SG10201912818WA - Topographic phase control for overlay measurement - Google Patents
Topographic phase control for overlay measurementInfo
- Publication number
- SG10201912818WA SG10201912818WA SG10201912818WA SG10201912818WA SG10201912818WA SG 10201912818W A SG10201912818W A SG 10201912818WA SG 10201912818W A SG10201912818W A SG 10201912818WA SG 10201912818W A SG10201912818W A SG 10201912818WA SG 10201912818W A SG10201912818W A SG 10201912818WA
- Authority
- SG
- Singapore
- Prior art keywords
- phase control
- overlay measurement
- topographic phase
- topographic
- overlay
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/32—Fiducial marks and measuring scales within the optical system
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/28—Systems for automatic generation of focusing signals
- G02B7/36—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals
- G02B7/38—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals measured at different points on the optical axis, e.g. focussing on two or more planes and comparing image data
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
- H04N23/672—Focus control based on electronic image sensor signals based on the phase difference signals
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/67—Focus control based on electronic image sensor signals
- H04N23/673—Focus control based on electronic image sensor signals based on contrast or high frequency components of image signals, e.g. hill climbing method
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/65—Raman scattering
- G01N2021/653—Coherent methods [CARS]
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201562163783P | 2015-05-19 | 2015-05-19 | |
US201562222724P | 2015-09-23 | 2015-09-23 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201912818WA true SG10201912818WA (en) | 2020-02-27 |
Family
ID=57320785
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201912818WA SG10201912818WA (en) | 2015-05-19 | 2016-05-19 | Topographic phase control for overlay measurement |
SG10201912822UA SG10201912822UA (en) | 2015-05-19 | 2016-05-19 | Topographic phase control for overlay measurement |
SG10201912816UA SG10201912816UA (en) | 2015-05-19 | 2016-05-19 | Topographic phase control for overlay measurement |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201912822UA SG10201912822UA (en) | 2015-05-19 | 2016-05-19 | Topographic phase control for overlay measurement |
SG10201912816UA SG10201912816UA (en) | 2015-05-19 | 2016-05-19 | Topographic phase control for overlay measurement |
Country Status (7)
Country | Link |
---|---|
US (5) | US10520832B2 (zh) |
JP (4) | JP6879939B2 (zh) |
KR (4) | KR102607646B1 (zh) |
CN (4) | CN112859541A (zh) |
SG (3) | SG10201912818WA (zh) |
TW (4) | TWI752764B (zh) |
WO (1) | WO2016187468A1 (zh) |
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KR102607646B1 (ko) * | 2015-05-19 | 2023-11-29 | 케이엘에이 코포레이션 | 오버레이 측정을 위한 지형 위상 제어 |
US9989806B2 (en) * | 2015-09-10 | 2018-06-05 | Samsung Display Co., Ltd. | Color conversion panel and display device including the same |
EP3387371B1 (en) | 2015-12-08 | 2023-04-19 | KLA-Tencor Corporation | Control of amplitude and phase of diffraction orders using polarizing targets and polarized illumination |
CN110312966B (zh) * | 2017-02-10 | 2022-03-25 | 科磊股份有限公司 | 与散射测量术测量中的光栅非对称相关的不精确性的减轻 |
JP2020529621A (ja) | 2017-06-06 | 2020-10-08 | ケーエルエー コーポレイション | レティクル最適化アルゴリズム及び最適ターゲットデザイン |
EP3454123A1 (en) * | 2017-09-06 | 2019-03-13 | ASML Netherlands B.V. | Metrology method and apparatus |
EP3499312A1 (en) * | 2017-12-15 | 2019-06-19 | ASML Netherlands B.V. | Metrology apparatus and a method of determining a characteristic of interest |
WO2019091678A1 (en) * | 2017-11-07 | 2019-05-16 | Asml Netherlands B.V. | Metrology apparatus and a method of determining a characteristic of interest |
US11085754B2 (en) * | 2017-12-12 | 2021-08-10 | Kla Corporation | Enhancing metrology target information content |
EP3521929A1 (en) * | 2018-02-02 | 2019-08-07 | ASML Netherlands B.V. | Method of determining an optimal focus height for a metrology apparatus |
KR102544707B1 (ko) | 2018-02-27 | 2023-06-16 | 에이에스엠엘 네델란즈 비.브이. | 기판 상의 하나 이상의 구조체의 특성을 결정하기 위한 계측 장치 및 방법 |
IL277294B1 (en) * | 2018-03-19 | 2024-01-01 | Kla Corp | Spread measurement using multiple wavelengths |
US10677588B2 (en) | 2018-04-09 | 2020-06-09 | Kla-Tencor Corporation | Localized telecentricity and focus optimization for overlay metrology |
WO2019236084A1 (en) * | 2018-06-07 | 2019-12-12 | Kla-Tencor Corporation | Overlay measurement using phase and amplitude modeling |
WO2020046408A1 (en) | 2018-08-28 | 2020-03-05 | Kla-Tencor Corporation | Off-axis illumination overlay measurement using two-diffracted orders imaging |
KR20210091803A (ko) * | 2018-12-31 | 2021-07-22 | 에이에스엠엘 네델란즈 비.브이. | 오버레이 계측을 위한 방법 및 그 장치 |
WO2020168140A1 (en) | 2019-02-14 | 2020-08-20 | Kla Corporation | Method of measuring misregistration in the manufacture of topographic semiconductor device wafers |
US11703460B2 (en) | 2019-07-09 | 2023-07-18 | Kla Corporation | Methods and systems for optical surface defect material characterization |
US11914290B2 (en) | 2019-07-24 | 2024-02-27 | Kla Corporation | Overlay measurement targets design |
US11346657B2 (en) * | 2020-05-22 | 2022-05-31 | Kla Corporation | Measurement modes for overlay |
KR20210156894A (ko) * | 2020-06-18 | 2021-12-28 | 삼성전자주식회사 | 스루-포커스 이미지 기반 계측 장치, 그것의 동작 방법, 및 그 동작을 실행하는 컴퓨팅 장치 |
CN113467033A (zh) * | 2021-06-24 | 2021-10-01 | 南昌欧菲光电技术有限公司 | 一种摄像头模组及其透镜的定位方法 |
CN113777731A (zh) * | 2021-08-11 | 2021-12-10 | 中国工程物理研究院应用电子学研究所 | 一种共轴反转环型连续变密度衰减器装置及其工作方法 |
CN113985711B (zh) * | 2021-10-28 | 2024-02-02 | 无锡卓海科技股份有限公司 | 一种套刻测量装置 |
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-
2016
- 2016-05-19 KR KR1020217038910A patent/KR102607646B1/ko active IP Right Grant
- 2016-05-19 CN CN202110100981.7A patent/CN112859541A/zh active Pending
- 2016-05-19 TW TW109145523A patent/TWI752764B/zh active
- 2016-05-19 JP JP2017560538A patent/JP6879939B2/ja active Active
- 2016-05-19 TW TW105115575A patent/TWI715582B/zh active
- 2016-05-19 TW TW109145524A patent/TWI755987B/zh active
- 2016-05-19 SG SG10201912818WA patent/SG10201912818WA/en unknown
- 2016-05-19 CN CN202110100880.XA patent/CN112859540A/zh active Pending
- 2016-05-19 CN CN201680028226.XA patent/CN107636538B/zh active Active
- 2016-05-19 CN CN202110100983.6A patent/CN112859542A/zh active Pending
- 2016-05-19 SG SG10201912822UA patent/SG10201912822UA/en unknown
- 2016-05-19 US US15/114,175 patent/US10520832B2/en active Active
- 2016-05-19 KR KR1020217038903A patent/KR20210149884A/ko active IP Right Grant
- 2016-05-19 TW TW109145525A patent/TWI760984B/zh active
- 2016-05-19 KR KR1020217038906A patent/KR20210149885A/ko not_active Application Discontinuation
- 2016-05-19 SG SG10201912816UA patent/SG10201912816UA/en unknown
- 2016-05-19 WO PCT/US2016/033353 patent/WO2016187468A1/en active Application Filing
- 2016-05-19 KR KR1020177036236A patent/KR102334168B1/ko active IP Right Grant
-
2019
- 2019-11-03 US US16/672,475 patent/US20200142321A1/en not_active Abandoned
- 2019-11-03 US US16/672,483 patent/US11314173B2/en active Active
- 2019-11-03 US US16/672,480 patent/US20200142322A1/en not_active Abandoned
-
2021
- 2021-04-26 US US17/241,006 patent/US20210255551A1/en active Pending
- 2021-04-30 JP JP2021077243A patent/JP7253006B2/ja active Active
- 2021-04-30 JP JP2021077244A patent/JP7250063B2/ja active Active
- 2021-04-30 JP JP2021077245A patent/JP7250064B2/ja active Active
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