SG11201800299PA - Workpiece holder and method for slicing workpiece - Google Patents
Workpiece holder and method for slicing workpieceInfo
- Publication number
- SG11201800299PA SG11201800299PA SG11201800299PA SG11201800299PA SG11201800299PA SG 11201800299P A SG11201800299P A SG 11201800299PA SG 11201800299P A SG11201800299P A SG 11201800299PA SG 11201800299P A SG11201800299P A SG 11201800299PA SG 11201800299P A SG11201800299P A SG 11201800299PA
- Authority
- SG
- Singapore
- Prior art keywords
- workpiece
- slicing
- holder
- workpiece holder
- slicing workpiece
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B27/00—Other grinding machines or devices
- B24B27/06—Grinders for cutting-off
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/0058—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
- B28D5/0082—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
- B28D5/0088—Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work the supporting or holding device being angularly adjustable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
- B28D5/04—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
- B28D5/045—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D7/00—Accessories specially adapted for use with machines or devices of the preceding groups
- B28D7/04—Accessories specially adapted for use with machines or devices of the preceding groups for supporting or holding work or conveying or discharging work
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Processing Of Stones Or Stones Resemblance Materials (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2015148107A JP6272801B2 (en) | 2015-07-27 | 2015-07-27 | Work holder and work cutting method |
PCT/JP2016/003287 WO2017017919A1 (en) | 2015-07-27 | 2016-07-12 | Workpiece holder and workpiece cutting method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11201800299PA true SG11201800299PA (en) | 2018-02-27 |
Family
ID=57884150
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11201800299PA SG11201800299PA (en) | 2015-07-27 | 2016-07-12 | Workpiece holder and method for slicing workpiece |
Country Status (8)
Country | Link |
---|---|
US (1) | US10596724B2 (en) |
JP (1) | JP6272801B2 (en) |
KR (1) | KR102545512B1 (en) |
CN (1) | CN107848092B (en) |
DE (1) | DE112016002951T5 (en) |
SG (1) | SG11201800299PA (en) |
TW (1) | TWI684489B (en) |
WO (1) | WO2017017919A1 (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6923067B2 (en) * | 2018-02-27 | 2021-08-18 | 株式会社Sumco | Semiconductor single crystal ingot slicing method |
JP6969579B2 (en) * | 2019-01-15 | 2021-11-24 | 信越半導体株式会社 | Work cutting method and wire saw |
JP7148437B2 (en) | 2019-03-01 | 2022-10-05 | 信越半導体株式会社 | Work cutting method and work cutting device |
CN111761745B (en) * | 2020-06-01 | 2022-08-30 | 徐州鑫晶半导体科技有限公司 | Crystal orientation deviation detection method of wire cutting machine, rod sticking method and storage medium |
CN114551638A (en) * | 2022-01-21 | 2022-05-27 | 无锡松煜科技有限公司 | Quartz boat sheet inserting method and sheet taking method |
CN114714526A (en) * | 2022-04-01 | 2022-07-08 | 宁夏中欣晶圆半导体科技有限公司 | Bonding method for two-dimensionally adjusting crystal orientation of single crystal silicon rod |
CN114905647A (en) * | 2022-05-13 | 2022-08-16 | 西安奕斯伟材料科技有限公司 | Positioning device for positioning crystal bar to be subjected to wire cutting and wire cutting machine |
Family Cites Families (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1119811A (en) * | 1980-01-25 | 1982-03-16 | Cominco Ltd. | Cutting apparatus for semi-conductor materials |
JP2909945B2 (en) * | 1992-10-09 | 1999-06-23 | コマツ電子金属株式会社 | Seed bar cutting method |
CH690845A5 (en) * | 1994-05-19 | 2001-02-15 | Tokyo Seimitsu Co Ltd | A method for positioning a workpiece, and apparatus therefor. |
TW355151B (en) * | 1995-07-07 | 1999-04-01 | Tokyo Seimitsu Co Ltd | A method for cutting single chip material by the steel saw |
CH692331A5 (en) * | 1996-06-04 | 2002-05-15 | Tokyo Seimitsu Co Ltd | Wire saw and cutting method using the same. |
WO1998000273A1 (en) * | 1996-06-28 | 1998-01-08 | Crystal Systems, Inc. | Method and apparatus to produce a radial cut profile |
JPH10321564A (en) * | 1997-05-20 | 1998-12-04 | Tokyo Seimitsu Co Ltd | Wafer recovery device |
JP3242050B2 (en) * | 1997-11-17 | 2001-12-25 | 株式会社日平トヤマ | Workpiece crystal orientation adjustment method |
DE19825051A1 (en) | 1998-06-04 | 1999-12-09 | Wacker Siltronic Halbleitermat | Method and device for producing a cylindrical single crystal and method for separating semiconductor wafers |
JP2000153517A (en) * | 1998-11-20 | 2000-06-06 | Tokyo Seimitsu Co Ltd | Wire saw |
JP2001050912A (en) * | 1999-08-11 | 2001-02-23 | Rigaku Corp | Support apparatus for single-crystal ingot and apparatus, and method for measurement of single-crystal ingot |
CH697024A5 (en) * | 2000-09-28 | 2008-03-31 | Hct Shaping Systems Sa | Wire sawing device. |
JP2002337137A (en) * | 2001-05-16 | 2002-11-27 | Nippei Toyama Corp | Work mounting method, wire saw and support plate |
DE10128630A1 (en) * | 2001-06-13 | 2003-01-02 | Freiberger Compound Mat Gmbh | Device and method for determining the orientation of a crystallographic plane relative to a crystal surface and device and method for separating a single crystal in a separating machine |
JP2004262180A (en) * | 2003-03-04 | 2004-09-24 | Sumitomo Electric Ind Ltd | Cutting method using slicer and equipment therefor |
CH696431A5 (en) * | 2003-04-01 | 2007-06-15 | Hct Shaping Systems Sa | Process and wire sawing device. |
DE102004011991B4 (en) * | 2004-03-11 | 2008-04-17 | Siltronic Ag | Wire saw for cutting off slices from a workpiece and method for cutting slices |
JP5590001B2 (en) * | 2011-10-04 | 2014-09-17 | 信越半導体株式会社 | Work cutting method and wire saw |
KR101449572B1 (en) * | 2013-03-25 | 2014-10-13 | 한국생산기술연구원 | Wire Saw with Lift-Up swing mechanism |
JP6132621B2 (en) | 2013-03-29 | 2017-05-24 | Sumco Techxiv株式会社 | Method for slicing semiconductor single crystal ingot |
JP6448181B2 (en) * | 2013-08-30 | 2019-01-09 | 株式会社Sumco | Method and apparatus for bonding ingot and work holder |
CN203510499U (en) * | 2013-09-30 | 2014-04-02 | 洛阳鸿泰半导体有限公司 | Device for adjusting crystal orientation deviation degree of silicon rod |
CN204196015U (en) * | 2014-06-06 | 2015-03-11 | 云南蓝晶科技股份有限公司 | Crystal bar axis positioning device |
-
2015
- 2015-07-27 JP JP2015148107A patent/JP6272801B2/en active Active
-
2016
- 2016-07-12 CN CN201680040269.XA patent/CN107848092B/en active Active
- 2016-07-12 DE DE112016002951.9T patent/DE112016002951T5/en active Pending
- 2016-07-12 SG SG11201800299PA patent/SG11201800299PA/en unknown
- 2016-07-12 KR KR1020187002347A patent/KR102545512B1/en active IP Right Grant
- 2016-07-12 US US15/746,941 patent/US10596724B2/en active Active
- 2016-07-12 WO PCT/JP2016/003287 patent/WO2017017919A1/en active Application Filing
- 2016-07-14 TW TW105122297A patent/TWI684489B/en active
Also Published As
Publication number | Publication date |
---|---|
CN107848092A (en) | 2018-03-27 |
WO2017017919A1 (en) | 2017-02-02 |
JP6272801B2 (en) | 2018-01-31 |
TWI684489B (en) | 2020-02-11 |
KR102545512B1 (en) | 2023-06-20 |
US10596724B2 (en) | 2020-03-24 |
JP2017024145A (en) | 2017-02-02 |
KR20180036702A (en) | 2018-04-09 |
DE112016002951T5 (en) | 2018-03-15 |
US20180215075A1 (en) | 2018-08-02 |
TW201703907A (en) | 2017-02-01 |
CN107848092B (en) | 2020-04-21 |
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