SE9601547D0 - Laser-plasma röntgenkälla utnyttjande vätskor som strålmål - Google Patents

Laser-plasma röntgenkälla utnyttjande vätskor som strålmål

Info

Publication number
SE9601547D0
SE9601547D0 SE9601547A SE9601547A SE9601547D0 SE 9601547 D0 SE9601547 D0 SE 9601547D0 SE 9601547 A SE9601547 A SE 9601547A SE 9601547 A SE9601547 A SE 9601547A SE 9601547 D0 SE9601547 D0 SE 9601547D0
Authority
SE
Sweden
Prior art keywords
target
chamber
generating
laser plasma
ray source
Prior art date
Application number
SE9601547A
Other languages
English (en)
Other versions
SE510133C2 (sv
SE9601547L (sv
Inventor
Hans M Hertz
Lars Malmqvist
Lars Rymell
Magnus Berglund
Original Assignee
Hans M Hertz
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=20402312&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=SE9601547(D0) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Hans M Hertz filed Critical Hans M Hertz
Priority to SE9601547A priority Critical patent/SE510133C2/sv
Publication of SE9601547D0 publication Critical patent/SE9601547D0/sv
Priority to DE0895706T priority patent/DE895706T1/de
Priority to PCT/SE1997/000697 priority patent/WO1997040650A1/en
Priority to DE69722609T priority patent/DE69722609T3/de
Priority to AU27207/97A priority patent/AU2720797A/en
Priority to EP97921060A priority patent/EP0895706B2/en
Priority to JP53800397A priority patent/JP3553084B2/ja
Publication of SE9601547L publication Critical patent/SE9601547L/sv
Priority to US09/175,953 priority patent/US6002744A/en
Publication of SE510133C2 publication Critical patent/SE510133C2/sv
Priority to JP2004036569A priority patent/JP3943089B2/ja

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05G—X-RAY TECHNIQUE
    • H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001—X-ray radiation generated from plasma
    • H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SE9601547A 1996-04-25 1996-04-25 Laser-plasma röntgenkälla utnyttjande vätskor som strålmål SE510133C2 (sv)

Priority Applications (9)

Application Number Priority Date Filing Date Title
SE9601547A SE510133C2 (sv) 1996-04-25 1996-04-25 Laser-plasma röntgenkälla utnyttjande vätskor som strålmål
JP53800397A JP3553084B2 (ja) 1996-04-25 1997-04-25 Ｘ線放射線または極紫外線放射線を発生するための方法および装置
EP97921060A EP0895706B2 (en) 1996-04-25 1997-04-25 Method and apparatus for generating x-ray or euv radiation
DE69722609T DE69722609T3 (de) 1996-04-25 1997-04-25 Verfahren und vorrichtung zum erzeugen von röntgen- oder extremer uv- strahlung
PCT/SE1997/000697 WO1997040650A1 (en) 1996-04-25 1997-04-25 Method and apparatus for generating x-ray or euv radiation
DE0895706T DE895706T1 (de) 1996-04-25 1997-04-25 Verfahren und vorrichtung zum erzeugen von röntgen- oder extremer uv- strahlung
AU27207/97A AU2720797A (en) 1996-04-25 1997-04-25 Method and apparatus for generating x-ray or euv radiation
US09/175,953 US6002744A (en) 1996-04-25 1998-10-21 Method and apparatus for generating X-ray or EUV radiation
JP2004036569A JP3943089B2 (ja) 1996-04-25 2004-02-13 Ｘ線放射線または極紫外線放射線を発生するための方法および装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE9601547A SE510133C2 (sv) 1996-04-25 1996-04-25 Laser-plasma röntgenkälla utnyttjande vätskor som strålmål

Publications (3)

Publication Number Publication Date
SE9601547D0 true SE9601547D0 (sv) 1996-04-25
SE9601547L SE9601547L (sv) 1997-10-26
SE510133C2 SE510133C2 (sv) 1999-04-19

Family

ID=20402312

Family Applications (1)

Application Number Title Priority Date Filing Date
SE9601547A SE510133C2 (sv) 1996-04-25 1996-04-25 Laser-plasma röntgenkälla utnyttjande vätskor som strålmål

Country Status (7)

Country Link
US (1) US6002744A (sv)
EP (1) EP0895706B2 (sv)
JP (2) JP3553084B2 (sv)
AU (1) AU2720797A (sv)
DE (2) DE69722609T3 (sv)
SE (1) SE510133C2 (sv)
WO (1) WO1997040650A1 (sv)

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US6831963B2 (en) * 2000-10-20 2004-12-14 University Of Central Florida EUV, XUV, and X-Ray wavelength sources created from laser plasma produced from liquid metal solutions
FR2799667B1 (fr) 1999-10-18 2002-03-08 Commissariat Energie Atomique Procede et dispositif de generation d'un brouillard dense de gouttelettes micrometriques et submicrometriques, application a la generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
US6469310B1 (en) * 1999-12-17 2002-10-22 Asml Netherlands B.V. Radiation source for extreme ultraviolet radiation, e.g. for use in lithographic projection apparatus
TWI246872B (en) * 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
EP1155419B1 (en) 1999-12-20 2007-02-14 Koninklijke Philips Electronics N.V. "x-ray microscope having an x-ray source for soft x-rays
US6493423B1 (en) * 1999-12-24 2002-12-10 Koninklijke Philips Electronics N.V. Method of generating extremely short-wave radiation, method of manufacturing a device by means of said radiation, extremely short-wave radiation source unit and lithographic projection apparatus provided with such a radiation source unit
US6972421B2 (en) * 2000-06-09 2005-12-06 Cymer, Inc. Extreme ultraviolet light source
US6711233B2 (en) 2000-07-28 2004-03-23 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
EP1305984B1 (en) * 2000-07-28 2010-11-24 Jettec AB Method and apparatus for generating x-ray radiation
US6324256B1 (en) * 2000-08-23 2001-11-27 Trw Inc. Liquid sprays as the target for a laser-plasma extreme ultraviolet light source
US6956885B2 (en) * 2000-08-31 2005-10-18 Powerlase Limited Electromagnetic radiation generation using a laser produced plasma
US6693989B2 (en) * 2000-09-14 2004-02-17 The Board Of Trustees Of The University Of Illinois Ultrabright multikilovolt x-ray source: saturated amplification on noble gas transition arrays from hollow atom states
US6760406B2 (en) 2000-10-13 2004-07-06 Jettec Ab Method and apparatus for generating X-ray or EUV radiation
SE520087C2 (sv) * 2000-10-13 2003-05-20 Jettec Ab Förfarande och anordning för alstring av röntgen- eller EUV- strålning samt användning av den
FR2823949A1 (fr) * 2001-04-18 2002-10-25 Commissariat Energie Atomique Procede et dispositif de generation de lumiere dans l'extreme ultraviolet notamment pour la lithographie
US7916388B2 (en) * 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US7405416B2 (en) * 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
GB0111204D0 (en) 2001-05-08 2001-06-27 Mertek Ltd High flux,high energy photon source
JP2003288998A (ja) 2002-03-27 2003-10-10 Ushio Inc 極端紫外光源
JP3759066B2 (ja) 2002-04-11 2006-03-22 孝晏 望月 レーザプラズマ発生方法およびその装置
WO2003096764A1 (en) * 2002-05-13 2003-11-20 Jettec Ab Method and arrangement for producing radiation
US6855943B2 (en) * 2002-05-28 2005-02-15 Northrop Grumman Corporation Droplet target delivery method for high pulse-rate laser-plasma extreme ultraviolet light source
US6738452B2 (en) * 2002-05-28 2004-05-18 Northrop Grumman Corporation Gasdynamically-controlled droplets as the target in a laser-plasma extreme ultraviolet light source
US6792076B2 (en) * 2002-05-28 2004-09-14 Northrop Grumman Corporation Target steering system for EUV droplet generators
US6744851B2 (en) 2002-05-31 2004-06-01 Northrop Grumman Corporation Linear filament array sheet for EUV production
SE523503C2 (sv) * 2002-07-23 2004-04-27 Jettec Ab Kapillärrör
US6835944B2 (en) * 2002-10-11 2004-12-28 University Of Central Florida Research Foundation Low vapor pressure, low debris solid target for EUV production
DE10251435B3 (de) * 2002-10-30 2004-05-27 Xtreme Technologies Gmbh Strahlungsquelle zur Erzeugung von extrem ultravioletter Strahlung
US6912267B2 (en) 2002-11-06 2005-06-28 University Of Central Florida Research Foundation Erosion reduction for EUV laser produced plasma target sources
US6864497B2 (en) * 2002-12-11 2005-03-08 University Of Central Florida Research Foundation Droplet and filament target stabilizer for EUV source nozzles
DE10306668B4 (de) 2003-02-13 2009-12-10 Xtreme Technologies Gmbh Anordnung zur Erzeugung von intensiver kurzwelliger Strahlung auf Basis eines Plasmas
JP4264505B2 (ja) * 2003-03-24 2009-05-20 独立行政法人産業技術総合研究所 レーザープラズマ発生方法及び装置
DE10314849B3 (de) * 2003-03-28 2004-12-30 Xtreme Technologies Gmbh Anordnung zur Stabilisierung der Strahlungsemission eines Plasmas
DE10326279A1 (de) * 2003-06-11 2005-01-05 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Plasma-basierte Erzeugung von Röntgenstrahlung mit einem schichtförmigen Targetmaterial
US6933515B2 (en) * 2003-06-26 2005-08-23 University Of Central Florida Research Foundation Laser-produced plasma EUV light source with isolated plasma
DE102004003854A1 (de) * 2004-01-26 2005-08-18 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Verfahren und Vorrichtungen zur Erzeugung fester Filamente in einer Vakuumkammer
DE102004005241B4 (de) 2004-01-30 2006-03-02 Xtreme Technologies Gmbh Verfahren und Einrichtung zur plasmabasierten Erzeugung weicher Röntgenstrahlung
DE102004005242B4 (de) 2004-01-30 2006-04-20 Xtreme Technologies Gmbh Verfahren und Vorrichtung zur plasmabasierten Erzeugung intensiver kurzwelliger Strahlung
JP2005276673A (ja) * 2004-03-25 2005-10-06 Komatsu Ltd Ｌｐｐ型ｅｕｖ光源装置
JP2005276671A (ja) * 2004-03-25 2005-10-06 Komatsu Ltd Ｌｐｐ型ｅｕｖ光源装置
US7208746B2 (en) * 2004-07-14 2007-04-24 Asml Netherlands B.V. Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
DE102004036441B4 (de) 2004-07-23 2007-07-12 Xtreme Technologies Gmbh Vorrichtung und Verfahren zum Dosieren von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
US7302043B2 (en) * 2004-07-27 2007-11-27 Gatan, Inc. Rotating shutter for laser-produced plasma debris mitigation
DE102004037521B4 (de) * 2004-07-30 2011-02-10 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung von Targetmaterial für die Erzeugung kurzwelliger elektromagnetischer Strahlung
DE102004042501A1 (de) * 2004-08-31 2006-03-16 Xtreme Technologies Gmbh Vorrichtung zur Bereitstellung eines reproduzierbaren Targetstromes für die energiestrahlinduzierte Erzeugung kurzwelliger elektromagnetischer Strahlung
JP2006128313A (ja) * 2004-10-27 2006-05-18 Univ Of Miyazaki 光源装置
JP4429302B2 (ja) * 2005-09-23 2010-03-10 エーエスエムエル ネザーランズ ビー．ブイ． 電磁放射線源、リソグラフィ装置、デバイス製造方法、および該製造方法によって製造されたデバイス
US7718985B1 (en) 2005-11-01 2010-05-18 University Of Central Florida Research Foundation, Inc. Advanced droplet and plasma targeting system
DE102007056872A1 (de) 2007-11-26 2009-05-28 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Berlin Strahlungserzeugung mittels Laserbestrahlung eines freien Tröpfchentargets
US7872245B2 (en) * 2008-03-17 2011-01-18 Cymer, Inc. Systems and methods for target material delivery in a laser produced plasma EUV light source
CN102484938B (zh) 2009-09-01 2014-12-10 株式会社Ihi 等离子体光源
JP2011054376A (ja) 2009-09-01 2011-03-17 Ihi Corp Ｌｐｐ方式のｅｕｖ光源とその発生方法
WO2014072149A2 (en) * 2012-11-07 2014-05-15 Asml Netherlands B.V. Method and apparatus for generating radiation
CN106061388B (zh) * 2014-01-07 2019-03-08 杰特克公司 X-射线微成像
WO2015179819A1 (en) 2014-05-22 2015-11-26 Ohio State Innovation Foundation Liquid thin-film laser target
JP5930553B2 (ja) * 2014-07-25 2016-06-08 株式会社Ihi Ｌｐｐ方式のｅｕｖ光源とその発生方法
DE102014226813A1 (de) * 2014-12-22 2016-06-23 Siemens Aktiengesellschaft Metallstrahlröntgenröhre
RU2658314C1 (ru) * 2016-06-14 2018-06-20 Общество С Ограниченной Ответственностью "Эуф Лабс" Высокояркостный источник эуф-излучения и способ генерации излучения из лазерной плазмы

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Also Published As

Publication number Publication date
DE69722609T2 (de) 2004-04-29
EP0895706A1 (en) 1999-02-10
JP2000509190A (ja) 2000-07-18
WO1997040650A1 (en) 1997-10-30
EP0895706B1 (en) 2003-06-04
SE510133C2 (sv) 1999-04-19
DE69722609T3 (de) 2009-04-23
SE9601547L (sv) 1997-10-26
EP0895706B2 (en) 2008-08-06
JP2004235158A (ja) 2004-08-19
US6002744A (en) 1999-12-14
DE69722609D1 (de) 2003-07-10
DE895706T1 (de) 2001-06-13
JP3553084B2 (ja) 2004-08-11
AU2720797A (en) 1997-11-12
JP3943089B2 (ja) 2007-07-11

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