SG11201708585SA - Method for producing pellicle, and method for producing pellicle-attached photomask - Google Patents

Method for producing pellicle, and method for producing pellicle-attached photomask

Info

Publication number
SG11201708585SA
SG11201708585SA SG11201708585SA SG11201708585SA SG11201708585SA SG 11201708585S A SG11201708585S A SG 11201708585SA SG 11201708585S A SG11201708585S A SG 11201708585SA SG 11201708585S A SG11201708585S A SG 11201708585SA SG 11201708585S A SG11201708585S A SG 11201708585SA
Authority
SG
Singapore
Prior art keywords
pellicle
producing
producing pellicle
attached photomask
photomask
Prior art date
Application number
SG11201708585SA
Other languages
English (en)
Inventor
Kazuo Kohmura
Daiki Taneichi
Yosuke Ono
Hisako Ishikawa
Tsuneaki BIYAJIMA
Yasuyuki Sato
Toshiaki Hirota
Original Assignee
Mitsui Chemicals Inc
Tazmo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc, Tazmo Co Ltd filed Critical Mitsui Chemicals Inc
Publication of SG11201708585SA publication Critical patent/SG11201708585SA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50—Working by transmitting the laser beam through or within the workpiece
    • B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
    • G03F1/24—Reflection masks; Preparation thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/0006—Working by laser beam, e.g. welding, cutting or boring taking account of the properties of the material involved
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00—Adhesives in the form of films or foils
    • C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
    • C09J7/38—Pressure-sensitive adhesives [PSA]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/60—Substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/36—Electric or electronic devices
    • B23K2101/40—Semiconductor devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/52—Ceramics
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2103/00—Materials to be soldered, welded or cut
    • B23K2103/50—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26
    • B23K2103/56—Inorganic material, e.g. metals, not provided for in B23K2103/02 – B23K2103/26 semiconducting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/80—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
SG11201708585SA 2015-04-27 2016-04-11 Method for producing pellicle, and method for producing pellicle-attached photomask SG11201708585SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015090780 2015-04-27
PCT/JP2016/061730 WO2016175019A1 (ja) 2015-04-27 2016-04-11 ペリクルの製造方法およびペリクル付フォトマスクの製造方法

Publications (1)

Publication Number Publication Date
SG11201708585SA true SG11201708585SA (en) 2017-11-29

Family

ID=57199078

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201708585SA SG11201708585SA (en) 2015-04-27 2016-04-11 Method for producing pellicle, and method for producing pellicle-attached photomask

Country Status (8)

Country Link
US (1) US10895805B2 (ko)
EP (1) EP3291006A4 (ko)
JP (1) JP6371904B2 (ko)
KR (1) KR102060869B1 (ko)
CN (1) CN107533283B (ko)
SG (1) SG11201708585SA (ko)
TW (1) TWI718143B (ko)
WO (1) WO2016175019A1 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG11201701802SA (en) * 2014-09-19 2017-04-27 Mitsui Chemicals Inc Pellicle, pellicle production method and exposure method using pellicle
KR101915912B1 (ko) * 2014-09-19 2018-11-06 미쯔이가가꾸가부시끼가이샤 펠리클, 그 제조 방법 및 노광 방법
NL2017606A (en) * 2015-10-22 2017-05-10 Asml Netherlands Bv A method of manufacturing a pellicle for a lithographic apparatus, a pellicle for a lithographic apparatus, a lithographic apparatus, a device manufacturing method, an apparatus for processing a pellicle, and a method for processing a pellicle
JP6844443B2 (ja) * 2017-06-23 2021-03-17 信越化学工業株式会社 フォトリソグラフィ用ペリクル膜、ペリクル及びフォトマスク、露光方法並びに半導体デバイス又は液晶ディスプレイの製造方法
EP3809202A4 (en) * 2018-06-12 2022-03-16 Mitsui Chemicals, Inc. FILM SUPPORT FRAME, FILM FILM, METHOD FOR MAKING FILM SUPPORT FRAME, AND ORIGINAL EXPOSURE PLATE AND EXPOSURE DEVICE USING FILM
TWI670562B (zh) * 2018-06-21 2019-09-01 美商微相科技股份有限公司 光罩保護組件結構
KR20200059061A (ko) 2018-11-20 2020-05-28 삼성전자주식회사 극자외선 리소그래피용 펠리클 및 그 제조방법
EP4325290A1 (en) 2021-04-13 2024-02-21 Shin-Etsu Chemical Co., Ltd. Pellicle frame laminate and method for manufacturing pellicle using said laminate
KR20220142571A (ko) * 2021-04-14 2022-10-24 한국전자기술연구원 극자외선 노광용 펠리클

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05109889A (ja) * 1991-04-24 1993-04-30 Nikko Kyodo Co Ltd ウエハの分割方法
US5793836A (en) * 1996-09-06 1998-08-11 International Business Machines Corporation X-ray mask pellicle
US5814381A (en) * 1997-04-04 1998-09-29 Inko Industrial Corporation Pellicle assembly having a vented frame
JP2000292909A (ja) * 1999-04-09 2000-10-20 Shin Etsu Chem Co Ltd ペリクルおよびペリクルの製造方法
US6593035B1 (en) * 2001-01-26 2003-07-15 Advanced Micro Devices, Inc. Pellicle for use in small wavelength lithography and a method for making such a pellicle using polymer films
JP4777761B2 (ja) * 2005-12-02 2011-09-21 株式会社ディスコ ウエーハの分割方法
JP5109889B2 (ja) 2008-09-12 2012-12-26 パナソニック株式会社 空気調和機
JP2011076042A (ja) 2009-10-02 2011-04-14 Shin-Etsu Chemical Co Ltd ペリクル
JP5152870B2 (ja) 2009-12-07 2013-02-27 信越化学工業株式会社 リソグラフィ用ペリクル及びその製造方法
JP5552095B2 (ja) 2011-06-21 2014-07-16 信越化学工業株式会社 Ｅｕｖ用レチクル
JP5517360B2 (ja) 2011-07-05 2014-06-11 信越化学工業株式会社 ペリクル及びその製造方法
JP2013057861A (ja) 2011-09-09 2013-03-28 Shin Etsu Chem Co Ltd リソグラフィ用ペリクルおよびその製造方法
US8586267B2 (en) * 2011-09-12 2013-11-19 Samsung Austin Semiconductor, L.P. Removable transparent membrane for a pellicle
KR101707763B1 (ko) * 2013-05-24 2017-02-16 미쯔이가가꾸가부시끼가이샤 펠리클 및 이것을 포함하는 ｅｕｖ 노광 장치

Also Published As

Publication number Publication date
WO2016175019A1 (ja) 2016-11-03
TW201704852A (zh) 2017-02-01
CN107533283A (zh) 2018-01-02
CN107533283B (zh) 2021-05-28
US20180046071A1 (en) 2018-02-15
US10895805B2 (en) 2021-01-19
KR20170128546A (ko) 2017-11-22
KR102060869B1 (ko) 2019-12-30
EP3291006A4 (en) 2019-01-23
EP3291006A1 (en) 2018-03-07
JPWO2016175019A1 (ja) 2018-02-15
JP6371904B2 (ja) 2018-08-08
TWI718143B (zh) 2021-02-11

Similar Documents

Publication Publication Date Title
SG11201701805QA (en) Pellicle, production method thereof, exposure method
SG11201701802SA (en) Pellicle, pellicle production method and exposure method using pellicle
SG11201708585SA (en) Method for producing pellicle, and method for producing pellicle-attached photomask
SG11201607443XA (en) Resist composition and method for forming resist pattern
PL3480306T3 (pl) Nowa, odporna na wysoką temperaturę fruktozo-6-fosforano-3-epimeraza i sposób wytwarzania allulozy z jej użyciem
SG10201607092VA (en) Defect Inspecting Method, Sorting Method and Producing Method for Photomask Blank
GB201501118D0 (en) Pellicle
SG11201705304PA (en) Pellicle film, pellicle frame, and pellicle and method for producing same
IL272530B (en) Membrane and method for producing a membrane
IL266044B (en) Method for the production of 3-alkylsulfanyl-2-chloro-n-(1-alkyl-h1-tetrazol-5-yl)-4-trifluoromethyl-benzamides
EP3339955A4 (en) EXTRACTION SHEET FRAME, EXTRACTION EMULSION LAYER THEREWITH, METHOD FOR PRODUCING THE EXTRACTION MEMBRANE LAYER FRAME AND METHOD FOR PRODUCING THE EXTRACTION EMULSION LAYER
SG10201912445QA (en) Photomask Blank and Method for Preparing Photomask
SG10201607715RA (en) Photomask Blank, Making Method, and Photomask
SG11201706827WA (en) Method for producing isosorbide ethoxylate dimethacrylate
HK1249098A1 (zh) 用於生產氟美他酚的方法
SG11202001427YA (en) Method for Manufacturing of Pellicle
SG11201810789WA (en) Case and method for producing case
IL246831B (en) A method for the production of 1-indanols and 1-indanamines
GB2556285B (en) Photomask for optical alignment and optical alignment method
SG10201606180YA (en) Photomask Blank And Method For Preparing Photomask
PL3197654T3 (pl) Preformy i sposób wytwarzania preform
SG11201701075UA (en) Method for producing dip-formed article, and dip-formed article
IL255093A0 (en) A method for the production of levoglucosenon
IL250223A0 (en) A method for the preparation of the pyrimidin-1-ol compound, and its intermediates
PL3511315T3 (pl) Sposób wytwarzania n-metylo-para-anizydyny