SG11201806311RA - Leveler compositions for use in copper deposition in manufacture of microelectronics - Google Patents
Leveler compositions for use in copper deposition in manufacture of microelectronicsInfo
- Publication number
- SG11201806311RA SG11201806311RA SG11201806311RA SG11201806311RA SG11201806311RA SG 11201806311R A SG11201806311R A SG 11201806311RA SG 11201806311R A SG11201806311R A SG 11201806311RA SG 11201806311R A SG11201806311R A SG 11201806311RA SG 11201806311R A SG11201806311R A SG 11201806311RA
- Authority
- SG
- Singapore
- Prior art keywords
- international
- waterbury
- street
- macdermid
- aqueous electrolytic
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title abstract 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 title abstract 4
- 229910052802 copper Inorganic materials 0.000 title abstract 4
- 239000010949 copper Substances 0.000 title abstract 4
- 230000008021 deposition Effects 0.000 title abstract 4
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 238000004377 microelectronic Methods 0.000 title abstract 2
- 238000000151 deposition Methods 0.000 abstract 3
- 239000003795 chemical substances by application Substances 0.000 abstract 2
- 230000000875 corresponding effect Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 229910001431 copper ion Inorganic materials 0.000 abstract 1
- 238000004070 electrodeposition Methods 0.000 abstract 1
- 230000002101 lytic effect Effects 0.000 abstract 1
- 230000008520 organization Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/22—Cyclic ethers having at least one atom other than carbon and hydrogen outside the ring
- C08G65/24—Epihalohydrins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/32—Polymers modified by chemical after-treatment
- C08G65/329—Polymers modified by chemical after-treatment with organic compounds
- C08G65/333—Polymers modified by chemical after-treatment with organic compounds containing nitrogen
- C08G65/33396—Polymers modified by chemical after-treatment with organic compounds containing nitrogen having oxygen in addition to nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L71/00—Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
- C08L71/02—Polyalkylene oxides
- C08L71/03—Polyepihalohydrins
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
- C25D7/123—Semiconductors first coated with a seed layer or a conductive layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
- H05K3/424—Plated through-holes or plated via connections characterised by electroplating method by direct electroplating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/28—Manufacture of electrodes on semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/268
- H01L21/283—Deposition of conductive or insulating materials for electrodes conducting electric current
- H01L21/288—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition
- H01L21/2885—Deposition of conductive or insulating materials for electrodes conducting electric current from a liquid, e.g. electrolytic deposition using an external electrical current, i.e. electro-deposition
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/486—Via connections through the substrate with or without pins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76898—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics formed through a semiconductor substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0723—Electroplating, e.g. finish plating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Electroplating Methods And Accessories (AREA)
- Ceramic Engineering (AREA)
- Electrolytic Production Of Metals (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201662294643P | 2016-02-12 | 2016-02-12 | |
PCT/US2017/014651 WO2017139087A1 (en) | 2016-02-12 | 2017-01-24 | Leveler compositions for use in copper deposition in manufacture of microelectronics |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201806311RA true SG11201806311RA (en) | 2018-08-30 |
Family
ID=59562390
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201806311RA SG11201806311RA (en) | 2016-02-12 | 2017-01-24 | Leveler compositions for use in copper deposition in manufacture of microelectronics |
SG10202111743WA SG10202111743WA (en) | 2016-02-12 | 2017-01-24 | Leveler compositions for use in copper deposition in manufacture of microelectronics |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202111743WA SG10202111743WA (en) | 2016-02-12 | 2017-01-24 | Leveler compositions for use in copper deposition in manufacture of microelectronics |
Country Status (9)
Country | Link |
---|---|
US (3) | US10519557B2 (zh) |
EP (1) | EP3414277B1 (zh) |
JP (1) | JP6726758B2 (zh) |
KR (1) | KR102175377B1 (zh) |
CN (1) | CN108779240B (zh) |
MY (1) | MY193571A (zh) |
SG (2) | SG11201806311RA (zh) |
TW (1) | TWI643981B (zh) |
WO (1) | WO2017139087A1 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7123942B2 (ja) * | 2016-09-22 | 2022-08-23 | マクダーミッド エンソン インコーポレイテッド | 集積回路のウェハレベルパッケージングにおける銅堆積 |
CN115182004A (zh) * | 2016-12-20 | 2022-10-14 | 巴斯夫欧洲公司 | 包含用于无空隙填充的抑制试剂的用于金属电镀的组合物 |
CN110424030B (zh) * | 2019-08-30 | 2020-06-30 | 广州三孚新材料科技股份有限公司 | 无氰碱性电镀铜液及其制备和在挠性印刷线路板中的应用 |
CN114031769B (zh) * | 2021-11-29 | 2024-03-26 | 广州市慧科高新材料科技有限公司 | 一种季铵盐类整平剂及其制备方法、含其的电镀液和电镀方法 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2483749A (en) * | 1948-02-24 | 1949-10-04 | Gen Mills Inc | Quaternary ammonium salts |
US3428680A (en) * | 1964-01-03 | 1969-02-18 | Procter & Gamble | Polyquaternary ammonium salts of polymerized epichlorohydrin |
US3591520A (en) * | 1968-01-17 | 1971-07-06 | Nalco Chemical Co | Quaternary adducts of polyepihalohydrin and use thereof |
US3824158A (en) * | 1973-01-26 | 1974-07-16 | Hull R & Co Inc | Composition of baths for electrodeposition of bright zinc |
US3864288A (en) * | 1973-10-15 | 1975-02-04 | Goodrich Co B F | Quaternized polyepihalohydrin thickening agent |
US3968065A (en) * | 1974-12-30 | 1976-07-06 | The B. F. Goodrich Company | Vulcanizable polymer blends of a halogen-containing polymer and a carboxyl-containing polymer |
US4007098A (en) * | 1975-09-04 | 1977-02-08 | Columbia Chemical Corporation | Baths and additives for the electrodeposition of bright zinc |
US4038161A (en) * | 1976-03-05 | 1977-07-26 | R. O. Hull & Company, Inc. | Acid copper plating and additive composition therefor |
JPS5930107B2 (ja) * | 1977-01-21 | 1984-07-25 | 日本ゼオン株式会社 | 抗凝血性医療用材料 |
US4336114A (en) * | 1981-03-26 | 1982-06-22 | Hooker Chemicals & Plastics Corp. | Electrodeposition of bright copper |
US4555315A (en) | 1984-05-29 | 1985-11-26 | Omi International Corporation | High speed copper electroplating process and bath therefor |
US6183622B1 (en) * | 1998-07-13 | 2001-02-06 | Enthone-Omi, Inc. | Ductility additives for electrorefining and electrowinning |
MY144574A (en) * | 1998-09-14 | 2011-10-14 | Ibiden Co Ltd | Printed circuit board and method for its production |
US7384533B2 (en) * | 2001-07-24 | 2008-06-10 | 3M Innovative Properties Company | Electrolytic processes with reduced cell voltage and gas formation |
US6676823B1 (en) | 2002-03-18 | 2004-01-13 | Taskem, Inc. | High speed acid copper plating |
WO2004055246A1 (ja) | 2002-12-18 | 2004-07-01 | Nikko Materials Co., Ltd. | 銅電解液およびそれにより製造された電解銅箔 |
US7128822B2 (en) * | 2003-06-04 | 2006-10-31 | Shipley Company, L.L.C. | Leveler compounds |
US20050092611A1 (en) * | 2003-11-03 | 2005-05-05 | Semitool, Inc. | Bath and method for high rate copper deposition |
US20060062753A1 (en) | 2004-09-17 | 2006-03-23 | Ali Naraghi | Polymeric quaternary ammonium salts useful as corrosion inhibitors and biocides |
TWI400365B (zh) | 2004-11-12 | 2013-07-01 | Enthone | 微電子裝置上的銅電沈積 |
JP5497261B2 (ja) * | 2006-12-15 | 2014-05-21 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | インジウム組成物 |
US8268157B2 (en) | 2010-03-15 | 2012-09-18 | Rohm And Haas Electronic Materials Llc | Plating bath and method |
TWI539036B (zh) * | 2010-06-01 | 2016-06-21 | 巴地斯顏料化工廠 | 包含平整劑之金屬電鍍用組合物 |
US8546254B2 (en) * | 2010-08-19 | 2013-10-01 | Taiwan Semiconductor Manufacturing Company, Ltd. | Mechanisms for forming copper pillar bumps using patterned anodes |
EP2465976B1 (en) * | 2010-12-15 | 2013-04-03 | Rohm and Haas Electronic Materials LLC | Method of electroplating uniform copper layer on the edge and walls of though holes of a substrate. |
JP5981455B2 (ja) | 2011-01-26 | 2016-08-31 | エンソン インコーポレイテッド | マイクロ電子工業におけるビアホール充填方法 |
US9145616B2 (en) * | 2012-02-29 | 2015-09-29 | Rohm and Haas Elcetronic Materials LLC | Method of preventing silver tarnishing |
WO2014072885A2 (en) * | 2012-11-09 | 2014-05-15 | Basf Se | Composition for metal electroplating comprising leveling agent |
US10100420B2 (en) * | 2015-12-29 | 2018-10-16 | Hong Kong Applied Science and Technology Research Institute Company Limtied | Plating leveler for electrodeposition of copper pillar |
-
2017
- 2017-01-23 US US15/412,809 patent/US10519557B2/en active Active
- 2017-01-24 CN CN201780010520.2A patent/CN108779240B/zh active Active
- 2017-01-24 SG SG11201806311RA patent/SG11201806311RA/en unknown
- 2017-01-24 KR KR1020187025827A patent/KR102175377B1/ko active IP Right Grant
- 2017-01-24 SG SG10202111743WA patent/SG10202111743WA/en unknown
- 2017-01-24 JP JP2018542253A patent/JP6726758B2/ja active Active
- 2017-01-24 WO PCT/US2017/014651 patent/WO2017139087A1/en active Application Filing
- 2017-01-24 MY MYPI2018001412A patent/MY193571A/en unknown
- 2017-01-24 EP EP17750557.5A patent/EP3414277B1/en active Active
- 2017-01-25 TW TW106102939A patent/TWI643981B/zh active
-
2019
- 2019-11-04 US US16/672,720 patent/US11168406B2/en active Active
-
2021
- 2021-06-15 US US17/347,934 patent/US20210310141A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
TWI643981B (zh) | 2018-12-11 |
WO2017139087A1 (en) | 2017-08-17 |
JP2019510875A (ja) | 2019-04-18 |
EP3414277A1 (en) | 2018-12-19 |
TW201802297A (zh) | 2018-01-16 |
EP3414277A4 (en) | 2020-02-26 |
KR20180114102A (ko) | 2018-10-17 |
US10519557B2 (en) | 2019-12-31 |
JP6726758B2 (ja) | 2020-07-22 |
US20210310141A1 (en) | 2021-10-07 |
SG10202111743WA (en) | 2021-12-30 |
KR102175377B1 (ko) | 2020-11-06 |
MY193571A (en) | 2022-10-19 |
CN108779240A (zh) | 2018-11-09 |
US11168406B2 (en) | 2021-11-09 |
US20200063280A1 (en) | 2020-02-27 |
CN108779240B (zh) | 2021-07-20 |
US20170233883A1 (en) | 2017-08-17 |
EP3414277B1 (en) | 2023-01-25 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SG11201806311RA (en) | Leveler compositions for use in copper deposition in manufacture of microelectronics | |
SG11201807803SA (en) | Semiconductor package and method of forming the same | |
SG11201811465WA (en) | Semiconductor package and method of forming the same | |
SG11201807252QA (en) | Anti-lag-3 antibodies | |
SG11201810179RA (en) | Novel crispr enzymes and systems | |
SG11201906794TA (en) | Systems and methods for issuing and tracking digital tokens within distributed network nodes | |
SG11201806578XA (en) | Self-alignment of metal and via using selective deposition | |
SG11201908194YA (en) | Synchronization signal block designs for wireless communication | |
SG11201900274VA (en) | Event trigger for independent links | |
SG11201809634TA (en) | Object detection from visual search queries | |
SG11201808546YA (en) | Process and apparatus for processing a nitride structure without silica deposition | |
SG11201808969XA (en) | Barrier layer for interconnects in 3d integrated device | |
SG11201908596WA (en) | Mmlv reverse transcriptase variants | |
SG11201807015YA (en) | Method of assembling an electronic subassembly for a personal care product | |
SG11201804997XA (en) | Process for preparing non-cariogenic, sustained energy release juice | |
SG11201408661WA (en) | Microetching agent for copper, replenishment solution thereof, and method for producing wiring board | |
SG11201809499UA (en) | Processes for preparing phosphorodiamidate morpholino oligomers | |
SG11201906017UA (en) | Support for a semiconductor structure | |
SG11201901207TA (en) | Strip process for high aspect ratio structure | |
SG11201909042QA (en) | Trajectory estimation system and method | |
SG11201806393QA (en) | Use of gabaa receptor modulators for treatment of itch | |
SG11201903147YA (en) | Method of making acrylic acid from hydroxypropionic acid | |
SG11201810603RA (en) | ELECTROCHEMICAL CELL HAVING SOLID lONICALLY CONDUCTING POLYMER MATERIAL | |
SG11201811476XA (en) | Electro-depositing metal layers of uniform thickness on semiconducting wafers | |
SG11201810406QA (en) | Production of a photocurable formulation for additive manufacturing |