SG10202102010YA - Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate - Google Patents

Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate

Info

Publication number
SG10202102010YA
SG10202102010YA SG10202102010YA SG10202102010YA SG10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA SG 10202102010Y A SG10202102010Y A SG 10202102010YA
Authority
SG
Singapore
Prior art keywords
polishing
polishing slurry
glass substrate
abrasive particles
producing
Prior art date
Application number
SG10202102010YA
Other languages
English (en)
Inventor
Ken Tamura
Masanori Tamaki
Kyosuke Iiizumi
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Publication of SG10202102010YA publication Critical patent/SG10202102010YA/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/14—Anti-slip materials; Abrasives
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
SG10202102010YA 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate SG10202102010YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2014156776 2014-07-31
JP2014156779 2014-07-31

Publications (1)

Publication Number Publication Date
SG10202102010YA true SG10202102010YA (en) 2021-04-29

Family

ID=55217713

Family Applications (2)

Application Number Title Priority Date Filing Date
SG11201610743PA SG11201610743PA (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive grains, polishing slurry, and method for producing glass substrate
SG10202102010YA SG10202102010YA (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive particles, polishing slurry, and method for manufacturing glass substrate

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG11201610743PA SG11201610743PA (en) 2014-07-31 2015-07-31 Method for producing polishing slurry, polishing abrasive grains, polishing slurry, and method for producing glass substrate

Country Status (5)

Country Link
JP (1) JP6357536B2 (ja)
CN (1) CN106661428B (ja)
MY (1) MY182259A (ja)
SG (2) SG11201610743PA (ja)
WO (1) WO2016017819A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019164722A1 (en) * 2018-02-20 2019-08-29 Engis Corporation Fixed abrasive three-dimensional lapping and polishing plate and methods of making and using the same
JP7074644B2 (ja) * 2018-10-31 2022-05-24 信越化学工業株式会社 合成石英ガラス基板の研磨用研磨粒子の製造方法、並びに合成石英ガラス基板の研磨方法
CN110756006B (zh) * 2019-07-10 2021-09-28 内蒙古中泰汇金环保科技有限公司 一种用于处理危废无机盐资源化产生的废气的急冷吸收塔

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3446988B2 (ja) * 1997-04-10 2003-09-16 三井金属鉱業株式会社 廃セリウム研摩材からの研摩材原料の回収方法
JP2001009723A (ja) * 1999-07-02 2001-01-16 Kurita Water Ind Ltd 研磨材の回収装置
JP2001277132A (ja) * 2000-03-31 2001-10-09 Ando Michihiro 研磨用砥石及びその製造方法
EP1332194B1 (en) * 2000-10-06 2007-01-03 3M Innovative Properties Company Ceramic aggregate particles
TWI281493B (en) * 2000-10-06 2007-05-21 Mitsui Mining & Smelting Co Polishing material
US6551366B1 (en) * 2000-11-10 2003-04-22 3M Innovative Properties Company Spray drying methods of making agglomerate abrasive grains and abrasive articles
US6797023B2 (en) * 2002-05-14 2004-09-28 Saint-Gobain Abrasives Technology Company Coated abrasives
JP4301434B2 (ja) * 2003-03-04 2009-07-22 株式会社リコー 研磨砥粒及び研磨具
JP2004306210A (ja) * 2003-04-08 2004-11-04 Speedfam Co Ltd ガラス研磨における排出水中の酸化セリウム系研磨剤と水を再利用するための処理方法とその処理装置
JP4849590B2 (ja) * 2004-12-28 2012-01-11 株式会社リコー 研磨工具及びその製造方法
JP2007136559A (ja) * 2005-11-15 2007-06-07 Kurenooton Kk ビトリファイド砥石及びその製造方法
JP4729428B2 (ja) * 2006-04-07 2011-07-20 Ａｇｃセイミケミカル株式会社 セリウム系研磨剤の再生方法
JP5150833B2 (ja) * 2006-07-07 2013-02-27 国立大学法人 熊本大学 複合粒子の製造方法
PT2436747E (pt) * 2007-01-23 2014-09-04 Saint Gobain Abrasives Inc Produtos abrasivos revestidos contendo agregados
EP2451613A1 (en) * 2009-06-25 2012-05-16 Evonik Degussa GmbH Dispersion comprising cerium oxide and silicon dioxide
JP2011011307A (ja) * 2009-07-03 2011-01-20 Sumco Corp ウェーハ研磨用スラリーのリサイクル方法およびそのリサイクル装置
JP2012011525A (ja) * 2010-07-02 2012-01-19 Admatechs Co Ltd 研磨材およびその製造方法
US8888878B2 (en) * 2010-12-30 2014-11-18 Saint-Gobain Abrasives, Inc. Coated abrasive aggregates and products containg same
JP2013129056A (ja) * 2011-11-21 2013-07-04 Tosoh Corp 研磨用ジルコニア複合粉末及びその製造方法

Also Published As

Publication number Publication date
SG11201610743PA (en) 2017-02-27
JP6357536B2 (ja) 2018-07-11
CN106661428A (zh) 2017-05-10
MY182259A (en) 2021-01-18
JPWO2016017819A1 (ja) 2017-05-25
CN106661428B (zh) 2020-01-31
WO2016017819A1 (ja) 2016-02-04

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