SG11201406262RA - Apparatus and methods for high-resolution electron beam imaging - Google Patents

Apparatus and methods for high-resolution electron beam imaging

Info

Publication number
SG11201406262RA
SG11201406262RA SG11201406262RA SG11201406262RA SG11201406262RA SG 11201406262R A SG11201406262R A SG 11201406262RA SG 11201406262R A SG11201406262R A SG 11201406262RA SG 11201406262R A SG11201406262R A SG 11201406262RA SG 11201406262R A SG11201406262R A SG 11201406262RA
Authority
SG
Singapore
Prior art keywords
methods
electron beam
beam imaging
resolution electron
resolution
Prior art date
Application number
SG11201406262RA
Other languages
English (en)
Inventor
Xinrong Jiang
Liqun Han
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG11201406262RA publication Critical patent/SG11201406262RA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/22—Optical or photographic arrangements associated with the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/05—Electron or ion-optical arrangements for separating electrons or ions according to their energy or mass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/10—Lenses
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/153—Correcting image defects, e.g. stigmators
    • H01J2237/1534—Aberrations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Tubes For Measurement (AREA)
SG11201406262RA 2012-04-03 2013-04-02 Apparatus and methods for high-resolution electron beam imaging SG11201406262RA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/438,543 US9053900B2 (en) 2012-04-03 2012-04-03 Apparatus and methods for high-resolution electron beam imaging
PCT/US2013/034999 WO2013152028A1 (en) 2012-04-03 2013-04-02 Apparatus and methods for high-resolution electron beam imaging

Publications (1)

Publication Number Publication Date
SG11201406262RA true SG11201406262RA (en) 2014-10-30

Family

ID=49233615

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201406262RA SG11201406262RA (en) 2012-04-03 2013-04-02 Apparatus and methods for high-resolution electron beam imaging

Country Status (8)

Country Link
US (1) US9053900B2 (zh)
EP (1) EP2842152A4 (zh)
KR (1) KR20150003248A (zh)
CN (2) CN104380427B (zh)
IL (1) IL234977A0 (zh)
SG (1) SG11201406262RA (zh)
TW (2) TW201727689A (zh)
WO (1) WO2013152028A1 (zh)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6340216B2 (ja) * 2014-03-07 2018-06-06 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
US9443696B2 (en) 2014-05-25 2016-09-13 Kla-Tencor Corporation Electron beam imaging with dual Wien-filter monochromator
US9905391B2 (en) * 2015-04-29 2018-02-27 Kla-Tencor Corporation System and method for imaging a sample with an electron beam with a filtered energy spread
KR102387776B1 (ko) * 2015-05-08 2022-04-15 케이엘에이 코포레이션 전자빔 시스템의 수차 보정 방법 및 시스템
US10297418B2 (en) * 2015-07-14 2019-05-21 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Method of reducing coma and chromatic aberration in a charged particle beam device, and charged particle beam device
US10090131B2 (en) * 2016-12-07 2018-10-02 Kla-Tencor Corporation Method and system for aberration correction in an electron beam system
US10096447B1 (en) * 2017-08-02 2018-10-09 Kla-Tencor Corporation Electron beam apparatus with high resolutions
US10748737B2 (en) * 2017-10-10 2020-08-18 Kla-Tencor Corporation Electron beam generation and measurement
US10340114B1 (en) 2018-01-19 2019-07-02 Kla-Tencor Corporation Method of eliminating thermally induced beam drift in an electron beam separator
JP7017437B2 (ja) * 2018-03-06 2022-02-08 Ｔａｓｍｉｔ株式会社 反射電子のエネルギースペクトルを測定する装置および方法
JP2019164886A (ja) * 2018-03-19 2019-09-26 株式会社日立ハイテクノロジーズ ビーム照射装置
US10964522B2 (en) * 2018-06-06 2021-03-30 Kla Corporation High resolution electron energy analyzer
US10748739B2 (en) * 2018-10-12 2020-08-18 Kla-Tencor Corporation Deflection array apparatus for multi-electron beam system
US20220246394A1 (en) * 2019-05-08 2022-08-04 Hitachi High-Tech Corporation Charged Particle Beam System and Method For Determining Observation Conditions in Charged Particle Beam Device
US20220172920A1 (en) * 2019-05-31 2022-06-02 Hitachi High-Tech Corporation Beam Deflection Device, Aberration Corrector, Monochromator, and Charged Particle Beam Device
CN111477529B (zh) * 2020-05-19 2024-05-14 桂林狮达技术股份有限公司 自动消像散电子枪及电子枪自动消像散方法
KR20230017264A (ko) * 2020-07-20 2023-02-03 주식회사 히타치하이테크 에너지 필터, 및 그것을 구비한 에너지 애널라이저 및 하전 입자빔 장치
JP7318824B2 (ja) * 2020-10-28 2023-08-01 株式会社ニューフレアテクノロジー ウィーンフィルタ及びマルチ電子ビーム検査装置

Family Cites Families (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3979890A (en) 1975-12-29 1976-09-14 Schenk John H Rake for gathering and containing fallen fruit
JPH0554853A (ja) 1991-08-21 1993-03-05 Jeol Ltd ウイーンフイルタ
JPH05275057A (ja) 1992-03-26 1993-10-22 Jeol Ltd ウィーンフィルタ
US5389858A (en) 1992-07-16 1995-02-14 International Business Machines Corporation Variable axis stigmator
US5444243A (en) 1993-09-01 1995-08-22 Hitachi, Ltd. Wien filter apparatus with hyperbolic surfaces
DE4438315A1 (de) 1994-10-26 1996-05-02 Siemens Ag Vorrichtung zum Entfernen von Ionen aus einem Elektronenstrahl
US6184526B1 (en) * 1997-01-08 2001-02-06 Nikon Corporation Apparatus and method for inspecting predetermined region on surface of specimen using electron beam
US6111253A (en) 1997-09-01 2000-08-29 Jeol Ltd. Transmission electron microscope
DE69827791T2 (de) 1998-09-23 2005-04-21 Advantest Corp Vorrichtung zur Reduzierung der Energieverteilung eines Teilchenstrahls und Teilchenstrahlgerät mit einer solchen Anordnung
US6614026B1 (en) * 1999-04-15 2003-09-02 Applied Materials, Inc. Charged particle beam column
JP3757371B2 (ja) 1999-07-05 2006-03-22 日本電子株式会社 エネルギーフィルタ及びそれを用いた電子顕微鏡
US6410924B1 (en) * 1999-11-16 2002-06-25 Schlumberger Technologies, Inc. Energy filtered focused ion beam column
DE10061798A1 (de) 2000-12-12 2002-06-13 Leo Elektronenmikroskopie Gmbh Monochromator für geladene Teilchen
WO2002056332A1 (fr) * 2001-01-10 2002-07-18 Ebara Corporation Appareil et procede d'inspection a faisceau d'electrons, et procede de fabrication de dispositif comportant l'appareil d'inspection
JP2002231168A (ja) * 2001-02-01 2002-08-16 Jeol Ltd ウィーンフィルタ
US6717141B1 (en) 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
JP2003331770A (ja) 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
JP2003331772A (ja) 2002-05-16 2003-11-21 Ebara Corp 電子線装置及びデバイス製造方法
JP2004319149A (ja) * 2003-04-14 2004-11-11 Hitachi Ltd 電子源およびそれを用いた電子ビーム装置
EP1610358B1 (en) 2004-06-21 2008-08-27 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Aberration correction device and method for operating same
US20090212213A1 (en) 2005-03-03 2009-08-27 Ebara Corporation Projection electron beam apparatus and defect inspection system using the apparatus
EP1739714B1 (en) * 2005-03-08 2012-04-18 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Imaging apparatus for high probe currents
WO2007013398A1 (ja) * 2005-07-26 2007-02-01 Ebara Corporation 電子線装置
JP2007149495A (ja) * 2005-11-28 2007-06-14 Jeol Ltd 収差補正装置及び電子顕微鏡
JP2007335125A (ja) 2006-06-13 2007-12-27 Ebara Corp 電子線装置
US7560691B1 (en) 2007-01-19 2009-07-14 Kla-Tencor Technologies Corporation High-resolution auger electron spectrometer
US7755043B1 (en) 2007-03-21 2010-07-13 Kla-Tencor Technologies Corporation Bright-field/dark-field detector with integrated electron energy spectrometer
US7821187B1 (en) 2007-09-07 2010-10-26 Kla-Tencor Corporation Immersion gun equipped electron beam column
JP5380206B2 (ja) * 2009-08-27 2014-01-08 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡装置及びそれを用いた試料の検査方法
US8294125B2 (en) 2009-11-18 2012-10-23 Kla-Tencor Corporation High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture

Also Published As

Publication number Publication date
CN106548913A (zh) 2017-03-29
KR20150003248A (ko) 2015-01-08
TW201727689A (zh) 2017-08-01
WO2013152028A1 (en) 2013-10-10
TWI590286B (zh) 2017-07-01
TW201342419A (zh) 2013-10-16
US20130256530A1 (en) 2013-10-03
EP2842152A1 (en) 2015-03-04
CN104380427A (zh) 2015-02-25
EP2842152A4 (en) 2016-03-09
IL234977A0 (en) 2014-12-31
US9053900B2 (en) 2015-06-09
CN104380427B (zh) 2017-03-01

Similar Documents

Publication Publication Date Title
IL234977A0 (en) Devices and methods for high resolution electron beam imaging
PL3242315T3 (pl) Rentgenowski układ inspekcyjny do skanowania obiektu
EP2713156A4 (en) DEVICE AND METHOD FOR RADIANT CANS AND ILLUSTRATION
EP2787722B8 (en) Imaging apparatus
GB201322299D0 (en) Apparatus and methods for generating distributed x-rays
EP2924992A4 (en) METHOD AND DEVICE FOR OBTAINING 3D IMAGES
EP2633678A4 (en) CELLSCOPE DEVICE AND IMAGING METHOD THEREFOR
EP2814063A4 (en) IMAGING UNIT AND IMAGING DEVICE
EP2934674A4 (en) SYSTEM AND METHOD FOR IMAGING THROUGH A RIVER
EP2605053A4 (en) IMAGING APPARATUS
GB2505691B (en) Method and apparatus for image scanning
GB201303378D0 (en) X-ray imaging apparatus
EP2830508A4 (en) METHODS AND APPARATUS FOR ULTRASONIC IMAGING
EP2727129A4 (en) MULTISOLED ELECTRON BEAM AND METHOD
SG11201501957PA (en) Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
EP2808674A4 (en) Image examination method and image examination device
EP2818114A4 (en) X-RAY IMAGING DEVICE
EP2897155A4 (en) X-RAY TUBE DEVICE AND METHOD OF USING X-RAY TUBE DEVICE
SG2013075726A (en) Systems and methods for high-resolution imaging usingseparated wavefields
EP2873438A4 (en) X-RAY POSITIONING DEVICE, X-RAY POSITIONING METHOD METHOD FOR IMAGING A PARTICULAR PICTURE
EP2838425A4 (en) IMAGING METHOD AND SYSTEM
HK1199762A1 (zh) 多能 成像系統以及成像方法
EP2747410A4 (en) IMAGING DEVICE
GB2506757B (en) Mobile x-ray imaging apparatus
EP2708188A4 (en) X-RAY IMAGING APPARATUS