SG10201800707SA - Apparatuses and methods for maintaining ph in nickel electroplating baths - Google Patents

Apparatuses and methods for maintaining ph in nickel electroplating baths

Info

Publication number
SG10201800707SA
SG10201800707SA SG10201800707SA SG10201800707SA SG10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA SG 10201800707S A SG10201800707S A SG 10201800707SA
Authority
SG
Singapore
Prior art keywords
apparatuses
maintaining
methods
electroplating baths
nickel electroplating
Prior art date
Application number
SG10201800707SA
Inventor
Bryan L Buckalew
Thomas A Ponnuswamy
Ben Foley
Steven T Mayer
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of SG10201800707SA publication Critical patent/SG10201800707SA/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/04Removal of gases or vapours ; Gas or pressure control
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/002Cell separation, e.g. membranes, diaphragms
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/12Process control or regulation
    • C25D21/14Controlled addition of electrolyte components
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/12Electroplating: Baths therefor from solutions of nickel or cobalt
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/12Semiconductors
SG10201800707SA 2013-08-06 2014-07-31 Apparatuses and methods for maintaining ph in nickel electroplating baths SG10201800707SA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13/960,624 US10190232B2 (en) 2013-08-06 2013-08-06 Apparatuses and methods for maintaining pH in nickel electroplating baths

Publications (1)

Publication Number Publication Date
SG10201800707SA true SG10201800707SA (en) 2018-02-27

Family

ID=52447682

Family Applications (2)

Application Number Title Priority Date Filing Date
SG10201404510YA SG10201404510YA (en) 2013-08-06 2014-07-31 Apparatuses and methods for maintaining ph in nickel electroplating baths
SG10201800707SA SG10201800707SA (en) 2013-08-06 2014-07-31 Apparatuses and methods for maintaining ph in nickel electroplating baths

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG10201404510YA SG10201404510YA (en) 2013-08-06 2014-07-31 Apparatuses and methods for maintaining ph in nickel electroplating baths

Country Status (6)

Country Link
US (1) US10190232B2 (en)
JP (1) JP6502628B2 (en)
KR (1) KR102303998B1 (en)
CN (1) CN104342747B (en)
SG (2) SG10201404510YA (en)
TW (2) TWI657168B (en)

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US10781527B2 (en) * 2017-09-18 2020-09-22 Lam Research Corporation Methods and apparatus for controlling delivery of cross flowing and impinging electrolyte during electroplating
JP2021501268A (en) * 2017-11-01 2021-01-14 ラム リサーチ コーポレーションLam Research Corporation Control of plating electrolyte concentration in electrochemical plating equipment
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CN112267143B (en) * 2020-09-29 2023-11-03 张家港扬子江冷轧板有限公司 Device for eliminating fluxing solution adding spots and fluxing method thereof
US11542626B2 (en) * 2020-10-08 2023-01-03 Honeywell International Inc. Systems and methods for enclosed electroplating chambers
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Also Published As

Publication number Publication date
JP2015030919A (en) 2015-02-16
US10190232B2 (en) 2019-01-29
KR20150017315A (en) 2015-02-16
TWI657168B (en) 2019-04-21
TW201527605A (en) 2015-07-16
CN104342747A (en) 2015-02-11
SG10201404510YA (en) 2015-03-30
TW201843356A (en) 2018-12-16
CN104342747B (en) 2019-04-16
JP6502628B2 (en) 2019-04-17
US20150041327A1 (en) 2015-02-12
KR102303998B1 (en) 2021-09-23

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