SG11201703289YA - Optical gas concentration measuring method, and method for monitoring gas concentration by said method - Google Patents
Optical gas concentration measuring method, and method for monitoring gas concentration by said methodInfo
- Publication number
- SG11201703289YA SG11201703289YA SG11201703289YA SG11201703289YA SG11201703289YA SG 11201703289Y A SG11201703289Y A SG 11201703289YA SG 11201703289Y A SG11201703289Y A SG 11201703289YA SG 11201703289Y A SG11201703289Y A SG 11201703289YA SG 11201703289Y A SG11201703289Y A SG 11201703289YA
- Authority
- SG
- Singapore
- Prior art keywords
- gas concentration
- monitoring
- optical
- concentration measuring
- measuring method
- Prior art date
Links
- 238000000034 method Methods 0.000 title 3
- 238000012544 monitoring process Methods 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
- G01N21/3151—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths using two sources of radiation of different wavelengths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
- C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/27—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands using photo-electric detection ; circuits for computing concentration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/0004—Gaseous mixtures, e.g. polluted air
- G01N33/0009—General constructional details of gas analysers, e.g. portable test equipment
- G01N33/0027—General constructional details of gas analysers, e.g. portable test equipment concerning the detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
- G01N2021/3155—Measuring in two spectral ranges, e.g. UV and visible
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
- G01N2021/3159—Special features of multiplexing circuits
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
- G01N2021/3181—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths using LEDs
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/062—LED's
- G01N2201/0627—Use of several LED's for spectral resolution
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/069—Supply of sources
- G01N2201/0696—Pulsed
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/12—Circuits of general importance; Signal processing
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Toxicology (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Medicinal Chemistry (AREA)
- Food Science & Technology (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2014237220 | 2014-11-23 | ||
| PCT/JP2015/082742 WO2016080532A1 (ja) | 2014-11-23 | 2015-11-20 | 光学的ガス濃度測定方法及び該方法によるガス濃度モニター方法 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201703289YA true SG11201703289YA (en) | 2017-06-29 |
Family
ID=56014062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201703289YA SG11201703289YA (en) | 2014-11-23 | 2015-11-20 | Optical gas concentration measuring method, and method for monitoring gas concentration by said method |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US10408742B2 (ja) |
| EP (1) | EP3222995B1 (ja) |
| JP (1) | JPWO2016080532A1 (ja) |
| KR (1) | KR20170103779A (ja) |
| CN (1) | CN107003236B (ja) |
| SG (1) | SG11201703289YA (ja) |
| TW (1) | TW201632864A (ja) |
| WO (1) | WO2016080532A1 (ja) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6344829B2 (ja) * | 2014-08-29 | 2018-06-20 | 国立大学法人東北大学 | 光学的濃度測定方法 |
| JP2018004399A (ja) * | 2016-06-30 | 2018-01-11 | 株式会社堀場製作所 | ガス濃度測定装置 |
| KR102607020B1 (ko) * | 2017-09-19 | 2023-11-29 | 가부시키가이샤 호리바 에스텍 | 농도 제어 장치 및 재료 가스 공급 장치 |
| JP7154850B2 (ja) * | 2017-09-19 | 2022-10-18 | 株式会社堀場エステック | 濃度制御装置及び材料ガス供給装置 |
| US10551356B2 (en) * | 2017-10-23 | 2020-02-04 | Infineon Technologies Ag | Photoacoustic gas sensor and method |
| US10288561B1 (en) * | 2018-03-23 | 2019-05-14 | Shimadzu Co. | Gas analyzer |
| CN110487739A (zh) * | 2018-08-30 | 2019-11-22 | 中山大学 | Mocvd实时在线红外检测系统 |
| KR102514737B1 (ko) * | 2018-09-28 | 2023-03-29 | 가부시키가이샤 후지킨 | 농도 측정 방법 |
| CN112805551A (zh) * | 2018-10-26 | 2021-05-14 | 株式会社富士金 | 浓度测定装置 |
| CN111270209B (zh) * | 2018-12-05 | 2023-12-12 | 东君新能源有限公司 | 一种蒸汽溅射装置及控制系统、控制方法 |
| CN109946231B (zh) * | 2019-03-13 | 2021-04-27 | 上海交通大学 | 具备温度补偿的差动光声测量系统和方法 |
| CN110455751A (zh) * | 2019-08-22 | 2019-11-15 | 复旦大学 | 一种基于卷曲薄膜的氢气痕迹检测方法 |
| EP3786321A3 (de) * | 2019-08-27 | 2021-03-17 | Albert-Ludwigs-Universität Freiburg | Verfahren und vorrichtung zur herstellung einer schicht und damit versehenes substrat |
| KR20220079977A (ko) * | 2020-03-13 | 2022-06-14 | 토쿠시마 대학 | 농도 측정 방법 및 농도 측정 장치 |
| US11709130B2 (en) * | 2020-10-09 | 2023-07-25 | Asahi Kasel Microdevices Corporation | Signal output apparatus and concentration measurement system |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3895233A (en) * | 1972-10-26 | 1975-07-15 | Bailey Meter Co | Gas analyzer |
| JPS533943B2 (ja) | 1973-02-09 | 1978-02-13 | ||
| JPS51127786A (en) * | 1975-04-30 | 1976-11-08 | Kokusai Gijutsu Kaihatsu Kk | Smoke sensor |
| DE2924131A1 (de) | 1979-06-15 | 1980-12-18 | Bodenseewerk Geosystem Gmbh | Signalauswerterschaltung fuer ein messgeraet zur messung der extinktion |
| US4297579A (en) | 1979-06-15 | 1981-10-27 | Bodenseewerk Geosystem Gmbh | Bi-frequency infrared spectrometer |
| US4505583A (en) * | 1981-04-10 | 1985-03-19 | Masaaki Konomi | Spectroscopic analyzer system for examining intravital tissue |
| JPH0315742A (ja) * | 1989-03-23 | 1991-01-24 | Anritsu Corp | ガス検出装置 |
| JPH03181845A (ja) | 1989-12-12 | 1991-08-07 | Seiko Instr Inc | 原子吸光光度計 |
| JPH0830680B2 (ja) | 1990-10-15 | 1996-03-27 | アンリツ株式会社 | ガス検出装置 |
| JP3124376B2 (ja) | 1992-06-17 | 2001-01-15 | 株式会社東芝 | 化合物半導体の気相成長装置 |
| JP2000230900A (ja) * | 1999-02-12 | 2000-08-22 | Omron Corp | 車両内アルコール検出装置 |
| JP3274656B2 (ja) * | 1999-04-14 | 2002-04-15 | 日本酸素株式会社 | ガスの分光分析方法および分光分析装置 |
| JP2006324532A (ja) | 2005-05-20 | 2006-11-30 | Matsushita Electric Ind Co Ltd | 薄膜堆積方法および薄膜堆積装置 |
| US7601950B2 (en) | 2007-09-25 | 2009-10-13 | Baker Hughes Incorporated | System and method for downhole optical analysis |
| CN101315328B (zh) * | 2008-07-17 | 2010-08-25 | 西北工业大学 | 一种气体浓度测量装置 |
| JP5281364B2 (ja) | 2008-10-31 | 2013-09-04 | 株式会社堀場製作所 | 材料ガス濃度制御システム |
| KR101578220B1 (ko) | 2008-10-31 | 2015-12-16 | 가부시키가이샤 호리바 세이샤쿠쇼 | 재료가스 농도 제어 시스템 |
| CN101701906B (zh) * | 2009-11-13 | 2012-01-18 | 江苏大学 | 基于近红外超光谱成像技术的仓储害虫检测方法和装置 |
| JP5615162B2 (ja) | 2010-12-24 | 2014-10-29 | 株式会社堀場エステック | 材料ガス濃度制御システム |
| JP2012211024A (ja) | 2011-03-24 | 2012-11-01 | Sumitomo Metal Mining Co Ltd | 活性炭性能評価装置および方法 |
| US9291554B2 (en) * | 2013-02-05 | 2016-03-22 | Kla-Tencor Corporation | Method of electromagnetic modeling of finite structures and finite illumination for metrology and inspection |
| CN103528972A (zh) * | 2013-10-29 | 2014-01-22 | 江苏雷奥生物科技有限公司 | 酶免或酶标比色分析系统用光电频率转换系统 |
| JP6344829B2 (ja) * | 2014-08-29 | 2018-06-20 | 国立大学法人東北大学 | 光学的濃度測定方法 |
-
2015
- 2015-11-20 US US15/524,815 patent/US10408742B2/en active Active
- 2015-11-20 CN CN201580063098.8A patent/CN107003236B/zh not_active Expired - Fee Related
- 2015-11-20 EP EP15860939.6A patent/EP3222995B1/en active Active
- 2015-11-20 KR KR1020177017288A patent/KR20170103779A/ko unknown
- 2015-11-20 JP JP2016560309A patent/JPWO2016080532A1/ja active Pending
- 2015-11-20 WO PCT/JP2015/082742 patent/WO2016080532A1/ja active Application Filing
- 2015-11-20 SG SG11201703289YA patent/SG11201703289YA/en unknown
- 2015-11-20 TW TW104138514A patent/TW201632864A/zh unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP3222995B1 (en) | 2022-11-16 |
| KR20170103779A (ko) | 2017-09-13 |
| CN107003236B (zh) | 2020-08-11 |
| US10408742B2 (en) | 2019-09-10 |
| US20170315051A1 (en) | 2017-11-02 |
| JPWO2016080532A1 (ja) | 2017-08-31 |
| WO2016080532A1 (ja) | 2016-05-26 |
| EP3222995A1 (en) | 2017-09-27 |
| EP3222995A4 (en) | 2018-06-06 |
| TW201632864A (zh) | 2016-09-16 |
| CN107003236A (zh) | 2017-08-01 |
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