SG10202013005WA - Processing apparatus for electronic component - Google Patents
Processing apparatus for electronic componentInfo
- Publication number
- SG10202013005WA SG10202013005WA SG10202013005WA SG10202013005WA SG10202013005WA SG 10202013005W A SG10202013005W A SG 10202013005WA SG 10202013005W A SG10202013005W A SG 10202013005WA SG 10202013005W A SG10202013005W A SG 10202013005WA SG 10202013005W A SG10202013005W A SG 10202013005WA
- Authority
- SG
- Singapore
- Prior art keywords
- processing apparatus
- electronic component
- electronic
- component
- processing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95684—Patterns showing highly reflecting parts, e.g. metallic elements
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
- G01N21/9505—Wafer internal defects, e.g. microcracks
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/01—Subjecting similar articles in turn to test, e.g. "go/no-go" tests in mass production; Testing objects at points as they pass through a testing station
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2601—Apparatus or methods therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/265—Contactless testing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/302—Contactless testing
- G01R31/308—Contactless testing using non-ionising electromagnetic radiation, e.g. optical radiation
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
- G06T7/001—Industrial image inspection using an image reference approach
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/10—Measuring as part of the manufacturing process
- H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/56—Cameras or camera modules comprising electronic image sensors; Control thereof provided with illuminating means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8835—Adjustable illumination, e.g. software adjustable screen
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8845—Multiple wavelengths of illumination or detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/04—Batch operation; multisample devices
- G01N2201/0407—Batch operation; multisample devices with multiple optical units, e.g. one per sample
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/04—Batch operation; multisample devices
- G01N2201/0415—Carrusel, sequential
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/04—Batch operation; multisample devices
- G01N2201/0415—Carrusel, sequential
- G01N2201/0423—Carrusel, sequential with rotating optics
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/04—Batch operation; multisample devices
- G01N2201/0438—Linear motion, sequential
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/04—Batch operation; multisample devices
- G01N2201/0453—Multicell sequential and multitest, e.g. multiwavelength
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/06—Illumination; Optics
- G01N2201/063—Illuminating optical parts
- G01N2201/0638—Refractive parts
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/90—Arrangement of cameras or camera modules, e.g. multiple cameras in TV studios or sports stadiums
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019234656A JP6755603B1 (ja) | 2019-12-25 | 2019-12-25 | 電子部品の処理装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10202013005WA true SG10202013005WA (en) | 2021-07-29 |
Family
ID=72432302
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10202013005WA SG10202013005WA (en) | 2019-12-25 | 2020-12-23 | Processing apparatus for electronic component |
Country Status (6)
Country | Link |
---|---|
US (1) | US11244842B2 (zh) |
JP (1) | JP6755603B1 (zh) |
CN (1) | CN112710675A (zh) |
MY (1) | MY190241A (zh) |
SG (1) | SG10202013005WA (zh) |
TW (1) | TWI744148B (zh) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6906779B1 (ja) * | 2021-03-11 | 2021-07-21 | ヴィスコ・テクノロジーズ株式会社 | 半導体チップの検査方法及び装置 |
US20220309646A1 (en) * | 2021-03-26 | 2022-09-29 | Changxin Memory Technologies, Inc. | Acquisition apparatus, acquisition system and acquisition method |
Family Cites Families (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09311109A (ja) * | 1996-05-22 | 1997-12-02 | Matsushita Electric Ind Co Ltd | 光を使用した欠陥検査方法、およびその装置 |
JP4176622B2 (ja) * | 2003-11-21 | 2008-11-05 | 日本板硝子株式会社 | 板状ガラスの欠陥検出方法及び欠陥検出装置 |
JP4560514B2 (ja) * | 2004-03-15 | 2010-10-13 | パナソニック株式会社 | 部品装着精度の検査方法及び検査装置 |
JP2006184177A (ja) * | 2004-12-28 | 2006-07-13 | Mitsubishi Electric Corp | 赤外検査装置及び赤外検査方法 |
JP4973062B2 (ja) * | 2006-08-14 | 2012-07-11 | ヤマハ株式会社 | 半導体チップの検査方法及びウェハのクラック検査装置 |
KR20080015363A (ko) | 2006-08-14 | 2008-02-19 | 야마하 가부시키가이샤 | 웨이퍼 및 반도체 소자의 검사 방법 및 장치 |
US20080174691A1 (en) * | 2007-01-19 | 2008-07-24 | Quality Vision International Inc. | Strobed image acquisition guided by range sensor |
JP5355922B2 (ja) | 2008-03-31 | 2013-11-27 | 株式会社日立ハイテクノロジーズ | 欠陥検査装置 |
KR101323035B1 (ko) * | 2009-05-29 | 2013-10-29 | 로세브 테크놀로지 코포레이션 | 다결정 웨이퍼의 검사 방법 |
DE102009050711A1 (de) * | 2009-10-26 | 2011-05-05 | Schott Ag | Verfahren und Vorrichtung zur Detektion von Rissen in Halbleitersubstraten |
JP2014077637A (ja) * | 2011-02-01 | 2014-05-01 | Asahi Glass Co Ltd | 光透過性板状物検査システム |
JP6029394B2 (ja) * | 2012-09-11 | 2016-11-24 | 株式会社キーエンス | 形状測定装置 |
JP6370177B2 (ja) * | 2014-09-05 | 2018-08-08 | 株式会社Screenホールディングス | 検査装置および検査方法 |
SG10202110739PA (en) | 2014-12-05 | 2021-11-29 | Kla Tencor Corp | Apparatus, method and computer program product for defect detection in work pieces |
KR101745764B1 (ko) * | 2014-12-30 | 2017-06-12 | 주식회사 포스코아이씨티 | 광학식 판재 표면검사장치 및 판재 표면검사방법 |
US11308601B2 (en) * | 2015-04-29 | 2022-04-19 | Emhart Glass S.A. | Container inspection system with individual light control |
JP6474334B2 (ja) * | 2015-07-30 | 2019-02-27 | 株式会社キーエンス | 画像検査装置、画像検査方法および画像検査プログラム |
JP2017053775A (ja) * | 2015-09-10 | 2017-03-16 | 東レエンジニアリング株式会社 | 光透過性を備えた物体内部の撮像装置および検査装置 |
US20180374239A1 (en) * | 2015-11-09 | 2018-12-27 | Cognex Corporation | System and method for field calibration of a vision system imaging two opposite sides of a calibration object |
US11042788B2 (en) * | 2016-01-28 | 2021-06-22 | Siemens Healthcare Diagnostics Inc. | Methods and apparatus adapted to identify a specimen container from multiple lateral views |
US10899138B2 (en) * | 2017-01-11 | 2021-01-26 | Applied Vision Corporation | Container inspection system controlling printheads to correct for detected ink thickness errors |
EP3413340B1 (en) * | 2017-06-08 | 2021-11-17 | Brooks Automation (Germany) GmbH | Method for inspecting a container and inspection system |
EP3413339B1 (en) * | 2017-06-08 | 2023-05-24 | Brooks Automation (Germany) GmbH | Inspection system and method of inspection for substrate containers |
JP2019049424A (ja) * | 2017-09-08 | 2019-03-28 | 上野精機株式会社 | 電子部品の検査装置 |
FR3073043B1 (fr) * | 2017-10-27 | 2019-11-15 | Tiama | Procede et installation de controle dimensionnel en ligne d'objets manufactures |
DE102017129356B3 (de) * | 2017-12-08 | 2019-03-07 | Infineon Technologies Ag | Inspektionsverfahren für halbleitersubstrate unter verwendung von neigungsdaten und inspektionsgerät |
CN208636220U (zh) * | 2018-04-04 | 2019-03-22 | 株式会社高永科技 | 检查装置 |
-
2019
- 2019-12-25 JP JP2019234656A patent/JP6755603B1/ja active Active
-
2020
- 2020-12-16 US US17/123,699 patent/US11244842B2/en active Active
- 2020-12-18 CN CN202011502899.9A patent/CN112710675A/zh active Pending
- 2020-12-23 MY MYPI2020006951A patent/MY190241A/en unknown
- 2020-12-23 SG SG10202013005WA patent/SG10202013005WA/en unknown
- 2020-12-25 TW TW109146104A patent/TWI744148B/zh active
Also Published As
Publication number | Publication date |
---|---|
TW202135189A (zh) | 2021-09-16 |
CN112710675A (zh) | 2021-04-27 |
MY190241A (en) | 2022-04-07 |
US11244842B2 (en) | 2022-02-08 |
JP6755603B1 (ja) | 2020-09-16 |
TWI744148B (zh) | 2021-10-21 |
JP2021103131A (ja) | 2021-07-15 |
US20210202286A1 (en) | 2021-07-01 |
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