SG11201604448SA - Method for slicing workpiece and workpiece holder - Google Patents

Method for slicing workpiece and workpiece holder

Info

Publication number
SG11201604448SA
SG11201604448SA SG11201604448SA SG11201604448SA SG11201604448SA SG 11201604448S A SG11201604448S A SG 11201604448SA SG 11201604448S A SG11201604448S A SG 11201604448SA SG 11201604448S A SG11201604448S A SG 11201604448SA SG 11201604448S A SG11201604448S A SG 11201604448SA
Authority
SG
Singapore
Prior art keywords
workpiece
slicing
holder
workpiece holder
slicing workpiece
Prior art date
Application number
SG11201604448SA
Inventor
Atsuo Uchiyama
Hisakazu Takano
Masahito Saitoh
Hirotoshi Kouzu
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of SG11201604448SA publication Critical patent/SG11201604448SA/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B27/00Other grinding machines or devices
    • B24B27/06Grinders for cutting-off
    • B24B27/0633Grinders for cutting-off using a cutting wire
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/0058Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material
    • B28D5/0082Accessories specially adapted for use with machines for fine working of gems, jewels, crystals, e.g. of semiconductor material for supporting, holding, feeding, conveying or discharging work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B28WORKING CEMENT, CLAY, OR STONE
    • B28DWORKING STONE OR STONE-LIKE MATERIALS
    • B28D5/00Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
    • B28D5/04Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools
    • B28D5/045Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor by tools other than rotary type, e.g. reciprocating tools by cutting with wires or closed-loop blades
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
SG11201604448SA 2013-12-24 2014-11-27 Method for slicing workpiece and workpiece holder SG11201604448SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2013265726A JP6000235B2 (en) 2013-12-24 2013-12-24 Work cutting method and work holding jig
PCT/JP2014/005931 WO2015097985A1 (en) 2013-12-24 2014-11-27 Workpiece cutting method and workpiece holding tool

Publications (1)

Publication Number Publication Date
SG11201604448SA true SG11201604448SA (en) 2016-07-28

Family

ID=53477897

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201604448SA SG11201604448SA (en) 2013-12-24 2014-11-27 Method for slicing workpiece and workpiece holder

Country Status (8)

Country Link
US (1) US10350788B2 (en)
JP (1) JP6000235B2 (en)
KR (1) KR102253809B1 (en)
CN (1) CN105814669B (en)
DE (1) DE112014005470T5 (en)
SG (1) SG11201604448SA (en)
TW (1) TWI580500B (en)
WO (1) WO2015097985A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6157421B2 (en) * 2014-07-03 2017-07-05 信越半導体株式会社 Work cutting method and work holding jig
CN106112092A (en) * 2016-08-16 2016-11-16 无锡尊宝电动车有限公司 A kind of cutting machine for the processing of buffing machine shell
JP6988358B2 (en) * 2017-10-16 2022-01-05 Tdk株式会社 Work holding jig, electronic component processing device and manufacturing method of electronic components
JP6971780B2 (en) * 2017-10-27 2021-11-24 上村工業株式会社 Work holding jig and load / unload device
KR102037745B1 (en) * 2017-12-14 2019-10-29 에스케이실트론 주식회사 Ingot clamping device and wire sawing apparatus for cutting Ingot having the same
CN110385746B (en) * 2019-08-29 2021-02-02 常州金纬化工成套设备有限公司 Sectional type cutting equipment of macromolecular material polyethylene board production usefulness
CN115041995B (en) * 2022-06-27 2023-11-17 青岛高测科技股份有限公司 Feeding device and cutting equipment

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0310760A (en) * 1989-06-09 1991-01-18 Nippon Spindle Mfg Co Ltd Wire saw for cutting crystalline brittle material
JP3144269B2 (en) * 1995-07-07 2001-03-12 株式会社東京精密 Cutting method of single crystal material
TW355151B (en) 1995-07-07 1999-04-01 Tokyo Seimitsu Co Ltd A method for cutting single chip material by the steel saw
CH692331A5 (en) 1996-06-04 2002-05-15 Tokyo Seimitsu Co Ltd Wire saw and cutting method using the same.
JPH09325124A (en) * 1996-06-04 1997-12-16 Tokyo Seimitsu Co Ltd Method and device for crystallographic axis orientation adjustment of ingot using x ray
JP3173564B2 (en) * 1996-06-04 2001-06-04 株式会社東京精密 Wire saw
JP2000171417A (en) * 1998-12-04 2000-06-23 Toshiba Ceramics Co Ltd Auxiliary apparatus for orientation measurement and method for orientation measuring processing
JP2001050912A (en) * 1999-08-11 2001-02-23 Rigaku Corp Support apparatus for single-crystal ingot and apparatus, and method for measurement of single-crystal ingot
AU2000251024A1 (en) * 2000-05-31 2001-12-11 Memc Electronic Materials S.P.A. Wire saw and process for slicing multiple semiconductor ingots
DE10052154A1 (en) 2000-10-20 2002-05-08 Freiberger Compound Mat Gmbh Method and device for separating single crystals, adjusting device and test method for determining an orientation of a single crystal for such a method
JP4951914B2 (en) 2005-09-28 2012-06-13 信越半導体株式会社 (110) Silicon wafer manufacturing method

Also Published As

Publication number Publication date
TWI580500B (en) 2017-05-01
US10350788B2 (en) 2019-07-16
CN105814669A (en) 2016-07-27
JP2015122424A (en) 2015-07-02
TW201540400A (en) 2015-11-01
JP6000235B2 (en) 2016-09-28
US20160303765A1 (en) 2016-10-20
WO2015097985A1 (en) 2015-07-02
KR20160102192A (en) 2016-08-29
CN105814669B (en) 2019-03-22
KR102253809B1 (en) 2021-05-21
DE112014005470T5 (en) 2016-08-11

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