SG10201800707SA - Apparatuses and methods for maintaining ph in nickel electroplating baths - Google Patents
Apparatuses and methods for maintaining ph in nickel electroplating bathsInfo
- Publication number
- SG10201800707SA SG10201800707SA SG10201800707SA SG10201800707SA SG10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA
- Authority
- SG
- Singapore
- Prior art keywords
- apparatuses
- maintaining
- methods
- electroplating baths
- nickel electroplating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/04—Removal of gases or vapours ; Gas or pressure control
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/002—Cell separation, e.g. membranes, diaphragms
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
- C25D21/14—Controlled addition of electrolyte components
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
- C25D7/12—Semiconductors
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US13/960,624 US10190232B2 (en) | 2013-08-06 | 2013-08-06 | Apparatuses and methods for maintaining pH in nickel electroplating baths |
Publications (1)
Publication Number | Publication Date |
---|---|
SG10201800707SA true SG10201800707SA (en) | 2018-02-27 |
Family
ID=52447682
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201404510YA SG10201404510YA (en) | 2013-08-06 | 2014-07-31 | Apparatuses and methods for maintaining ph in nickel electroplating baths |
SG10201800707SA SG10201800707SA (en) | 2013-08-06 | 2014-07-31 | Apparatuses and methods for maintaining ph in nickel electroplating baths |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG10201404510YA SG10201404510YA (en) | 2013-08-06 | 2014-07-31 | Apparatuses and methods for maintaining ph in nickel electroplating baths |
Country Status (6)
Country | Link |
---|---|
US (1) | US10190232B2 (en) |
JP (1) | JP6502628B2 (en) |
KR (1) | KR102303998B1 (en) |
CN (1) | CN104342747B (en) |
SG (2) | SG10201404510YA (en) |
TW (2) | TWI657168B (en) |
Families Citing this family (23)
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US9732434B2 (en) | 2014-04-18 | 2017-08-15 | Lam Research Corporation | Methods and apparatuses for electroplating nickel using sulfur-free nickel anodes |
WO2015181706A1 (en) * | 2014-05-27 | 2015-12-03 | Auckland Uniservices Limited | Plating or coating method for producing metal-ceramic coating on a substrate |
CN104894633A (en) * | 2015-05-22 | 2015-09-09 | 北京中冶设备研究设计总院有限公司 | Continuous nickel electroplating solution supply device |
CN104947173A (en) * | 2015-05-22 | 2015-09-30 | 北京中冶设备研究设计总院有限公司 | Device and method for improving pH value of continuous electronickelling solution |
KR101667291B1 (en) * | 2015-06-30 | 2016-10-18 | 주식회사 포스코 | Electrodeposition coating apparatus and method |
US10227707B2 (en) | 2015-07-17 | 2019-03-12 | Applied Materials, Inc. | Inert anode electroplating processor and replenisher |
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KR20230141940A (en) * | 2016-10-12 | 2023-10-10 | 램 리써치 코포레이션 | Pad raising mechanism in wafer positioning pedestal for semiconductor processing |
JP6696462B2 (en) * | 2017-03-09 | 2020-05-20 | トヨタ自動車株式会社 | Metal film forming equipment |
US10240245B2 (en) | 2017-06-28 | 2019-03-26 | Honeywell International Inc. | Systems, methods, and anodes for enhanced ionic liquid bath plating of turbomachine components and other workpieces |
KR101872734B1 (en) * | 2017-07-20 | 2018-06-29 | 주식회사 익스톨 | Nickel electroplating solution and electroplating method using the same |
US10781527B2 (en) * | 2017-09-18 | 2020-09-22 | Lam Research Corporation | Methods and apparatus for controlling delivery of cross flowing and impinging electrolyte during electroplating |
JP2021501268A (en) * | 2017-11-01 | 2021-01-14 | ラム リサーチ コーポレーションLam Research Corporation | Control of plating electrolyte concentration in electrochemical plating equipment |
CN107672066A (en) * | 2017-11-09 | 2018-02-09 | 华晶精密制造股份有限公司 | Sand device on a kind of single line production diamond cutting secant equipment vertical suspending |
US10494731B2 (en) * | 2017-12-11 | 2019-12-03 | Applied Materials, Inc. | Electroplating dynamic edge control |
CN110047735A (en) * | 2019-04-02 | 2019-07-23 | 深圳市华星光电技术有限公司 | Metal structure wet process processing method, TFT preparation method, TFT and display device |
DE102019123858A1 (en) * | 2019-09-05 | 2021-03-11 | Thyssenkrupp Uhde Chlorine Engineers Gmbh | Cross-flow water electrolysis |
EP3868923A1 (en) * | 2020-02-19 | 2021-08-25 | Semsysco GmbH | Electrochemical deposition system for a chemical and/or electrolytic surface treatment of a substrate |
CN112267143B (en) * | 2020-09-29 | 2023-11-03 | 张家港扬子江冷轧板有限公司 | Device for eliminating fluxing solution adding spots and fluxing method thereof |
US11542626B2 (en) * | 2020-10-08 | 2023-01-03 | Honeywell International Inc. | Systems and methods for enclosed electroplating chambers |
CN114867892B (en) * | 2020-12-28 | 2024-03-15 | 株式会社荏原制作所 | Plating apparatus |
TWI789175B (en) * | 2021-12-23 | 2023-01-01 | 日商荏原製作所股份有限公司 | Maintenance method of plating equipment |
TWI814308B (en) * | 2022-03-28 | 2023-09-01 | 國立臺灣科技大學 | An equipment for continuously processing electrochemical device or component for increasing capacity thereof |
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US4554056A (en) | 1985-04-18 | 1985-11-19 | Eagle-Picher Industries, Inc. | Impregnation of nickel electrodes using electric pH control circuits |
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-
2013
- 2013-08-06 US US13/960,624 patent/US10190232B2/en active Active
-
2014
- 2014-07-31 SG SG10201404510YA patent/SG10201404510YA/en unknown
- 2014-07-31 SG SG10201800707SA patent/SG10201800707SA/en unknown
- 2014-08-04 JP JP2014158336A patent/JP6502628B2/en active Active
- 2014-08-05 TW TW103126801A patent/TWI657168B/en active
- 2014-08-05 TW TW107132345A patent/TW201843356A/en unknown
- 2014-08-06 CN CN201410382721.3A patent/CN104342747B/en active Active
- 2014-08-06 KR KR1020140101331A patent/KR102303998B1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2015030919A (en) | 2015-02-16 |
US10190232B2 (en) | 2019-01-29 |
KR20150017315A (en) | 2015-02-16 |
TWI657168B (en) | 2019-04-21 |
TW201527605A (en) | 2015-07-16 |
CN104342747A (en) | 2015-02-11 |
SG10201404510YA (en) | 2015-03-30 |
TW201843356A (en) | 2018-12-16 |
CN104342747B (en) | 2019-04-16 |
JP6502628B2 (en) | 2019-04-17 |
US20150041327A1 (en) | 2015-02-12 |
KR102303998B1 (en) | 2021-09-23 |
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