HK1246406A1 - 測量裝置及測量方法、曝光裝置及曝光方法、以及器件製造方法 - Google Patents
測量裝置及測量方法、曝光裝置及曝光方法、以及器件製造方法Info
- Publication number
- HK1246406A1 HK1246406A1 HK18105556.5A HK18105556A HK1246406A1 HK 1246406 A1 HK1246406 A1 HK 1246406A1 HK 18105556 A HK18105556 A HK 18105556A HK 1246406 A1 HK1246406 A1 HK 1246406A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- exposure
- measurement
- production method
- production
- device production
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000005259 measurement Methods 0.000 title 1
- 238000000691 measurement method Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
- G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
- G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
- G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
- G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
- G01D5/36—Forming the light into pulses
- G01D5/38—Forming the light into pulses by diffraction gratings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/14—Measuring arrangements characterised by the use of optical techniques for measuring distance or clearance between spaced objects or spaced apertures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014259759 | 2014-12-24 | ||
PCT/JP2015/085848 WO2016104511A1 (ja) | 2014-12-24 | 2015-12-22 | 計測装置及び計測方法、露光装置及び露光方法、並びにデバイス製造方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1246406A1 true HK1246406A1 (zh) | 2018-09-07 |
Family
ID=56150527
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK18105556.5A HK1246406A1 (zh) | 2014-12-24 | 2018-04-28 | 測量裝置及測量方法、曝光裝置及曝光方法、以及器件製造方法 |
Country Status (8)
Country | Link |
---|---|
US (4) | US10372046B2 (zh) |
EP (2) | EP3926404A1 (zh) |
JP (1) | JP6459082B2 (zh) |
KR (2) | KR102022785B1 (zh) |
CN (2) | CN107407894B (zh) |
HK (1) | HK1246406A1 (zh) |
TW (2) | TWI690781B (zh) |
WO (1) | WO2016104511A1 (zh) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107407894B (zh) * | 2014-12-24 | 2020-01-24 | 株式会社尼康 | 测量装置及测量方法、曝光装置及曝光方法、以及器件制造方法 |
WO2018210505A1 (en) | 2017-05-15 | 2018-11-22 | Asml Netherlands B.V. | Metrology sensor, lithographic apparatus and method for manufacturing devices |
TWI796408B (zh) * | 2017-12-28 | 2023-03-21 | 美商魯道夫科技股份有限公司 | 順應機台以及形成其之基部的方法 |
US11275146B2 (en) | 2018-11-08 | 2022-03-15 | Infineon Technologies Ag | LIDAR system with non-uniform sensitivity response |
CN111752112B (zh) * | 2019-03-27 | 2021-09-10 | 上海微电子装备(集团)股份有限公司 | 掩膜对准标记组合、掩膜对准系统、光刻装置及其方法 |
WO2021047903A1 (en) | 2019-09-09 | 2021-03-18 | Asml Holding N.V. | Invariable magnification multilevel optical device with telecentric converter |
CN112838018B (zh) * | 2019-11-25 | 2023-09-15 | 致茂电子(苏州)有限公司 | 光学量测方法 |
WO2022115457A1 (en) * | 2020-11-24 | 2022-06-02 | Applied Materials, Inc. | Illumination system for ar metrology tool |
CN115881697B (zh) * | 2023-02-01 | 2023-06-02 | 广州粤芯半导体技术有限公司 | 对准标记组件和晶圆对准标记检测装置 |
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DE69223916T2 (de) * | 1991-10-03 | 1998-05-28 | Canon Kk | Optische Kodiereinrichtung |
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CN107615473B (zh) * | 2014-12-24 | 2021-04-20 | 株式会社尼康 | 移动体的控制方法、曝光方法、器件制造方法、移动体装置及曝光装置 |
CN107407894B (zh) * | 2014-12-24 | 2020-01-24 | 株式会社尼康 | 测量装置及测量方法、曝光装置及曝光方法、以及器件制造方法 |
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-
2015
- 2015-12-22 CN CN201580076880.3A patent/CN107407894B/zh active Active
- 2015-12-22 KR KR1020177020375A patent/KR102022785B1/ko active IP Right Grant
- 2015-12-22 KR KR1020197026384A patent/KR102284227B1/ko active IP Right Grant
- 2015-12-22 CN CN202010012207.6A patent/CN111045302B/zh active Active
- 2015-12-22 EP EP21177718.0A patent/EP3926404A1/en active Pending
- 2015-12-22 WO PCT/JP2015/085848 patent/WO2016104511A1/ja active Application Filing
- 2015-12-22 EP EP15873079.6A patent/EP3239776B1/en active Active
- 2015-12-22 JP JP2016566390A patent/JP6459082B2/ja active Active
- 2015-12-24 TW TW104143485A patent/TWI690781B/zh active
- 2015-12-24 TW TW109107469A patent/TWI748363B/zh active
-
2017
- 2017-06-20 US US15/627,707 patent/US10372046B2/en active Active
-
2018
- 2018-04-28 HK HK18105556.5A patent/HK1246406A1/zh unknown
-
2019
- 2019-05-31 US US16/428,223 patent/US10642169B2/en active Active
-
2020
- 2020-03-31 US US16/836,016 patent/US20200225592A1/en not_active Abandoned
-
2022
- 2022-06-10 US US17/837,107 patent/US20220317581A1/en active Pending
Also Published As
Publication number | Publication date |
---|---|
CN111045302A (zh) | 2020-04-21 |
KR20170097185A (ko) | 2017-08-25 |
EP3926404A1 (en) | 2021-12-22 |
TW201635054A (zh) | 2016-10-01 |
TWI690781B (zh) | 2020-04-11 |
KR20190107187A (ko) | 2019-09-18 |
US20200225592A1 (en) | 2020-07-16 |
WO2016104511A1 (ja) | 2016-06-30 |
US20220317581A1 (en) | 2022-10-06 |
TW202028894A (zh) | 2020-08-01 |
CN111045302B (zh) | 2022-12-30 |
JPWO2016104511A1 (ja) | 2017-09-28 |
EP3239776A4 (en) | 2018-09-19 |
EP3239776B1 (en) | 2021-07-07 |
US20190285995A1 (en) | 2019-09-19 |
US10372046B2 (en) | 2019-08-06 |
KR102284227B1 (ko) | 2021-07-30 |
US20180129144A1 (en) | 2018-05-10 |
US10642169B2 (en) | 2020-05-05 |
JP6459082B2 (ja) | 2019-01-30 |
EP3239776A1 (en) | 2017-11-01 |
CN107407894B (zh) | 2020-01-24 |
CN107407894A (zh) | 2017-11-28 |
TWI748363B (zh) | 2021-12-01 |
KR102022785B1 (ko) | 2019-09-18 |
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