SG111237A1 - Use of a top layer on a mirror for use in a lithographic apparatus, mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method - Google Patents
Use of a top layer on a mirror for use in a lithographic apparatus, mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing methodInfo
- Publication number
- SG111237A1 SG111237A1 SG200406153A SG200406153A SG111237A1 SG 111237 A1 SG111237 A1 SG 111237A1 SG 200406153 A SG200406153 A SG 200406153A SG 200406153 A SG200406153 A SG 200406153A SG 111237 A1 SG111237 A1 SG 111237A1
- Authority
- SG
- Singapore
- Prior art keywords
- mirror
- lithographic apparatus
- top layer
- device manufacturing
- source
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000002923 metal particle Substances 0.000 abstract 2
- 238000005286 illumination Methods 0.000 abstract 1
- 238000000059 patterning Methods 0.000 abstract 1
- 230000005855 radiation Effects 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
- G03F1/24—Reflection masks; Preparation thereof
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- General Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Optical Elements Other Than Lenses (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP03078316A EP1526550A1 (en) | 2003-10-20 | 2003-10-20 | Mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG111237A1 true SG111237A1 (en) | 2005-05-30 |
Family
ID=34384643
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG200406153A SG111237A1 (en) | 2003-10-20 | 2004-10-19 | Use of a top layer on a mirror for use in a lithographic apparatus, mirror for use in a lithographic apparatus, lithographic apparatus comprising such a mirror and device manufacturing method |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7592610B2 (ja) |
| EP (2) | EP1526550A1 (ja) |
| JP (2) | JP2005129936A (ja) |
| KR (1) | KR100794278B1 (ja) |
| CN (1) | CN1609715A (ja) |
| SG (1) | SG111237A1 (ja) |
| TW (1) | TW200527128A (ja) |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7034308B2 (en) * | 2003-06-27 | 2006-04-25 | Asml Netherlands B.V. | Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby |
| US7145641B2 (en) | 2003-12-31 | 2006-12-05 | Asml Netherlands, B.V. | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
| US7233010B2 (en) * | 2005-05-20 | 2007-06-19 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
| US7372058B2 (en) * | 2005-09-27 | 2008-05-13 | Asml Netherlands B.V. | Ex-situ removal of deposition on an optical element |
| EP1946331B1 (en) * | 2005-11-02 | 2009-04-29 | University College Dublin, National University of Ireland Dublin | Mirror for high power euv lamp system |
| US7372049B2 (en) | 2005-12-02 | 2008-05-13 | Asml Netherlands B.V. | Lithographic apparatus including a cleaning device and method for cleaning an optical element |
| US7462850B2 (en) * | 2005-12-08 | 2008-12-09 | Asml Netherlands B.V. | Radical cleaning arrangement for a lithographic apparatus |
| US7468521B2 (en) * | 2005-12-28 | 2008-12-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7541603B2 (en) * | 2006-09-27 | 2009-06-02 | Asml Netherlands B.V. | Radiation system and lithographic apparatus comprising the same |
| EP2076801A1 (en) * | 2006-10-13 | 2009-07-08 | Media Lario S.r.L. | Coated mirrors and their fabication |
| US7696492B2 (en) * | 2006-12-13 | 2010-04-13 | Asml Netherlands B.V. | Radiation system and lithographic apparatus |
| US7772570B2 (en) | 2006-12-22 | 2010-08-10 | Asml Netherlands B.V. | Assembly for blocking a beam of radiation and method of blocking a beam of radiation |
| US7737418B2 (en) * | 2006-12-27 | 2010-06-15 | Asml Netherlands B.V. | Debris mitigation system and lithographic apparatus |
| US20080218709A1 (en) * | 2007-03-07 | 2008-09-11 | Asml Netherlands B.V. | Removal of deposition on an element of a lithographic apparatus |
| JP5099793B2 (ja) | 2007-11-06 | 2012-12-19 | カール・ツァイス・エスエムティー・ゲーエムベーハー | 光学面から汚染層を除去するための方法、洗浄ガスを生成するための方法、ならびに対応する洗浄および洗浄ガス生成の構造 |
| JP5657535B2 (ja) * | 2008-07-18 | 2015-01-21 | コーニンクレッカ フィリップス エヌ ヴェ | 汚染物捕獲体を含む極紫外線放射生成装置 |
| EP2157481A3 (en) * | 2008-08-14 | 2012-06-13 | ASML Netherlands B.V. | Radiation source, lithographic apparatus, and device manufacturing method |
| EP2161725B1 (en) * | 2008-09-04 | 2015-07-08 | ASML Netherlands B.V. | Radiation source and related method |
| JP5534910B2 (ja) * | 2009-04-23 | 2014-07-02 | ギガフォトン株式会社 | 極端紫外光源装置 |
| US8587768B2 (en) | 2010-04-05 | 2013-11-19 | Media Lario S.R.L. | EUV collector system with enhanced EUV radiation collection |
| WO2012013747A1 (en) * | 2010-07-30 | 2012-02-02 | Carl Zeiss Smt Gmbh | Euv exposure apparatus |
| CN102621815B (zh) * | 2011-01-26 | 2016-12-21 | Asml荷兰有限公司 | 用于光刻设备的反射光学部件及器件制造方法 |
| WO2012151497A1 (en) * | 2011-05-04 | 2012-11-08 | The University Of Akron | Suppression of dewetting of polymer films via inexpensive soft lithography |
| NL2009359A (en) * | 2011-09-23 | 2013-03-26 | Asml Netherlands Bv | Radiation source. |
| DE102013002064A1 (de) | 2012-02-11 | 2013-08-14 | Media Lario S.R.L. | Quell-kollektor-module für euv-lithographie unter verwendung eines gic-spiegels und einer lpp-quelle |
| WO2013189827A2 (en) * | 2012-06-22 | 2013-12-27 | Asml Netherlands B.V. | Radiation source and lithographic apparatus. |
| JP6395832B2 (ja) * | 2013-08-02 | 2018-09-26 | エーエスエムエル ネザーランズ ビー．ブイ． | 放射源用コンポーネント、関連した放射源およびリソグラフィ装置 |
| DE102014216240A1 (de) * | 2014-08-15 | 2016-02-18 | Carl Zeiss Smt Gmbh | Reflektives optisches Element |
| WO2017084872A1 (en) * | 2015-11-19 | 2017-05-26 | Asml Netherlands B.V. | Euv source chamber and gas flow regime for lithographic apparatus, multi-layer mirror and lithographic apparatus |
| DE102015225509A1 (de) * | 2015-12-16 | 2017-06-22 | Carl Zeiss Smt Gmbh | Reflektives optisches Element |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4465820A (en) * | 1983-06-03 | 1984-08-14 | General Electric Company | Copolyestercarbonates |
| JPH08236292A (ja) * | 1995-02-27 | 1996-09-13 | Hitachi Ltd | レーザプラズマｘ線発生装置 |
| US6566667B1 (en) * | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with improved pulse power system |
| US6541786B1 (en) * | 1997-05-12 | 2003-04-01 | Cymer, Inc. | Plasma pinch high energy with debris collector |
| US5958605A (en) * | 1997-11-10 | 1999-09-28 | Regents Of The University Of California | Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography |
| DE10138313A1 (de) * | 2001-01-23 | 2002-07-25 | Zeiss Carl | Kollektor für Beleuchtugnssysteme mit einer Wellenlänge < 193 nm |
| EP1083777A4 (en) * | 1998-05-29 | 2004-03-05 | Nippon Kogaku Kk | LASER EXCITED PLASMA LIGHT SOURCE, LIGHTING DEVICE AND MANUFACTURING METHOD THEREOF |
| TWI267704B (en) * | 1999-07-02 | 2006-12-01 | Asml Netherlands Bv | Capping layer for EUV optical elements |
| FR2802311B1 (fr) * | 1999-12-08 | 2002-01-18 | Commissariat Energie Atomique | Dispositif de lithographie utilisant une source de rayonnement dans le domaine extreme ultraviolet et des miroirs multicouches a large bande spectrale dans ce domaine |
| US6285737B1 (en) * | 2000-01-21 | 2001-09-04 | Euv Llc | Condenser for extreme-UV lithography with discharge source |
| US6972421B2 (en) * | 2000-06-09 | 2005-12-06 | Cymer, Inc. | Extreme ultraviolet light source |
| JP2003142296A (ja) * | 2001-11-05 | 2003-05-16 | Canon Inc | Ｘ線発生装置 |
| EP1333323A3 (en) * | 2002-02-01 | 2004-10-06 | Nikon Corporation | Self-cleaning reflective optical elements for use in x-ray optical systems, and optical systems and microlithography systems comprising same |
| EP1348984A1 (en) * | 2002-03-27 | 2003-10-01 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Optical broad band element and process for its production |
| JP2004037295A (ja) * | 2002-07-04 | 2004-02-05 | Nikon Corp | 多層膜反射鏡、その製造方法、多層膜反射鏡の反射率回復方法、軟ｘ線光学系及び軟ｘ線露光装置 |
| US6968850B2 (en) * | 2002-07-15 | 2005-11-29 | Intel Corporation | In-situ cleaning of light source collector optics |
| JP2004093483A (ja) * | 2002-09-03 | 2004-03-25 | Nikon Corp | 多層膜反射鏡及び露光装置 |
| WO2004104707A2 (de) * | 2003-05-22 | 2004-12-02 | Philips Intellectual Property & Standards Gmbh | Verfahren und vorrichtung zum reinigen mindestens einer optischen komponente |
-
2003
- 2003-10-20 EP EP03078316A patent/EP1526550A1/en not_active Withdrawn
- 2003-10-20 EP EP05108671A patent/EP1624467A3/en not_active Withdrawn
-
2004
- 2004-10-15 TW TW093131449A patent/TW200527128A/zh unknown
- 2004-10-19 JP JP2004304405A patent/JP2005129936A/ja active Pending
- 2004-10-19 KR KR1020040083486A patent/KR100794278B1/ko not_active IP Right Cessation
- 2004-10-19 CN CNA2004100951484A patent/CN1609715A/zh active Pending
- 2004-10-19 SG SG200406153A patent/SG111237A1/en unknown
- 2004-10-20 US US10/968,471 patent/US7592610B2/en not_active Expired - Fee Related
-
2008
- 2008-11-13 JP JP2008290853A patent/JP4805997B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009055064A (ja) | 2009-03-12 |
| KR100794278B1 (ko) | 2008-01-11 |
| JP4805997B2 (ja) | 2011-11-02 |
| US7592610B2 (en) | 2009-09-22 |
| KR20050037962A (ko) | 2005-04-25 |
| US20050111080A1 (en) | 2005-05-26 |
| CN1609715A (zh) | 2005-04-27 |
| JP2005129936A (ja) | 2005-05-19 |
| TW200527128A (en) | 2005-08-16 |
| EP1526550A1 (en) | 2005-04-27 |
| EP1624467A2 (en) | 2006-02-08 |
| EP1624467A3 (en) | 2007-05-30 |
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