SG11201707505QA - Novel siloxane polymer compositions and their use - Google Patents

Novel siloxane polymer compositions and their use

Info

Publication number
SG11201707505QA
SG11201707505QA SG11201707505QA SG11201707505QA SG11201707505QA SG 11201707505Q A SG11201707505Q A SG 11201707505QA SG 11201707505Q A SG11201707505Q A SG 11201707505QA SG 11201707505Q A SG11201707505Q A SG 11201707505QA SG 11201707505Q A SG11201707505Q A SG 11201707505QA
Authority
SG
Singapore
Prior art keywords
polymer compositions
siloxane polymer
novel siloxane
novel
compositions
Prior art date
Application number
SG11201707505QA
Other languages
English (en)
Inventor
Ari Kärkkäinen
Milja Hannu-Kuure
Admir Hadzic
Jarkko Leivo
Henna Järvitalo
Rauna-Leena Kuvaja
Graeme Gordon
Matti Pesonen
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Publication of SG11201707505QA publication Critical patent/SG11201707505QA/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages
    • C08G77/52—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages containing aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/14—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
    • C08G77/50—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms by carbon linkages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
SG11201707505QA 2015-03-17 2016-03-17 Novel siloxane polymer compositions and their use SG11201707505QA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US201562134032P 2015-03-17 2015-03-17
FI20155186 2015-03-17
PCT/FI2016/050166 WO2016146896A1 (en) 2015-03-17 2016-03-17 Novel siloxane polymer compositions and their use

Publications (1)

Publication Number Publication Date
SG11201707505QA true SG11201707505QA (en) 2017-10-30

Family

ID=56918410

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201707505QA SG11201707505QA (en) 2015-03-17 2016-03-17 Novel siloxane polymer compositions and their use

Country Status (10)

Country Link
US (2) US20180066159A1 (ja)
EP (1) EP3271433A1 (ja)
JP (1) JP6756729B2 (ja)
KR (2) KR20170128438A (ja)
CN (1) CN107636097B (ja)
AU (1) AU2016232011B2 (ja)
PH (1) PH12017501675A1 (ja)
SG (1) SG11201707505QA (ja)
TW (1) TWI692492B (ja)
WO (1) WO2016146896A1 (ja)

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KR102590498B1 (ko) 2016-02-19 2023-10-19 삼성디스플레이 주식회사 플렉서블 표시장치, 윈도우 부재의 제조방법 및 하드 코팅 조성물
KR102092800B1 (ko) * 2016-10-24 2020-04-23 삼성에스디아이 주식회사 감광성 수지 조성물, 그로부터 형성된 경화막, 및 상기 경화막을 갖는 전자 장치
KR102072209B1 (ko) * 2016-10-31 2020-01-31 삼성에스디아이 주식회사 감광성 수지 조성물, 그로부터 형성된 경화막, 및 상기 경화막을 갖는 전자 장치
KR101968223B1 (ko) * 2016-12-15 2019-04-11 삼성에스디아이 주식회사 감광성 수지 조성물, 그로부터 형성된 경화막, 및 경화막을 갖는 소자
KR102393376B1 (ko) * 2017-04-10 2022-05-03 삼성디스플레이 주식회사 감광성 수지 조성물 및 이를 포함한 패턴 형성용 조성물의 경화물을 포함하는 전자 장치
KR102392261B1 (ko) * 2017-08-24 2022-04-29 코오롱인더스트리 주식회사 코팅용 수지 조성물 및 이의 경화물을 코팅층으로 포함하는 코팅필름
WO2019039881A1 (ko) * 2017-08-24 2019-02-28 코오롱인더스트리 주식회사 코팅용 수지 조성물 및 이의 경화물을 코팅층으로 포함하는 코팅필름
KR102145656B1 (ko) * 2017-11-24 2020-08-18 주식회사 엘지화학 컬러필터 평탄화막용 열경화성 수지 조성물 및 이를 이용한 평탄화막
JP2019099673A (ja) * 2017-12-01 2019-06-24 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ ポリシロキサン、これを含んでなる組成物、およびこれを用いた硬化膜
US10947412B2 (en) 2017-12-19 2021-03-16 Honeywell International Inc. Crack-resistant silicon-based planarizing compositions, methods and films
WO2019124514A1 (ja) * 2017-12-20 2019-06-27 日産化学株式会社 光硬化性シリコン含有被覆膜形成組成物
JP2019120750A (ja) * 2017-12-28 2019-07-22 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ 感光性シロキサン組成物およびこれを用いたパターン形成方法
JP6470860B1 (ja) * 2018-03-15 2019-02-13 マクセルホールディングス株式会社 コーティング組成物、導電性膜及び液晶表示パネル
EP3775075A1 (en) * 2018-04-06 2021-02-17 Optitune Oy Flexible and foldable abrasion resistant photopatternable siloxane hard coat
FI128435B (en) * 2018-05-09 2020-05-15 Canatu Oy Electrically conductive multilayer film
KR101930729B1 (ko) * 2018-07-12 2018-12-19 (주)켐텍인터내셔날 유기 금속을 가지는 실록산 올리고머, 실록산 올리고머의 제조 방법, 실록산 올리고머를 포함하는 하드 코팅 조성물, 하드 코팅 필름 및 디스플레이 장치
KR102316018B1 (ko) * 2018-11-23 2021-10-22 주식회사 엘지화학 광학 적층체
CA3146489A1 (en) * 2019-07-10 2021-01-14 Brightplus Oy Method for forming a biodegradable or recyclable hybrid material composition
JP7227890B2 (ja) * 2019-12-03 2023-02-22 信越化学工業株式会社 感光性樹脂組成物、感光性樹脂皮膜、感光性ドライフィルム、パターン形成方法及び発光素子
US11378886B2 (en) * 2020-09-29 2022-07-05 Taiwan Semiconductor Manufacturing Company, Ltd. Method for removing resist layer, and method of manufacturing semiconductor
EP4098630A1 (en) 2021-05-31 2022-12-07 Optitune Oy Method for coating glass containers
US20240059961A1 (en) * 2022-08-11 2024-02-22 Promega Corporation Biocompatible oxygen-sensitive materials
CN115785527B (zh) * 2022-12-28 2023-09-12 佛山市普力达科技有限公司 一种加速深度固化偶联剂及制备方法及应用的透明rtv

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Also Published As

Publication number Publication date
AU2016232011B2 (en) 2020-07-09
CN107636097A (zh) 2018-01-26
TW201700548A (zh) 2017-01-01
EP3271433A1 (en) 2018-01-24
JP2018509510A (ja) 2018-04-05
PH12017501675A1 (en) 2018-03-12
KR20170128438A (ko) 2017-11-22
US11634610B2 (en) 2023-04-25
WO2016146896A1 (en) 2016-09-22
US20220010172A1 (en) 2022-01-13
AU2016232011A1 (en) 2017-10-05
TWI692492B (zh) 2020-05-01
KR20230131955A (ko) 2023-09-14
US20180066159A1 (en) 2018-03-08
JP6756729B2 (ja) 2020-09-16
CN107636097B (zh) 2024-03-15

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