MY182259A - Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particles - Google Patents
Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particlesInfo
- Publication number
- MY182259A MY182259A MYPI2016704793A MYPI2016704793A MY182259A MY 182259 A MY182259 A MY 182259A MY PI2016704793 A MYPI2016704793 A MY PI2016704793A MY PI2016704793 A MYPI2016704793 A MY PI2016704793A MY 182259 A MY182259 A MY 182259A
- Authority
- MY
- Malaysia
- Prior art keywords
- abrasive particles
- raw
- polishing
- glass substrate
- mass
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C19/00—Surface treatment of glass, not in the form of fibres or filaments, by mechanical means
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K3/00—Materials not provided for elsewhere
- C09K3/14—Anti-slip materials; Abrasives
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
Abstract
Provided is a method for producing a polishing slurry, polishing abrasive particles, and a polishing slurry, according to which a polishing rate is improved, and the formation of marks on a glass substrate can be suppressed. Also provided is a method for manufacturing a glass substrate using such a polishing slurry and polishing abrasive particles. The method for producing the polishing slurry of the present invention is a method for producing a polishing slurry including polishing abrasive particles for use in processing for polishing a glass substrate, including: adding processing in which binders are added to a raw-material slurry including raw-material abrasive particles serving as a raw material for the polishing abrasive particles; drying processing in which the raw-material slurry including the binders is dried to produce a mass of the raw-material abrasive particles including the binders; and firing processing in which the mass of the raw-material abrasive particles is fired to produce a cluster of the raw-material abrasive particles including the binders.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014156779 | 2014-07-31 | ||
JP2014156776 | 2014-07-31 | ||
PCT/JP2015/071894 WO2016017819A1 (en) | 2014-07-31 | 2015-07-31 | Method for producing polishing slurry, polishing abrasive grains, polishing slurry, and method for producing glass substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
MY182259A true MY182259A (en) | 2021-01-18 |
Family
ID=55217713
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
MYPI2016704793A MY182259A (en) | 2014-07-31 | 2015-07-31 | Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particles |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6357536B2 (en) |
CN (1) | CN106661428B (en) |
MY (1) | MY182259A (en) |
SG (2) | SG11201610743PA (en) |
WO (1) | WO2016017819A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2019164722A1 (en) * | 2018-02-20 | 2019-08-29 | Engis Corporation | Fixed abrasive three-dimensional lapping and polishing plate and methods of making and using the same |
JP7074644B2 (en) * | 2018-10-31 | 2022-05-24 | 信越化学工業株式会社 | A method for manufacturing abrasive particles for polishing a synthetic quartz glass substrate, and a method for polishing a synthetic quartz glass substrate. |
CN110756006B (en) * | 2019-07-10 | 2021-09-28 | 内蒙古中泰汇金环保科技有限公司 | Quenching absorption tower for treating waste gas generated by recycling hazardous waste inorganic salt |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3446988B2 (en) * | 1997-04-10 | 2003-09-16 | 三井金属鉱業株式会社 | Method for recovering abrasive raw materials from waste cerium abrasive |
JP2001009723A (en) * | 1999-07-02 | 2001-01-16 | Kurita Water Ind Ltd | Abrasive recovering device |
JP2001277132A (en) * | 2000-03-31 | 2001-10-09 | Ando Michihiro | Grinding wheel and its manufacturing method |
TWI281493B (en) * | 2000-10-06 | 2007-05-21 | Mitsui Mining & Smelting Co | Polishing material |
DE60125808T2 (en) * | 2000-10-06 | 2007-10-11 | 3M Innovative Properties Co., St. Paul | CERAMIC AGGREGATE PARTICLES |
US6551366B1 (en) * | 2000-11-10 | 2003-04-22 | 3M Innovative Properties Company | Spray drying methods of making agglomerate abrasive grains and abrasive articles |
US6797023B2 (en) * | 2002-05-14 | 2004-09-28 | Saint-Gobain Abrasives Technology Company | Coated abrasives |
JP4301434B2 (en) * | 2003-03-04 | 2009-07-22 | 株式会社リコー | Polishing abrasive grains and polishing tool |
JP2004306210A (en) * | 2003-04-08 | 2004-11-04 | Speedfam Co Ltd | Processing method and processing equipment for reusing cerium oxide-based polishing agent and water, in drainage in glass polishing |
JP4849590B2 (en) * | 2004-12-28 | 2012-01-11 | 株式会社リコー | Polishing tool and manufacturing method thereof |
JP2007136559A (en) * | 2005-11-15 | 2007-06-07 | Kurenooton Kk | Vitrified grinding stone, and its manufacturing method |
JP4729428B2 (en) * | 2006-04-07 | 2011-07-20 | Agcセイミケミカル株式会社 | Regeneration method of cerium-based abrasive |
JP5150833B2 (en) * | 2006-07-07 | 2013-02-27 | 国立大学法人 熊本大学 | Method for producing composite particles |
PL2125984T3 (en) * | 2007-01-23 | 2012-09-28 | Saint Gobain Abrasives Inc | Coated abrasive products containing aggregates |
EP2451613A1 (en) * | 2009-06-25 | 2012-05-16 | Evonik Degussa GmbH | Dispersion comprising cerium oxide and silicon dioxide |
JP2011011307A (en) * | 2009-07-03 | 2011-01-20 | Sumco Corp | Recycling method and recycling apparatus of slurry for use in wafer polishing |
JP2012011525A (en) * | 2010-07-02 | 2012-01-19 | Admatechs Co Ltd | Abrasive and manufacturing method thereof |
US8888878B2 (en) * | 2010-12-30 | 2014-11-18 | Saint-Gobain Abrasives, Inc. | Coated abrasive aggregates and products containg same |
JP2013129056A (en) * | 2011-11-21 | 2013-07-04 | Tosoh Corp | Zirconia composite powder for polishing and method for producing the same |
-
2015
- 2015-07-31 MY MYPI2016704793A patent/MY182259A/en unknown
- 2015-07-31 SG SG11201610743PA patent/SG11201610743PA/en unknown
- 2015-07-31 WO PCT/JP2015/071894 patent/WO2016017819A1/en active Application Filing
- 2015-07-31 CN CN201580040539.2A patent/CN106661428B/en active Active
- 2015-07-31 SG SG10202102010YA patent/SG10202102010YA/en unknown
- 2015-07-31 JP JP2016538472A patent/JP6357536B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN106661428B (en) | 2020-01-31 |
CN106661428A (en) | 2017-05-10 |
SG11201610743PA (en) | 2017-02-27 |
WO2016017819A1 (en) | 2016-02-04 |
SG10202102010YA (en) | 2021-04-29 |
JPWO2016017819A1 (en) | 2017-05-25 |
JP6357536B2 (en) | 2018-07-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP3137433A4 (en) | Drying, sizing and shaping process to manufacture ceramic abrasive grain | |
MX2017004141A (en) | Method for the production of homogenized tobacco material. | |
JP2016521235A5 (en) | ||
EA201690781A1 (en) | METHOD OF FORMING A DECORATIVE WEAR RESISTANT LAYER | |
MX2015017782A (en) | Abrasive article including shaped abrasive particles. | |
MX2015017794A (en) | Abrasive article including shaped abrasive particles. | |
MX2017000700A (en) | Ceramic grains and method for their production. | |
IL245976B1 (en) | Machine for smoothing and/or polishing slabs of stone material, such as natural or agglomerated stone, ceramic and glass | |
EA201890004A1 (en) | METHOD OF MANUFACTURE OF HIGHLY REACTIVE CEMENT | |
IL267505A (en) | Machine and method for grinding and/or polishing slabs of stone material, such as natural or agglomerated stone, ceramic and glass | |
MX355889B (en) | Process for making tiles. | |
PL3313612T3 (en) | Grinding machine for plate-like elements, particularly ceramic tiles and plates, natural stones, glass or similar | |
MY182934A (en) | Raw material for direct reduction, method of producing raw material for direct reduction, and method of producing reduced iron | |
EP3128535A4 (en) | SURFACE TREATMENT METHOD FOR SiC SUBSTRATES, SiC SUBSTRATE, AND SEMICONDUCTOR PRODUCTION METHOD | |
SG11202005140RA (en) | Polishing slurry composition for sti process | |
UA117826C2 (en) | Batch composition for producing an unshaped refractory ceramic product, method for producing a fired refractory ceramic product, fired refractory ceramic product, and use of an unshaped refractory ceramic product | |
MX2017003301A (en) | Refractory product, batch composition for producing said product, method for producing the product and use of said product. | |
SG11202100586PA (en) | Slurry, polishing solution production method, and polishing method | |
MY182259A (en) | Method for producing polishing slurry, method for manufacturing glass substrate, and mass of raw-material abrasive particles | |
TW201611944A (en) | Method for producing target material for cylindrical sputtering target and cylindrical sputtering target | |
MX2021001223A (en) | Additive manufacturing of structural components on the basis of silicon carbide with embedded diamond particles. | |
PH12017500440A1 (en) | Dry process for preparing a surface-modified alkaline earth metal carbonate-containing material | |
MY177468A (en) | Method for producing a polished article | |
MY173233A (en) | Methods and compositions comprising cement kiln dust having an altered particle size | |
SG11201702917RA (en) | Method for manufacturing magnetic-disk substrate, and grindstone for grinding |