SG11201506649YA - Latex for dip molding use, composition for dip molding use, and dip-molded article - Google Patents

Latex for dip molding use, composition for dip molding use, and dip-molded article

Info

Publication number
SG11201506649YA
SG11201506649YA SG11201506649YA SG11201506649YA SG11201506649YA SG 11201506649Y A SG11201506649Y A SG 11201506649YA SG 11201506649Y A SG11201506649Y A SG 11201506649YA SG 11201506649Y A SG11201506649Y A SG 11201506649YA SG 11201506649Y A SG11201506649Y A SG 11201506649YA
Authority
SG
Singapore
Prior art keywords
dip
molding use
dip molding
latex
composition
Prior art date
Application number
SG11201506649YA
Other languages
English (en)
Inventor
Yoshiyuki Nakamura
Osamu Ishizu
Shunjin Aihara
Original Assignee
Zeon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeon Corp filed Critical Zeon Corp
Publication of SG11201506649YA publication Critical patent/SG11201506649YA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F279/00—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00
    • C08F279/02—Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group C08F36/00 on to polymers of conjugated dienes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41—Compounds containing sulfur bound to oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/41—Compounds containing sulfur bound to oxygen
    • C08K5/42—Sulfonic acids; Derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/45—Heterocyclic compounds having sulfur in the ring
    • C08K5/46—Heterocyclic compounds having sulfur in the ring with oxygen or nitrogen in the ring
    • C08K5/47—Thiazoles
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L51/00—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers
    • C08L51/04—Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds; Compositions of derivatives of such polymers grafted on to rubbers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/09—Carboxylic acids; Metal salts thereof; Anhydrides thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Moulding By Coating Moulds (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Graft Or Block Polymers (AREA)
SG11201506649YA 2013-02-22 2014-02-20 Latex for dip molding use, composition for dip molding use, and dip-molded article SG11201506649YA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013033233 2013-02-22
JP2013201829 2013-09-27
PCT/JP2014/054041 WO2014129547A1 (ja) 2013-02-22 2014-02-20 ディップ成形用ラテックス、ディップ成形用組成物およびディップ成形体

Publications (1)

Publication Number Publication Date
SG11201506649YA true SG11201506649YA (en) 2015-09-29

Family

ID=51391329

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201506649YA SG11201506649YA (en) 2013-02-22 2014-02-20 Latex for dip molding use, composition for dip molding use, and dip-molded article

Country Status (6)

Country Link
US (1) US9546239B2 (ja)
EP (1) EP2960293B1 (ja)
JP (1) JP6206482B2 (ja)
SG (1) SG11201506649YA (ja)
TW (1) TWI595041B (ja)
WO (1) WO2014129547A1 (ja)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI624478B (zh) * 2013-03-28 2018-05-21 Zeon Corp Method for producing synthetic isoprene polymer latex
EP3022030B1 (en) 2013-07-16 2020-03-18 Skinprotect Corporation SDN BHD Elastomeric film-forming compositions and articles made from the elastomeric film
JP6614159B2 (ja) * 2014-12-04 2019-12-04 日本ゼオン株式会社 ディップ成形用合成ポリイソプレンラテックス、ディップ成形用組成物およびディップ成形体
JP6696433B2 (ja) 2014-12-25 2020-05-20 日本ゼオン株式会社 ディップ成形用ラテックス組成物及びディップ成形品
US10519258B2 (en) 2015-03-03 2019-12-31 Zeon Corporation Dip-forming synthetic isoprene polymer latex, dip-forming composition, and dip-formed article
EP3284781B1 (en) * 2015-04-16 2020-10-28 Showa Denko K.K. Composition for rubber and use thereof
BR112018015004A2 (ja) * 2016-01-27 2018-12-18 Zeon Corporation Latex constituent
US10934399B2 (en) * 2016-02-03 2021-03-02 Zeon Corporation Polymer latex production method
CN109689764B (zh) 2016-09-29 2021-09-14 日本瑞翁株式会社 胶乳组合物
JP7063318B2 (ja) * 2017-02-22 2022-05-09 日本ゼオン株式会社 ラテックス組成物
US11098136B2 (en) 2017-02-24 2021-08-24 Zeon Corporation Modified polymer latex production method
WO2019039523A1 (ja) 2017-08-25 2019-02-28 日本ゼオン株式会社 ラテックス組成物
JP7163924B2 (ja) * 2017-09-22 2022-11-01 日本ゼオン株式会社 ラテックス組成物の製造方法
CN111742006B (zh) * 2018-03-08 2023-05-23 日本瑞翁株式会社 酸改性共轭二烯系聚合物的胶乳及其制造方法
WO2020013076A1 (ja) 2018-07-13 2020-01-16 日本ゼオン株式会社 開環共重合体組成物
EP3845265A4 (en) 2018-08-29 2022-05-18 Zeon Corporation MEDICAL BALLOON PRODUCTION METHOD
JP7435457B2 (ja) * 2018-09-14 2024-02-21 日本ゼオン株式会社 ラテックス組成物および膜成形体
US11976180B2 (en) 2018-09-14 2024-05-07 Zeon Corporation Xanthogen compound dispersion, conjugated-diene-based polymer latex composition, and film molded body
JP2020100738A (ja) * 2018-12-21 2020-07-02 日本ゼオン株式会社 変性ポリイソプレンのラテックスの製造方法
EP4108404A4 (en) 2020-02-20 2024-03-20 Zeon Corp METHOD FOR PRODUCING A LATEX COMPOSITION
CN115003733A (zh) 2020-02-20 2022-09-02 日本瑞翁株式会社 胶乳组合物的制造方法
US20230101503A1 (en) 2020-02-26 2023-03-30 Zeon Corporation Latex composition
WO2021171994A1 (ja) 2020-02-27 2021-09-02 日本ゼオン株式会社 ディップ成形体の製造方法
CN114426611B (zh) * 2020-10-29 2024-05-24 中国石油化工股份有限公司 一种顺丁橡胶硫化性能的调节工艺
JPWO2022172696A1 (ja) 2021-02-09 2022-08-18
JPWO2023026782A1 (ja) 2021-08-26 2023-03-02

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6021524A (en) 1997-12-31 2000-02-08 The University Of Akron Cut resistant polymeric films
JP2001261751A (ja) * 2000-03-23 2001-09-26 Kanegafuchi Chem Ind Co Ltd グラフト共重合体ラテックスの製造方法
JP2002053602A (ja) 2000-08-04 2002-02-19 Nippon Zeon Co Ltd 共重合体ラテックスおよび紙塗工用組成物
US6870019B2 (en) * 2000-12-12 2005-03-22 Nippon A & L Inc. Latex for dip molding and a dip molded product
JP3920633B2 (ja) 2000-12-12 2007-05-30 日本エイアンドエル株式会社 ディップ成形用ラテックス及びディップ成形物
JP5187501B2 (ja) * 2008-03-03 2013-04-24 日本ゼオン株式会社 ディップ成形用組成物及び成形体
JP5472286B2 (ja) 2009-02-28 2014-04-16 日本ゼオン株式会社 ディップ成形用組成物及びディップ成形体
JP2012062487A (ja) * 2011-12-27 2012-03-29 Nippon Zeon Co Ltd ディップ成形用組成物およびディップ成形体
US9637621B2 (en) * 2013-09-30 2017-05-02 Zeon Corporation Dip-forming composition and dip-formed article

Also Published As

Publication number Publication date
EP2960293B1 (en) 2018-12-05
TWI595041B (zh) 2017-08-11
JP6206482B2 (ja) 2017-10-04
JPWO2014129547A1 (ja) 2017-02-02
US20150376322A1 (en) 2015-12-31
WO2014129547A1 (ja) 2014-08-28
US9546239B2 (en) 2017-01-17
EP2960293A4 (en) 2016-09-28
TW201443137A (zh) 2014-11-16
EP2960293A1 (en) 2015-12-30

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