SG11201501957PA - Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents - Google Patents

Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents

Info

Publication number
SG11201501957PA
SG11201501957PA SG11201501957PA SG11201501957PA SG11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA SG 11201501957P A SG11201501957P A SG 11201501957PA
Authority
SG
Singapore
Prior art keywords
dual
lens
methods
resolution imaging
electron beam
Prior art date
Application number
SG11201501957PA
Inventor
Xinrong Jiang
Liqun Han
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG11201501957PA publication Critical patent/SG11201501957PA/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/063—Geometrical arrangement of electrodes for beam-forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/02—Electron guns
    • H01J3/029—Schematic arrangements for beam forming
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J3/00—Details of electron-optical or ion-optical arrangements or of ion traps common to two or more basic types of discharge tubes or lamps
    • H01J3/08—Arrangements for controlling intensity of ray or beam
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/045—Diaphragms
    • H01J2237/0456—Supports
    • H01J2237/0458—Supports movable, i.e. for changing between differently sized apertures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/304—Controlling tubes
    • H01J2237/30472—Controlling the beam

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
SG11201501957PA 2012-09-14 2013-09-13 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents SG11201501957PA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/618,760 US8859982B2 (en) 2012-09-14 2012-09-14 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
PCT/US2013/059788 WO2014043557A1 (en) 2012-09-14 2013-09-13 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents

Publications (1)

Publication Number Publication Date
SG11201501957PA true SG11201501957PA (en) 2015-04-29

Family

ID=50273493

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201501957PA SG11201501957PA (en) 2012-09-14 2013-09-13 Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents

Country Status (8)

Country Link
US (1) US8859982B2 (en)
EP (1) EP2896062B1 (en)
JP (1) JP6310920B2 (en)
KR (1) KR102139654B1 (en)
IL (1) IL237738A (en)
SG (1) SG11201501957PA (en)
TW (1) TWI620224B (en)
WO (1) WO2014043557A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI502616B (en) 2014-08-08 2015-10-01 Nat Univ Tsing Hua Desktop electron microscope and wide range tunable magnetic lens thereof
CN110462509B (en) 2017-03-30 2022-04-15 Lg伊诺特有限公司 Double-lens driving device and camera module
DE102017208005B3 (en) * 2017-05-11 2018-08-16 Carl Zeiss Microscopy Gmbh Particle source for generating a particle beam and particle-optical device
US10096447B1 (en) * 2017-08-02 2018-10-09 Kla-Tencor Corporation Electron beam apparatus with high resolutions
CN111183503B (en) * 2017-09-29 2023-07-14 Asml荷兰有限公司 Method and apparatus for adjusting the beam state of charged particles
US10964522B2 (en) 2018-06-06 2021-03-30 Kla Corporation High resolution electron energy analyzer
US20200194223A1 (en) * 2018-12-14 2020-06-18 Kla Corporation Joint Electron-Optical Columns for Flood-Charging and Image-Forming in Voltage Contrast Wafer Inspections
KR20210151969A (en) 2019-05-21 2021-12-14 주식회사 히타치하이테크 Electron gun and charged particle beam device equipped with electron gun
US11469072B2 (en) * 2021-02-17 2022-10-11 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Charged particle beam apparatus, scanning electron microscope, and method of operating a charged particle beam apparatus
CN113163564B (en) * 2021-04-30 2024-06-04 中国科学院电工研究所 Electron beam processing device with static electricity eliminating function

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3979890A (en) 1975-12-29 1976-09-14 Schenk John H Rake for gathering and containing fallen fruit
JPH01143217A (en) * 1987-11-27 1989-06-05 Jeol Ltd Electron beam lithography equipment
US5444243A (en) 1993-09-01 1995-08-22 Hitachi, Ltd. Wien filter apparatus with hyperbolic surfaces
DE4438315A1 (en) 1994-10-26 1996-05-02 Siemens Ag Gas ion removal device from electron beam in tomography appts.
US6111253A (en) 1997-09-01 2000-08-29 Jeol Ltd. Transmission electron microscope
JPH11233053A (en) * 1998-02-18 1999-08-27 Jeol Ltd Movable beam limiting apparatus for electron microscope
WO2000079565A1 (en) * 1999-06-22 2000-12-28 Philips Electron Optics B.V. Particle-optical apparatus including a particle source that can be switched between high brightness and large beam current
JP3757371B2 (en) 1999-07-05 2006-03-22 日本電子株式会社 Energy filter and electron microscope using the same
JP4146103B2 (en) * 2001-05-23 2008-09-03 日本電子株式会社 Electron beam apparatus equipped with a field emission electron gun
US6717141B1 (en) 2001-11-27 2004-04-06 Schlumberger Technologies, Inc. Reduction of aberrations produced by Wien filter in a scanning electron microscope and the like
JP2003173581A (en) * 2001-12-07 2003-06-20 Matsushita Electric Ind Co Ltd Electron beam recording apparatus and electron beam recording method
JP2003331770A (en) 2002-05-15 2003-11-21 Seiko Instruments Inc Electron beam device
US6753533B2 (en) * 2002-11-04 2004-06-22 Jeol Ltd. Electron beam apparatus and method of controlling same
DE602004021750D1 (en) 2003-07-14 2009-08-13 Fei Co Two beam system
TW200703409A (en) 2005-03-03 2007-01-16 Ebara Corp Mapping projection type electron beam apparatus and defects inspection system using such apparatus
US7893406B1 (en) 2005-06-29 2011-02-22 Hermes-Microvision, Inc. Electron gun with magnetic immersion double condenser lenses
WO2007013398A1 (en) 2005-07-26 2007-02-01 Ebara Corporation Electron beam device
JP2007335125A (en) 2006-06-13 2007-12-27 Ebara Corp Electron beam device
US7560691B1 (en) 2007-01-19 2009-07-14 Kla-Tencor Technologies Corporation High-resolution auger electron spectrometer
WO2008090380A1 (en) * 2007-01-25 2008-07-31 Nfab Limited Improved particle beam generator
US7755043B1 (en) 2007-03-21 2010-07-13 Kla-Tencor Technologies Corporation Bright-field/dark-field detector with integrated electron energy spectrometer
US7821187B1 (en) * 2007-09-07 2010-10-26 Kla-Tencor Corporation Immersion gun equipped electron beam column
EP2088613B1 (en) 2008-02-08 2015-10-14 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Use of a dual mode gas field ion source
US8253118B2 (en) 2009-10-14 2012-08-28 Fei Company Charged particle beam system having multiple user-selectable operating modes
US8294125B2 (en) * 2009-11-18 2012-10-23 Kla-Tencor Corporation High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
EP2492950B1 (en) * 2011-02-25 2018-04-11 FEI Company Method for rapid switching between a high current mode and a low current mode in a charged particle beam system

Also Published As

Publication number Publication date
JP2015531984A (en) 2015-11-05
EP2896062B1 (en) 2019-12-18
KR20150055023A (en) 2015-05-20
IL237738A (en) 2016-10-31
JP6310920B2 (en) 2018-04-11
US8859982B2 (en) 2014-10-14
TW201419360A (en) 2014-05-16
KR102139654B1 (en) 2020-07-30
US20140077077A1 (en) 2014-03-20
EP2896062A4 (en) 2016-06-08
EP2896062A1 (en) 2015-07-22
WO2014043557A1 (en) 2014-03-20
TWI620224B (en) 2018-04-01

Similar Documents

Publication Publication Date Title
IL234977A0 (en) Apparatus and methods for high-resolution electron beam imaging
SG11201501957PA (en) Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
EP2795690A4 (en) Electron tunneling apparatus and associated methods
PL3242315T3 (en) X-ray inspection system for scanning an object
HK1199332A1 (en) Apparatus and methods for envelope tracking
EP2940458A4 (en) Ct imaging system and method
PL2633543T3 (en) Device for producing an electron beam
EP2713156A4 (en) Device and method for ray scanning and imaging
GB201322299D0 (en) Apparatus and methods for generating distributed x-rays
EP2805143A4 (en) Apparatus and method for producing specimens for electron microscopy
EP2866666A4 (en) Method and system for x-ray ct imaging
EP2727129A4 (en) Multiple-column electron beam apparatus and methods
EP2680294A4 (en) Electron gun and electron beam device
EP2864771A4 (en) High resolution eddy current array probe
GB201303378D0 (en) X-ray imaging apparatus
PL2713340T3 (en) Methods and devices for locating an object in CT imaging
EP2808674A4 (en) Image examination method and image examination apparatus
EP2991078A4 (en) Electron beam irradiation apparatus
EP2818114A4 (en) X-ray imaging apparatus
EP2897155A4 (en) X-ray tube device and method for using x-ray tube device
HK1199762A1 (en) Pleuripotent ct imaging system and imaging method ct
SG2013075726A (en) Systems and methods for high-resolution imaging usingseparated wavefields
EP2769740A4 (en) Shield structure for electron beam sterilization equipment
EP2838425A4 (en) Method and system for imaging
EP2873438A4 (en) X-ray positioning apparatus, x-ray positioning method, and image-of-interest imaging method