SG11201509571RA - Electrolytic treatment method and electrolytic treatment device - Google Patents

Electrolytic treatment method and electrolytic treatment device

Info

Publication number
SG11201509571RA
SG11201509571RA SG11201509571RA SG11201509571RA SG11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA SG 11201509571R A SG11201509571R A SG 11201509571RA
Authority
SG
Singapore
Prior art keywords
electrolytic treatment
treatment device
treatment method
electrolytic
treatment
Prior art date
Application number
SG11201509571RA
Inventor
Haruo Iwatsu
Hidenori Akiyama
Original Assignee
Tokyo Electron Ltd
Univ Kumamoto Nat Univ Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd, Univ Kumamoto Nat Univ Corp filed Critical Tokyo Electron Ltd
Publication of SG11201509571RA publication Critical patent/SG11201509571RA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B7/00—Electrophoretic production of compounds or non-metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/02—Electrodes; Manufacture thereof not otherwise provided for characterised by shape or form
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B9/00—Cells or assemblies of cells; Constructional parts of cells; Assemblies of constructional parts, e.g. electrode-diaphragm assemblies; Process-related cell features
    • C25B9/30—Cells comprising movable electrodes, e.g. rotary electrodes; Assemblies of constructional parts thereof
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/10—Electrodes, e.g. composition, counter electrode
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/467—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis by electrochemical disinfection; by electrooxydation or by electroreduction

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Automation & Control Theory (AREA)
  • General Chemical & Material Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
SG11201509571RA 2013-05-20 2014-05-12 Electrolytic treatment method and electrolytic treatment device SG11201509571RA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013106072 2013-05-20
JP2014001465A JP6411741B2 (en) 2013-05-20 2014-01-08 Electrolytic treatment method and electrolytic treatment apparatus
PCT/JP2014/062585 WO2014188898A1 (en) 2013-05-20 2014-05-12 Electrolytic treatment method and electrolytic treatment device

Publications (1)

Publication Number Publication Date
SG11201509571RA true SG11201509571RA (en) 2015-12-30

Family

ID=51933459

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201509571RA SG11201509571RA (en) 2013-05-20 2014-05-12 Electrolytic treatment method and electrolytic treatment device

Country Status (7)

Country Link
US (1) US10036095B2 (en)
JP (1) JP6411741B2 (en)
KR (1) KR102217899B1 (en)
CN (1) CN105229205B (en)
SG (1) SG11201509571RA (en)
TW (1) TWI613332B (en)
WO (1) WO2014188898A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104229946B (en) * 2013-06-20 2017-02-08 罗民雄 Simple electrolysis method capable of preparing electrolytic water from pure water
US10294575B2 (en) * 2014-01-08 2019-05-21 Tokyo Electron Limited Electric field treatment method and electric field treatment device
JP2016113652A (en) * 2014-12-12 2016-06-23 春生 岩津 Electrolytic treatment method and electrolytic treatment apparatus
JP6501700B2 (en) * 2015-12-03 2019-04-17 東京エレクトロン株式会社 Electrolytic treatment apparatus and electrolytic treatment method
JP6806476B2 (en) * 2016-07-07 2021-01-06 春生 岩津 Electrolytic treatment method and electrolytic treatment equipment
KR102499511B1 (en) * 2016-10-07 2023-02-14 도쿄엘렉트론가부시키가이샤 Electrolytic treatment jig and electrolytic treatment method
WO2018068094A1 (en) * 2016-10-12 2018-04-19 Newsouth Innovations Pty Limited Method and apparatus for controlling an electrochemical process
JP6833521B2 (en) * 2017-01-06 2021-02-24 春生 岩津 Wiring forming method and wiring forming device
US11427921B2 (en) 2017-02-01 2022-08-30 Tokyo Electron Limited Electrolytic treatment apparatus and electrolytic treatment method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0798997B2 (en) * 1992-09-04 1995-10-25 株式会社イケックス工業 Metal electrodeposition method
DE19545231A1 (en) * 1995-11-21 1997-05-22 Atotech Deutschland Gmbh Process for the electrolytic deposition of metal layers
JP3765076B2 (en) * 2000-07-13 2006-04-12 藤一 竹間 Electrolysis method and apparatus
US8147660B1 (en) * 2002-04-04 2012-04-03 Novellus Systems, Inc. Semiconductive counter electrode for electrolytic current distribution control
CN1450207A (en) * 2002-04-05 2003-10-22 视动自动化科技股份有限公司 Electric field electron current decoupling electroplating device and control method thereof
JP4725145B2 (en) * 2005-03-17 2011-07-13 日本電気株式会社 Alloy plating method and alloy plating apparatus
JP4428299B2 (en) * 2005-06-17 2010-03-10 パナソニック株式会社 Plating equipment
JP3881687B1 (en) * 2005-08-05 2007-02-14 新光電気工業株式会社 Plating metal filling method and plating metal filling device
WO2010047375A1 (en) * 2008-10-22 2010-04-29 ローム株式会社 Method for forming boron-containing thin film and multilayer structure
JP5504147B2 (en) 2010-12-21 2014-05-28 株式会社荏原製作所 Electroplating method

Also Published As

Publication number Publication date
CN105229205A (en) 2016-01-06
WO2014188898A1 (en) 2014-11-27
JP2015004124A (en) 2015-01-08
KR102217899B1 (en) 2021-02-18
JP6411741B2 (en) 2018-10-24
KR20160009684A (en) 2016-01-26
CN105229205B (en) 2017-12-19
TW201500596A (en) 2015-01-01
US10036095B2 (en) 2018-07-31
US20160083856A1 (en) 2016-03-24
TWI613332B (en) 2018-02-01

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