SE9702629D0 - Laserdiod av typen med begravd heterostruktur - Google Patents
Laserdiod av typen med begravd heterostrukturInfo
- Publication number
- SE9702629D0 SE9702629D0 SE9702629A SE9702629A SE9702629D0 SE 9702629 D0 SE9702629 D0 SE 9702629D0 SE 9702629 A SE9702629 A SE 9702629A SE 9702629 A SE9702629 A SE 9702629A SE 9702629 D0 SE9702629 D0 SE 9702629D0
- Authority
- SE
- Sweden
- Prior art keywords
- layers
- type
- thin
- output power
- current
- Prior art date
Links
- 230000000903 blocking effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2222—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special electric properties
- H01S5/2226—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special electric properties semiconductors with a specific doping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/227—Buried mesa structure ; Striped active layer
- H01S5/2275—Buried mesa structure ; Striped active layer mesa created by etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/323—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser
- H01S5/3235—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers
- H01S5/32391—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures in AIIIBV compounds, e.g. AlGaAs-laser, InP-based laser emitting light at a wavelength longer than 1000 nm, e.g. InP-based 1300 nm and 1500 nm lasers based on In(Ga)(As)P
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Geometry (AREA)
- Semiconductor Lasers (AREA)
Priority Applications (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9702629A SE511719C2 (sv) | 1997-07-04 | 1997-07-04 | Begravd heterostrukturlaser med ströminneslutande skikt |
TW087101945A TW399343B (en) | 1997-07-04 | 1998-02-12 | A laser diode of the type having a buried heterostructure |
US09/108,971 US6222865B1 (en) | 1997-07-04 | 1998-07-02 | Laser diode of the type having a buried heterostructure |
CN98806913A CN1261985A (zh) | 1997-07-04 | 1998-07-03 | 具有掩埋异质结构类型的激光二极管 |
CA002294808A CA2294808A1 (en) | 1997-07-04 | 1998-07-03 | A laser diode of the type having a buried heterostructure |
PCT/SE1998/001315 WO1999001019A2 (en) | 1997-07-04 | 1998-07-03 | A laser diode of the type having a buried heterostructure |
JP2000500808A JP2001509638A (ja) | 1997-07-04 | 1998-07-03 | 埋込みヘテロ構造を有する型のレーザーダイオード |
EP98932697A EP1019993B1 (en) | 1997-07-04 | 1998-07-03 | A laser diode of the type having a buried heterostructure |
AU82517/98A AU8251798A (en) | 1997-07-04 | 1998-07-03 | A laser diode of the type having a buried heterostructure |
DE69826502T DE69826502T2 (de) | 1997-07-04 | 1998-07-03 | Laserdiode mit vergrabener heterostruktur |
KR10-1999-7012535A KR100404307B1 (ko) | 1997-07-04 | 1998-07-03 | 매립된 헤테로 구조를 갖는 형태의 레이저 다이오드 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE9702629A SE511719C2 (sv) | 1997-07-04 | 1997-07-04 | Begravd heterostrukturlaser med ströminneslutande skikt |
Publications (3)
Publication Number | Publication Date |
---|---|
SE9702629D0 true SE9702629D0 (sv) | 1997-07-04 |
SE9702629L SE9702629L (sv) | 1999-01-05 |
SE511719C2 SE511719C2 (sv) | 1999-11-15 |
Family
ID=20407677
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE9702629A SE511719C2 (sv) | 1997-07-04 | 1997-07-04 | Begravd heterostrukturlaser med ströminneslutande skikt |
Country Status (11)
Country | Link |
---|---|
US (1) | US6222865B1 (sv) |
EP (1) | EP1019993B1 (sv) |
JP (1) | JP2001509638A (sv) |
KR (1) | KR100404307B1 (sv) |
CN (1) | CN1261985A (sv) |
AU (1) | AU8251798A (sv) |
CA (1) | CA2294808A1 (sv) |
DE (1) | DE69826502T2 (sv) |
SE (1) | SE511719C2 (sv) |
TW (1) | TW399343B (sv) |
WO (1) | WO1999001019A2 (sv) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6819695B1 (en) * | 2000-01-07 | 2004-11-16 | Triquint Technology Holding Co | Dopant diffusion barrier layer for use in III-V structures |
GB0126642D0 (en) * | 2001-11-06 | 2002-01-02 | Denselight Semiconductors Pte | Design of current blocking structure to improve semiconductor laser performance |
JP4142532B2 (ja) * | 2003-09-02 | 2008-09-03 | シャープ株式会社 | 光学式速度計、変位情報測定装置および搬送処理装置 |
US7919349B2 (en) * | 2008-02-22 | 2011-04-05 | Alcatel-Lucent Usa Inc. | Photonic integration scheme |
TWI416764B (zh) * | 2010-05-06 | 2013-11-21 | 發光二極體 | |
US20150125510A1 (en) | 2011-08-22 | 2015-05-07 | Sean R. Kirkpatrick | Drug delivery system and method of manufacturing thereof |
WO2021022476A1 (zh) * | 2019-08-06 | 2021-02-11 | 华为技术有限公司 | 一种波导结构、集成光芯片及实现电学隔离的方法 |
CN111313233B (zh) * | 2020-03-04 | 2021-07-27 | 常州纵慧芯光半导体科技有限公司 | 一种激光器及其制造方法与应用 |
CN113258442B (zh) * | 2021-07-14 | 2021-11-09 | 华芯半导体研究院(北京)有限公司 | 垂直腔面发射激光器及其制备方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61168981A (ja) | 1985-01-23 | 1986-07-30 | Hitachi Ltd | 半導体レ−ザ装置 |
JPH0828554B2 (ja) | 1989-10-20 | 1996-03-21 | 三菱電機株式会社 | 半導体レーザ及びその製造方法 |
US5179040A (en) | 1990-07-16 | 1993-01-12 | Mitsubishi Denki Kabushiki Kaisha | Method of making a semiconductor laser device |
JP2718342B2 (ja) | 1993-05-28 | 1998-02-25 | 日本電気株式会社 | 半導体レーザ及びその製造方法 |
US5847415A (en) * | 1995-03-31 | 1998-12-08 | Nec Corporation | Light emitting device having current blocking structure |
-
1997
- 1997-07-04 SE SE9702629A patent/SE511719C2/sv not_active IP Right Cessation
-
1998
- 1998-02-12 TW TW087101945A patent/TW399343B/zh not_active IP Right Cessation
- 1998-07-02 US US09/108,971 patent/US6222865B1/en not_active Expired - Fee Related
- 1998-07-03 DE DE69826502T patent/DE69826502T2/de not_active Expired - Fee Related
- 1998-07-03 CA CA002294808A patent/CA2294808A1/en not_active Abandoned
- 1998-07-03 JP JP2000500808A patent/JP2001509638A/ja active Pending
- 1998-07-03 EP EP98932697A patent/EP1019993B1/en not_active Expired - Lifetime
- 1998-07-03 AU AU82517/98A patent/AU8251798A/en not_active Abandoned
- 1998-07-03 WO PCT/SE1998/001315 patent/WO1999001019A2/en active IP Right Grant
- 1998-07-03 CN CN98806913A patent/CN1261985A/zh active Pending
- 1998-07-03 KR KR10-1999-7012535A patent/KR100404307B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69826502D1 (de) | 2004-10-28 |
JP2001509638A (ja) | 2001-07-24 |
US6222865B1 (en) | 2001-04-24 |
DE69826502T2 (de) | 2005-09-29 |
KR20010020581A (ko) | 2001-03-15 |
AU8251798A (en) | 1999-01-25 |
WO1999001019A3 (en) | 1999-04-01 |
TW399343B (en) | 2000-07-21 |
WO1999001019A2 (en) | 1999-01-14 |
KR100404307B1 (ko) | 2003-11-03 |
SE9702629L (sv) | 1999-01-05 |
CA2294808A1 (en) | 1999-01-14 |
EP1019993A2 (en) | 2000-07-19 |
SE511719C2 (sv) | 1999-11-15 |
EP1019993B1 (en) | 2004-09-22 |
CN1261985A (zh) | 2000-08-02 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6175582B1 (en) | Semiconductor laser device | |
JPS6041479B2 (ja) | 注入半導体レ−ザ | |
JP2008135786A (ja) | 高出力半導体レーザダイオード | |
SE9702629D0 (sv) | Laserdiod av typen med begravd heterostruktur | |
US4280108A (en) | Transverse junction array laser | |
EP1283574A3 (en) | Semiconductor laser element | |
WO2005017568A3 (en) | Semiconductor light sources with doping gradients in optical confinement layers for improved device efficiency | |
TW346694B (en) | Self-pulsation semiconductor laser | |
WO2019111804A1 (ja) | 光半導体素子の駆動方法、及び光半導体素子 | |
JPH02189991A (ja) | 電気的に同調可能の半導体レーザー | |
DE502004003310D1 (de) | Oberflächenemittierender halbleiterlaser mit strukturiertem wellenleiter | |
JPS62291987A (ja) | 光集積化素子 | |
KR890005935A (ko) | 반도체 레이저 | |
JP2003168842A (ja) | 波長可変分布帰還型レーザ素子及び波長可変分布帰還型レーザ集積装置 | |
JPS6218782A (ja) | 埋込み構造半導体レ−ザ | |
JP2004095822A (ja) | 半導体レーザ素子 | |
JPH11220208A (ja) | 半導体レーザダイオード | |
JPH05226775A (ja) | 半導体レーザ素子 | |
JP2933981B2 (ja) | 半導体光素子 | |
JPS61276389A (ja) | 半導体光素子 | |
SE9700931D0 (sv) | Buried heterostructure laser | |
JPH07263808A (ja) | 半導体レーザ | |
JPH02203584A (ja) | 半導体発光装置 | |
JPH06334260A (ja) | 半導体レーザ素子とその製造方法 | |
JPH02159086A (ja) | 半導体発光装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |