé

Publications (1)

Publication Number Publication Date
SG11201709937SA true SG11201709937SA (en) 2017-12-28

Family

ID=53879659

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201709937SA SG11201709937SA (en) 2015-06-02 2016-05-26 Method for controlling the surface energy at the interface between a block copolymer and another compound

Country Status (9)

Country Link
US (1) US20180173094A1 (fr)
EP (1) EP3304198A1 (fr)
JP (1) JP2018524154A (fr)
KR (1) KR20180005223A (fr)
CN (1) CN107735727A (fr)
FR (1) FR3037070B1 (fr)
SG (1) SG11201709937SA (fr)
TW (1) TW201715296A (fr)
WO (1) WO2016193582A1 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3069339B1 (fr) * 2017-07-21 2021-05-14 Arkema France Procede de controle de l'orientation des nano-domaines d'un copolymere a blocs
FR3074179B1 (fr) 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique
FR3074180B1 (fr) * 2017-11-24 2021-01-01 Arkema France Procede de controle de la planeite d'un empilement polymerique
FR3096281A1 (fr) 2019-05-20 2020-11-27 Université De Bordeaux procédé de préparation d’un film de copolymère à blocs destiné à la création d’un masque de nanolithographie

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101114955B1 (ko) * 2009-10-28 2012-03-06 한국과학기술연구원 폴리(3-헥실티오펜) 기반 블록공중합체의 자기조립 구조 제어방법
US9157008B2 (en) * 2012-02-10 2015-10-13 Board Of Regents, The University Of Texas System Anhydride copolymer top coats for orientation control of thin film block copolymers
US20140065379A1 (en) * 2012-08-31 2014-03-06 Wisconsin Alumni Research Foundation Topcoat surfaces for directing the assembly of block copolymer films on chemically patterned surfaces
JP5758363B2 (ja) * 2012-09-07 2015-08-05 株式会社東芝 パターン形成方法
JP5752655B2 (ja) * 2012-09-10 2015-07-22 株式会社東芝 パターン形成方法
US8822619B1 (en) * 2013-02-08 2014-09-02 Rohm And Haas Electronic Materials Llc Directed self assembly copolymer composition and related methods
US9382444B2 (en) * 2013-06-24 2016-07-05 Dow Global Technologies Llc Neutral layer polymers, methods of manufacture thereof and articles comprising the same
US9802400B2 (en) * 2013-06-24 2017-10-31 Dow Global Technologies Llc Orientation control layer formed on a free top surface of a first block copolymer from a mixture of first and second block copolymers

Also Published As

Publication number Publication date
WO2016193582A1 (fr) 2016-12-08
CN107735727A (zh) 2018-02-23
US20180173094A1 (en) 2018-06-21
EP3304198A1 (fr) 2018-04-11
JP2018524154A (ja) 2018-08-30
FR3037070B1 (fr) 2019-05-31
TW201715296A (zh) 2017-05-01
KR20180005223A (ko) 2018-01-15
FR3037070A1 (fr) 2016-12-09

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